• 한국표면공학회지
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• 제35권4호
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• pp.199-205
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• 2002

TiN and TiAlN films were deposited on SKD 11 steel substrates by an arc ion plating (AIP) technique. The crystallinity and morphology for the deposited films were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). The mechanical properties of both films were investigated through the indentation, impact, and wear test. Those films fairly adherent to SKD 11 steel substrate, showed hardness values of 2300 $\pm$ 100kg/$\textrm{mm}^2$ and 3200 $\pm$ 100kg/$\textrm{mm}^2$ with a load of 25g, respectively. During impact test, TiAlN films showed much superior impact wear resistance to TiN films. It could be suggested that the TiN films was failed relatively by plastic deformation with oxidation during impact test, while TiAlN films was failed by brittle fracture and resisted the oxidation by the impact energy. The friction coefficient of TiAlN films became lower than that of TiN films at high sliding speed condition although it was higher than that of TiN films at low speed. Therefore, TiAlN films was suggested to be more advantageous than TiN films for high speed machining fields.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2003년도 춘계학술대회논문집
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• pp.99-104
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• 2003

TiN coated films show a good mechanical properties, high thermal properties and wear, erosion and corrosion resistance and are widely used as a coating materials in tools, ornaments, parts and semiconductors. In spite of these good properties, the fracture of TiN coated films occur during use. The fracture of TiN thin films is related to their microstructure. Especially, the life of TiN coated layer is related to the texture of the TiN films. One researcher suggested that the corrosion and erosion resistance of the TiN thin films is related to a uniform and dense structure of films. In this study, we studied the relationships between textures and friction coefficient, erosion and corrosion in TiN coated films. The flatness of (115) texture surface of TiN thin films is flatter than that of (111) texture surface. The friction coefficient of (115) texture surface of TiN thin films is similar with that of (111) texture surface. The wear resistance of (115) texture surface of TiN thin films is better than that of (111) texture surface. The erosion and corrosion resistance of (115) texture surface of TiN thin films is better than that of (111) torture surface. As well as texture, the wear, erosion and corrosion of TiN thin films has to consider defects such as pinholes, cracks, surface roughness and open columnar structure. The life of TiN coated products is influenced by the properties of wear, erosion, and corrosion resistance of TiN thin films and is related to texture of TiN coated films, density of pinholes and cracks, density of structure, and surface flatness.

• 한국표면공학회지
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• 제25권5호
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• pp.235-252
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• 1992

(Ti, Al)N films were deposited on 304 stainless steel sheet by D.C. magnetron sputtering using Al target and Ti plate. The high temperature oxidation of (T, Al)N films with the variation of composition has been investigated. The chemical composition of (Ti, Al)N films with the variation of composition has been investigated. The chemical composition of (Ti, Al)N films was similar to the sputter area ratio of titanium to aluminum target by means of EDS and AES survey. The high temperature oxidation test of (Ti, Al)N showed that (Ti, Al)N has better high temperature resistance than TiN and TiC films. TiC films were cracked at 40$0^{\circ}C$ in air TiN films quickly were oxidised at $600^{\circ}C$, were spalled more than $700^{\circ}C$. But (Ti, Al)N films are relatively stable to$ 900^{\circ}C$. The good resistance to high temperature oxida-tion of (Ti, Al)N films are due to the formation of dense Al2O3 and TiO2 oxide layer. Especially, Al2O3 oxide layer is more important. The results obtained from this study show, it is believe that the (Ti, Al)N film by D.C. magnetron sputtering is promising for the use of high temperature and wear resistance mate-rials.

• 한국진공학회지
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• 제11권3호
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• pp.159-165
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• 2002

본 연구에서는 $TiCl_4$과 $NH_3$을 이용하여 atomic layer deposition(ALD)법으로 TiN막을 증착한 후, 그 막의 특성에 관하여 조사하였다. 최적 공정조건에서 TiN막의 성장률은 cycle당 두께가 약 0.6 $\AA$인 것으로 나타났고, 비저항은 반응온도 구간에서 200~350 $\mu\Omega$cm 수준으로 낮게 얻어졌다. XRD분석결과 TiN-ALD온도구간에서 TiN막이 결정화되었음을 알 수 있었다. AES 분석결과 Cl불순물의 함량이 거의 없는 상태(<1 at%)로 나타났고, TiN막에서의 Ti:N비가 1:1인 것으로 보아 거의 균일하게 형성되었음을 알 수 있었다. 또한 SEM관찰로 Aspect ratio 10:1의 trench 내에 형성된 TiN막의 스텝.커버리지는 극히 우수함을 알 수 있었다.

• Journal of Ceramic Processing Research
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• 제13권spc1호
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• pp.149-153
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• 2012

Ti2AlN MAX-phase films were synthesized through the post-annealing process of as-deposited Ti-Al-N films. Near amorphous or quasi-crystalline ternary Ti-Al-N films were deposited on Si and Al2O3 substrates by sputtering a Ti2AlN MAX-phase target at room temperature, 300 ℃ and 450 ℃, respectively. A vacuum annealing of those films at 800 ℃ for 1 hour changed those films to crystalline Ti2AlN MAX-phase. The polycrystalline Ti2AlN MAX-phase films exhibited very excellent oxidation resistance due to its characteristics microstructure (nanolaminates), which has potential applications for high-temperature protective coatings. The microstructure and composition of Ti2AlN MAX-phase films were investigated using with a variety of characterization tools.

• 한국안광학회지
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• 제14권1호
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• pp.57-62
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• 2009

목적: Magnetron의 세기를 비대칭으로 한 unbalanced magnetron sputtering 장치를 설계 제작하고 sus304시편 위에 TiN박막을 증착하여 색상과 경도에 관한 연구를 하고자 한다. 방법: 증착된 박막표면의 화학조성을 양적으로 분석하기 위하여 XPS high resolution scan과 curve fitting을 수행하였으며, 박막 표면의 경도를 측정하기 위해 nano indentation 장비를 이용하였다. 결과: 박막 두께가 두꺼워지면 박막의 색상은 처음에는 연한 금색, 시간이 지남에 따라 어두운 금색, 연보라, 남색으로 바뀌었다. 두께에 따른 박막의 색상변화는 박막에$TiO_{x}N_{y}$, $TiO_2$, TiN과 같은 세가지 화합물의 조성변화에 기인함을 알 수 있었으며,$ TiO_{x}N_{y}$의 조성변화가 두께에 따른 색상변화에 가장 큰 영향을 미치는 것을 여겨졌다. 결론: TiN박막의 비커스 경도가 TiN의 일반적인 경도보다 수치가 작은 것은 박막이 TiN, $TiO_2$,$TiO_{x}N_{y}$ 세가지 물질 섞여 있기 때문이라고 여겨지며, 두께에 따른 박막의 경도가 점점 커지다가 줄어드는 것은 두께에 따른 TiN 양과 밀접한 관계가 있음을 알 수 있었다.

• 한국표면공학회지
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• 제41권6호
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• pp.264-268
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• 2008

Interaction between human osteoblast and TiN films was conducted in vitro. TiN films were produced by cathodic arc plasma deposition. The surface was characterized by atomic force microscopy (AFM). TiN films, glass substrates and Ti films were cultured with human osteoblasts for 48 and 72 h hours. Actin stress fiber patterns and microtubules of osteoblasts were found slightly more organized and distributed on TiN films compared to those on the Ti films and the glass substrates. Human osteoblasts also showed slightly higher cell attachment, proliferation, and focal contact adhesion on TiN films compared to those on Ti films and glass substrates. Our results demonstrated that TiN films showed slightly better cellular adhesion of osteoblasts than Ti films and glass substrates in a short-time culture period.

• 열처리공학회지
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• 제18권5호
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• pp.281-287
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• 2005

Titanium aluminium nitride((TiAl)N) film is anticipated as an advanced coating film with wear resistance used for drills, bites etc. and with corrosion resistance at a high temperature. In this study, (TiAl)N thin films were deposited both at room temperature and at elevated substrate temperatures of 573 to 773 K by using a two-facing-targets type DC sputtering system in a mixture Ar and $N_2$ gases. Atomic compositions of the binary Ti-Al alloy target is Al-rich (25Ti-75Al (atm%)). Process parameters such as precursor volume %, substrate temperature and Ar/$N_2$ gas ratio were optimized. The crystallization processes and phase transformations of (TiAl)N thin films were investigated by X-ray diffraction, field-emission scanning electron microscopy. The microhardness of (TiAl)N thin films were measured by a dynamic hardness tester. The films obtained with Ar/$N_2$ gas ratio of 1:3 and at 673 K substrate temperature showed the highest microhardness of $H_v$ 810. The crystallized and phase transformations of (TiAl)N thin films were $Ti_2AlN+AlN{\rightarrow}TiN+AlN$ for Ar/$N_2$ gas ratio of 1:3, $Ti_2AlN+AlN{\rightarrow}TiN+AlN{\rightarrow}Ti_2AlN+TiN+AlN$ for Ar/$N_2$ gas ratio of 1:1 and $TiN+AlN{\rightarrow}Ti_2AlN+TiN+AlN{\rightarrow}Ti_2AlN+AlN{\rightarrow}Ti_2AlN+TiN+AlN$ for Ar/$N_2$ gas ratio of 3:1. The above results are discussed in terms of crystallized phases and microhardness.

• 한국표면공학회지
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• 제35권4호
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• pp.211-217
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• 2002

Ti-Si-N films were deposited onto WC-Co substrate by a RF-PECVD technique. The deposition behaviors of Ti-Si-N films were investigated by varying the deposition temperature, RF power, and reaction gas ratio (Mx). Ti-Si-N films deposited at 500, 180W, and Mx 60% had a maximum hardness value of 38GPa. The microstructure of films with a maximum hardness was revealed to be a nanocomposite of TiN crystallites penetrated by amorphous silicon nitride phase by HRTEM analyses. The microstructure of maximum hardness with Si content (10 at.%) was revealed to be a nanocomposite of TiN crystallites penetrated by amorphous silicon nitride phase, but to have partly aligned structure of TiN and some inhomogeniety in distribution. and At above 10 at.% Si content, TiN crystallite became finer and more isotropic also thickness of amorphous silicon nitride phase increased at microstructure.

• 한국진공학회지
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• 제10권3호
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• pp.321-327
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• 2001

Radio frequency magnetron sputtering방법으로 타켈의 Ti/si 조성과 $N_2$ 유량을 변화시켜 증착한 다양한 조성비의 Ti-Si-N 박막의 비저항 변화와 확산방지능력을 조사하였다. 높은 Si 함량을 포함한 Ti-Si-N박막내의 Si은 주로 비정질의 $Si_3N_4$ 형태로 존재하였으며 $N_2$의 양이 증가함에 따라 비저항도 증가하였다. 반면, 낮은 Si 함량을 포함한 Ti-Si-N박막은 낮은 $N_2$ 유량에서도 결정질의 TiN이 형성되었고 낮은 비저항을 나타내었다. 또한, 박막내의 N의 양이 증가함에 따라, 높은 박막의 밀도와 압축응력을 갖는 Ti-Si-N이 형성되었으며, 이는 박막 내의 N의 함량이 확산방지능력에 영향을 미치는 가장 중요한 요소 중 하나로 판단된다. 결과적으로, 29~49 at.%, Ti, 6~20 at.% Si, 45~55 at.% N 범위의 조성을 갖는 Ti-Si-N박막이 우수한 확산 억제 능력을 보유하면서 또한 낮은 비저항 특성을 나타내는데 적합한 조성 범위로 나타났다.