• 제목/요약/키워드: Ti precursor

검색결과 293건 처리시간 0.021초

CeMnO3가 치환된 저온소결 PMW-PNN-PZT 세라믹스의 유전 및 압전 특성 (Dielectric and Piezoelectric Properties of Low Temperature Sintering PMW-PNN-PZT Substituted with CeMnO3)

  • 김용진;류주현
    • 한국전기전자재료학회논문지
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    • 제28권3호
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    • pp.160-164
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    • 2015
  • In this study, $(1-x)Pb(Mg_{1/2}W_{1/2})_{0.03}(Ni_{1/3}Nb_{2/3})_{0.09}(Zr_{0.5}Ti_{0.5})_{0.88}O_3+xCeMnO_3$ (x= 0~0.02) ceramics were prepared by Columbite precursor method. The phase structure, ferroelectric and piezoelectric properties were systematically investigated. It was found that PMW-PNN-PZT possessed superior electrical properties due to its composition close to the MPB (morphotropic phase boundary). Coercive electric field of 10.05 [kV/cm] and density of 7.88 [$g/cm^3$] were obtained when the substitution amount of $CeMnO_3$ is x=0.02. In contrast, specimens with x=0.01 showed the mechanical quality factor($Q_m$) of 1,091 and the electromechanical coupling factor($k_p$) of 0.613.

Fabrication and characterization of perovskite CH3NH3Pb1-xSbxI3-3xBr3x photovoltaic devices

  • Yamanouchi, Jun;Oku, Takeo;Ohishi, Yuya;Fukaya, Misaki;Ueoka, Naoki;Tanaka, Hiroki;Suzuki, Atsushi
    • Advances in materials Research
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    • 제7권1호
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    • pp.73-81
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    • 2018
  • $TiO_2/CH_3NH_3Pb_{1-x}Sb_xI_{3-3x}Br_{3x}-based$ photovoltaic devices were fabricated by a spin-coating method using mixture solutions with $SbBr_3$. Effects of $SbBr3$, CsI or RbBr addition to $CH_3NH_3PbI_3$ precursor solutions on the photovoltaic properties where investigated. The short-circuit current densities and photoconversion efficiencies were improved by adding a small amount of $SbBr_3$, CsI or RbBr to the perovskite phase, which would be due to the doping effect of Sb, Br and Cs/Rb atom at the Pb, I and $CH_3NH3$ sites, respectively.

첨가제의 조성과 함량이 코디어라이트 세라믹스의 소결밀도와 압축강도에 미치는 영향 (Effects of Additive Composition and Content on Sintered Density and Compressive Strength of Cordierite Ceramics)

  • 장두희;임광영;김영욱
    • 한국세라믹학회지
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    • 제44권4호
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    • pp.230-234
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    • 2007
  • Cordierite ceramics were fabricated via a reaction sintering process using ceramics-filled polysiloxane as a precursor for cordierite ceramics. In this study, the effects of the additive composition, additive content, and sintering temperature on the sintered density and compressive strength of cordierite ceramics have been investigated The sintered densities of reaction-sintered cordierite ceramics containing $TiO_2$ as an additive were insensitive to the additive composition, additive content, and sintering temperature and ranged from $1.92g/cm^3\;to\;2.06g/cm^3$. In contrast, the cordierite ceramics containing $Y_2O_3$ showed a maximal density of $2.21g/cm^3$ at 5 wt% addition and at a sintering temperature of $1400^{\circ}C$. The compressive strength of cordierite ceramics showed the same tendency with the density. Typical compressive strength of cordierite ceramics containing 5 wt% $Y_2O_3$ as a sintering additive and sintered at $1400^{\circ}C\;was\;{\sim}480MPa$.

Hybrid Sol을 이용한 박막 유전체 제작 (Fabrication of Thin Film Dielectric by Hybrid Sol)

  • 김용석;유원희;장병규;오용수
    • 한국재료학회지
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    • 제17권4호
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    • pp.185-191
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    • 2007
  • The purpose of this study is to evaluate the thin fihn dielectric made of hybrid sol, which consist of barium titanate powder, polymeric sol and other polymers. This sol will be used dielectric applied to small, thin electric passive components such as MLCC(Multi Layer Ceramic Condenser), resister, inductor. This sol is composed of mixed fine barium titanate powder and polymeric sol including Ba, Ti-precursor, solvent, chelating agent, chemical reaction catalyst, the additive sols to improve fired densification and temperature reliability. First at all, we mixed hybrid sol to be dispersed and be stabilized by ball milling for 24hrs. By spin coating method, we makes thin film dielectric on the convectional green sheet for MLCC. After heat treatments, we analyzes the structure morphology, physical, electrical properties and X5R Temperature properties.

Reduced Titania Films with Ordered Nanopores and Their Application to Visible Light Water Splitting

  • Shahid, Muhammad;Choi, Seo-Yeong;Liu, Jingling;Kwon, Young-Uk
    • Bulletin of the Korean Chemical Society
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    • 제34권8호
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    • pp.2271-2275
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    • 2013
  • We report on the photoelectrochemical properties of partially reduced mesoporous titania thin films. The fabrication is achieved by synthesizing mesoporous titania thin films through the self-assembly of a titania precursor and a block copolymer, followed by aging and calcination, and heat-treatment under a $H_2$ (1 torr) environment. Depending on the temperature used for the reaction with $H_2$, the degree of the reduction (generation of oxygen vacancies) of the titania is controlled. The oxygen vacancies induce visible light absorption, and decrease of resistance while the mesoporosity is practically unaltered. The photoelectrochemical activity data on these films, by measuring their photocurrent-potential behavior in 1 M NaOH electrolyte under AM 1.5G 100 mW $cm^{-2}$ illumination, show that the three effects of the oxygen vacancies contribute to the enhancement of the photoelectrochemical properties of the mesoporous titania thin films. The results show that these oxygen deficient $TiO_2$ mesoporous thin films hold great promise for a solar hydrogen generation. Suggestions for the materials design for improved photoelectrochemical properties are made.

Sputter Seeding을 이용한 CVD Cu 박막의 비선택적 증착 및 기판의 영향 (The Blanket Deposition and the Sputter Seeding Effects on Substrates of the Chemically Vapor Deposited Cu Films)

  • 박종만;김석;최두진;고대홍
    • 한국세라믹학회지
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    • 제35권8호
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    • pp.827-835
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    • 1998
  • Blanket Copper films were chemically vapor deposited on six kinds for substrates for scrutinizing the change of characteristics induced by the difference of substrates and seeding layers. Both TiN/Si and {{{{ { SiO}_{2 } }}/Si wafers were used as-recevied and with the Cu-seeding layers of 40${\AA}$ and 160${\AA}$ which were produced by sputtering The CVD processes were exectued at the deposition temperatures between 130$^{\circ}C$ and 260$^{\circ}C$ us-ing (hfc)Cu(VTMS) as a precursor. The deposition rate of 40$^{\circ}C$ Cu-seeded substrates was higher than that of other substrates and especially in seeded {{{{ { SiO}_{2 } }}/Si substrate because of the incubation period reducing in-duced by seeding layer at the same deposition time and temperature. The resistivity of 160${\AA}$ Cu seeded substrate was lower then that of 40 ${\AA}$ because the nucleation and growth behavior in Cu-island is different from the behavior in {{{{ { SiO}_{2 } }} substrate due to the dielectricity of {{{{ { SiO}_{2 } }}.

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Metal-Organic Decomposition법에 의한 강유전성 $YMnO_3$ 박막의 제조 및 특성 (Preparation of Ferroelectric $YMnO_3$ Thin Films by Metal-Organic Decomposition Process and their Characterization)

  • 김제헌;강승구;김응수;김유택;심광보
    • 한국세라믹학회지
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    • 제37권7호
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    • pp.665-672
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    • 2000
  • The ferroelectric YMnO3 thin films were prepared by MOD(metal-organic decomposition) method with Y- and Mn-acetylacetonate as starting materials. Thin films were grown on various substrates by spin-coating technique. The crystalline phases of the thin films were identified by X-ray diffractometer as a function of heat-treatment temperature, pH of coating solution and substrate. In addition, the effect of Mn/Y molar ratio(0.8~1.2) on the formation of hexagonal-YMnO3 phase was investigated. In forming highly c-axisoriented hexagonal-YMnO3 single phase, the Pt coated Si substrate was more effective than the bare Si substrate, and the optimum heat-treatment condition was at 82$0^{\circ}C$ for 30 min. Higher Mn/Y molar ratio within 0.8~1.2 and pH of YMnO3 precursor solution within 0.5~2.5 favored formation of ferroelectric hexagonal phase rather than orthorhombic phase. Leakage current density of the hexagonal-YMnO3 thin film formed on Pt(111)/TiO2/SiO2/Si substrate was low enough as 0.4~4.0$\times$10-8(A/$\textrm{cm}^2$) at 5 V and its remanent polarization(Pr), calculated from the P-E hysteresis loop, was 3 nC/$\textrm{cm}^2$.

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다결정 및 박막형 $Sr_2Nb_2O_7$의 입자배향과 전기적특성 (Grain Orientation and Electrical Properties of $Sr_2Nb_2O_7$ Ceramics and Thin Films)

  • 손창헌;전상재;남효덕;이희영
    • 한국전기전자재료학회논문지
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    • 제11권4호
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    • pp.274-280
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    • 1998
  • Polycrystalline $Sr_2Nb_2O_7$ ceramics with very high Curie temperature were sintered using the powder derived by the chemical coprecipitation method (CCP). The phase evolution and grain-orientation of sintered samples were examined by XRD, while sintering behavior, dielectric properties and polarization were studied by SEM and ferroelectric tester. Extremely high degree of grain-orientation was observed along the (0k0) direction, which resulted in anisotropic dielectric properties of the sintered samples, with the dielectric constant values approaching those for single crystal. Thin film fabrication of $Sr_2Nb_2O_7$ in the pyroniobate family was also attempted on $SiO_2$/Si(100), Pt/$SiO_2$/Si(100), Pt/Ti/$SiO_2$/Si(100) and Pt/$ZrO_2/SiO_2/Si_2(100)$ substrates, using metalorganic decomposition (MOD) process. Neodecanoate precursor solution was prepared by mixing strontium neodecanoate with niobium neodecanoate synthesized from niobium ethoxide. It was found that $Sr_2Nb_2O_7$ single phase appeared in XRD patterns the samples annealed above $950^{\circ}C$. The effect of substrate type on film microstructure and dielectric properties was observed.

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화학적기계적연마 공정으로 제조한 PZT 캐패시터의 공정 조건에 따른 강유전 특성 연구 (Ferroelectric characteristics of PZT capacitors fabricated by using chemical mechanical polishing process with change of process parameters)

  • 전영길;정판검;고필주;김남훈;이우선
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.66-66
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    • 2007
  • Lead zirconate titanate (PZT) is one of the most attractive perovskite-type materials for ferroelectric random access memory (FRAM) due to its higher remanant polarization and the ability to withstand higher coercive fields. We first applied the damascene process using chemical mechanical polishing (CMP) to fabricate the PZT thin film capacitor to solve the problems of plasma etching including low etching profile and ion charging. The $0.8{\times}0.8\;{\mu}m$ square patterns of silicon dioxide on Pt/Ti/$SiO_2$/Si substrate were coated by sol-gel method with the precursor solution of PZT. Damascene process by CMP was performed to pattern the PZT thin film with the vertical sidewall and no plasma damage. The polarization-voltage (P-V) characteristics of PZT capacitors and the current-voltage characteristics (I-V) were examined by change of process parameters. To examine the CMP induced damage to PZT capacitor, the domain structure of the polished PZT thin film was also investigated by piezoresponse force microscopy (PFM).

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Influence of Deposition Parameters on Film Hardness for Newly Synthesized BON Thin Film by Low Frequency R.F. PEMOCVD

  • G.C. Chen;J.-H. Boo;Kim, Y.J.;J.G. Han
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2001년도 춘계학술발표회 초록집
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    • pp.73-73
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    • 2001
  • Boron-containing materials have several excellent properties, such as superlnardness, insulation and non-Rinear optical property. Recently, oxynitride compounds, such as Si(ON), Ti(ON), became the promising materials applied in diffusion barrier layer and solar cell. With the expectation of obtaining the hybrid property, we have firstly grown the BON thin film by radio frequency (R.F.) plasma enhanced metalorganic chemical vapm deposition (PEMOCVD) with 100 kHz frequency and trimethyl borate precursor. The plasma source gases used in this study were Ar and $H_2$, and two kinds of nhmgen source gases, $N_2$ and <$NH_3$, were also employed. The as-grown films were characterized by XPS, IR, SEM and Knoop microlhardness tester. The relationship between the films hardness and the growth rate indicated that the hardness of the film was dependent on several factors such as nitrogen source gas, substrate temperature and film thickness due to the variation of the composition and the structure of the film. Both nitrogen and carbon content could raise the film hardness, on which nitrogen content did stronger effect than carbon. The smooth morphology and continuous structure was benefit of obtaining high hardness. The maximum hardness of BON film was about 10 GPa.

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