• Title/Summary/Keyword: Talbot distance

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A Simple Method for Determining Focal Distances Using Talbot Self-Images

  • Spires, Oliver;Sasian, Jose;Lee, Sukmock
    • Journal of the Optical Society of Korea
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    • v.19 no.6
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    • pp.638-642
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    • 2015
  • We present a simple method to determine the focal distances of lenses with the Talbot self-images. This method uses only one grating, and a priori knowledge of the period of the grating is replaced with a linear relation between the (de)magnified periods of the Talbot images and the lens-to-grating distance. A thick lens whose effective focal length is 500 mm was used to validate the method, and the focal distance of the converging beam was determined with the difference of 0.15% for the nominal focal distance of 521.9 mm. The determined period of the grating with the difference of 0.2% also supports the validation.

Talbot imaging of periodic amplitude objects and its visibility (주기적인 진폭격자들에 의한 Talbot 결상 및 가시도 분석)

  • Kim, Young-Ran;lee, Seung-Bok;Jo, jae-Heung;Chang, Soo;Rim, Cheon-Seog
    • Korean Journal of Optics and Photonics
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    • v.12 no.2
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    • pp.83-90
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    • 2001
  • The Talbot effect for periodic objects with the spatial period p illuminated by expanded coherent light is analyzed by Fresnel diffraction theory, and the Talbot distance (Zr) at which we can observe 1: 1 imaging without any lenses can be defined. We confmned experimentally the Talbot imaging of line, circular, X -type and '||'&'||'copy;-type 2 dimensional alTay gratings at ZT. At the same time, we observed phase reversed Talbot imaging at Zr/2 and Talbot subimage with p/2 at Zr/4 and 3Zr/4. The visibility of Talbot images as a function of the number of slits of the input grating was measured by the FFf (Fast Fourier Transform) results of these images. As a result stationary maximum visibility of V = 0.25 was obtained from grating numbers with more than 15 slit pairs.

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Development of Optical Head Unit for Nano Optical Probe Array (나노 광 프로브 어레이 구현을 위한 광학 헤드 유닛 개발)

  • Kim H.;Lim J.;Kim S.;Han J.;Kang S.
    • Transactions of Materials Processing
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    • v.15 no.1 s.82
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    • pp.21-26
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    • 2006
  • A optical head unit for nano optical probe array was developed. The optical probe array is generated by Talbot effect. The shape and thickness of microlens array(MLA) were designed to minimize the spot size at the foci of MLA. To increase the optical efficiency of the system and obtain the large tolerance for fabrication, aperture size was theoretically optimized. Then microlens illuminated aperture array(MLIAA) as an optical head unit was fabricated using a ultra violet(UV) molding process on aluminum aperture array. In this process, Al aperture array was fabricated separately using the photolithography and reactive ion etching(RIE) process. Optical properties of the generated optical probes were measured and compared at Talbot distance from the aperture array having a diameter of $1{\mu}m$ and MLIAA.

Development of Optical Head Unit for Nano Optical Probe Array (나노 광 프로브 어레이 구현을 위한 광학 헤드 유닛 개발)

  • Kim H.;Lim J.;Kim S.;Han J.;Kang S.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.09a
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    • pp.29-34
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    • 2005
  • A optical head unit for nano optical probe away was developed. The optical probe array is generated by Talbot effect. The shape and thickness of microlens array(MLA) were designed to minimize the spot size at the foci of MLA. To increase the optical efficiency of the system and obtain the large tolerance for fabrication, aperture size was theoretically optimized. Then microlens illuminated aperture array(MLIAA) as an optical head unit was fabricated using a ultra violet(UV) molding process on aluminum aperture array. In this process, Al aperture array was fabricated separately using the photolithography and reactive ion etching(RIE) process. Optical properties of the generated optical probes were measured and compared at Talbot distance from the aperture array having a diameter of $1{\mu}m$ and MLIAA.

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Sensitivity Improvement of Shadow Moiré Technique Using LED Light and Deformation Measurement of Electronic Substrate (LED 광을 이용한 그림자 무아레 방법의 감도 향상 및 모바일 전자 기판의 변형 측정)

  • Yang, Heeju;Joo, Jinwon
    • Journal of the Microelectronics and Packaging Society
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    • v.26 no.4
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    • pp.141-148
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    • 2019
  • Electronic substrates used in a mobile device is composed of various materials, and when the temperature is changed during manufacturing or operating, thermal deformation and stress concentration occur due to the difference in thermal expansion coefficient of each material. The shadow moiré technique is a non-contact optical method that measures shape or out-of-plane displacement over the entire area, but it is necessary to overcome the Talbot effect for high sensitivity applications. In this paper, LED light sources of various wavelengths was used to overcome the Talbot effect caused in the shadow moiré technique. By using the phase shift method, an experimental method to retain the measurement sensitivity within 10 ㎛/fringe was proposed and evaluated, and this method is applied to the thermal deformation measurement of the mobile electronic substrate. In the case of using white light, there were several areas that could not be measured due to the Talbot effect, but in the case of using blue LED light, it was shown that a precise moiré pattern with a sensitivity of 6.25 ㎛/fringe could be obtained in most areas.

System Design and Evaluation of a Compact and High Energy X-ray Talbot-Lau Grating Interferometer for Industrial Applications

  • Lee, Seho;Oh, Ohsung;Kim, Youngju;Lee, Seung Wook;Kim, Insoo;Kim, Jinkyu
    • Journal of the Korean Physical Society
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    • v.73 no.12
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    • pp.1827-1833
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    • 2018
  • X-ray grating interferometry has been an active area of research in recent years. In particular, various studies have been carried out for the practical use of the x-ray grating interferometer in medical and industrial fields. For the commercialization of the system, it needs to be optimized for its application. In this study, we have developed a prototype of the compact high energy x-ray grating interferometer of which the high effective energy and compactness is of our primary feature of design. We have designed the Talbot-Lau x-ray interferometer in a symmetrical geometry with an effective energy of 54.3 keV. The system has a source-to-analyzer grating distance of 788.4 mm, which is compact enough for a commercial product. In a normal operation, it took less than ten seconds to acquire a set of phase stepping images. The acquired images had a maximum visibility of about 15%, which is relatively high compared with the visibilities of the other high-energy grating interferometric systems reported so far.

Self-imaging of a phase line grating and analysis of its visibility (위상형 직선격자의 자체결상과 가시도 분석)

  • 백승선;이상일;조재흥;김영란
    • Korean Journal of Optics and Photonics
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    • v.14 no.6
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    • pp.606-612
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    • 2003
  • The self-imaging effect or lensless imaging effect of a phase line grating is theoretically analyzed by using Fresnel diffraction theory, then experimentally investigated. The self-imaging distance $z_{T,p}$, that is the imaging distance being perfectly copied from the phase distribution of the phase grating to its intensity distribution with the magnification of 1X, can be uniquely defined as the (4n-3) $z_{T,a}$/4(n=positive integers), where rte is the well-known self-imaging distance of an amplitude grating. When the coherent laser beam is illuminated at the phase grating, the self-imaged images were obtained at $z_{T,p}$= $z_{T,a}$/4 and $z_{T,p}$=5 $z_{T,a}$/4 without any optics. On the other side, the phase-reversed self-imaging was obviously observed at $z_{T,p}$ = 3 $z_{T,a}$/4. The visibility of self-imaged images of a phase line grating as a function of the number of slits of the input grating was measured by the FFT(Fast Fourier Transform) results of the self-imaging images. As a result a stationary maximum visibility of V = 0.10 can be obtained from a grating with more than 15 slit pairs.n 15 slit pairs.

Simulation for Small Lamellar Grating FTIR Spectrometer for Passive Remote Sensing

  • Chung, You Kyoung;Jo, Choong-Man;Kim, Seong Kyu;Kim, In Cheol;Park, Do-Hyun;Bae, Hyo-Yook;Kang, Young Il
    • Journal of the Optical Society of Korea
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    • v.20 no.6
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    • pp.669-677
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    • 2016
  • A miniaturized FTIR spectrometer based on lamellar grating interferometry is being developed for passive remote-sensing. Consisting of a pair of micro-mirror arrays, the lamellar grating can be fabricated using MEMS technology. This paper describes a method to compute the optical field in the interferometer to optimize the design parameters of the lamellar grating FTIR spectrometer. The lower limit of the micro-mirror width in the grating is related to the formation of a Talbot image in the near field and is estimated to be about $100{\mu}m$ for the spectrometer to be used for the wavelength range of $7-14{\mu}m$. In calculating the far field at the detection window, the conventional Fraunhofer equation is inadequate for detection distance of our application, misleading the upper limit of the micro-mirror width to avoid interference from higher order diffractions. Instead, the far field is described by the unperturbed plane-wave combined with the boundary diffraction wave. As a result, the interference from the higher order diffractions turns out to be negligible as the micro-mirror width increases. Therefore, the upper limit of the micro-mirror width does not need to be set. Under this scheme, the interferometer patterns and their FT spectra are successfully generated.