Characteristics of SiO2 Gas Barrier Films as a Function of Process Conditions in Facing Target Sputtering (FTS) System |
Bae, Kang
(대구가톨릭대학교 전자공학과)
Wang, Tae-Hyun (대구가톨릭대학교 전자공학과) Sohn, Sun-Young (대구가톨릭대학교 전자공학과) Kim, Hwa-Min (대구가톨릭대학교 전자공학과) Hong, Jae-Suk ((주)CTC) |
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