• Title/Summary/Keyword: Transistor

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High Temperature Electrical Behavior of 2D Multilayered MoS2

  • Lee, Yeon-Seong;Jeong, Cheol-Seung;Baek, Jong-Yeol;Kim, Seon-Guk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.377-377
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    • 2014
  • We demonstrate the high temperature-dependent electrical behavior at 2D multilayer MoS2 transistor. Our previous reports explain that the extracted field-effect mobility of good device was inversely proportional to the increase of temperature. Because scattering mechanism is dominated by phonon scattering at a well-designed MoS2 transistor, having, low Schottky barrier. However, mobility at an immature our $MoS_2$ transistor (${\mu}m$ < $10cm^2V^{-1}s^{-1}$) is proportional to the increase temperature. The existence of a big Schottky barrier at $MoS_2-Ti$ junction can reduce carrier transport and lead to lower transistor conductance. At high temperature (380K), the field-effect mobility of multilayer $MoS_2$ transistor increases from 8.93 to $16.9cm^2V^{-1}sec^{-1}$, which is 2 times higher than the value at room temperature. These results demonstrate that carrier transport at an immature $MoS_2$ with a high Schottky barrier is mainly affected by thermionic emission over the energy barrier at high temperature.

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A study on the efficiency characteristics for two transistor Forward DC-DC converter (Two transistor 포워드 DC-DC 컨버터의 효율 특성에 관한 연구)

  • Ahn, Tae-Young;Lee, Gwang-Taek
    • The Transactions of the Korean Institute of Power Electronics
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    • v.12 no.1
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    • pp.50-55
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    • 2007
  • In this paper, we present an analytical method that provides fast and efficient evaluation of the conversion efficiency for Two transistor forward (TTF) DC-DC converter In the proposed method, the conduction losses are evaluated by calculating the effective values of the ideal current waveform first and incorporating them into an exact equivalent circuit model of the TTF converter that includes all the parasitic resistances of the circuit components. While the conduction losses are accurately accounted for the diode rectification, the core losses are assumed to be negligible in order to simplify the analysis. The validity and accuracy of the proposed method are verified with experiments on a prototype TTF converter An excellent correlation between the experiments and theories are obtained for the input voltages of 390V, output voltage 12V and maximum power 480W.

Simulation of Characteristics Analysis by Total Ionizing Dose Effects in Partial Isolation Buried Channel Array Transistor (부분분리 매립 채널 어레이 트랜지스터의 총 이온화 선량 영향에 따른 특성 해석 시뮬레이션)

  • Je-won Park;Myoung-Jin Lee
    • Journal of IKEEE
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    • v.27 no.3
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    • pp.303-307
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    • 2023
  • In this paper, the creation of an Electron-Hole Pair due to Total Ionizing Dose (TID) effects inside the oxide of a Buried Channel Array Transistor (BCAT) device is induced, resulting in an increase in leakage current and threshold due to an increase in hole trap charge at the oxide interface. By comparing and simulating changes in voltage with the previously proposed Partial Isolation Buried Channel Array Transistor (Pi-BCAT) structure, the characteristics in leakage current and threshold voltage changed regardless of the increased oxide area of the Pi-BCAT device, compared to the asymmetrically doped BCAT structure. It shows superiority.

Impact of Gamma Irradiation Effects on IGBT and Design Parameter Considerations

  • Lho, Young-Hwan
    • ETRI Journal
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    • v.31 no.5
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    • pp.604-606
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    • 2009
  • The primary dose effects on an insulated gate bipolar transistor (IGBT) irradiated with a $^{60}Co$ gamma-ray source are found in both of the components of the threshold shifting due to oxide charge trapping in the MOS and the reduction of current gain in the bipolar transistor. In this letter, the IGBT macro-model incorporating irradiation is implemented, and the electrical characteristics are analyzed by SPICE simulation and experiments. In addition, the collector current characteristics as a function of gate emitter voltage, VGE, are compared with the model considering the radiation damage of different doses under positive biases.

An Improved Soft Switching Two-transistor Forward Converter (개선된 소프트 스위칭 Two-transistor forward converter)

  • Kim, Marn-Go
    • Proceedings of the KIPE Conference
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    • 2000.07a
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    • pp.137-140
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    • 2000
  • This paper proposes an improved soft switching two-transistor forward converter which uses a novel lossless snubber circuit to effectively control the turn-off dv/dt rate of the main transistors. In the proposed soft switching implementation the turn-off voltage traces across the main two transistors are almost the same contributing to reduce the total capacitive turn-on loss and the snubber current is divided into the two transistors resulting in distributed thermal stresses

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Hot Carrier Induced Device Degradation in GAA MOSFET (Hot carrier에 의한 GAA MOSFET의 열화현상)

  • 최락종;이병진;장성준;유종근;박종태
    • Proceedings of the IEEK Conference
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    • 2002.06b
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    • pp.5-8
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    • 2002
  • Hot carrier induced device degradation is observed in thin-film, gate-all-around SOI transistor under DC stress conductions. We observed the more significant device degradation in GAA device than general single gate SOI device due to the degradation of edge transistor. Therefore, it is expected that the maximum available supply voltage of GAA transistor is lower than that o( bulk MOSFET or single gale SOI device.

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A Technique for Full Wave Rectification using a Single Transistor (Single Transistor에 의한 전파정류 Technique)

  • 이주근;이동근
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.15 no.3
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    • pp.7-10
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    • 1978
  • A method of full wave rectification is proposed which is accomplished by an inverter circuit including R-feed back. Both halves of the input cycle can be presented in the out put by composing a conductive half cycle and an inactive half cycle substituted by feed back in the cut off state.

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A Symbolic Layout Generator for CMOS Standard Cells Using Artificial Intelligence Approach (인공지능 기법을 이용한 CMOS 표준셀의 심볼릭 레이아웃 발생기)

  • 유종근;이문기
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.24 no.6
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    • pp.1080-1086
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    • 1987
  • SLAGEN, a system for symbolic cell layout based on artificial intelligence approach, takes as input a transistor connection description of CMOS standard cells and environment information, and outputs a symbolic layout description. SLAGEN performas transistor grouping by a heuristic search method, in order to minimize the number of separations, and then performs group reordering and transistor reordering with an eye toward minimizing routing. Next, SLAGEN creates a rough initial routing in order to guarantee functionality and correctness, and then improve the initial routing by a rule-based approach.

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3- Transistor Cell OTP ROM Array Using Standard CMOS Gate-Oxide Antifuse

  • Kim, Jin-Bong;Lee, Kwy-Ro
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.3 no.4
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    • pp.205-210
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    • 2003
  • A 3-Transistor cell CMOS OTP ROM array using standard CMOS antifuse (AF) based on permanent breakdown of MOSFET gate oxide is proposed, fabricated and characterized. The proposed 3-T OTP cell for ROM array is composed of an nMOS AF, a high voltage (HV) blocking nMOS, and cell access transistor, all compatible with standard CMOS technology. The experimental results show that the proposed structure can be a viable technology option as a high density OTP ROM array for modern digital as well as analog circuits.

X-shaped Conjugated Organic Materials for High-mobility Thin Film Transistor

  • Choi, Dong-Hoon;Park, Chan-Eon
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.310-311
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    • 2009
  • New X-shaped crystalline molecules have been synthesized through various coupling reactions and their electronic properties were investigated. They exhibit good solubility in common organic solvents and good self-film forming properties. They are intrinsically crystalline as they exhibit well-defined X-ray diffraction patterns from uniform and preferred orientations of molecules. They also exhibited high field effect mobilities in thin film transistor (TFT) and good device performances.

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