• Restorative Dentistry and Endodontics
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• 제20권2호
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• pp.549-576
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• 1995

Bacteria are one of the most important causative agents of the pulpal and periapical diseases. Streptococci are one of the most frequently isolated facultative anarerobic bacteria in the infected root canals. Bacterial cell wall components have a direct effect in the pathogenesis of the pulpal and periapical infections. Hyaluronidase produced by bacteria has been implicated in dissemination of the diseases. The purpose of this study was to evaluate the effect of cell wall extract of streptococci on the L929 cells using inverted microscope and the transmission electron microscopy (TEM). Hyaluronidase production of streptococcal strains were investigated to determine the correlation between the severity of cell damage and the activity of enzymes. Bacterial cell wall extracts of S. sanguis, S. mitis and S. uberis isolated from infected root canals and ATCC type strains of S. mutans (ATCC 10449) and E. faecalis (ATCC 19433) were prepared by sonication and confirmed with SDS-PAGE. Silver stain of SDS-PAGE of sonic extract was efficient at $100{\mu}g$/ml concentration of cell wall protein, while Coomasie blue stain was efficient at $100{\mu}g$/ml concentration. Inverted microscope showed that sonic extract-treated L929 cells were round and detached from the substratum while others lost their fibroblastic shapes. Transmission electron microscopic examination revealed that streptococcal extracts induced death of L929 cells. Sonic extracts of streptococci had variable effect on microstructure of L929 cells. significant chromatin condensation was observed in the nucleus of the cells. Disappearance of cell surface microvilli and nuclear fragments with dense chromatin were observed. The cell nucleus had an irregular shape and numerous large vacuoles were seen in the cytoplasm and some breaks of the cell membrane could be seen. Cell organelles were in various stages of destruction and cristae of mitochondria were disoriented or disappeared. Eighteen strains of streptococci did not produce hyaluronidase.

• 한국재료학회지
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• 제27권6호
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• pp.295-300
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• 2017

Aluminum-oxide($Al_2O_3$) thin films were deposited by electron cyclotron resonance plasma-enhanced atomic layer deposition at room temperature using trimethylaluminum(TMA) as the Al source and $O_2$ plasma as the oxidant. In order to compare our results with those obtained using the conventional thermal ALD method, $Al_2O_3$ films were also deposited with TMA and $H_2O$ as reactants at $280^{\circ}C$. The chemical composition and microstructure of the as-deposited $Al_2O_3$ films were characterized by X-ray diffraction(XRD), X-ray photo-electric spectroscopy(XPS), atomic force microscopy(AFM) and transmission electron microscopy(TEM). Optical properties of the $Al_2O_3$ films were characterized using UV-vis and ellipsometry measurements. Electrical properties were characterized by capacitance-frequency and current-voltage measurements. Using the ECR method, a growth rate of 0.18 nm/cycle was achieved, which is much higher than the growth rate of 0.14 nm/cycle obtained using thermal ALD. Excellent dielectric and insulating properties were demonstrated for both $Al_2O_3$ films.

• 한국진공학회지
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• 제4권S2호
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• pp.40-48
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• 1995

$TiB_2$-TiN double-layer coating have been prepared by ion beam enhanced deposition. AES, XRD, TEM and HRTEM were employed to characterize the $TiB_2$ layer. The microhardness of the coatings was evaluated by an ultra low-load microhardness indenter system, and the tribological behavior was examined by a ball-on-disc tribology wear tester. It was found that in a single titanium diboride layer, the composition is uniform along the depth of the film, and it is mainly composed of nanocrystalline $TiB_2$ with hexagonal structure, which resulted from the ion bombardment during the film growth. The hardness of the $TiB_2$ films increases with increasing ion energy, and approaches a maximum value of the $TiB_2$ films increases with increasing ion energy, and approaches a maximum value of 39 Gpa at ion energy of 85 keV. The tribological property of the TiB2 films is also improved by higher energy of 85keV. The tribological property of the $TiB_2$ films is also improved by higher energy ion beam bombardment. There is no major disparity in the mechanical properties of double-layer $TiB_2$/TiN coatings and TiN/$TiB_2$ coatings. Both show an improved wear resistance compared with single-layer $TiB_2$ films. The adhesion of double-layer coatings is also superior to that of single-layer films.

• 대한금속재료학회지
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• 제50권1호
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• pp.78-85
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• 2012

Aluminum nitride(AlN) is a compound (III-V group) of hexagonal system with a crystal structure. Its Wurzite phase is a very wide band gap semiconductor material. It has not only a high thermal conductivity, a high electrical resistance, a high electrical insulating constant, a high breakdown voltage and an excellent mechanical strength but also stable thermal and chemical characteristics. This study is on the preferred orientation characteristics of AlN thin films by reactive evaporation using $NH_3$. We have manufactured an AlN thin film and then have checked the crystal structure and the preferred orientation by using an X-ray diffractometer and have also observed the microstructure with TEM and AlN chemical structure with FT-IR. We can manufacture an excellent AlN thin film by reactive evaporation using $NH_3$ under 873 K of substrate temperature. The AlN thin film growth is dependent on Al supplying and $NH_3$ has been found to be effective as a source of $N_2$. However, the nuclear structure of AlN did not occur randomly around the substrate a particle of the a-axis orientation in fast growth speed becomes an earlier crystal structure and is shown to have an a-axis preferred orientation. Therefore, reactive evaporation using $NH_3$ is not affected by provided $H_2$ amount and this can be an easy a-axis orientation method.

• 대한금속재료학회지
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• 제50권6호
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• pp.455-462
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• 2012

Al-Si coated boron steel and Zn coated DP steel plates were laser-welded to manufacture a Tailor Welded Blank (TWB) for a car body frame. Hot-stamping heat treatment ($900^{\circ}C$, 5 min) was applied to the TWB weld, and the microstructural change and transformation mechanism were investigated in the Al-rich area near the bond line of the Al-Si coated steel side. There was Al-rich area with a single phase, $Fe_3(Al,Si)$, which was transformed to ${\alpha}-Fe$ (Ferrite) after the heat treatment. It could be explained that the $Fe_3(Al,Si)$ phase was transformed to ${\alpha}-Fe$ during heat treatment at $900^{\circ}C$ for 5 min and the resultant ${\alpha}-Fe$ phase was not transformed by rapid cooling. Before the heat treatment, the microstructures around the $Fe_3(Al,Si)$ phase consisted of martensite, bainite and ${\alpha}-Fe$ while they were transformed to martensite and ${\delta}-Fe$ after the heat treatment. Due to the heat treatment, Al was diffused to the $Fe_3(Al,Si)$ and this resulted in an increase of Al content to 0.7 wt% around the Al-rich area. If the weld was held at $900^{\circ}C$ for 5 min it was transformed to a mixture of austenite (${\gamma}$) and ${\delta}-Fe$, and only ${\gamma}$ was transformed to the martensite by water cooling while the ${\delta}-Fe$ was remained unchanged.

• 대한금속재료학회지
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• 제49권11호
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• pp.845-852
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• 2011

The Spark Plasma Sintering(SPS) method offers a means of fabricating a sintered-body having high density without grain growth through short sintering time and a one-step process. A titanium compact having high density and purity was fabricated by the SPS process. It can be used to fabricate a Ti sputtering target with controlled parameters such as sintering temperature, heating rate, and pressure to establish the optimized processing conditions. The compact/target(?) has a diameter of ${\Phi}150{\times}6.35mm$. The density, purity, phase transformation, and microstructure of the Ti compact were analyzed by Archimedes, ICP, XRD and FE-SEM. A Ti thin-film fabricated on a $Si/SiO_2$ substrate by a sputtering device (SRN-100) was analyzed by XRD, TEM, and SIMS. Density and grain size were up to 99% and below $40{\mu}m$, respectively. The specific resistivity of the optimized Ti target was $8.63{\times}10^{-6}{\Omega}{\cdot}cm$.

• 한국재료학회지
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• 제31권1호
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• pp.29-37
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• 2021

Martensitic stainless steel is commonly used in the medical implant instrument. The alloy has drawbacks in terms of strength and wear properties when applied to instruments with sharp parts. 440C STS alloy, with improved durability, is an alternative to replace 420 J2 STS. In the present study, the carbide precipitation, and mechanical and corrosion properties of STS 440C alloy are studied as a function of different heat treatments. The STS 440C alloy is first austenitized at different temperatures; this is immediately followed by oil quenching and sub-zero treatment. After sub-zero treatment, the alloy is tempered at low temperatures. The microstructures of the heat treated STS 440C alloy consist of martensite and retained austenite and carbides. Using EDX and SADP with a TEM, the precipitated carbides are identified as a Cr23C6 carbide with a size of 1 to 2 ㎛. The hardness of STS 440C alloy is improved by austenitization at 1,100 ℃ with sub-zero treatment and tempering at 200 ℃. The values of Ecorr and Icorr for STS 440C increase with austenitization temperature. Results can be explained by the dissolution of Cr-carbide and the increase in the retained austenite. Sub-zero treatment followed by tempering shows a little difference in the properties of potentiodynamic polarizations.

• 대한금속재료학회지
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• 제48권2호
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• pp.133-140
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• 2010

10 nm thick Ni layers were deposited on 200 nm $SiO_2/Si$ substrates using an e-beam evaporator. Then, 60 nm or 20 nm thick ${\alpha}$-Si:H layers were grown at low temperature (<$200^{\circ}C$) by a Catalytic-CVD. NiSi layers were already formed instantaneously during Cat-CVD process regardless of the thickness of the $\alpha$-Si. The resulting changes in sheet resistance, microstructure, phase, chemical composition, and surface roughness with the additional rapid thermal annealing up to $500^{\circ}C$ were examined using a four point probe, HRXRD, FE-SEM, TEM, AES, and SPM, respectively. The sheet resistance of the NiSi layer was 12${\Omega}$/□ regardless of the thickness of the ${\alpha}$-Si and kept stable even after the additional annealing process. The thickness of the NiSi layer was 30 nm with excellent uniformity and the surface roughness was maintained under 2 nm after the annealing. Accordingly, our result implies that the low temperature Cat-CVD process with proposed films stack sequence may have more advantages than the conventional CVD process for nano scale NiSi applications.

• 대한금속재료학회지
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• 제46권12호
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• pp.771-779
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• 2008

An effective way of increasing the strength and fracture toughness of reactor pressure vessel steels is to change the material specification from that of Mn-Mo-Ni low alloy steel(SA508 Gr.3) to Ni-Mo-Cr low alloy steel(SA508 Gr.4N). In this study, we evaluate the effects of alloying elements on the microstructural characteristics of Ni-Mo-Cr low alloy steel. The changes in the stable phase of the SA508 Gr.4N low alloy steel with alloying elements were evaluated by means of a thermodynamic calculation conducted with the software ThermoCalc. The changes were then compared with the observed microstructural results. The calculation of Ni-Mo-Cr low alloy steels confirms that the ferrite formation temperature decreases as the Ni content increases because of the austenite stabilization effect. Consequently, in the microscopic observation, the lath martensitic structure becomes finer as the Ni content increases. However, Ni does not affect the carbide phases such as $M_{23}C_6 $ and $M_7C_3$. When the Cr content decreases, the carbide phases become unstable and carbide coarsening can be observed. With an increase in the Mo content, the $M_2C$ phase becomes stable instead of the $M_7C_3$ phase. This behavior is also observed in TEM. From the calculation results and the observation results of the microstructure, the thermodynamic calculation can be used to predict the precipitation behavior.

• Applied Microscopy
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• 제38권4호
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• pp.279-284
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• 2008

상변화 메모리 재료로 사용 가능한 In-Sb-Te (IST) 박막을 RF 마그네트론 스퍼터링법을 사용하여 증착한 후 열처리를 통해 온도에 따른 결정화 거동 및 미세구조를 투과전자현미경(TEM)을 통해 분석하였다. IST 박막은 as-dep 상태에서 비정질상으로 존재하였으며, 열처리 온도에 따라 결정상인 InSb, $In_3SbTe_2$, InTe으로 상변화가 일어났다. 이러한 상변화는 기존의 삼원계 상태도와 다른 비평형 상태에서의 상변태가 이루어짐을 확인할 수 있다. 상변화 과정 중 박막의 두께가 무질서하게 배열되었던 비정질상에서 규칙적인 배열을 갖는 결정질상으로 변할수록 감소하는 경향을 확인하였다. 또한 각각의 결정립의 크기도 온도가 증가할수록 증가하는 것을 관찰하였다. 특히, $350^{\circ}C$ 열처리한 박막의 InSb 상은 비정질 상태에서 표면에너지가 가장 낮은 {111}면을 따라 facet을 이루며 결정화가 이루어졌다. 온도가 증가함에 따라 $In_3SbTe_2$로 상변화가 일어났는데, $400^{\circ}C$ 열처리한 시편의 경우 미소영역에서 마이크로 트윈들이 관찰되었다. 이 면결함은 {111}면을 따라 양쪽의 격자점들이 일치하는 정합 쌍정립계를 이루고 있었으며, $450^{\circ}C$에서 동일영역을 관찰해 본 결과 쌍정 결함들이 치유되어 {111} facet 면을 이루고 있는 것을 확인하였다. 또한 비교적 작은 영역에서 상분리가 일어난 InTe 상도 관찰하였다. InTe 상의 경우 포정반응 온도인 $555^{\circ}C$보다 낮은 온도에서 관찰되었는데, InTe의 (002)면과 $In_3SbTe_2$의 (111)면이 비슷한 면간거리를 가지고 있음을 확인하였다. 추가적으로 $500^{\circ}C$ 이상의 온도에서 이들의 결정학적 관계에 따른 상변화 과정에 연구가 수행되어야 할 것으로 생각된다.