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Syntheses and properties of Ti2AlN MAX-phase films  

Zhang, Tengfei (School of Materials Science and Engineering, Pusan National University)
Myoung, Hee-bok (School of Materials Science and Engineering, Pusan National University)
Shin, Dong-woo (School of Nano & Advanced Materials Engineering, Gyeongsang National University)
Kim, Kwang Ho (School of Materials Science and Engineering, Pusan National University)
Publication Information
Journal of Ceramic Processing Research / v.13, no.spc1, 2012 , pp. 149-153 More about this Journal
Abstract
Ti2AlN MAX-phase films were synthesized through the post-annealing process of as-deposited Ti-Al-N films. Near amorphous or quasi-crystalline ternary Ti-Al-N films were deposited on Si and Al2O3 substrates by sputtering a Ti2AlN MAX-phase target at room temperature, 300 ℃ and 450 ℃, respectively. A vacuum annealing of those films at 800 ℃ for 1 hour changed those films to crystalline Ti2AlN MAX-phase. The polycrystalline Ti2AlN MAX-phase films exhibited very excellent oxidation resistance due to its characteristics microstructure (nanolaminates), which has potential applications for high-temperature protective coatings. The microstructure and composition of Ti2AlN MAX-phase films were investigated using with a variety of characterization tools.
Keywords
MAX-phase; $Ti_2AlN$; Pulse DC magnetron sputtering; HRTEM; Oxidation behaviour;
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