• Title/Summary/Keyword: Spiral planar inductor

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Frequency Characteristics of Octagonal Spiral Planar Inductor (팔각 나선형 박막 인덕터의 주파수 특성)

  • Kim, Jae-Wook
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.13 no.3
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    • pp.1284-1287
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    • 2012
  • In this study, we propose the structures of octagonal spiral planar inductors without underpass and via, and confirm the frequency characteristics. The structures of inductors have Si thickness of $300{\mu}m$, $SiO_2$ thickness of $7{\mu}m$. The width of Cu coils and the space between segments have $20{\mu}m$, respectively. The number of turns of coils have 3. The performance of spiral planar inductors was simulated to frequency characteristics for inductance, quality-factor, SRF(Self- Resonance Frequency) using HFSS. The octagonal spiral planar inductors have inductance of 2.5nH over the frequency range of 0.8 to 1.8 GHz, quality-factor of maximum 18.9 at 5 GHz, SRF of 11.1 GHz. Otherwise, square spiral planar inductors have inductance of 2.8nH over the frequency range of 0.8 to 1.8 GHz, quality-factor of maximum 18.9 at 4.9 GHz, SRF of 10.3 GHz.

Fabrication of Planar Type Inductor Using FeTaN Magnetic thin Films

  • Kim, Chung-Sik;Seok Bae;Jeong, Jong-Han;Nam, Seoung-Eui;Kim, Hyoung-June
    • Proceedings of the Korean Magnestics Society Conference
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    • 2000.09a
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    • pp.532-538
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    • 2000
  • A double rectangular spiral inductor is fabricated using FeTaN films. The inductor is composed of internal coils sandwiched by magnetic layers. Characteristics of inductor performance are investigated with an emphasis on planarization of magnetic films. In the absence of the planarization process, the grating topology of upper magnetic films over coil arrays degrades the soft magnetic properties and the inductor performance. It also induces a longitudinal magnetic anisotropy with the easy axis aligned to the magnetic flux direction. This alignment prevents the upper magnetic films from contributing to the total induction. Glass bonding is a viable method for achieving a completely planar inductor structure. The planar inductor with glass bonding shows excellent performance : inductance of 1.1 H, Q factor of 7 (at 5 MHz), and the dc current capability up to 100 mA.

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Characteristic of Planar Spiral Inductor for Wireless Signal Transmission based on AC Coupling (AC 커플링 기반 무선 신호 전송을 위한 평면 나선형 인덕터의 특성)

  • Kim, Jae-Wook
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.13 no.9
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    • pp.4126-4130
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    • 2012
  • In this paper, we proposed planar spiral inductors based on AC coupling for high-frequency wireless signal transmission. Design and characteristics of various structures of the inductor were analyzed. Capacitance between the inductors can be reduced by positioning two thin-film inductors in parallel. So two structures were proposed. First structure is inter-diagonal structure. This structure was made not to overlap the wire part of the paralleled two inductors. Second structure is On-chip type structure that the two thin-film inductors were in parallel but located on diagonal line not to face each other. The resonance in this structure was reduced from twice to once by increasing horizontal distance between the two thin-film inductors, because the capacitance effect between the two thin-film inductors decreases when the distance between the two inductors increases.

Impedence Analysis of Planar Air Core Inductor (공심 평면인덕터의 임피던스 해석)

  • 김영학;송재성
    • Journal of the Korean Magnetics Society
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    • v.6 no.3
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    • pp.179-188
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    • 1996
  • This paper discussed on the impedance analysis of the planar air core inductors having spiral pattern and meander pattern. The width and distance of conductor, and number of turns were varied. As the width of conductor increased, both resistance and inductance decreased and there existed an maximum value in Q for spiral pattern. But Q increased with increasing width of conductor in meander pattern. In spiral pattern, there existed a distance between conductors where inductance became constant and Q became maximum, while the distance between conductors must be as large as possible to obtain large Q because the mutual inductance of meander pattern inductor has negative sign due to opposite current direction at adjacent conductor. Resistance and inductance increased with increasing the number of turns. There existed maximum Q at certain number of turns in spiral pattern. But Q became small in the meander pattern because increase of resistance was larger than increase of inductance with increasing number of turns.

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Fabrication of the 7$\times$7 mm Planar Inductor for 1W DC-DC Converter (1W DC-DC 컨버터를 위한 7$\times$7 mm 평면 인덕터의 제조)

  • Bae, Seok;Ryu, Sung-Ryong;Kim, Choong-Sik;Nam, Seoung-Eui;Kim, Hyoung-June;Min, Bok-Ki;Song, Jae-Sung
    • Journal of the Korean Magnetics Society
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    • v.11 no.5
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    • pp.222-225
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    • 2001
  • The planar type inductors have a good potential for the application of miniaturized low power DC-DC converters. For those high quality application, the reduction of coil loss and also magnetic films which have good high frequency properties are required. Fabricated inductor was consisted of FeTaN/Ti magnetic film and electroplated Cu coil thickness of 100$\mu\textrm{m}$ and $SiO_2$ as a insulating layer. The inductor was designed double rectangular spiral shape for magnetic field highly confining within the device. The measured value of inductance and resistance were 980 nH and 1.7 $\Omega$ at 1 MHz as operating frequency of device. The Q factor is 3.55 at 1 MHz.

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LAM 공정을 위한 Underpass를 갖지 않는 나선형 박막 인덕터의 주파수 특성 (Frequency Characteristics of Spiral Planar Inductor without Underpass for LAM Process)

  • Kim, Jae-Wook
    • Journal of IKEEE
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    • v.12 no.3
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    • pp.138-143
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    • 2008
  • In this study, we propose that the structures of spiral inductors have the environment advantage utilizing direct-write and LAM(Laser Ablation of Microparticles) processes without process step of lithography and etching etc. of existing semiconductor process. The structures of inductors have Si thickness of 540${\mu}m$, $SiO_2$ thickness of 3${\mu}m$. The width of Cu coils and the space between segments have 30${\mu}m$, respectively, using for direct-write and LAM processes. The performance of spiral planar inductors was simulated to frequency characteristics for inductance, quality-factor, SRF(Self- Resonance Frequency) using HFSS. The inductors without underpass and via have inductance of 1.11nH over the frequency range of 300 to 800 MHz, quality-factor of maximum 38 at 5 GHz, SRF of 18 GHz. Otherwise, inductors with underpass and via have inductance of 1.12nH over the frequency range of 300 to 800 MHz, quality-factor of maximum 35 at 5 GHz, SRF of 16 GHz.

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An LTCC Inductor Embedding NiZn Ferrite and Its Application (NiZn 페라이트를 내장한 LTCC 인덕터 및 응용)

  • Won, Yu-June;Kim, Hee-Jun
    • The Transactions of the Korean Institute of Electrical Engineers B
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    • v.55 no.10
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    • pp.534-539
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    • 2006
  • An integrated inductor using the low-temperature co-fired ceramics(LTCC) technology for low-power electronics was fabricated. In the inductor NiZn ferrite sheet$({\mu}_r=230)$, was embedded to increase inductance. The inductor has Ag spiral coil with 14 turns$(7turns{\times}2layers)$, a dimension of 0.6mm in width, 10um in thickness, and 0.15mm pitch. To evaluate the inductance, including the parasitic resistance, the fabricated inductor was calculated and measured. It was confirmed that calculated values were very close to the measured values. Finally as an application of the LTCC integrated inductor to low power electronic circuits, a LTCC boost DC/DC converter with 1W output power and up to 0.5MHz switching frequency using the inductor fabricated was developed.

Low Phase Noise CMOS VCO with Hybrid Inductor

  • Ryu, Seonghan
    • IEIE Transactions on Smart Processing and Computing
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    • v.4 no.3
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    • pp.158-162
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    • 2015
  • A low phase noise CMOS voltage controlled oscillator(VCO) for multi-band/multi-standard RF Transceivers is presented. For both wide tunability and low phase noise characteristics, Hybrid inductor which uses both bondwire inductor and planar spiral inductor in the same area, is proposed. This approach reduces inductance variation and presents high quality factor without custom-designed single-turn inductor occupying large area, which improves phase noise and tuning range characteristics without additional area loss. An LC VCO is designed in a 0.13um CMOS technology to demonstrate the hybrid inductor concept. The measured phase noise is -121dBc/Hz at 400KHz offset and -142dBc/Hz at 3MHz offset from a 900MHz carrier frequency after divider. The tuning range of about 28%(3.15 to 4.18GHz) is measured. The VCO consumes 7.5mA from 1.3V supply and meets the requirements for GSM/EDGE and WCDMA standard.

Optimal Design of Spiral Inductors on Silicon Substrates for RF ICs

  • Moon, Yeong-Joo;Choi, Moon-Ho;Na, Kee-Yeol;Kim, Nam-Su;Kim, Yeong-Seuk
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.3
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    • pp.216-218
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    • 2005
  • Planar spiral inductors on silicon substrates were optimally designed using MATLAB, which is a tool to perform numerical computations with matrices. The equivalent circuit parameters of the spiral inductors were extracted from the data measured from the spiral inductors fabricated using a 0.18 $\mu\textrm{m}$ RF CMOS process. The metal width, which is a critical design parameter, was optimized for the maximum quality factor with respect to the operating frequency.

Effects of Thermal Treatment on the Characteristics of Spiral Inductors on Bragg Reflectors

  • Mai, Linh;Lee, Jae-Young;Le, Minh-Tuan;Pham, Van-Su;Yoon, Gi-Wan
    • Journal of information and communication convergence engineering
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    • v.4 no.4
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    • pp.155-157
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    • 2006
  • This paper presents the thermal technique to improve characteristic of planar spiral inductors. The spiral inductors were fabricated on silicon dioxide/silicon (SiO2/Si) wafer. The thermal treatment was done by annealing processes. The measure results showed a considerable improvement of return loss (Sl1). This thermal treatment seems very promising for enhancing spiral inductors based RF IC's.