• 정보저장시스템학회논문집
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• 제1권1호
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• pp.73-77
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• 2005

In this paper, a new silicon nitride cantilever integrated with silicon heater and piezoelectric sensor has been firstly developed to improve the uniformity of the initial bending and the mechanical stability of the cantilever array for thermo-piezoelectric SPM(scanning probe microscopy) -based data storages. This nitride cantilever shows thickness uniformity less than $2\%$. Data bits of 40 nm in diameter were recorded on PMMA film. The sensitivity of the piezoelectric sensor was 0.615 fC/nm after poling the PZT layer. For high speed operation, 128${\times}$128 probe array was developed.

• 대한기계학회논문집
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• 제17권12호
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• pp.3094-3104
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• 1993

The five punch and die sets are selected as the examples of arbitrary cross sections which have two opposite inclined sides. Two kinds of blank shapes are designed for all cross sections. One(h-b1.) is determined by slip-line theory and the other (G-b1.) is determined conventionally as the similar shapes with the cross sections which were used by Gopinathan. As a result of the experimental procedures, the superiority of the blank shapes designed by slip-line theory is verified in the limiting drawing ratio, the uniformity of cup height and the thickness distributions.

• 한국초전도저온공학회:학술대회논문집
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• 한국초전도저온공학회 2003년도 추계학술대회 논문집
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• pp.63-66
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• 2003

1 km length of Bi-2223/Ag superconducting wires were fabricated by stacking, drawing process with advanced heat-treatment schedules. Intermediate annealing was carried out to increase the homogeneity and uniformity of the superconducting filaments embedded in the silver matrix. Phase modification from tetragonal to orthorhombic Bi-2212 by pre heat treatment(PHT) was executed to improve the texture and phase transformation of Bi-2223. Drawing stress was measured to Predict the sausaging and stress limit, Rolling parameters such as thickness, width and winding tension were investigated to roll the tape with uniformity. Critical current of 1 km length of superconducting tapes was measured about 50 A continuously after final sintering.

• 한국표면공학회지
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• 제43권3호
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• pp.154-158
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• 2010

Numerical analysis is done to investigate the effects of pulse bias on the plasma processing characteristics like ion doping and ion nitriding by using fluid dynamic code with a 2D axi-symmetric model. For 10 mTorr of Ar plasma, -1 kV of pulse bias was simulated. Maximum sheath thickness was around 20 mm based on the electric potential profile. The peak electron temperature was about 20 eV, but did not affect the averaged plasma characteristics of the whole chamber. Maximum ion current density incident on the substrate was 200 $A/m^2$ at the center, but was decreased down to 1/10th at radius 100 mm, giving poor radial uniformity.

• 한국재료학회지
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• 제31권7호
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• pp.403-408
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• 2021

Various surface colors are predicted and implemented using the interference color generated by controlling the thickness of nano-level diamond like carbon (DLC) thin film. Samples having thicknesses of up to 385 nm and various interference colors are prepared using a single crystal silicon (100) substrate with changing processing times at low temperature by plasma-enhanced chemical vapor deposition. The thickness, surface roughness, color, phases, and anti-scratch performance under each condition are analyzed using a scanning electron microscope, colorimeter, micro-Raman device, and scratch tester. Coating with the same uniformity as the surface roughness of the substrate is possible over the entire experimental thickness range, and more than five different colors are implemented at this time. The color matched with the color predicted by the model, assuming only the reflection mode of the thin film. All the DLC thin films show constant D/G peak fraction without significant change, and have anti-scratch values of about 19 N. The results indicate the possibility that nano-level DLC thin films with various interference colors can be applied to exterior materials of actual mobile devices.

• 한국의류산업학회지
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• 제8권3호
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• pp.317-325
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• 2006

The purposes of this study are to examine clothing businesses which are using dress forms and grasp the problems in apparel manufacturing process, to verify the size and shape of the dress forms for uniformity, to ascertain the uniformity between the dress forms being sold today and the somatotype of the target consumers. The following results were obtained. First, most of the clothing businesses used the existing dress forms in the company. The dress forms didn't reflect the somatotype of the current consumers. And the users satisfaction was below the average. Second, the size and shape of the dress forms being sold today had lack of uniformity between themselves. Third, the dress forms didn't reflect the shape characteristics as well as the size of the target consumers. Consequently, The dress forms need to have the following. First, It is necessary that the dress forms have various functions in a dress form in the future. Second, to get high satisfaction of clothing fit, we need to build up the data base of the consumers somatotype. The data base have to consist of not only circumference but also width, thickness, angle of the current consumers. Last, the further studies of the dress forms need to meet the clothing businesses demand.

• Elastomers and Composites
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• 제48권4호
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• pp.282-287
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• 2013

슬롯코팅은 평판 디스플레이의 부품을 위해 유리에 감광제를 코팅방법으로 많이 쓰이고 있다. 갈수록 고화질의 디스플레이가 요구됨에 따라 코팅의 고품질도 요구되고 있다. 슬롯코팅에서 코팅의 품질은 노즐방향의 코팅 균일성과 운전방향의 코팅 균일성으로 평가된다. 노즐방향의 코팅 균일성은 코터다이 내부의 설계에 의존되며 운전방향의 코팅 균일성은 코터다이 외부의 모양과 운전조건에 의존된다. 본 연구에서는 스롯코팅에서 운전방향의 코팅 균일성에 대해서 컴퓨터해석을 통하여 조사하였다. 해석에서 다이 외부의 형상으로 다이 립 각도와 길이를 변수로 하였고, 운전조건으로는 코팅속도를 변수로 하여 코팅 현상을 분석하고 코팅의 품질을 평가하였다. 코팅속도가 커질수록 코팅두께가 얇아지며 코팅의 균일성이 증대되었으나 maniscus형성이 불안정하여 코팅의 안정성은 감소되었다. Down stream 다이 립 각도가 커질수록 코팅두께의 편차는 작아졌으며, Down stream 다이 립 길이가 길수록 코팅 두께는 얇아졌고 안정적인 코팅이 이루어지기까지의 시간이 길어졌다.

• 한국세라믹학회지
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• 제52권4호
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• pp.290-293
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• 2015

The properties of the IZTO thin films on the glass were studied with a variation of the $SiO_2$ buffer layer thickness. $SiO_2$ buffer layers were deposited by plasma-enhanced chemical vapor deposition (PECVD) on the glass, and the In-Zn-Tin-Oxide (IZTO) thin films were deposited on the buffer layer by RF magnetron sputtering. All the IZTO thin films with the $SiO_2$ buffer layer are shown to be amorphous. Optimum $SiO_2$ buffer layer thickness was obtained through analyzing the structural, morphological, electrical, and optical properties of the IZTO thin films. As a result, the IZTO surface roughness is 0.273 nm with a sheet resistance of $25.32{\Omega}/sq$ and the average transmittance is 82.51% in the visible region, at a $SiO_2$ buffer layer thickness of 40 nm. The result indicates that the uniformity of surface and the properties of the IZTO thin film on the glass were improved by employing the $SiO_2$ buffer layer and the IZTO thin film can be applied well to the transparent conductive oxide for display devices.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.1511-1514
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• 2009

Organic light emitting layer in OLED device was formed by gravure printing process in this work. Organic surface coated by gravure printing typically showed relatively bad uniformity. Thickness and roughness control was characterized by applying various mixed solvents in this work. Poly (N-vinyl carbazole) (PVK) and fact-tris(2-phenylpyridine)iridium($Ir(ppy)_3$) are host dopant system materials. PVK was used as a host and Ir(ppy)3 as green-emitting dopant. To luminance efficiency of the plasma treatment on etched ITO glass and then PEDOT:PSS spin coated. The device layer structure of OLED devices is as follow Glass/ITO/PEDOT:PSS/PVK+Ir(ppy)3-Active layer /LiF/Al. It was printed by gravure printing technology for polymer light emitting diode (PLED). To control the thickness multi-printing technique was applied. As the number of the printing was increased the thickness enhancement was increased. To control the roughness of organic layer film, thermal annealing process was applied. The annealing temperature was varied from room temperature, $40^{\circ}C$, $80^{\circ}C$, to $120^{\circ}C$.

• 대한금속재료학회지
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• 제48권9호
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• pp.856-860
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• 2010

Silver nanoparticles were formed on silica substrates through thin film dewetting at high temperature. The microstructural and morphological evolution of the particles were characterized as a function of processing variables such as initial film thickness, annealing time, and temperature. Silver thin films were deposited onto the silica using a pulsed laser deposition system and annealed in reducing atmosphere to induce agglomeration of the films. The film thicknesses before dewetting were in the range of 5 to 25 nm. A noticeable agglomeration occurs with annealing at temperatures higher than $300^{\circ}C$, and higher annealing temperature increases particle size uniformity for the same film thickness sample. Average particle size linearly correlates to the film thickness, but it does not strongly depend on annealing temperature and time, although threshold temperature for complete dewetting increases with an increase of film thickness. Lower annealing temperature develops faceted surface morphology of the silver particles by enhancing the growth of the low index crystal plane of the particles.