• Korean Journal of Materials Research
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• v.11 no.5
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• pp.393-397
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• 2001

Fer the purpose of improving ductility of $Al_3$Ti intermetallic compound has potential to industrial application, we investigated formation behavior of cubic Ll$_2$ structure and effect of Mn addition. Nanocrystalline cubic Ll$_2$Al$_3$Ti intermetallic compound, has 10nm size of grain, was fabricated by mechanical alloying for 20hr at the composition of Al-8Mn-25Ti. Ternary cubic Ll$_2$Al$_3$Ti, added Mn, did not showed phase transformation from Ll$_2$ to D0$_{23}$ or D0$_{22}$ unlike binary cubic Ll$_2$Al$_3$Ti and maintained Ll$_2$ structure.

• Steel and Composite Structures
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• v.29 no.4
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• pp.527-544
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• 2018

The paper presents the study on a change in modal parameters and structural stiffness of cable-stayed Fiberline Bridge made entirely of Glass Fiber Reinforced Polymer (GFRP) composite used for 20 years in the fjord area of Kolding, Denmark. Due to this specific location the bridge structure was subjected to natural aging in harsh environmental conditions. The flexural properties of the pultruded GFRP profiles acquired from the analyzed footbridge in 1997 and 2012 were determined through three-point bending tests. It was found that the Young's modulus increased by approximately 9%. Moreover, the influence of the temperature on the storage and loss modulus of GFRP material acquired from the Fiberline Bridge was studied by the dynamic mechanical analysis. The good thermal stability in potential real temperatures was found. The natural vibration frequencies and mode shapes of the bridge for its original state were evaluated through the application of the Finite Element (FE) method. The initial FE model was created using the real geometrical and material data obtained from both the design data and flexural test results performed in 1997 for the intact composite GFRP material. Full scale experimental investigations of the free-decay response under human jumping for the experimental state were carried out applying accelerometers. Seven natural frequencies, corresponding mode shapes and damping ratios were identified. The numerical and experimental results were compared. Based on the difference in the fundamental natural frequency it was again confirmed that the structural stiffness of the bridge increased by about 9% after 20 years of service life. Data collected from this study were used to validate the assumed FE model. It can be concluded that the updated FE model accurately reproduces the dynamic behavior of the bridge and can be used as a proper baseline model for the long-term monitoring to evaluate the overall structural response under service loads. The obtained results provided a relevant data for the structural health monitoring of all-GFRP bridge.

• Journal of the Computational Structural Engineering Institute of Korea
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• v.34 no.6
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• pp.347-353
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• 2021

In this study, we presented a novel size optimization framework to control the linear buckling temperature and several buckling modes of plates, by optimizing thickness values of composite structures for practical engineering applications. Predicting the buckling temperature and mode shape of structures is a vital research topic in engineering to achieve structural stability. However, optimizing designs of engineering structures through engineering intuition is challenging. To address this limitation, we proposed a method that combines finite element simulation and size optimization. Based on the idea that the structural buckling temperature and mode shape of a plate are affected by the thickness of the structure, the thickness values of the nodes of the target structure were set as the design variables in this optimization method; and the buckling temperature values, and buckling mode shapes were set as the objective functions. This size optimization method enabled the determination of optimal thickness distributions, to induce the desired buckling temperature values and mode shapes. The validity of the proposed method was verified in terms of their buckling temperature values and buckling mode shapes, using several numerical examples of rectangular composite structures.

• Journal of the Korean institute of surface engineering
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• v.56 no.6
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• pp.401-411
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• 2023

This study investigates the synthesis, characterization, and application of zinc oxide (ZnO) nanoparticles for corrosion resistance and stress corrosion cracking (SCC) mitigation in high-temperature and high-pressure environments. The ZnO nanoparticles are synthesized using plasma discharge in water, resulting in rod-shaped particles with a hexagonal crystal structure. The ZnO nanoparticles are applied to Alloy 600 tubes in simulated nuclear power plant atmospheres to evaluate their effectiveness. X-ray diffraction and X-ray photoelectron spectroscopy analysis reveals the formation of thermodynamically stable ZnCr₂O₄and ZnFe₂O₄ spinel phases with a depth of approximately 35 nm on the surface after 240 hours of treatment. Stress corrosion cracking (SCC) mitigation experiments reveal that ZnO treatment enhances thermal and mechanical stability. The ZnO-treated specimens exhibit increased maximum temperature tolerance up to 310 ℃ and higher-pressure resistance up to 60 bar compared to non-treated ZnO samples. Measurements of crack length indicate reduced crack propagation in ZnO-treated specimens. The formation of thermodynamically stable Zn spinel structures on the surface of Alloy 600 and the subsequent improvements in surface properties contribute to the enhanced durability and performance of the material in challenging high-temperature and high-pressure environments. These findings have significant implications for the development of corrosion-resistant materials and the mitigation of stress corrosion cracking in various industries.

• Journal of the Korean Magnetics Society
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• v.11 no.5
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• pp.184-188
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• 2001

Using a DC-sputter and changing the substrate temperature to room temperature and 200$\^{C}$, we manufactured each Co-22%Cr alloy thin-films, which has a uniform micro-structure at room temperature, and a fine self-organized nato structure (SONS) at the inside of the grain at the elevated temperature. We also investigated the microstructure and domain structure using a transmission electron microscope (TEM) and a magnetic force microscope (MFM). We managed to corrode selectively Co-enriched phase, then investigate the microstructure using a TEM. We found that it has a uniform composition when it is manufactured at room temperature, but, we found that it has a unique microstructure, which has a plate-like fine Co-enriched phase, with the formation of SONS at the inside of the grain at the elevated temperature. In MFM characterization, we found maze-type domains at the period of 5000 when the substrate temperature maintains at room temperature. We define that the maze-type domain has a disadvantage at the high density recording because it generates noises easily as the exchange coupling energy between the grains is big. On the other hand, there is only a fine domain structure at the period of 500 when the substrate temperature maintains at 200 $\^{C}$. We define that the fine domain structure has an advantage at the high density magnetic recording because it has thermal stability due to small exchange coupling energy.

• Current Photovoltaic Research
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• v.9 no.3
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• pp.75-83
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• 2021

The tunnel oxide passivated contact (TOPCon) structure got more consideration for development of high performance solar cells by the introduction of a tunnel oxide layer between the substrate and poly-Si is best for attaining interface passivation. The quality of passivation of the tunnel oxide layer clearly depends on the bond of SiO in the tunnel oxide layer, which is affected by the subsequent annealing and the tunnel oxide layer was formed in the suboxide region (SiO, Si₂O, Si₂O₃) at the interface with the substrate. In the suboxide region, an oxygen-rich bond is formed as a result of subsequent annealing that also improves the quality of passivation. To control the surface morphology, annealing profile, and acceleration rate, an oxide tunnel junction structure with a passivation characteristic of 700 mV or more (V_oc) on a p-type wafer could achieved. The quality of passivation of samples subjected to RTP annealing at temperatures above 900℃ declined rapidly. To improve the quality of passivation of the tunnel oxide layer, the physical properties and thermal stability of the thin layer must be considered. TOPCon silicon solar cell has a boron diffused front emitter, a tunnel-SiO_x/n⁺-poly-Si/SiN_x:H structure at the rear side, and screen-printed electrodes on both sides. The saturation currents J_o of this structure on polished surface is 1.3 fA/cm² and for textured silicon surfaces is 3.7 fA/cm² before printing the silver contacts. After printing the Ag contacts, the J_o of this structure increases to 50.7 fA/cm² on textured silicon surfaces, which is still manageably less for metal contacts. This structure was applied to TOPCon solar cells, resulting in a median efficiency of 23.91%, and a highest efficiency of 24.58%, independently. The conversion efficiency of interdigitated back-contact solar cells has reached up to 26% by enhancing the optoelectrical properties for both-sides-contacted of the cells.

• Composites Research
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• v.12 no.4
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• pp.71-78
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• 1999

To determine the effect of chemical structure of linear amine curing agents on thermal and mechanical properties, standard epoxy resin DGEBA was cured with diaminodiphenyl methane (DDM), diaminodiphenyl sulphone (DDS) in a stoichiometrically equivalent ratio. From this work, the effect of aromatic amine curing agents. In contrast, the results show that the DGEBA/DDS cure system having the sulfone structure between the benzene rings had higher values in the conversion of epoxide, density, shrinkage (%), glass transition temperature, tensile modulus and strength, flexural modulus and strength than the DGEBA/DDM cure system having methylene structure between the benzene rings, whereas the DGEBA/DDM cure system presented higher values in the maximum exothermic temperature, thermal expansion coefficient, and thermal stability. These results are caused by the relative effects of sulfone group having strong electronegativity and methylene group having (+) repulsive property and stem from the effect of the conversion ratio of epoxide group. The result of fractography shows that the each grain size of the DDM/DGEBA system with feather-like structure is larger than that of the DDS/DGEBA system.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.105-105
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• 2009

$ZrO_2$ is one of the most attractive high dielectric constant (high-k) materials. As integrated circuit device dimensions continue to be scaled down, high-k materials have been studied more to resolve the problems for replacing the EY31conventional $SiO_2$. $ZrO_2$ has many favorable properties as a high dielectric constant (k= 20~25), wide band gap (5~7 eV) as well as a close thermal expansion coefficient with Si that results in good thermal stability of the $ZrO_2/Si$ structure. In order to get fine-line patterns, plasma etching has been studied more in the fabrication of ultra large-scale integrated circuits. The relation between the etch characteristics of high-k dielectric materials and plasma properties is required to be studied more to match standard processing procedure with low damaged removal process. Due to the easy control of ion energy and flux, low ownership and simple structure of the inductively coupled plasma (ICP), we chose it for high-density plasma in our study. And the $BCl_3$ included in the gas due to the effective extraction of oxygen in the form of $BCl_xO_y$ compound In this study, the surface kinetic properties of $ZrO_2$ thin film was investigated in function of Ch addition to $BCl_3/Ar$ gas mixture ratio, RF power and DC-bias power based on substrate temperature. The figure 1 showed the etch rate of $ZrO_2$ thin film as function of gas mixing ratio of $Cl_2/BCl_3/Ar$ dependent on temperature. The chemical state of film was investigated using x-ray photoelectron spectroscopy (XPS). The characteristics of the plasma were estimated using optical emission spectroscopy (OES). Auger electron spectroscopy (AES) was used for elemental analysis of etched surface.

• Polymer(Korea)
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• v.29 no.2
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• pp.177-182
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• 2005

Montmorillonite (MMT) modified with siloxane diamine was reacted with a reactant obtained from 4,4'-diphenyl methane diisocyanate (MDI) and polyester type polyol, $Nippollan4010(\bar{M}_n2000)$. Finally, polyurethane (PU)/MMT composites were prepared by using 1,4-butane diol as a chain extender in $25\;wt\%$ solution of N,N-dimethyl acetamide (DMAc). It was expected that these nanocomposites had superior exfoliation property to that of MMT dispersed polyurethanes produced by simple mixing due to insertion of siloxane main chain to the silicate interlayer of MMT. Extent of reaction and formation of final products were analysed by using FT-IR spectroscopy. Dispersion into the PU and intercalation of MMT were identified by applying X-ray diffraction (XRD) and transmission electron microscopy (TEM). Tensile data were acquired by universal test machine (UTM). Thermal stability and variation of surface energy were characterized by thermal gravimetric analysis (TGA) method and measurement of contact angle on the synthesized composites, respectively. As the results the organo-MMT modified with siloxane diamine in the PU composites has an intercalated structure relatively well-expanded rather than a completely exfoliated structure. The tensile strengths and the moduli for the PU/organo-MMT composites were drastically enhanced in comparison to those of $PU/Na^+-MMT$ composites.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.145-145
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• 2008

High-k materials have been paid much more attention for their characteristics with high permittivity to reduce the leakage current through the scaled gate oxide. Among the high-k materials, $ZrO_2$ is one of the most attractive ones combing such favorable properties as a high dielectric constant (k= 20 ~ 25), wide band gap (5 ~ 7 eV) as well as a close thermal expansion coefficient with Si that results in good thermal stability of the $ZrO_2$/Si structure. During the etching process, plasma etching has been widely used to define fine-line patterns, selectively remove materials over topography, planarize surfaces, and trip photoresist. About the high-k materials etching, the relation between the etch characteristics of high-k dielectric materials and plasma properties is required to be studied more to match standard processing procedure with low damaged removal process. Among several etching techniques, we chose the inductively coupled plasma (ICP) for high-density plasma, easy control of ion energy and flux, low ownership and simple structure. And the $BCl_3$ was included in the gas due to the effective extraction of oxygen in the form of $BCl_xO_y$ compounds. During the etching process, the wafer surface temperature is an important parameter, until now, there is less study on temperature parameter. In this study, the etch mechanism of $ZrO_2$ thin film was investigated in function of $Cl_2$ addition to $BCl_3$/Ar gas mixture ratio, RF power and DC-bias power based on substrate temperature increased from $10^{\circ}C$ to $80^{\circ}C$. The variations of relative volume densities for the particles were measured with optical emission spectroscopy (OES). The surface imagination was measured by scanning emission spectroscope (SEM). The chemical state of film was investigated using energy dispersive X-ray (EDX).