• Korean Journal of Materials Research
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• v.30 no.7
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• pp.338-342
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• 2020

Tin oxide (SnO₂) nanocrystals are synthesized by a thermal evaporation method using a mixture of SnO₂ and Mg powders. The synthesis process is performed in air at atmospheric pressure, which makes the process very simple. Nanocrystals with a belt shape start to form at 900 ℃ lower than the melting point of SnO₂. As the synthesis temperature increases to 1,100 ℃, the quantity of nanocrystals increases. The size of the nanocrystals did not change with increasing temperature. When SnO₂ powder without Mg powder is used as the source material, no nanocrystals are synthesized even at 1,100 ℃, indicating that Mg plays an important role in the formation of the SnO₂ nanocrystals at temperatures as low as 900 ℃. X-ray diffraction analysis shows that the SnO₂ nanocrystals have a rutile crystal structure. The belt-shaped SnO₂ nanocrystals have a width of 300~800 nm, a thickness of 50 nm, and a length of several tens of micrometers. A strong blue emission peak centered at 410 nm is observed in the cathodoluminescence spectra of the belt-shaped SnO₂ nanocrystals.

• JSTS:Journal of Semiconductor Technology and Science
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• v.8 no.2
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• pp.156-163
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• 2008

We proposed a new $p^+/n^+$ gate locally-separated-channel (LSC) bulk FinFET which has vertically formed oxide region in the center of fin body, and device characteristics were optimized and compared with that of normal channel (NC) FinFET. Key device characteristics were investigated by changing length of $n^+$ poly-Si gate ($L_s$), the material filling the trench, and the width and length of the trench at a given gate length ($L_g$). Using 3-dimensional simulations, we confirmed that short-channel effects were properly suppressed although the fin width was the same as that of NC device. The LSC device having the trench non-overlapped with the source/drain diffusion region showed excellent $I_{off}$ suitable for sub-50 nm DRAM cell transistors. Design of the LSC devices were performed to get reasonable $L_s/L_g$ and channel fin width ($W_{cfin}$) at given $L_gs$ of 30 nm, 40 nm, and 50 nm.

• Korean Journal of Materials Research
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• v.15 no.8
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• pp.548-553
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• 2005

Trivalent cerium$(Ce^{3+})$ activated YAG (yttrium aluminum garnet, $Y_3Al_5O_{12})$) thin films phosphor were deposited on quartz glass substrates by rf magnetron sputtering. The effects of sputtering parameters, annealing atmosphere, and substrates on growing behaviors and luminescent properties were investigated. The sputtering parameters were $O_2/(Ar+O_2)$ gas ratio, rf power, and deposition time. XRD (X-ray diffractometery) spectra exhibited that as-deposited films were amorphous, while they were transformed to the crystalline phases by post-annealing. The crystallinity and the atomic ratio strongly depended on the sputtering gas ratio $O_2/(Ar+O_2)$. High quality YAG:Ce thin films could be obtained at the gas ratio of $50\%$ oxygen. After annealing process, PL (Photoluminescence) spectra excited at 450nm showed a yellow single band at 550nm. The films deposited at the sputtering gas ratio of 50% oxygen exhibited the highest PL intensity.

• Korean Journal of Materials Research
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• v.32 no.11
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• pp.496-507
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• 2022

For the selective catalytic reduction of NOx with ammonia (NH₃-SCR), a V₂O₅WO₃/TiO₂ (VW/nTi) catalyst was prepared using V₂O₅ and WO₃ on a nanodispersed TiO₂ (nTi) support by simple impregnation process. The nTi support was dispersed for 0~3 hrs under controlled bead-milling in ethanol. The average particle size (D₅₀) of nTi was reduced from 582 nm to 93 nm depending on the milling time. The NOx activity of these catalysts with maximum temperature shift was influenced by the dispersion of the TiO₂. For the V_0.5W₂/nTi-0h catalyst, prepared with 582 nm nTi-0h before milling, the decomposition temperature with over 94 % NOx conversion had a narrow temperature window, within the range of 365-391 ℃. Similarly, the V_0.5W₂/nTi-2h catalyst, prepared with 107 nm nTi-2h bead-milled for 2hrs, showed a broad temperature window in the range of 358~450 ℃. However, the V_0.5W₂/Ti catalyst (D₅₀ = 2.4 ㎛, aqueous, without milling) was observed at 325-385 ℃. Our results could pave the way for the production of effective NOx decomposition catalysts with a higher temperature range. This approach is also better at facilitating the dispersion on the support material. NH₃-TPD, H₂-TPR, FT-IR, and XPS were used to investigate the role of nTi in the DeNOx catalyst.

• Journal of Surface Science and Engineering
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• v.50 no.4
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• pp.282-288
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• 2017

$Eu^{3+}$- or $Sm^{3+}$-doped $La_2MoO_6$ phosphors were synthesized with different concentrations of activator ions via a solid-state reaction. The X-ray diffraction patterns exhibited that crystalline structures of all the phosphors were tetragonal systems with the dominant peak occurring at (103) plane, irrespective of the concentration and the type of activator ions. The crystallites showed the pebble-like crystalline shapes and the average crystallite size increased with a tendency to agglomerate as the concentration of $Eu^{3+}$ ions increased. The excitation spectra of $Eu^{3+}$-doped $La_2MoO_6$ phosphors contained an intense charge transfer band centered at 331 nm in the range of 250-370 nm and three weak peaks at 381, 394, and 415 nm, respectively, due to the $^7F_0{\rightarrow}^5L_7$, $^7F_0{\rightarrow}^5L_6$, and $^7F_0{\rightarrow}^5D_3$ transitions of $Eu^{3+}$ ions. The emission spectra under excitation at 331 nm exhibited a strong red band centered at 620 nm and two weak bands at 593 and 704 nm. As the concentration of $Eu^{3+}$ increased from 1 to 20 mol%, the intensities of all the emission bands gradually increased. For the $Sm^{3+}$-doped $La_2MoO_6$ phosphors, the emission spectra consisted of an intense emission band at 607 nm arising from the $^4G_{5/2}{\rightarrow}^6H_{7/2}$ transition and three relatively small bands at 565, 648, and 707 nm originating from the $^4G_{5/2}{\rightarrow}^6H_{5/2}$, $^4G_{5/2}{\rightarrow}^6H_{9/2}$, and $^4G_{5/2}{\rightarrow}^6H_{11/2}$ transitions of $Sm^{3+}$, respectively. The intensities of all the emission bands approached maxima when concentration of $Sm^{3+}$ ions was 5 mol%. These results indicate that the optimum concentrations for highly-luminescent red and orange emission are 20 mol% of $Eu^{3+}$ and 5 mol% of $Sm^{3+}$ ions, respectively.

• Journal of the Korean Ceramic Society
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• v.39 no.7
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• pp.642-648
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• 2002

Barium Titanate(BaTiO$_3$) nanoparticles were prepared at 22$0^{\circ}C$ through glycothermal process by using barium hydroxide and amorphous titanium hydrous gel as precursor and 1,4-butanediol and distilled water as solvent. It is demonstrated that the size of BaTiO$_3$ particles can be controlled by reaction conditions such as various content of 1,4-butanediol/distilled water volume ratio. This processing method can fabricate BaTiO$_3$ powders, which have a narrow distribution and exhibit good dispersion. The particle size of BaTiO$_3$ powders obtained by glycothermal process were about 50 nm to 200 nm on the condition that reaction temperature was 22$0^{\circ}C$ and holding time was 24 h.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.27 no.7
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• pp.472-476
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• 2014

We report the characteristics of thin-film transistor (TFT) to make the bi-channel structure with stacked $Mg_{0.1}Zn_{0.9}O$ (Mg= 10 at.%) and ZnO. The ZnO and $Mg_{0.1}ZnO_{0.9}O$ thin films were deposited by radio frequency (RF) co-sputter system onto the thermally oxidized silicon substrate. A total thickness of active layer was 50 nm. Firstly, the ZnO thin films were deposited to control the thickness from 5 nm to 30 nm. Sequentially, the $Mg_{0.1}ZnO_{0.9}O$ thin films were deposited to change from 45 nm to 20 nm. The bi-layer TFT shows more improved properties than the single layer TFT. The field effect mobility and subthreshold slope for $Mg_{0.1}ZnO_{0.9}O$/ZnO-TFT are $7.40cm^2V^{-1}s^{-1}$ and 0.24 V/decade at the ZnO thickness of 10 nm, respectively.

• Journal of the Korean Ceramic Society
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• v.41 no.6
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• pp.439-443
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• 2004

SrAl$_2$O$_4$ powder was prepared by polymerized complex method and its nucleation was observed at different temperatures and times. Problems of inhomogeneity and high synthesis temperature induced by solid state reaction could be solved by using polymeric precursors. The process of decomposition by heat treatment above 40$0^{\circ}C$ was observed by Scanning Electron Microscopy (SEM) and elemental analyzer. Crystallization of SrAl$_2$O$_4$ occured at about 90$0^{\circ}C$ and its crystalline size. which was determined by using Transmission Electron Microscopy (TEM) and X-Ray Diffractometer (XRD). was about 30∼50 nm.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.35 no.4
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• pp.348-352
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• 2022

Resistive switching behaviors of a co-sputtered zinc silicate thin film (ZnO and SiO₂ targets) have been investigated. We fabricated an Ag/ZnSiO_x/highly doped n-type Si substrate device by using an RF magnetron sputter system. X-ray diffraction pattern (XRD) indicated that the Zn₂SiO₄ was formed by a post annealing process. A unique morphology was observed by scanning electron microscope (SEM) and atomic force microscope (AFM). As a result of annealing process, 50 nm sized nano clusters were formed spontaneously in 200~300 nm sized grains. The device showed a unipolar resistive switching process. The average value of the ratio of the resistance change between the high resistance state (HRS) and the low resistance state (LRS) was about 106 when the readout voltage (0.5 V) was achieved. Resistance ratio is not degraded during 50 switching cycles. The conduction mechanisms were explained by using Ohmic conduction for the LRS and Schottky emission for the HRS.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.64 no.9
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• pp.1323-1329
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• 2015

The WO₃/Ag/WO₃ transparent thin films are fabricated by the RF magnetron sputtering. This has a transmittance of front and rear about 90% in the visible light range and surface resistance of 6.41Ω/□. In this paper, we analyzed the surface characteristics caused by the working pressure and O₂ plasma surface treatment to apply a transparent electrode that was prepared to the laminated structure with other materials. The working pressure was changed in the WO₃ film to 10mTorr, 7mTorr, and 5mTorr, it showed a lower than roughness of conventional ITO. In addition, by 55.5774 J/m² at 5mTorr, it shows the hydrophobic property with lower process pressure. O₂ plasma surface treatment was changed at the condisions of the RF power to 150W, 100W, and 50W and the process time to 240s, 180s, 120s, and 60s. The surface roughness are the maximum roughness(Rmax) 6.437nm and the average roughness(Rq) 0.827nm at RF power 150W, and the maximum roughness (Rmax) 6.880nm and the average roughness (Rq) 0.839nm at process time 240sec. It showed a lower value than the surface treatment. also about working pressure and process time is increased, it showed the hydrophobic.