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http://dx.doi.org/10.6111/JKCGCT.2020.30.2.066

Comparison of plasma resistance between spray coating films and bulk of CaO-Al2O3-SiO2 glasses under CF4/O2/Ar plasma etching  

Na, Hyein (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology)
Park, Jewon (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology)
Park, Jae-Hyuk (IONES. Co. Ltd.)
Kim, Dae-Gun (IONES. Co. Ltd.)
Choi, Sung-Churl (Division of Materials Science and Engineering Hanyang University)
Kim, Hyeong-Jun (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology)
Publication Information
Journal of the Korean Crystal Growth and Crystal Technology / v.30, no.2, 2020 , pp. 66-72 More about this Journal
Abstract
The difference of plasma resistance between the CAS glass bulk and coating films were compared. Plasma resistance was confirmed by analyzing the etch rate and the microstructure of the surface when the CAS glass bulk and the glass coating film were etched with CF4/O2/Ar plasma gas. CAS glass coating film was etched up to 25 times faster than the glass bulk. A statistically high correlation between the surface roughness and the etching rate of the coating film was derived, and thus, the high surface roughness of the coating film was determined to cause rapid etching. In addition, cristobalite crystals that has a low Ca content and a high Si content, was foamed on the glass coating film. Therefore, the CAS glass coating film is considered to have low plasma resistance compared to the glass bulk.
Keywords
Corrosion; Sintering; $CaO-Al_2O_3-SiO_2$ (CAS) glass; Surface roughness;
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Times Cited By KSCI : 2  (Citation Analysis)
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