• Title/Summary/Keyword: Sub-array

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Characteristics of SiO2 Gas Barrier Films as a Function of Process Conditions in Facing Target Sputtering (FTS) System (대향타겟식 스퍼터링 장치의 공정 조건에 따른 SiO2 가스 차단막의 특성)

  • Bae, Kang;Wang, Tae-Hyun;Sohn, Sun-Young;Kim, Hwa-Min;Hong, Jae-Suk
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.7
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    • pp.595-601
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    • 2009
  • For the silicon oxide $(SiO_x)$ films prepared by using the facing target sputtering (FTS) apparatus that was manufactured to enhance the preciseness of the fabricated thin-film and sputtering yield rate by forming a higher-density plasma in the electrical discharge space for using it as a thin-film passivation system for flexible organic light emitting devices (FOLEDs). The deposition characteristics were investigated under various process conditions, such as array of the cathode magnets, oxygen concentration$(O_2/Ar+O_2)$ introduced during deposition, and variations of distance between two targets and working pressure. We report that the optimum conditions for our FTS apparatus for the deposition of the $SiO_x$ films are as follows: $d_{TS}\;and\;d_{TT}$ are 90mm and 120mm, respectively and the maximum deposition rate is obtained under a gas pressure of 2 mTorr with an oxygen concentration of 3.3%. Under this optimum conditions, it was found that the $SiO_x$ film was grown with a very high deposition rate of $250{\AA}$/min by rf-power of $4.4W/cm^2$, which was significantly enhanced as compared with a deposition rate (${\sim}55{\AA})$/min) of the conventional sputtering system. We also reported that the FTS system is a suitable method for the high speed and the low temperature deposition, the plasma free deposition, and the mass-production.

Effects of $C_2F_{6}$ Gas on Via Etching Characteristics ($C_2F_{6}$ 가스가 Via Etching 특성에 미치는 영향)

  • Ryu, Ji-Hyeong;Park, Jae-Don;Yun, Gi-Wan
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.39 no.1
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    • pp.31-38
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    • 2002
  • In order to improve the 0.35 $mutextrm{m}$-via hole etching process the etching characteristic of the gas $C_2F_{6}$ has been analyzed. The samples were triple-layer films(TEOS/SOG/TEOS) on 8-inch wafers and the orthogonal array matrix technique was used for the process. The equipment for etching was the transformer coupled plasma (TCP) source which is a type of high density plasma(HDP). This experiment showed the etching rate for $C_2F_{6}$ was 0.8 $mutextrm{m}$/min-1.1 $mutextrm{m}$/min and the measured uniformity was under $pm$6.9% in the matrix window. The CD skew comparison between pre and post-etching was under 10% which is an outstanding results in the window of profile in anisotropic etching. There was no problem in C2F6 with the flow rate of 20sccm, but when 14sccm of $C_2F_{6}$ was supplied there was a recess problem on the inner wall of SOG film. Consequently the etching characteristic of $C_2F_{6}$ shows a fast etching rate and a very wide process window in HDP TCP.

An Interference Coordination Technique Utilizing Sub-Arrays and Its Performance in Cellular Systems (부 어레이 빔포밍을 활용하는 간섭 제어 기법 및 셀룰러 시스템에서의 성능 평가)

  • Kang, Hosik;Lee, Donghyun;Sung, Wonjin
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.25 no.6
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    • pp.653-663
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    • 2014
  • To cope with an increasing amount of data traffic, research efforts are being made to maximize the data rate by reducing the interference between the transmission nodes. This paper also focuses on interference control schemes utilizing antenna sub-array beam-forming. The first scheme relies on horizontal beam rotation which utilizes three types of narrow beam patterns. Different beam patterns are applied to transmit signals in rotating fashion to control the interference. The second scheme is based on user-specific sub-array beamforming, which uses the precoding matrix based on users' location and controls the amount of interference in the multi-user environment. The performance of the proposed schemes is evaluated using the computer simulation to demonstrate the performance enhancement.

Characterization of Deep Shear Wave Velocity Profiles in the Gimhae Plains Using the Microtremor Array Method (상시미동 표면파 분석에 의한 김해평야 퇴적층 심부 전단파 속도 결정)

  • Kim, Jae Hwi;Jeong, Seokho
    • Journal of the Korean Geotechnical Society
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    • v.38 no.8
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    • pp.17-27
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    • 2022
  • To characterize the dynamic properties of Gimhae Plains sediments, we calculated natural frequencies using microtremor horizontal-to-vertical spectral ratios and derived shear wave velocity profiles by inversion of Rayleigh-wave dispersion curves obtained by the high frequency-wavenumber and modified spatial autocorrelation methods. Our results suggest that in this region, strong amplification of ground motion is expected in the vibration frequency (f ≥ 1 Hz). Additionally, obtained velocity profiles show that shear wave velocities are ~200 and 400 m/s for the shallow marine and old fluvial sediments, respectively. Bedrock is possibly encountered at depths of 60-100 m at most sites. We developed a simplified shear wave velocity model of shallow sediments based on the obtained profiles. Our results suggest that a large area in the Gimhae Plains could be categorized as an S6 site based on the Korean seismic design code (KDS 17 10 00).

A Study on Detection of Small Defects for MoSi2 by Medical Ultrasonic Testing (의학용 초음파검사기에 의한 MoSi2의 미소결함 탐상)

  • Namkoong, Chai-Kwan;Kim, You-Chul
    • Journal of the Korean Society of Safety
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    • v.10 no.4
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    • pp.9-12
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    • 1995
  • Detection of small defects by medical ultrasonic testing when the thermal sprayed coating by $MoSi_2$ on the metal is done. The defects may occur at the bonded surface. So, the detecting method of the defects by non-destructive in spection is desired. Here, in order to examine the possibility of the detection of the small defects by the ultrasonic. The electronic scanning ultrasonic equipment using an array probe developed as the medical ultrasonic diagnostic equipment is applied for the detection of the metal material defects. It's validity is investigated.

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Electrochemical preparation of Blue TiO2 nanotube array and its application for oxygen evolution reaction (전기화학적 방법을 이용한 산소 발생용 Blue TiO2 전극제조 및 반응특성조사)

  • Han, Jun-Hyeok;Tak, Yong-Seok;Yun, Je-Yong
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2014.11a
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    • pp.46-46
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    • 2014
  • 알칼리 수전해는 신재생에너지를 이용하여 오염물질 없이 효율적으로 수소를 생산할 수 있는 방법 중의 하나이다. 알칼리 수전해 시스템의 산화전극으로 불용성전극이 많이 사용되고 있으나 높은 과전압과 제조 공정이 복잡한 문제점을 가지고 있다. 본 연구에서는 전기변색을 이용해 짙은 파란색의 $TiO_2$ 나노튜브를 알칼리 수전해 시스템의 산화전극으로 이용하고자 하였다. 양극산화법을 이용해 $TiO_2$ 나노튜브를 만드는 과정에서 양극산화 시간과 인가전압에 따라 Blue $TiO_2$의 산소발생반응(Oxygen evolution reaction, OER) 활성 변화를 측정하였고 나노튜브 길이가 길고 직경이 클수록 OER활성과 내구성이 향상되는 것을 확인하였다.

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Photovoltaic Generating System on Ships to Reduce Fossil Fuel Dependence (선박에서 화석연료 의존도 절감을 위한 태양광 발전)

  • Takeshi Katagi;Yoshimi Fujii;Eiichi Nishikawa;Takeshi Hashimoto;Kenji Ishida
    • Journal of Advanced Marine Engineering and Technology
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    • v.20 no.3
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    • pp.44-54
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    • 1996
  • The release of polluting gases such as NO/sub x/ of SO/sub x/ to the atmosphere from ships is causing increasing concern. To reduce destruction to the marine environment, the value of the utilization of photovoltaic energy is highly appreciated since photovoltaic energy is and alternate clean energy source to fossil fuels. The use of a photovoltaic generating system to supplement diesel engine driven electric power system on ships has been studied. The design of the photovoltaic generating system based on a photovoltaic array is presented in this paper. The amount of NO/sub x/ and SO/sub x/ emission is found to be significantly reduced for a small vessel operated within a harbour after a photovoltaic generating system is installed to supplement the diesel engine generator system.

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Impedance Analysis of High Integrated Sensor Array Using Impedance Relation Matrix (임피던스 관계 행렬을 이용한 고집적 센서 어레이의 임피던스 분석에 관한 연구)

  • Lee, Hak-Sung
    • Journal of the Institute of Electronics Engineers of Korea SC
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    • v.48 no.3
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    • pp.1-5
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    • 2011
  • In order to analyze the impedance properties of high integrated impedance network with multiple terminals, this paper introduces the concept of impedance relation matrix(IRM). The linear relation between the terminal voltages and currents is represented in the form of IRM and this matrix can be utilized to calculate the impedance between any two terminals. Furthermore, IRM representation for 2-port impedance network can be also defined. The whole impedance network is divided into the several 2-port sub-networks and each sub-network is analyzed in a form of the IRM representation. An illustrated example is given to show that the proposed method is simple and effective to analyze the impedance of a sensor array which has a very large number of impedance elements.