• Title/Summary/Keyword: Titanium oxide films

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Self-Assembled $TiO_2$ and Polyelectrolyte Multilayer as OTFT Gate Insulator

  • Moon, Zi-Su;Kim, Hong-Doo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.1422-1424
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    • 2009
  • Modified self-assembled $TiO_2$ and polyelectrolyte multilayer film have been used as OTFT insulator. Both films were used as gate insulator and their thickness were reduced to the order of 10nm. The operating voltage of OTFT was substantially reduced due to nanoscale thickness of titanium oxide and polyelectrolyte multilayer. Pentacene-based OTFT characteristics will be discussed.

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Advanced Optical and Electrical Properties of TIO Thin Films by Thermal Surface Treatment of Electron Beam Irradiation (전자빔 열 표면처리에 따른 TIO 박막의 투명전극 특성 개선 효과)

  • Yeon-Hak Lee;Min-Sung Park;Daeil Kim
    • Journal of the Korean Society for Heat Treatment
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    • v.36 no.4
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    • pp.193-197
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    • 2023
  • Transparent and conducting titanium (Ti) doped indium oxide (TIO) thin films were deposited on the poly-imide (PI) substrate with radio frequency magnetron sputtering and then electron irradiation was conducted on the TIO film's surface to investigate the effect electron irradiation on the crystallization and opto-electrical properties of the films. All x-ray diffraction (XRD) pattern showed two diffraction peaks of the In2O2 (431) and (444) planes with regardless of the electron beam irradiation energy. In the AFM analysis, the surface roughness of as deposited films was 3.29 nm, while the films electron irradiated at 700 eV, show a lower RMS roughness of 2.62 nm. In this study, the FOM of as deposited TIO films is 6.82 × 10-3 Ω-1, while the films electron irradiated at 500 eV show the higher FOM value of 1.0 × 10-2 Ω-1. Thus, it is concluded that the post-deposition electron beam irradiation at 500 eV is the one of effective methods of crystallization and enhancement of opto-electrical performance of TIO thin film deposited on the PI substrate.

Evaluation of Corrosion Resistance Properties by Applying Galvanostatic Nanoscale Current Density on Passive Metals

  • Na, Seung-Chan;Lee, Jeong-Ja;Yang, Won-Seog;Hwang, Woon-Suk
    • Corrosion Science and Technology
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    • v.6 no.1
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    • pp.7-11
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    • 2007
  • In this study, new evaluation method for the stability and corrosion resistance properties of passive films has been suggested by means of observation of self-activation process in open-circuit state and galvanostatic nanoscale reduction test. The experiments were performed for air-formed oxide film in case of plain carbon steel, and for anodically passivated films formed in aqueous sulfuric acid solutions in case of titanium and 304 stainless steel. From these experimental results, we derived two parameters, $i_{0}$ and $q_{0}$, which characterize the self-activation process and the properties of passive film on a stainless steel surface. The parameter $i_{0}$ was defined as the rate of self-activation, and $q_{0}$, the reduced amount of charge during the self-activation process. In conclusion, it is considered that the stability and corrosion resistance of passive metals and alloys can be evaluated quantitatively by three parameters of $\tau_{0}$, $q_{0}$, and $i_{0}$, which easily obtain by means of observing the self-activation process and galvanostatic nanoscale reduction test.

A Study of Photoelectrolysis of Water by Use of Titanium Oxide Films (산화티타늄피막의 광 전기분해 특성에 대한 연구)

  • Park, Seong-Yong;Cho, Won-Il;Cho, Byung-Won;Lee, Eung-Cho;Yun, Kyung-Suk
    • Journal of Hydrogen and New Energy
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    • v.2 no.1
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    • pp.47-56
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    • 1990
  • Pure titanium rods were oxidized by anodic oxidation, furnace oxidation and flame oxidation and used as a electrode in the photodecomposition of water. The maximum photoelectrochemical conversion efficiency(${\eta}$) was found for flame oxidized electrode ($1200^{\circ}C$ for 2 min in air), 0.8 %. Anodically oxidized electrodes have minimum photoelectrochemical conversion efficiencies, 0.3 %. Furnace oxidized electrode ($800^{\circ}C$ for 10min in air) has 0.5% phtoelectrochemical efficiency and shows a band-gap energy of about 2.9eV. The efficiency shows a parallelism with the presence of the metallic interstitial compound $TiO_{O+X}$(X < 0.33) at the metal-semiconductor interface, the thickness of the sub oxide layer and that of the external rutile scale.

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A Study of Weldability for Pure Titanium by Nd:YAG Laser(III) - Weld Properties of Edge Welding - (순티타늄판의 Nd:YAG 레이저 용접성에 관한 연구(III) - 에지 용접 특성 -)

  • Kim, Jong-Do;Kil, Byung-Lea;Kwak, Myung-Sub;Song, Moo-Keun
    • Journal of Welding and Joining
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    • v.27 no.6
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    • pp.74-79
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    • 2009
  • Titanium and titanium alloy can be reproduced immediately even if oxide films($TiO_2$) break apart in sea water. Therefore, since titanium demonstrates large specific strength and outstanding resistance to stress corrosion cracking, crevice corrosion, pitting and microbiologically influenced corrosion in sea water environment, it has been widely applied to heat exchanger for ships. In particular, with excellent elongation, pure titanium may be deemed as optimal material for production of heat exchanger plate which is used with wrinkles formed for efficient heat exchange. Conventional plate type heat exchanger prevented leakage of liquid through insertion of gasket between plates and mechanical tightening by bolts and nuts, but in high temperature and high pressure environment, gasket deterioration and leakage occur, so heat exchanger for LPG re-liquefaction device etc do not use gasket but weld heat exchanger plate for use. On the other hand, since welded plate cannot be separated, it is important to obtain high quality reliable welds. In addition, for better workability and production performance, lasers that can obtain weldment with large aspect ratio and demonstrate fast welding speed even in atmospheric condition not in vacuum condition are used in producing products. So far, 1st report and 2nd report compared and analyzed embrittlement degrees by bead colors of weldment through quantitative analysis of oxygen and nitrogen and measurement of hardness as fundamental experiment for the evaluation of titanium laser welding, and evaluated the welding performance and mechanical properties of butt welding. This study welded specimens in various conditions by using laser and GTA welding machine to apply edge welding to heat exchanger, and evaluated the mechanical strength through tensile stress test. As a result of tensile test, laser weldment demonstrated tensile strength 4 times higher than GTA welds, and porosity could be controlled by increasing and decreasing slope of laser power at overlap area.

Improvement on Surface and Electrical Properties of Polymer Insulator Coated TiO2 Thin Film by Atomic Layer Deposition (원자층 증착장치에 의한 TiO2 박막 코팅된 폴리머 절연체의 표면 및 전기적 특성의 향상)

  • Kim, Nam-Hoon;Park, Yong Seob
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.29 no.7
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    • pp.440-444
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    • 2016
  • Titanium oxide ($TiO_2$) thin films were synthesized on polymer insulator and Si substrates by atomic layer deposition (ALD) method. The surface and electrical properties of $TiO_2$ films synthesized at various ALD cycle numbers were investigated. The synthesized $TiO_2$ films exhibited higher contact angle and smooth surface. The contact angle of $TiO_2$ films was increased with the increase of ALD-cycle number. Also, the rms surface roughness of films was slightly rough with the increase of ALD-cycle number. The leakage current on $TiO_2$ film surface synthesized at various conditions were uniformed, and the values were decreased with the increase of ALD-cycle number. In the results, the performance of $TiO_2$ films for self-cleaning critically depended on a number of ALD-cycle.

Effects of Oxygen Surface Treatment on the Properties of TiO2 Thin Film for Self-cleaning Application (자기세정을 위한 스퍼터링 TiO2 박막의 산소 표면처리에 따른 특성)

  • Kim, Nam-Hoon;Park, Yong Seob
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.29 no.5
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    • pp.294-297
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    • 2016
  • Titanium oxide ($TiO_2$) thin films were fabricated by unbalanced magnetron (UBM) sputtering. The fabricated $TiO_2$ films were treated by oxygen plasma under various RF powers. We investigated the characteristics of oxygen plasma treatment on the surface, structural, and physical properties of $TiO_2$ films prepared at various plasma treatment RF powers. UBM sputtered $TiO_2$ films exhibited higher contact angle value, smooth surface, and amorphous structure. However, the rms surface roughness $TiO_2$ films were rough, and the contact angle value was decreased with the increase of the plasma treatment RF power Also, the hardness value of $TiO_2$ film as physical properties was slightly increased with the increase of the plasma treatment RF power. In the results, the performance of $TiO_2$ films for self cleaning critically depended on the with the plasma treatment RF power.

The influence of preparation conditions on the electrochemical degradation of tungsten oxide thin films prepared by electron beam deposition (제작조건이 전자비임으로 제작된 텅스텐산화물 박막의 전기화학적 퇴화에 미치는 영향)

  • 이길동
    • Journal of the Korean Vacuum Society
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    • v.7 no.4
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    • pp.306-313
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    • 1998
  • The electrochromic $WO_3$thin films were prepared by using the electron-beam evaporatin technique. Flms prepared at a vacuum pressure of $10^{-4}$ mbar were found to be most stable during repeated potential cycles. The chemical stability of the film in aqueous solutions was also affected by the vacuum pressure during evaporation. The redox current and the optical properties of the degraded films were affected by the thickness of the film. The 5,000$\AA$-thick films were found to be most stable, undergoing the least degradation during the repeated coloring and bleaching cycles. The origin of the mechanism dominating the degradation during the repeated coloring and bleaching cycles was the accumulation of lithium in the film, which results in decreasing redox current. Tungsten oxide films with titanium content of about 10-15 mol% was found to be most stable, undergoing the least degradation during the repeated cycles. The origin of the mechanism dominating the least degradation during the repeated cycles was the reduction of lithium ion trapping sites in the films, which results in a increased durability.

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The effect of annealing for dielectric properties of Ti doped $K(Ta,Nb)O_3$ thin film using PLD (PLD를 사용하여 Ti doped K(Ta,Nb)O3 thin film의 유전특성을 위한 annealing 효과)

  • Koo, Ja-Yl;Yi, Chong-Ho;Bae, Hyung-Jin;Lee, Won-Suk
    • Proceedings of the IEEK Conference
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    • 2006.06a
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    • pp.985-986
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    • 2006
  • The epitaxial $KTa_{0.524}Nb_{0.446}Ti_{0.03}O_3$ films with 3% Ti were investigated. Titanium (+4) substitution on the Nb/Ta site should reduce dielectric losses of KTN: Ti film by introducing an acceptor state. This acceptor state traps electrons due to oxygen vacancies that form during oxide film growth. KTN:Ti films were grown using pulsed laser deposition, and then annealed at different temperatures in oxygen ambient. The crystallinity, and surface morphology of KTN:Ti film were investigated using x-ray diffraction, and atomic force microscopy. The dielectric properties of Ti doped KTN films measured for unannealed and annealed films will be reported. Tunability and dielectric loss of as-deposited KTN:Ti film were determined to be 10% and 0.0134, respectively. For films annealed at $800^{\circ}C$ and $900^{\circ}C$, the dielectric loss decreased but with a decrease in tunability as well.

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Effect of Additives on the Stress Corrosion Cracking Behavior of Alloy 600 in High Temperature Caustic Solutions

  • Hur, Do Haeng;Kim, Joung Soo;Baek, Jae Sun;Kim, Jung Gu
    • Corrosion Science and Technology
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    • v.3 no.1
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    • pp.6-13
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    • 2004
  • The effect of inhibitors on the electrochemical behavior and the stress corrosion cracking resistance of Alloy 600(UNS N06600) was evaluated in 10% sodium hydroxide solution at $315^{\circ}C$. The specimens of a C-ring type for stress corrosion cracking test were polarized at 150 mV above the corrosion potential for 120 hours with and without inhibitors such as titanium oxide, titanium boride and cerium boride. The chemical compositions of the films formed on the crack tip in the C-ring specimens were analyzed using a scanning Auger electron spectroscopy. The cerium boride, the most effective, was observed to decrease the crack propagation rate more than a factor of three compared with that obtained in no inhibitor solution. It was found that the changes of the active-passive transition potentials and the film compositions were related to the resistance to stress corrosion cracking in high temperature caustic solution.