• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.237.1-237.1
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• 2013

Ti 와 Al 은 금속간의 화합물이 내산화성에 우수한 성질을 가지고 있으며 낮은 밀도와 고온에도 큰 변화가 없는 성질을 가지고 있다. 그리하여 내식 및 부식 관련 연구나 고온재료를 필요로 하는 우주, 엔진 제품 등에 많은 연구가 진행되고 있다. 또한 Ti-Al-N 박막은 경도가 우수하여 고속 공구 부품에 널리 사용되고 있으며 최근 Ti-Al-N 에 Si 첨가로 인하여 40 GPa 이상의 고경도와 1,000도 이상의 산화온도를 지닌 나노 혼합물 코팅을 형성 시키는 것으로 알려져 있다. 본 연구에서는 Ti, Al, Si 원분말을 PBM (Planetary Ball Milling) 방법을 사용하여 Ti-Al-Si 혼합분말로 제조하고, 제조된 분말들은 SPS (Spark Plasma Sintering) 공정을 통하여 Ti-Al-Si 합금타겟을 제작하였다. 제작된 Ti-Al-Si 합급타겟을 사용한 Sputtering 공정을 수행하여 Ti-Al-Si 3원계 박막을 증착하였다. 그 결과 기존 Ti (82 ${\mu}m$), Al (32 ${\mu}m$), Si (16 ${\mu}m$) 크기의 원분말들이 PBM (Planetary Ball Milling) 공정 후 Ti-Al-Si (18 ${\mu}m$) 로 입도가 작아진 것을 확인 할 수 있었고, 소결 후 타겟이 99% 이상의 높은 밀도를 가졌으며 원분말의 조성과 동일한 조성을 가진 타겟이 제작되었음을 확인하였다. Ti-Al-Si 타겟의 경도는 약 1,000 Hv 이상의 값을 보였으며, Ti-Al-Si-N 박막의 경우 타겟의 조성과 동일하였고 경도는 약 35 GPa 로 높은 경도 값을 가지는 것을 확인하였다. 내산화 테스트 결과 Ti-Al-Si-N 박막은 1,000도 에서도 박막의 손상이 가지 않았다.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2013.05a
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• pp.119-120
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• 2013

공구, 다이몰드 등에 널리 쓰이는 TiC, TiN, CrN, TiCrN, TiAlN 코팅의 산화특성을 비교하기 위하여 $600^{\circ}C-900^{\circ}C$에서 대기중 산화시험을 실시하였다. 내산화성은 (TiC, TiN), TiAlN, TiCrN, CrN 코팅의 순서로 증가하였다. 코팅원소중 Ti는 $TiO_2$로, Cr은 $Cr_2O_3$로, Al은 $Al_2O_3$로 산화되었다.

• Corrosion Science and Technology
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• v.12 no.3
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• pp.119-124
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• 2013

Nano-multilayered, crystalline AlTiSiN thin films were deposited on WC-TiC-Co substrates by the cathodic arc plasma deposition. The deposited film consisted of wurtzite-type AlN, NaCl-type TiN, and tetragonal $Ti_2N$ phases. Their oxidation characteristics were studied at 800 and $900^{\circ}C$ for up to 20 h in air. The WC-TiC-Co oxidized fast with large weight gains. By contrast, the AlTiSiN film displayed superior oxidation resistance, due mainly to formation of the ${\alpha}-Al_2O_3$-rich surface oxide layer, below which an ($Al_2O_3$, $TiO_2$, $SiO_2$)-intermixed scale existed. Their oxidation progressed primarily by the outward diffusion of nitrogen, combined with the inward transport of oxygen that gradually reacted with Al, Ti, and Si in the film.

• Journal of the Korean institute of surface engineering
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• v.36 no.4
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• pp.329-333
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• 2003

The high-temperature oxidation behavior of Ti39Al-10V alloy that consisted primarily of $\beta$-Ti, ${\gamma}$-TiAl, and $\alpha_2$ $-Ti_3$Al phases was studied. The relatively thick and porous oxide scales formed consisted primarily of an outermost, thin TiO$_2$ layer, and an outer, thin $Al_2$$O_3$-rich layer, and an inner, very thick (TiO$_2$, $Al_2$$O_3$) mixed layer. Vanadium was present uniformly throughout the oxide scale. The formation and subsequent evaporation of V-oxides such as VO, $VO_2$, and $V_2$O$_{5}$ deteriorated oxidation resistance and scale adherence of the TiAl alloy significantly.y.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2015.11a
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• pp.255-255
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• 2015

나노압침방법을 적용하여 arc ion plating을 통해 제조된 TiAlSiN 코팅층의 질소 함량에 따른 나노 기계적 특성을 평가하였다. 코팅층의 질소 함량은 28~30 [at.%] 이었다. 코팅층에는 AlN, TiSi, $Al_5Ti_3$, $Ti_3AlN$, $Al_5Ti_2$ 상이 형성되었다. 질소 함량이 더 작은 코팅층의 나노경도, 마찰계수, 피로한계의 값이 높아짐을 알 수 있었다.

• Korean Journal of Materials Research
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• v.5 no.3
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• pp.345-356
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• 1995

본 연구에서는 TiAl 금속간 화합물을 자전 고온 반응법을 이용하여 제조시 반응과정을 열시차 분석 방법으로 분석하였다. 합금 조성은 Ti-45at% Al, 53at%Al, 알루미늄 분말 크기, 승온 속도, 성형 밀도 등을 변화시켜 이들이 반응 과정에 미치는 영향을 관찰하였다. 분말이 미세할수록, 승온속도가 느릴수록, 성형 밀도가 낮을수록 반응 점화 온도 및 연소 온도가 감소하였으며, 고상 Ti와 고상 Al간의 반응정도가 증가하는 것이 관찰되었다. 고상 Ti와 고상 Al간의 반응에서 생성되는 것은 XRD 분석 결과 Ti$Al_{3}$상으로 확인되었다. 이에 비하여 반응 점화 온도가 알루미늄의 용융 온도보가 높을 경우에는 생성되는 상이 $Ti_{3}$Al, TiAl상으로 확인되었다. 이러한 상의 생성 원인에 대하여 확산 계수 및 알루미늄의 용해도등의 요인으로 설명하였다.

• Journal of Ceramic Processing Research
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• v.13 no.spc1
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• pp.149-153
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• 2012

Ti2AlN MAX-phase films were synthesized through the post-annealing process of as-deposited Ti-Al-N films. Near amorphous or quasi-crystalline ternary Ti-Al-N films were deposited on Si and Al2O3 substrates by sputtering a Ti2AlN MAX-phase target at room temperature, 300 ℃ and 450 ℃, respectively. A vacuum annealing of those films at 800 ℃ for 1 hour changed those films to crystalline Ti2AlN MAX-phase. The polycrystalline Ti2AlN MAX-phase films exhibited very excellent oxidation resistance due to its characteristics microstructure (nanolaminates), which has potential applications for high-temperature protective coatings. The microstructure and composition of Ti2AlN MAX-phase films were investigated using with a variety of characterization tools.

• Journal of Powder Materials
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• v.5 no.2
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• pp.129-132
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• 1998

The elevated temperature compressive tests were carried out in order to investigate the deformation behavior and microstructural characteristics of Al-8%Ti, Al-12%Ti and Al-16%Ti (wt%) alloys, which were mechanically alloyed and consolidated by vacuum hot pressing, A13Ti intermetallic phases were formed with sizes of few hundred nanometers in the mechanically alloyed Al-Ti alloys. The compressive strength of mechanically alloyed AA-Ti alloys increased with decroasing the temperature and with increasing the strain rate. The strain rate sensitivities of Al-8%Ti, Al-12%Ti and Al-16%Ti alloys were measured 0.02,0.03, and 0.14, respectively, at 35$0^{\circ}C$.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2013.05a
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• pp.114-115
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• 2013

$Ti_3AlC_2$ was corroded between 800 and $1100^{\circ}C$ in an Ar-0.2% $SO_2$ gas atmosphere according to the equation: $Ti_3AlC_2+O_2{\rightarrow}rutile-TiO_2+{\alpha}-Al_2O_3$ + (CO or $CO_2$). The scales that formed on the $Ti_3AlC_2$ were thin and rich in ${\alpha}-Al_2O_3$, whose growth rate was exceedingly slow. The $TiO_2$ was present either as the outermost surface scale or a mixture inside the ${\alpha}-Al_2O_3$-rich scale. In the $Ti_3AlC_2$, the activity and diffusivity of Ti were low, whereas those of Al were high. This was the main reason for the superior corrosion resistance of $Ti_3AlC_2$ over TiAl.

• Korean Journal of Materials Research
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• v.9 no.7
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• pp.688-694
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• 1999

Ti-6Al-4V-N films have been grown onto glass substrates by dc reactive magnetron sputtering from a Ti-6Al-4V-N alloy target at different nitrogen partial pressure, input powers and sputtering times. The influence of various sputtering conditions on structural properties of Ti-6Al-4V-N films was investigated by measuring their X-ray diffraction. The quaternary Ti-6Al-4V-N film is crystallizing in a face centered cubic TiN structure, the lattice parameter is smaller than the TiN parameter as titanium atoms of the TiN lattice are replaced by aluminum and vanadium atoms. The films show the (111) preferred orientation and the (111) peak intensity decreases as the nitrogen partial pressure is increased, but the intensity increases as the sputtering time is increased. The deposition rate and the grain size are alto related with the variation of various sputtering conditions.