Journal of the Korean Society for Heat Treatment (열처리공학회지)

The Korean Society for Heat Treatment (한국열처리공학회)
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Advanced Optical and Electrical Properties of TIO Thin Films by Thermal Surface Treatment of Electron Beam Irradiation

전자빔 열 표면처리에 따른 TIO 박막의 투명전극 특성 개선 효과

  • Yeon-Hak Lee (School of Materials Science and Engineering, University of Ulsan) ;
  • Min-Sung Park (School of Materials Science and Engineering, University of Ulsan) ;
  • Daeil Kim (School of Materials Science and Engineering, University of Ulsan)
  • 이연학 (울산대학교 첨단소재공학부) ;
  • 박민성 (울산대학교 첨단소재공학부) ;
  • 김대일 (울산대학교 첨단소재공학부)
  • Received : 2023.05.08
  • Accepted : 2023.05.29
  • Published : 2023.07.30
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Abstract

Transparent and conducting titanium (Ti) doped indium oxide (TIO) thin films were deposited on the poly-imide (PI) substrate with radio frequency magnetron sputtering and then electron irradiation was conducted on the TIO film's surface to investigate the effect electron irradiation on the crystallization and opto-electrical properties of the films. All x-ray diffraction (XRD) pattern showed two diffraction peaks of the In2O2 (431) and (444) planes with regardless of the electron beam irradiation energy. In the AFM analysis, the surface roughness of as deposited films was 3.29 nm, while the films electron irradiated at 700 eV, show a lower RMS roughness of 2.62 nm. In this study, the FOM of as deposited TIO films is 6.82 × 10-3 Ω-1, while the films electron irradiated at 500 eV show the higher FOM value of 1.0 × 10-2 Ω-1. Thus, it is concluded that the post-deposition electron beam irradiation at 500 eV is the one of effective methods of crystallization and enhancement of opto-electrical performance of TIO thin film deposited on the PI substrate.

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References

  1. D. J. Seo and S. H. Park : Physica. B 357 (2005) 420.
  2. T. Koida and M. Kondo : Appl. Phys. lett. 89 (2006) 082104.
  3. D. R. Acosta and A. I. Martinez : Thin Solid Films 515 (2007) 8432.
  4. S. H. Choe, J. K. Jang, H. Kim, J. Choi, S. B. Heo, Y. Kim3, Y. Kong1 and D. Kim1, Korean J. Met. Mater. 59 (2021) 545.
  5. D. Kim, B. Kim and H. Kim : Thin Solid Films 547 (2013) 225.
  6. R. K. Gupta, K. Ghosh, S. R. Mishra and P.K. Kahol : Mater. Lett. 62 (2008) 1033 .
  7. B. D. Cullity : Elements of X-ray diffractions, Addition-Wesley, Reading, MA, (1978) 102.
  8. S. B. Heo, J. Chun, Y. Lee and D. Kim : J. Kor. Soc. Heat. Treat., 25 (2012) 134.
  9. G. Haacke : J. Appl. Phys., 47 (1976) 4086.