• 제목/요약/키워드: Sol-gel coating

검색결과 623건 처리시간 0.041초

Application of Taguchi Method and Orthogonal Arrays for Optimization of Adhesion of $SrZrO_3$ Coatings on Ag/Bi(2223) Tapes

  • Lee, Se-Jong;Lee, Deuk-Yong;Song, Yo-Seung;Kim, Bae-Yeon
    • 한국초전도ㆍ저온공학회논문지
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    • 제5권1호
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    • pp.13-16
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    • 2003
  • Adhesion of $SrZrO_3$ resistive oxide barrier on Ag sheathed Bi(2223) tapes prepared by the sol-gel and dip-coating method was evaluated with an aid of Taguchi method and Lie($2^1{\times}3^7$) orthogonal arrays to determine the optimal process combination of levels of factors that best satisfy the bigger is better quality characteristic (QC=B). For analyses of results statistical calculations such as average and analysis of variance (ANOVA) were employed to analyze the results for improving the performance qualities of the dip-coated $SrZrO_3$ film. Experimentally, the performance of the films was evaluated in terms of bond strength by varying Sr/Zr moi ratio (A), amount of organic vehicle additives (B), drying temperature (C) and time (D), heat treatment temperature (E) and time (F), respectively. The optimal combination of levels of factors was determined to be $A_3B_2C_3D_2E_1F_3$ having a 90% confidence level.

졸-겔법에 의한 SiO2-Tio2계 박막의 내후성 (The Weathering Resistance of Sol-Gel Derived Anti-Reflective SiO2-Tio2 Thin Films)

  • 김상문;임용무;황규석
    • 한국안광학회지
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    • 제3권1호
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    • pp.237-242
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    • 1998
  • $80SiO_2-20TiO_2$(mol%)의 무색투명한 비정질 박막을 현미경용 슬라이드 유리판과 사파이어 위에 tetraethyl orthosilicate와 titanium trichloride의 전구체 용액을 사용하여 스핀코팅방법으로 제조하였다. 코팅 후 $750^{\circ}C$에서 열처리된 박막은 높은 투과율과 낮은 반사율을 보였다. 슬라이드 유리판에 코팅한 $SiO_2-TiO_2$ 박막의 경우에 나트륨이온과 산소 간의 강한 상호작용에 의하여 고온과 높은 습도에서도 안정성이 우수하였다.

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자성 및 발광 특성이 조절 가능한 다기능 코어/중간체/쉘 나노 입자 합성 (Synthesis of the Multifunctional Core/Intermediate/Shell Nanoparticles: Tunable Magnetic and Photoluminescence Properties)

  • 김문경;김세윤;문경석;신원호;정형모
    • 한국분말재료학회지
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    • 제26권6호
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    • pp.463-470
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    • 2019
  • Fe3O4/SiO2/YVO4:Eu3+ multifunctional nanoparticles are successfully synthesized by facile stepwise sol-gel processes. The multifunctional nanoparticles show a spherical shape with narrow size distribution (approximately 40 nm) and the phosphor shells are well crystallized. The Eu3+ shows strong photoluminescence (red emission at 619 nm, absorbance at 290 nm) due to an effective energy transfer from the vanadate group to Eu. Core-shell structured multifunctional nanoparticles have superparamagnetic properties at 300 K. Furthermore, the core-shell nanoparticles have a quick response time for the external magnetic field. These results suggest that the photoluminescence and magnetic properties could be easily tuned by either varying the number of coating processes or changing the phosphor elements. The nanoparticles may have potential applications for appropriate fields such as laser systems, optical amplifiers, security systems, and drug delivery materials.

The discharge characteristic of Li ion doped MgO film in a flat fluorescent lamp structure

  • Ryu, Si-Hong;Lee, Seong-Eui;Ahn, Sung-Il;Choi, Kyung-Cheol
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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    • pp.1388-1390
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    • 2007
  • This paper investigates how various concentrations of lithium ion influence on crystallization of MgO in thin films formed by spin coating and an the discharge characteristic in a flat fluorescent lamp structure. The XRD results indicate $Li^+$ ion enhances the growth of MgO crystal in a spin coated thin film. The discharge property with the $Li^+$ ion doped MgO films show the lithium ion in MgO film clearly reduce the initial discharge voltages of test devices. Interestingly, the test panels with various doped MgO film have somewhat higher static memory margin of than that of pure-MgO owing probably to the pore structure of spin coated MgO films. The CL spectra, which confirm that the doping creates defects energy levels in the band gap of MgO, show the $F^+$ center is the main defects in doped MgO films.

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Zinc Gallate (ZnGa2O4)박막 형광체의 합성과 발광특성 (Synthesis and Photoluminescence Characteristics of Zinc Gallate (ZnGa2O4) Thin Film Phosphors)

  • 김수연;윤영훈;최성철
    • 한국세라믹학회지
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    • 제44권1호
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    • pp.32-36
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    • 2007
  • Zinc gallate $(ZnGa_2O_4)$ thin film phosphors have been formed on ITO glass substrates by a sol-gel spinning coating method. For the formation of the film phosphors, the starting materials of zinc acetate dihydrate, gallium nitrate hydrate and 2-methoxyethanol as a solution were used. The thin films deposited were firstly dried at $100^{\circ}C$ and fired at $500^{\circ}C\;or\;600^{\circ}C$ for 30 min and then, annealed $500^{\circ}C\;or\;600^{\circ}C$ at for 30 min under an annealing atmosphere of 3% $H_2/Ar$. The thin films deposited on ITO glass plates showed the (220), (222), (400), (422), (511), and (440) peaks of spinel structure as well as the (311) peak indicating a standard powder diffraction pattern. The surface morphologies of the thin film phosphors were observed with a firing and an annealing condition. The $ZnGa_2O_4$ film phosphors showed the blue emission spectra around 410 nm as well as the emission spectra in the UV region (360-380 nm).

ONO 버퍼층을 이용한 Metal/Ferroelectrics/Insulator/Semiconductor 구조의 제작 및 특성 (Fabrication and Properties of Metal/Ferroelectrics/Insulator/Semiconductor Structures with ONO buffer layer)

  • 이남열;윤성민;유인규;류상욱;조성목;신웅철;최규정;유병곤;구진근
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
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    • pp.305-309
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    • 2002
  • We have successfully fabricated a Metal-Ferroelectric-Insulator-Semiconductor (MFIS) structure using Bi$\sub$4-x/La$\sub$x/Ti$_3$O$\sub$12/ (BLT) ferroelectric thin film and SiO$_2$/Nitride/SiO$_2$ (ONO) stacked buffer layers for single transistor type ferroelectric nonvolatile memory applications. BLT films were deposited on 15 nm-thick ONO buffer layer by sol-gel spin-coating. The dielectric constant and the leakage current density of prepared ONO film were measured to be 5.6 and 1.0 x 10$\^$-8/ A/$\textrm{cm}^2$ at 2MV/cm, respectively, It was interesting to note that the crystallographic orientations of BLT thin films were strongly effected by pre-bake temperatures. X-ray diffraction patterns showed that (117) crystallites were mainly detected in the BLT film if pre-baked below 400$^{\circ}C$. Whereas, for the films pre-baked above 500$^{\circ}C$, the crystallites with preferred c-axis orientation were mainly detected. From the C-V measurement of the MFIS capacitor with c-axis oriented BLT films, the memory window of 0.6 V was obtained at a voltage sweep of ${\pm}$8 V, which evidently reflects the ferroelectric memory effect of a BLT/ONO/Si structure.

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프렉탈 처리에 의한 BST 박막의 특성에 관한 연구 (A Study on the Characteristics of BST Thin Films Using Fractal Process)

  • 기현철;장동환;홍경진;오수홍;김태성
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 영호남학술대회 논문집
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    • pp.34-38
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    • 2000
  • Recently, the ceramics of high permittivity are applied to DRAM and FRAM. In this study, (Ba, Sr)$TiO_3$ (BST) ceramics thin films were prepared by Sol-Gel method. BST solution was made and spin-coated on Pt/$SiO_2$/Si substrate at 4000 [rpm] for 10 seconds. Coated specimens were dried at $150[^{\circ}C]$ for 5 minutes. Coating process was repeated 3 times and then sintered at $750[^{\circ}C]$ for 30 minutes. Each specimen was analyzed structure and electrical characteristics by Fractal Process. Thickness of BST ceramics thin films are about $2000{\AA}$. Dielectric constant and loss of thin films was little decreased at 1[KHz] - 1[MHz]. Dielectric constant and loss to frequency were 250 and 0.02 in BST3. The property of leakage current as the realation between the current and the voltage was that change of the leakage current was stable when the applied voltage was 0~3[V].

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신축성 유기발광다이오드를 위한 은 나노와이어 기반의 신축성 투명 전극 기판 연구 (Silver Nanowire-Based Stretchable Transparent Electrodes for Deformable Organic Light-Emitting Diodes)

  • 정현수;고혁;박계춘;윤창훈
    • 한국전기전자재료학회논문지
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    • 제30권10호
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    • pp.609-614
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    • 2017
  • The proposed stretchable transparent electrodes based on silver nanowires (AgNWs) were prepared on a polyurethane (PU) substrate. In order toavoid the surface roughness caused by the silver nanowires, a titanium oxide ($TiO_2$) buffer layer was addedby coating and heating the organometallic sol-gel solution. The fabricated stretchable electrodes showedan electrical sheet resistance of $24{\Omega}sq^{-1}$, 78% transmittance at 550 nm, and an average surface roughness below 5 nm. Furthermore, the AgNW-based electrode maintained its initial electrical resistance under 130% strain testing conditions, without the assistance of additional conductive polymer layers. In this paper, the critical role of the $TiO_2$ buffer layer between the AgNW network and the PU substrate has been discussed.

소결온도에 따른 $Pb(Zr_{x}Ti_{1-x})O_3$ 이종층 후막의 구조적.전기적 특성 (StructuralElectrtonic Properies of $Pb(Zr_{x}Ti_{1-x})O_3$ Heterolayerd Thick Films with Variation of Sintering Temperature)

  • 이성갑;이영희;남성필;배선기
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2005년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.71-73
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    • 2005
  • Ferroelectric PZT heterolayered thick films were fabricated by the alkoxide-based sol-gel method. PZT(20/80) and PZT(80/20) paste were made and alternately screen-printed on the alumina substrates. The coating and drying procedure was repeated 4 times to form the heterolayered thick films. The thickness of the PZT heterolayered thick films was approximately 60 mm. All PZT thick films showed the typical XRD patterns of a perovskite polycrystalline structure. The relative dielectric constant and the dielectric loss of the PZT thick films sintered at $1050^{\circ}C$ were 1382 and 1.90%, respectively. The remanent polarization and coercive field of the PZT thick films sintered at $1050^{\circ}C$ were $14.15{\mu}C/cm^2$ and 19.13kV/cm, respectively.

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DRAM용 PZT 박막 캐패시터의 유전특성 (Dielectric Properties of the PZT Thin Film Capacitors for DRAM Application)

  • 정장호;박인길;이성갑;이영희
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1995년도 추계학술대회 논문집 학회본부
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    • pp.335-337
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    • 1995
  • In this study, $Pb(Zr_{0.52}Ti_{0.48})O_3$ ceramic thin films were fabricated from an alkoxide-based by Sol-Gel method. $Pb(Zr_{0.52}Ti_{0.48})O_3$ stock solution was made and spin-coated on the $Pt/SiO_2/Si$ substrate at 4000[rpm] for 30[sec]. Coated specimens were dried at 400[$^{\circ}C$] for 10 [min]. The coating process was repeated 4 times and then heat-treated at 500$\sim$800[$^{\circ}C$], 1 hour. The final thickness of the thin films were about 3000[A]. The crystallinity and microstructure of the thin films were investigated for varing the sintering condition. The ferroelectric perovskite' phases precipitated under the sintering of 700[$^{\circ}C$] for 1 hours. In the $Pb(Zr_{0.52}Ti_{0.48})O_3$ thin films sintered at 700[$^{\circ}C$] for 1 hour, dielectric constant and dielectric loss were 2133, 2.2[%] at room temperature, respectively. $Pb(Zr_{0.52}Ti_{0.48})O_3$ thin film capacitors having good dielectric and electrical properties are expected for the application to the dielectric material of DRAM.

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