• 한국재료학회지
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• 제22권10호
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• pp.508-512
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• 2012

ZnO thin films were grown on a sapphire substrate by RF magnetron sputtering. The characteristics of the thin films were investigated by ellipsometry, X-ray diffraction (XRD), atomic force microscopy (AFM), photoluminescence (PL), and Hall effect. The substrate temperature and growth time were kept constant at $200^{\circ}C$ at 30 minutes, respectively. The RF power was varied within the range of 200 to 500 W. ZnO thin films on sapphire substrate were grown with a preferred C-axis orientation along the (0002) plan; X-ray diffraction peak shifted to low angles and PL emission peak was red-shifted with increasing RF power. In addition, the electrical characteristics of the carrier density and mobility decreased and the resistivity increased. In the electrical and optical properties of ZnO thin films under variation of RF power, the crystallinity improved and the roughness increased with increasing RF power due to decreased oxygen vacancies and the presence of excess zinc above the optimal range of RF power. Consequently, the crystallinity of the ZnO thin films grown on sapphire substrate was improved with RF sputtering power; however, excess Zn resulted because of the structural, electrical, and optical properties of the ZnO thin films. Thus, excess RF power will act as a factor that degrades the device characteristics.

• 한국재료학회지
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• 제18권1호
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• pp.32-37
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• 2008

The electrical, optical, structural and surface properties of an indium tin oxide (ITO) film grown on a flexible PET substrate using a specially designed roll-to-roll (R2R) sputtering system as a function of the DC power, $Ar/O_2$ flow ratio, and rolling speed is reported. It was observed that both the electrical and optical properties of the ITO film on the PET substrate were critically dependent on the $Ar/O_2$ flow ratio. In addition, x-ray diffraction examination results showed that the structure of the ITO film on the PET substrate was an amorphous structure regardless of the DC power and the $Ar/O_2$ flow ratio due to a low substrate temperature, which was maintained constant by a main cooling drum. Under optimized conditions, ITO film with resistivity of $6.44{\times}10^{-4}{\Omega}-cm$ and transparency of 86% were obtained, even when prepared at room temperature. Furthermore, bending test results exhibited that R2R-grown ITO film had good flexibility which would be applicable to flexible displays and solar cells.

• Restorative Dentistry and Endodontics
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• 제23권1호
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• pp.468-476
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• 1998

The purpose of this study was to observe the morphologic change of dentinal surface, adhesion in interface between dentin and bonding agents, and penetration pattern of resin tags into dentinal tubles according to bonding procedure of ONE-STEP universal adhesive system. Ten extracted human molars were mounted in dental stone and sectioned to expose mid-coronal occlusal dentin and again sectioned tooth crown apically. Specimens were randomly assigned to three groups for dentin conditioning with 32% phoshoric acid, two coats of bonding agents after dentin conditioning, and bond of composite resin. The surfaces of dentin were treated with etch ant and applied bonding agent, and bonded composite resin according to the directions of manufacturer. Specimens which were boned composite were sectioned longitudinally for observing interfaces between resin and dentin. Two of specimens which were sectioned longitudinally were immersed in 6 N HCL for 30 seconds and 1% NaOCL for 12 hours to partially demineralize and deproteinize the dentin substrate. Each specimen was mounted on a brass stub, sputter-coated with gold and observed under SEM. The result were as follows : 1. On the dentinal surface which was conditioned with 32% phosphoric acid. the smear layer was completely removed. orifices of dentinal tubules were opened 3-$5{\mu}m$ wide. and dentinal surface was irregular. 2. On the dentinal surface which was applied ONE-STEP. bonding agent. resin particles were observed on the orifices of dentinal tubules and intertubular dentin. 3. There were close adaptation between dentin and resin and were the pattern which composite invaded into dentin. 4. 1-$3{\mu}m$-wide hybrid layer was visible in the interface between dentin and resin. 5. Long and funnel shaped resin tags were observed in demineralized specimens. and the surfaces of tags were rough.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2012년도 춘계학술발표회 논문집
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• pp.150-150
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• 2012

본 연구는 1차원 나노 구조의 합성과 기초적 분석에 관한 연구로써 특히 무기 산화물 나노재료를 그 대상으로 하였다. 내용으로는 첫째, 1차원 코어 나노와이어의 합성을 하였고 Thermal evaporation, substrate의 가열, 그리고 MOCVD 를 사용한 결과들을 나열한다. 둘째, 코어-쉘 나노와이어를 제작하기 위하여 특히 쉘층의 제작방법을 연구하였는데 PECVD, ALD, 그리고 sputtering에 의한 결과들을 나열하고 간단히 설명한다. Thermal evaporation에 의한 1차원 나노와이어 합성의 경우는 MgO의 예를 들었는데 MgO 나노와이어는 Au가 증착된 기판을 열처리하여 Au dot를 형성하고 이의 morphology를 조절하여 최적의 나노와이어 합성조건을 선정하였다. 이로써 기판 morphology가 나노선의 성장및 형상에 영향을 준다는 사실을 알게 되었다. 이 사실은 In2O3기판을 사용하고 이의 표면거칠기를 열처리로 조절하므로써 역시 나노와이어의 성장을 촉진하는 방법을 찾아내었다. 또한 thermal evaporation공법은 source분말의 선택에 따라 다양한 소재를 제작가능하다는 결과를 제시하였다. 예를 들면 SiOx 층이 precoating된 chamber내에서 MgO 나노선을 합성하는 것과 동일한 조건으로 실험을 진행하면 Mg2SiO4 나노와이어가 형성된 것을 확인하였다. 또한 Sn과 MgB2 분말을 함께 적용할 경우 Sn tip을 가진 MgO 나노와이어를 얻을 수 있었다. 이는 Sn이 동시에 촉매의 역할을 하였기 때문일 것으로 추정된다. 한편 Sn과 Bi 혼합분말을 적용한 경우 Bi2Sn2O7 신소재 tip을 포함한 SnO2 나노와이어를 얻을 수 있었다. 이 경우 Bi원자가 적절한 촉매의 역할을 수행한 것으로 사료된다. Substrate의 가열공법에서는 Si wafer상에 각종 금속 즉 Au, Ag, Cu, Co, Mo, W, Pt, Pd등 초박막을 DC sputter 로 형성한후 annealing하는 기술을 사용하였다. 특기할 만한 것은 Co를 사용한 경우 나노와이어의 spring구조를 얻을 수 있었다는 점이다. MOCVD에 의하여는 Ga2O3및 Bi2O3 나노와이어를 비교적 저온에서 합성하였고 In2O3의 경우는 독특한 나노구조를 형성하였고 이의 결정학적 특성에 대하여 조사하였다.

• 자원리싸이클링
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• 제26권5호
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• pp.61-66
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• 2017

이산화바나듐은 적외선 투과를 차단하거나 창을 통해 건물 내부열 손실을 막아주는 광선택적 유리코팅 소재로 알려졌는데, 본 연구에서 이와 같은 열변색 특성을 가진 이산화바나듐을 수소와의 환원반응을 통하여 제조하는 방법에 대해 연구하였다. 환원반응에 의한 이산화바나듐의 제조는 반응이 쉽게 진행되고, 스퍼터, 빔 증발기 등과 같은 반도체 장비가 필요 없이 공정이 단순하고 대량생산에 용이한 장점을 갖고 있는데, 본 연구에서 수소와의 환원반응에 대한 반응온도, 반응시간, 환원가스의 농도 및 사후 열처리 조건, 첨가제로서 텅스텐의 첨가 등에 대해 실험을 수행하였으며, 최적조건을 도출하여 제조된 이산화바나듐 분말의 특성과 열변색 특성에 대해 조사하였다. 본 연구를 통해 개발된 이산화바나듐이 전자소재 및 에너지 저감 소재로서 많이 활용될 것으로 기대되고 있다.

• 대한금속재료학회지
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• 제48권12호
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• pp.1116-1122
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• 2010

Metal interconnections of multilayer Al/Ni and TiW/seed-Ni/Ni were formed on glass, and the adhesion strength and nanoindentation response of the composite layers were evaluated. The Al/Ni multilayer was formed by an anodic bonding of glass to Al and subsequent electroless plating of Ni, while the TiW/Ni multilayer was fabricated by sputter deposition of TiW and seed-Ni onto glass and electroless plating of Ni. Because of the diffusion of aluminum into glass during the anodic bonding, anodically bonded glass/Al joint exhibited greater interfacial strength than the sputtered glass/TiW one. The Al/Ni on glass also showed excellent resistance against delamination by bending deformation compared to the TiW/seed-Ni/Ni on glass. From the nanoindentation experiment of each metal layer on glass, it was found that the aluminum layer had extremely low hardness and elastic modulus similar to the glass substrate and played a beneficial role in the delamination resistance by lessening stress intensification at the joint. The indentation data of the multilayers also supported superior joint reliability of the Al/Ni to glass compared to that of the TiW/seed-Ni/Ni to glass.

• 대한금속재료학회지
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• 제50권3호
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• pp.243-247
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• 2012

A ruthenium (Ru) catalytic layer and a conventional Pt layer were assessed as counter electrodes (CE) for dye sensitized solar cells (DSSCs). Ru films with different thicknesses of 34, 46, and 90 nm were deposited by atomic layer deposition (ALD). Pt layers with the same thicknesses were prepared by sputtering. $0.45cm^2$ DSSCs were prepared and their properties were characterized by FE-SEM, cyclic voltammetry (CV), impedance spectroscopy (EIS), and current-voltage (I-V). FE-SEM revealed that the crystallized Ru films and Pt films had been deposited quite conformally. CV showed that the catalytic activity of Pt was much greater than that of Ru. In addition, although the catalytic activity of Pt did not depend on the thickness, that of Ru showed an increase with increasing thickness. Impedance analysis revealed high charge transfer resistance at the Ru interface and a decrease with increasing Ru thickness, whereas Pt showed low resistance with no thickness dependence. Despite the relatively small catalytic activity of Ru, the I-V result revealed the average energy conversion efficiency of Ru and Pt to be 2.98% and 6.57%, respectively. These results suggest that Ru can be used as counter electrodes in DSSCs due to its extremely low temperature process compatibility.

• 한국자기학회지
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• 제9권3호
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• pp.159-165
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• 1999

Ar 및 Ar/H2 분위기에서 마그네트론 스퍼터로 제조한 NiFe/Ag 다층박막의 구조, 자기 및 자기저항 거동에 관하여 연구하였다. Ar 분위기에서 제조한 시편은 균일한 다층박막 구조 형성이 어려우며 따라서 열처리 전후의 자기저항의 변화가 없었다. Ar/H2 분위기 하에서 제조한 경우 균일한 다층박막이 이루어졌으며 이는 스퍼터 원자의 에너지 감소 및 박막내의 Ar함량의 감소에 의한 표면 평활도의 개선에 기인되는 것으로 사료된다. 균일한 다층구조가 이루어진 경우 열처리에 의하여 불연속 다층박막구조에 의한 자기저항 거동을 보인다. 그러나 증착된 상태에서 균일한 다층구조를 이루지 못할 경우, 미세입상합금박막의 자기저항 거동을 보이며 열처리 전후의 차이가 나타나지 않는다. 기판 온도는 다층구조 개선에 효과가 없었으며 20$0^{\circ}C$ 이상의 온도에서는 미세입상합금박막 구조를 이루었다.

• 한국자기학회지
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• 제5권5호
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• pp.874-879
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• 1995

고 포화자속밀도를 갖는 Fe미세결정 박막의 자기특성 및 미세구조에 미치는 첨가원소의 영향을 조사하였다. Mo 첨가 박막의 경우, $Fe_{2}Mo$, $Fe_{4}N$, $Fe_{3-2}N$상의 생성으로 연자기 특성이 발현되지 않았다. Ta첨가 박막의 경우, 미세한 TaN, TaC 상이 석출하여 $\alpha$-Fe 결정립을 효과적으로 미세화 시켰으며 Fe 질화물의 생성도 억제되었다. 이에 따라 우수한 연자기 특성이 발현되었으며 FeTaN계 박막은 4000, FeTaC 박막은 2700의 높은 투자율을 나타내었다.

• 한국세라믹학회지
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• 제56권1호
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• pp.49-55
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• 2019

$Ti_{0.33}Al_{0.67}N/CrN$ nano-multilayers, which are known to have excellent wear resistance, were prepared using an unbalanced magnetron sputter to have various periods of 2-5 nm. $Ti_{0.33}Al_{0.67}N$ had a hexagonal structure in a single layer, but converted to a cubic structure by forming a multilayer with CrN, which has a cubic structure. Thus, $Ti_{0.33}Al_{0.67}N$ formed a superlattice in the multilayer. The $Ti_{0.33}Al_{0.67}/CrN$ multilayer with a period of 2.5 nm greatly exceeded the hardness of the $Ti_{0.33}Al_{0.67}N$ and the CrN single layer, reaching 39 GPa. According to the low angle X-ray diffraction results, the $Ti_{0.33}Al_{0.67}N/CrN$ multilayer maintained its as-coated structure to a temperature as high as $700^{\circ}C$ and exhibited hardness of 30 GPa. The thickness of the oxide layer of the $Ti_{0.33}Al_{0.67}N/CrN$ multilayered coating was less than one-tenth of those of the single layers. Thus, $Ti_{0.33}Al_{0.67}N/CrN$ multilayered coating had hardness and oxidation resistance far superior to those of its constituent single layers.