• Journal of Sensor Science and Technology
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• v.13 no.2
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• pp.157-167
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• 2004

A stoichiometric mixture of evaporating materials for $CuAlSe_{2}$ single crystal thin films was prepared from horizontal electric furnace. To obtain the single crystal thin films, $CuAlSe_{2}$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were $680^{\circ}C$ and $410^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of $CuAlSe_{2}$ single crystal thin films measured with Hall effect by van der Pauw method are $9.24{\times}10^{16}cm^{-3}$ and $295cm^{2}/V{\codt}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the $CuAlSe_{2}$ obtained from the absorption spectra was well described by the Varshni's relation, $E_{g}(T)$ = 2.8382 eV - ($8.68{\circ}10^{-4}$ eV/K)$T^{2}$/(T + 155 K). The crystal field and the spin-orbit splitting energies for the valence band of the $CuAlSe_{2}$ have been estimated to be 0.2026 eV and 0.2165 eV at 10 K, respectively, by means of the photocurrent spectra and the Hopfield quasicubic model. These results indicate that the splitting of the ${\Delta}so$ definitely exists in the ${\Gamma}_{5}$ states of the valence band of the $CuAlSe_{2}$. The three photocurrent peaks observed at 10 K are ascribed to the $A_{1-}$, $B_{1-}$, and $C_{1-}$ exciton peaks for n = 1.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.22 no.3
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• pp.472-479
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• 2013

We carried out research into an environmentally friendly injection molding process that involves filling the mold with polymer after thin films are fixed into the cavity, without the coating, plating process. Film insert injection molding is a new technique in which molten plastic resin is injected into the cavity after films are precisely attached to the side of the mold wall. In the film insert injection molding process, the insert film is moved by the flow of the molten plastic resin. Overlap defects cause a decline in the productivity and the quality of the manufactured goods. To reduce overlap defects, new injection mold parts are proposed to produce automotive exterior parts using thin films. It is suggested that the best possible method would be to fix the thin films to one side of the mold wall, and develop interior pins to fix the films in the mold. Based on this new pin fixing system, the problem of the film being moved by the flow of the molten resin was improved.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.13 no.6
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• pp.279-283
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• 2003

In this study, ZnTe : S single crystal thin films substituted by sulfur were grown on GaAs (100) substrates by hot-wall epitaxy. The photoluminescence (PL) characteristics of ZnTe : S single crystal thin films was measured to investigate the effects due to sulfur atoms in the ZnTe layer. The Peak of 2.339 eV identified as the isoelectronic center was observed in low temperature PL spectrum, but PL spectra which the origin had not been well-explained were not observed. Temperature dependence of PL intensities of the light hole free exciton was explained by extrinsic self-trapping. Besides it is reported that the emission lines near absorption edge at room temperature were observed.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.25 no.3
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• pp.211-216
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• 2016

Al alloys are useful materials having high specific strength and are used in machining of parts having thin-walled structures for weight reduction in aircraft, automobiles, and portable devices. In machining of thin-walled structures, it is difficult to maintain dimensional accuracy because machining deformation occurs because of cutting forces and heat in the cutting zone. Thus, cutting conditions and methods need to be investigated and cutting signals need to be analyzed to diagnose and minimize machining deformation and thereby enhance machining quality. In this study, an investigation on cutting conditions to minimize machining deformation and an analysis on characteristics of cutting signals when machining deformation occurs are conducted. Cutting signals for the process are acquired by using an accelerometer and acoustic emission (AE) sensor. Signal characteristics according to the cutting conditions and the relation between machining deformation and cutting signals are analyzed.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.15 no.4
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• pp.157-161
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• 2005

Spectroscopic ellipsomerty measurements of the complex dielectric function of the CdTe thin films grown on GaAs(100) substrates by hot wall epitaxy have been performed in 1.5${\~}$5.5 eV photon energy range at room temperature. The spectroscopic ellipsometer spectra revealed distinct structures at energies of the $E_l,\;E_1+{\Delta}_1$, and $E_2$ critical points. These energies were decreased with increasing thickness of CdTe thin films.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.07a
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• pp.381-384
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• 2004

The stochiometric nix of evaporating materials for the $AgInS_2$ single crystal thin films were prepared from horizontal furnace. The polycrystal structure obtaind from the power x-ray diffraction was chalcopyrite. The lattice costants $a_0\;and\;c_0$ were $a_0=5.86(5.82)\;A,\;c_0=11.355(11.17)\;A$. To obtains the single crystal thin films, $AgInS_2$ mixed crystal were deposited on throughly etched GaAs(100) by the Hot Wall Epitaxy(HWE) system. The temperates of the source and the substrate were $590^{\circ}C\;and\;450^{\circ}C$, respectively. The crystalline structure of single crystal thin films was investigated by the double crystal X-ray diffraction(DCXD). Hall effect on this sample was measured by the method of van der Pauw and studied on carrier density and mobility dependence on temperature. In order to explore the applicability as a photoconductive cell, we measured the sensitivity($\gamma$), the ratio of photocurrent to dark current (pc/dc), maximum allowable power dissipation(MAPD), spectral response and response time.

• KIEAE Journal
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• v.7 no.1
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• pp.33-40
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• 2007

0.4 Million tons of shell powder have been disused as waste in KOREA and caused severe environmental pollution though shell powder can be utilized in real life for many ways. It is impending problem to recycle shell powder as it requires high expense for burying and temporary outside heap and causes severe environmental pollution being a main factor of ocean waste. To suggest the basic data for development of eco-friendly and high-function Wall Coatings Thin Textured Finishes, a wall coating sample was applied to indoor walls of a mock-up and temperature and humidity were measured to assess the thermal performance of it, and a survey of preference for the color sense and feel of the materials with a movie of specimens. The results of the study are following; 1) High insulation performance is shown from the assessment result of the room polystyrene board adhered on the walls then high humidity controlling performance is shown from that of the room polystyrene board coated by shell powder. This point out that shell powder has superiority for humidity controlling. 2) The result of thermal and humidity assessment shows that shell powder makes up for thermal conduction of the polystyrene board and same result can be expected from the assessment with materials which has similar thermal characteristics with polystyrene.3) Ranking of preferred specimens is; 1st Case 13, 2nd Case 17, 3rd Case 16, and 4th Case 12. Preferred shell powder was the ark shell. Preferred powder for plaster was the powder mixed with that sifted by 0.8mm, 100mesh and 40mesh, and for spray was the fine powder mixed with that sifted by 100mesh and 40mesh.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.179-180
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• 2007

Single crystal $AgGaSe_2$ layers were grown on thoroughly etched semi-insulating GaAs(100) substrate at $420^{\circ}C$ with hot wall epitaxy (HWE) system by evaporating $AgGaSe_2$ source at $630^{\circ}C$. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of single crystal $AgGaSe_2$ thin films measured with Hall effect by van der Pauw method are $4.05{\times}\;10^{16}/cm^3$, $139\;cm^2/V{\cdot}s$ at 293 K. respectively. The temperature dependence of the energy band gap of the $AgGaSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=1.9501\;eV\;-\;(8.79{\times}10^{-4}\;eV/K)T^2$/(T + 250 K). The crystal field and the spin-orbit splitting energies for the valence band of the $AgGaSe_2$ have been estimated to be 0.3132 eV and 0.3725 eV at 10 K, respectively, by means of the phcitocurrent spectra and the Hopfield quasicubic model. These results indicate that the splitting of the ${\Delta}So$ definitely exists in the $\Gamma_5$ states of the valence band of the $AgGaSe_2$. The three photocurrent peaks observed at 10 K are ascribed to the $A_1$-, $B_1$-, and $C_1$-exciton peaks for n = 1.

• Journal of the Korean Ceramic Society
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• v.34 no.3
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• pp.241-248
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• 1997

RuO2 thin films were deposited on SiO2(1000$\AA$)/Si and MgO(100) single crystal substrates at low tem-peratures by hot-wall metalorganic chemical vapor deposition(MOCVD), and effects of deposition paramet-ers on the properties of the thin films were investigated. RuO2 single phase was obtained at lower de-position temperature of 25$0^{\circ}C$. RuO2 thin films deposited onto SiO2(1000$\AA$)/Si substrates showed a random orientation, and RuO2 films onto MgO(100) single crystals showed the (hk0) orientation. The crystallinity and resistivity of RuO2 thin films increased and decreased with increasing deposition temperature, respec-tively. The resistivity of RuO2 thin films decreased with decreasing the flow rate. The resistivity of the 2600$\AA$-thick RuO2 thin films deposited with O2 flow rate of 50 sccm at 35$0^{\circ}C$ was 52.7$\mu$$\Omega$-cm, and they could be applicable to bottom electrodes of high dielectric materals.

• Journal of the Korean institute of surface engineering
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• v.26 no.3
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• pp.115-120
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• 1993

Aluminum thin films were deposited on the silicon substrate by the pyrolysis of TrilsoButylAluminum (TIBA) in a cold wall LPCVD reactor. The effect of substrate on the surface topograply and the decomposition reaction was investigated. The activation energy for the decomposition of TIBA was turned out to be 1 eV from the Arrhenious plot. The surface topography of the CVD aluminum could be improved by the application of thin metal film, which was in-situ deposited on the silicon prior to CVD process.