Journal of Ceramic Processing Research

Ceramic Processing Research Center (한양대학교 세라믹연구소)
권호 표지

Syntheses and properties of Ti2AlN MAX-phase films

  • Zhang, Tengfei (School of Materials Science and Engineering, Pusan National University) ;
  • Myoung, Hee-bok (School of Materials Science and Engineering, Pusan National University) ;
  • Shin, Dong-woo (School of Nano & Advanced Materials Engineering, Gyeongsang National University) ;
  • Kim, Kwang Ho (School of Materials Science and Engineering, Pusan National University)
  • Published : 2012.07.01
⟨ Previous Next ⟩

Abstract

Ti2AlN MAX-phase films were synthesized through the post-annealing process of as-deposited Ti-Al-N films. Near amorphous or quasi-crystalline ternary Ti-Al-N films were deposited on Si and Al2O3 substrates by sputtering a Ti2AlN MAX-phase target at room temperature, 300 ℃ and 450 ℃, respectively. A vacuum annealing of those films at 800 ℃ for 1 hour changed those films to crystalline Ti2AlN MAX-phase. The polycrystalline Ti2AlN MAX-phase films exhibited very excellent oxidation resistance due to its characteristics microstructure (nanolaminates), which has potential applications for high-temperature protective coatings. The microstructure and composition of Ti2AlN MAX-phase films were investigated using with a variety of characterization tools.

Keywords