• Title/Summary/Keyword: SnO2 thin films

검색결과 303건 처리시간 0.028초

FTO 투명전극에 따른 박막 실리콘 태양전지 특성평가 (Characterization of thin film Si solar cell with FTO transparent electrode)

  • 김성현;김윤정;노임준;조진우;이능헌;김진식;신백균
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2009년도 제40회 하계학술대회
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    • pp.1351_1352
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    • 2009
  • We deposited $SnO_2$:F thin films by atomospheric pressure chemical vapor deposition(APCVD) on corning glass. $SnO_2$:F films were used as transparent conductive oxide (TCO) electrode for Si thin film solar cells. We have investigated structural, electrical and optical properties of $SnO_2$:F thin films and fabricated thin film Si solar cells by plasma enhanced CVD(PECVD) on $SnO_2$:F thin films The cells were characterized by I-V measurement using AM1.5 spectra. Conversion efficiency of our cells were between 5.61% and 6.45%.

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SnO/Sn 혼합 타겟을 이용한 SnO 박막 제조 및 특성 (Analysis of Sputter-Deposited SnO thin Film with SnO/Sn Composite Target)

  • 김철;김성동;김은경
    • 한국재료학회지
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    • 제26권4호
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    • pp.222-227
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    • 2016
  • Tin oxides have been studied for various applications such as gas detecting materials, transparent electrodes, transparent devices, and solar cells. p-type SnO is a promising transparent oxide semiconductor because of its high optical transparency and excellent electrical properties. In this study, we fabricated p-type SnO thin film using rf magnetron sputtering with an SnO/Sn composite target; we examined the effects of various oxygen flow rates on the SnO thin films. We fundamentally investigated the structural, optical, and electrical properties of the p-type SnO thin films utilizing X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), UV/Vis spectrometry, and Hall Effect measurement. A p-type SnO thin film of $P_{O2}=3%$ was obtained with > 80% transmittance, carrier concentration of $1.12{\times}10^{18}cm^{-3}$, and mobility of $1.18cm^2V^{-1}s^{-1}$. With increasing of the oxygen partial pressure, electrical conductivity transition from p-type to n-type was observed in the SnO crystal structure.

반응성 전자빔 방법에 의한 써모크로믹 V$_{1-x}$ Sn$_{x}$O$_2$박막 (Thermochromic VV$_{1-x}$ Sn$_{x}$O$_2$Thin Films by Reactive E-beam Evaporation)

  • 김명근;이문희
    • 한국재료학회지
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    • 제5권7호
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    • pp.850-857
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    • 1995
  • 반응성 전자빔 증착 방법으로 여러 산소압력 하에서 VO$_x$ 및 V$_{1-x}$ Sn$_{x}$O$_2$박막을 유리 위에 코팅하였다. Thermochromism과 천이온도는 spectrophotometer를 이용하여 여러 온도에서 파장에 따른 광투과율을 측정하여 조사하였다. 화학양론비를 RBS로 조사한 결과 산소 압력이 5$\times$$10^{-5}$ Torr 일때 가장 뚜렷한 thermochromic 효과를 나타내는 완전에 가까운 화학양론비를 갖는 VO$_2$박막을 제작할 수 있었다. 그리고 박막의 결정화를 위하여 rapid thermal annealing (RTA) 방법을 적웅한 결과 공기중에서 40$0^{\circ}C$~45$0^{\circ}C$에서 20~30초간의 어닐링 하였을 때가 두께 100~300nm의 박막을 결정화시키는데 최적조건으로 발견되었다. 또한, Sn을 VO$_2$에 1%~6% 첨가한 V$_{1-x}$ Sn$_{x}$O$_2$박막의 써모크로미즘 및 천이온도를 spectrophotometer로 근적외선의 투과율을 측정하여 조사한 결과 뚜렷한 thermochromism은 그대로 유지되었고 V$_{1-x}$ Sn$_{x}$O$_2$, 박막의 천이온도는 VO$_2$박막의 천이온도 보다 높게 나타났다.

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Characterization of ZnO Nanorods and SnO2-CuO Thin Film for CO Gas Sensing

  • Lim, Jae-Hwan;Ryu, Jee-Youl;Moon, Hyung-Sin;Kim, Sung-Eun;Choi, Woo-Chang
    • Transactions on Electrical and Electronic Materials
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    • 제13권6호
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    • pp.305-309
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    • 2012
  • In this study, ZnO nanorods and $SnO_2$-CuO heterogeneous oxide were grown on membrane-type gas sensor platforms and the sensing characteristics for carbon monoxide (CO) were studied. Diaphragm-type gas sensor platforms with built-in Pt micro-heaters were made using a conventional bulk micromachining method. ZnO nanorods were grown from ZnO seed layers using the hydrothermal method, and the average diameter and length of the nanorods were adjusted by changing the concentration of the precursor. Thereafter, $SnO_2$-CuO heterogeneous oxide thin films were grown from evaporated Sn and Cu thin films. The average diameters of the ZnO nanorods obtained by changing the concentration of the precursor were between 30 and 200 nm and the ZnO nanorods showed a sensitivity value of 21% at a working temperature of $350^{\circ}C$ and a carbon monoxide concentration of 100 ppm. The $SnO_2$-CuO heterogeneous oxide thin films showed a sensitivity value of 18% at a working temperature of $200^{\circ}C$ and a carbon monoxide concentration of 100 ppm.

SnO2가 도핑된 TiO2 박막의 합성 및 광촉매 효과 (Synthesis and Photoactivity of SnO2-Doped TiO2 Thin Films)

  • 정미원;곽윤정
    • 한국세라믹학회지
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    • 제44권11호
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    • pp.650-654
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    • 2007
  • [ $SnO_2$ ]-doped $TiO_2$ thin films were prepared from tin (IV) bis (acetylacetonate) dichloride and titanium diisopropoxide bis (acetylacetonate) with pluronic P123 or degussa P25 as a structural-directing agent. These hydrolyzed sol were spin coated onto Si(100) wafer substrate. The microstructure, morphology and bonding states of thin films were studied by field-emission scanning electron microscopy (FE-SEM), X-ray diffractometry (XRD), and X-ray photoelectron spectroscopy (XPS). The photocatalytic activity of these films was investigated by using indigo carmine solution.

열산화법으로 형성한 $Pt-SnO_{2-x}$ 박막소자의 CO 가스 감지특성 (CO Sensing Characteristics of $Pt-SnO_{2-x}$ Thin Film Devices Fabricated by Thermal Oxidation)

  • 심창현;박효덕;이재현;이덕동
    • 센서학회지
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    • 제1권2호
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    • pp.117-123
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    • 1992
  • 적층구조의 Pt-Sn 박막을 히터 위에서 열산화하여 $Pt-SnO_{2-x}$ 박막형 CO 가스감지소자를 제조하였다. 열증착법으로 증착된 Sn의 두께는 $4000{\AA}$이었으며 그 위에 D.C. sputtering법으로 증착된 Pt의 두께는 $14{\AA}{\sim}71{\AA}$ 이었다. XRD 분석에서 $Pt-SnO_{2-x}$ 박막은 $200{\AA}$ 정도의 입경과 주방향성이 (110)인 $(SnO_{2}){\cdot}6T$ 결정상을 보였다. $Pt-SnO_{2-x}$ 박막소자(Pt 두께 : $43{\AA}$)는 6000 ppm의 CO에 대해 80% 정도의 감도와 CO에 대해 높은 선택도를 나타내었다. 그리고 CO에 고감도를 갖는 $Pt-SnO_{2-x}$ 박막소자의 열산화 온도와 동작온도가 각각 $500^{\circ}C$$200^{\circ}C$이었다.

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SnO2 박막의 산소 빈자리에 관한 연구 (A Study of Oxygen Vacancy on SnO2 Thin Films)

  • 정진;최승평
    • 한국전기전자재료학회논문지
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    • 제18권2호
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    • pp.109-115
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    • 2005
  • The study of Oxygen Vacancy on SnO$_2$ thin films grown by thermal chemical vapor deposition were investigated with different substrate temperature. X-ray diffraction showed that the crystallinity of the grown thin films increased with increasing substrate temperature. Two narrow peaks and two broad peaks were observed from the photoluminescence measurements at 6 K. The intensity and shape of the broad peaks were changed with increasing substrate temperature. It was concluded that the origin of the broad peak at 2.4 eV was due to oxygen vacancies and that of peak at 3.1 eV was related to structural defects. Hall effect measurements showed that the carrier density was decreased as increasing deposition time from 10 to 30 min., but increased for the deposition of 60 min.

증착 후 진공열처리에 따른 SnO2 박막의 특성 변화 (Influence of Post-depsotion Vacuum Annealing on the Properties of SnO2 Thin Films)

  • 송영환;문현주;김대일
    • 열처리공학회지
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    • 제29권4호
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    • pp.163-167
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    • 2016
  • $SnO_2$ thin films were prepared by radio frequency magnetron sputtering on glass substrates and then vacuum annealed for 30 minutes at 100, 200, and $300^{\circ}C$, respectively. The thickness of films kept at 100 nm by controlling the deposition rate. While the optical transmittance and electrical resistivity of as deposited $SnO_2$ films were 82.6% in the visible wavelength region and $1.9{\times}10^{-3}{\Omega}cm$, respectively, the films annealed at $200^{\circ}C$ show the increased optical transmittance of 84.5% and the electrical resistivity also decreased as low as $8.5{\times}10^{-4}{\Omega}cm$. From the observed results, it is concluded that post-deposition vacuum annealing at $200^{\circ}C$ is an attractive condition to optimize the opto-elecrtical properties of $SnO_2$ thin films for the opto-electrical applications.

$SnO_2$ 박막 특성에 미치는 annealing 효과 (Annealing Effect on $SnO_2$ Thin Films Properties)

  • 박경희;서용진;이우선;박진성
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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    • pp.99-102
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    • 2003
  • Tin dioxide thin films were deposited at $375^{\circ}C$ on alumina substrate by metal-organic chemical vapor deposition process to find the relationship between physicochemical properties and the annealing treatments. The small grains with heat treatments grew to the bunch of grains and then showed the hillocks on the film surface. The thickness decreased with annealing treatment. The measured binding energy (BE) and branching ratio of the Sn 3d spin-orbital doublet were typical of oxidized states of Sn and the BE of the O1s core level of about 530~530.65eV also confirmed the presence of O-Sn bonds. The BE of oxygen and tin with annealing treatment shifted to higher position. O/Sn atomic ratios of films deposited at $375^{\circ}C$ for 2min and 4min were 1.99 and 2.01, respectively. The value of the atomic ratio O/Sn of films deposited at $375^{\circ}C$ for 2min changed from 1.99 to 2.45 with annealing treatment. Gas sensitivity depended on annealing temperature, the sensitivity increased with increasing annealing temperature.

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Growth of ZnSnO3 Thin Films on c-Al2O3 (0001) Substrate by Pulsed Laser Deposition

  • Manh, Trung Tran;Lim, Jae-Ryong;Yoon, Soon-Gil
    • 한국전기전자재료학회논문지
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    • 제27권5호
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    • pp.297-302
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    • 2014
  • $La_{0.5}Sr_{0.5}CoO_3$ (LSCO) electrode thin films with a resistivity of ~ 1,600 ${\mu}{\Omega}cm$ were grown on c-$Al_2O_3$ (0001) substrate. $ZnSnO_3$ (ZTO) thin films with different thicknesses were directly grown on LSCO/c-$Al_2O_3$ (0001) substrates at a substrate temperature that ranged from 550 to $750^{\circ}C$ using Pulsed Laser Deposition (PLD). The secondary phase $Zn_2SnO_4$ occurred during the growth of ZTO films and it became more significant with further increasing substrate temperature. Polarization-electric-field (P-E) hysteresis characteristics, with a remnant polarization and coercive field of 0.05 ${\mu}C/cm^2$ and 48 kV/cm, respectively, were obtained in the ZTO film grown at $700^{\circ}C$ in 200 mTorr.