• Journal of the Korean institute of surface engineering
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• v.54 no.6
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• pp.365-370
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• 2021

In this research, we proceeded with research on plasma resistance of the cleaning process of APS(Atmospheric Plasma Spray)-Y₂O₃ coated parts used for semiconductor and display plasma process equipment. CF₄, O₂, and Ar mixed gas were used for the plasma environment, and respective alconox, surfactant, and piranha solution was used for the cleaning process. After APS-Y₂O₃ was exposed to CF₄ plasma, the surface changed from Y₂O₃ to YF₃ and a large amount of carbon was deposited. For this reason, the plasma corrosion resistance was lowered and contamination particles were generated. We performed a cleaning process to remove the defect-inducing surface YF₃ layer and carbon layer. Among three cleaning solutions, the piranha cleaning process had the highest detergency and the alconox cleaning process had the lowest detergency. Such results could be confirmed through the etching amount, morphology, composition, and accumulated contamination particle analysis results. Piranha cleaning process showed the highest detergency, but due to the very large thickness reduction, the base metal was exposed and a large number of contaminated particles were generated. In contrast, the surfactant cleaning process exhibit excellent properties in terms of surface detergency, etching amount, and accumulated contamination particle analysis.

• Journal of the korean academy of Pediatric Dentistry
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• v.35 no.3
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• pp.437-445
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• 2008

The presence of a "prismless" layer on the enamel surface particularly on deciduous teeth has been reported by a number of workers. This structure, which appears to lack the normal prism delineations, could interfere with tag formation and hence, reduce bonding to such surfaces. The purpose of this study was to investigate the relationship of etching times on the effect of acid etching on primary enamel with respect to the quality of etching patterns. Labial surfaces of 32 extracted or exfoliated caries-free primary anterior teeth were used. 35% phosphoric acid gel was used only cervical regions of labial surfaces for each etching time group, 15, 30, 45 and 60 seconds. The surfaces were then washed with water for 20 seconds and dried with air spray for 20 seconds. 1. The Type 3 is 75% when the 15 seconds acid etching time was used. 2. The Type 1 is 38% and Type 2 is 75% when the 30 and 45 seconds acid etching time was used. 3. The Type 1 is 25% and Type 2 is 75% when the 60 seconds acid etching time was used. 4. An etching time of 60 seconds produced a constant and regular etching pattern. 5. There is a significant difference between the groups with respect to the patterns of etch achieved(p<0.05). 6. We confirmed that the acid induced patterns(type 1, 2) became more pronounced when the application time increased(p<0.05). $45{\sim}60$ seconds was the optimal time for etching on the primary enamel.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.31 no.6
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• pp.276-281
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• 2021

In order to manufacture a semiconductor circuit, etching, cleaning, and deposition processes are repeated. During these processes, the inside of the processing chamber is exposed to corrosive plasma. Therefore, the coating of the inner wall of the semiconductor equipment with a plasma-resistant material has been attempted to minimize the etching of the coating and particle contaminant generation. In this study, we synthesized yttrium oxyfluoride (YOF) powder by a solid-state reaction using Y₂O₃ and YF₃ as raw materials. Mixing ratio of the Y₂O₃ and YF₃ was varied from 1.0:1.0 to 1.0:1.6. Effects of the mixing ratio on crystal structure and microstructure of the synthesized YOF powder were investigated using XRD and FE-SEM. The synthesized YOF powder was successfully applied to plasma spray coating process on Al substrate.

• Proceedings of the KAIS Fall Conference
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• 2011.05a
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• pp.347-350
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• 2011

본 논문에서는 습식식각 설비의 Process 동작 간에 발생되는 설비의 비 가동 시간을 최소화하여 Throughput을 향상시키기 위하여 Monitoring 한 결과 Recipe 변경, 액 교환 발생, Tact 변경 등의 공정간 조건에 따라 대기시간이 발생(생산 지연시간 발생) 하는 것을 확인 하고 이를 개선하기 위한 연구이다. 연구 방법으로, Recipe Data 적용 시점을 약액 구간 처리 완료 시점에서 후속 기판이 대기하지 않고 연속 투입을 실시, Chamber Drain과 약액 Tank 전환이 동시에 이루어지고 액 교환 동작 중 Pump Spray의 연속성을 유지하는 무정지 액 교환 Sequence 적용, Tact 적용 시점을 전 기판 배출 확인 후 실시하는 것을 약액 구간 처리 완료 후 적용의 3가지 방법을 6시그마의 DMAIC 기법을 활용하였다. 연구 결과 개선 전 비 가동 시간이 설비 대당 1일 28분 시그마 Level 3.40 이었던 것을 개선 후 설비 대당 1일 17분 시그마 Level 5.3 으로 개선됨을 확인 할 수 있다.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.24 no.6
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• pp.268-273
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• 2014

$Y_2O_3$ ceramic specimens were fabricated from the granular powder, obtained by spray drying process from the slurry. The slurry was prepared by mixing PVA binder, NaOH for Ph control, PEG and $Y_2O_3$ powder. The $Y_2O_3$ specimen was shaped in size of ${\phi}14mm$ and then sintered at $1650^{\circ}C$. The characteristics, microstructure, densities and plasma resistance of the $Y_2O_3$ specimens were investigated with the function of forming pressure and sintering time. $Y_2O_3$ specimens were exposed under the $CHF_3/O_2/Ar$ plasma, the dry etching treatment of specimens was carried out by the physical reaction etching of $Ar^+$ ion beam and the chemical reaction etching of $F^-$ ion decomposed from $CHF_3$. With increasing sintering time, $Y_2O_3$ specimens showed relatively high density and strong resistance in plasma etching test.

• Journal of the Korean Society for Heat Treatment
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• v.25 no.1
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• pp.6-13
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• 2012

HVOF thermal spray coating of 80%WC-CoFe powder is one of the most promising candidate for the replacement of the traditional hard chrome plating and hard ceramics coating because of the environmental problem of the very toxic $Cr^{6+}$ known as carcinogen by chrome plating and the brittleness of ceramics coatings. 80%WC-CoFe powder was coated by HVOF thermal spraying for the study of durability improvement of the high speed spindle such as air bearing spindle. The coating procedure was designed by the Taguchi program, including 4 parameters of hydrogen and oxygen flow rates, powder feed rate and spray distance. The surface properties of the 80%WC-CoFe powder coating were investigated roughness, hardness and porosity. The optimal condition for thermal spray has been ensured by the relationship between the spary parameters and the hardness of the coatings. The optimal coating process obtained by Taguchi program is the process of oxygen flow rate 34 FRM, hydrogen flow rate 57 FRM, powder feed rate 35 g/min and spray distance 8 inch. The coating cross-sectional structure was observed scanning electron microscope before chemical etching. Estimation of coating porosity was performed using metallugical image analysis. The Friction and wear behaviors of HVOF WC-CoFe coating prepared by OCP are investigated by reciprocating sliding wear test at $25^{\circ}C$ and $450^{\circ}C$. Friction coefficients (FC) of coating decreases as sliding surface temperature increases from $25^{\circ}C$ to $450^{\circ}C$.

• Restorative Dentistry and Endodontics
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• v.19 no.2
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• pp.447-459
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• 1994

The purpose of this study is to evaluate of shear bond strength of light-curing composite resin to light-curing glass ionomer cement. Composite resin and glass ionomer cement have been widely used as an esthetic filling materials in dental clinics. To achieve better clinical results, sandwich technic was developed with conpensating for disadvantages of these two materials. Especially, light-curing glass ionomer cement provided greately improved bonding strength of teeth or composite resin, and then excellent clinical results can be acquired. In this study, 6 commercial light-curing glass ionomer cements(3 commercial restorative materials : Fuji II LC, Variglass VLC, Vitremer, and 3 commercial lining materials : Fuji Lining LC, Baseline VLC, Vitrebond) were devided two groups. According to manufacturer's appointment, no surface treatment was referred to N groups. Supposing. of clinical practice, surface grinding with water spray at 320 grit sand paper, 40 seconds etching with 37% phosphoric acid, 20 seconds washing, 20 seconds air drying was referred to N groups. Totally 12 experimental groups were devided, and all 120 specimens from 10 specimens of each groups were made. After light-curing composite resin was bonded to light-curing glass ionomer cement, shear bond strength was tested by Instron universal testing machine between glass ionomer cement and composit resin. The data were analyzed statistically by Student's t-test and ANOVA. The obtained results were as follows; 1. In light-curing glass ionomer cement, restorative materials showed higher shear bond strength to composite resin than lining materials(p<0.05). 2. Variglass VLC of restorative material group and Baseline VLC of lining material group have highest shear bond strength to composite resin(p<0.001). 3. In light-curing glass ionomer cement, surface grinding and acid etching reduced shear bond strength to composite resin(p<0.001)}. 4. VGN group 1s highest shear bond strength to composite resin, VBE group is lowest shear bond strength to composite resin(p<0.001).

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.30 no.2
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• pp.66-72
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• 2020

The difference of plasma resistance between the CAS glass bulk and coating films were compared. Plasma resistance was confirmed by analyzing the etch rate and the microstructure of the surface when the CAS glass bulk and the glass coating film were etched with CF₄/O₂/Ar plasma gas. CAS glass coating film was etched up to 25 times faster than the glass bulk. A statistically high correlation between the surface roughness and the etching rate of the coating film was derived, and thus, the high surface roughness of the coating film was determined to cause rapid etching. In addition, cristobalite crystals that has a low Ca content and a high Si content, was foamed on the glass coating film. Therefore, the CAS glass coating film is considered to have low plasma resistance compared to the glass bulk.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.43-43
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• 2010

반도체 및 디스플레이의 진공부품은 알루미늄 모제에 전해연마법(electrolytic polishing), 양극산화피막법(anodizing), 플라즈마 용사법(plasma spray) 등을 사용하여 $Al_2O_3$ 피막을 성장시켜 사용되고 있다. 반도체 제조공정 중 30~40% 이상의 비중을 차지하는 식각(etching) 및 증착(deposition) 공정의 대부분 은 플라즈마에 의해 화학적, 물리적 침식이 발생하여 피막에 손상을 일으켜 피막이 깨지거나 박리되면서 다량의 particle을 생성함으로써 생산수율에도 문제를 야기 시킨다. 본 연구에서는 이러한 진공부품의 하나인 etcher용 상부전극을 양극산화피막법(Anodizing)으로 $Al_2O_3$ 피막을 성장시킨 샘플을 제작하여 플라즈마 처리에 따른 내전압, 식각율, 표면 미세구조의 변화를 관찰하였고 이를 종합적으로 고려하여 etcher용 상부전극의 Life Time 평가 방법을 연구하였다. 이러한 실험을 통해 플라즈마 처리 후 피막에 크랙이 발생되는 것을 확인할 수 있었고 피막의 손상으로 전기적 특성이 감소되는 것을 확인할 수 있었다. 또한 플라즈마 처리 중 ISPM 장비를 이용하여 플라즈마 공정에서 발생하는 오염입자를 실시간으로 측정할 수 있는 방법을 연구하였다. 이러한 결과를 이용하여 진공공정에서 사용되는 코팅부품이 플라즈마에 의한 손상정도를 정량화 하고 etcher용 상부전극의 Life Time 평가 방법을 개발하여 부품 양산업체의 진공장비용 코팅부품의 개발 신뢰성 향상이 가능할 것으로 기대된다.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.16 no.3
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• pp.116-120
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• 2006

We have investigated plasma spray coated $Al_2O_3$ layers on Al-60 series substrates for development of wafer electrostatic chuck in semiconductor dry etching system. Samples were prepared without/with cooling bar on backside of samples, at various distances, and with different powder feed rates. There were many cracks and pores in the $Al_2O_3$ layers coated on Al-60 series substrates without cooling bar on the backside of samples. But the cracks and pores were almost disappeared in the $Al_2O_3$ layers on Al-60 series substrates coated with cooling bar on the back side of samples, 15 g/min. powder feed rate and various 60, 70, 80 mm working distances. Then the surface morphology was not changed with various working distances of 60, 70, 80 mm. When the powder feed rate was changed from 15 g/min to 20 g/min, the crack did not appear, but few pores appeared. Also the $Al_2O_3$ layer was coated with many small splats compared with $Al_2O_3$ layer coated with 15 g/min powder feed rate. The deposited rate of $Al_2O_3$ layer was higher when the process was done without cooling bar on the back side of sample than that with cooling bar on the back side of sample.