• Title/Summary/Keyword: Silicon waveguide

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Analysis of Coupled Mode Theory for Design of Coupler Between Optical Fiber And Grating Assisted Waveguide (광섬유와 격자구조 도파로 결합기 설계를 위한 결합 모드 이론 분석)

  • Heo, Hyung-Jun;Kim, Sang-In
    • The Journal of the Korea institute of electronic communication sciences
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    • v.12 no.4
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    • pp.561-568
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    • 2017
  • In order to effectively utilize the Coarse Wavelength Division Multiplexing(CWDM) technology in optical integrated devices, a design of a wavelength selective coupler structure between an optical fiber and an optical waveguide in a flat substrate is can be considered. In this paper, we consider the coupling between a silicon waveguide with an air trench and a single mode fiber. We investigated the tendency of coupling efficiency and its limitations according to the grating depth. For this purpose, the coupling efficiency of coupler structure designed through modeling based on coupled mode theory is predicted and quantitatively compared with simulation results using finite element method.

Wideband Slow Light in a Line-defect Annular Photonic-crystal Waveguide

  • Kuang, Feng;Li, Feng;Yang, Zhihong;Wu, Hong
    • Current Optics and Photonics
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    • v.3 no.5
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    • pp.438-444
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    • 2019
  • In this theoretical study, a line-defect photonic-crystal waveguide hosted in an annular photonic crystal was demonstrated to provide high-performance slow light with a wide band, low group-velocity dispersion, and a large normalized delay-bandwidth product. Combined with structural-parameter optimization and selective optofluid injection, the normalized delay-bandwidth product could be enhanced to a large value of 0.502 with a wide bandwidth of 58.4 nm in the optical-communication window, for a silicon-on-insulator structure. In addition, the group-velocity dispersion is on the order of $10^5$ ($ps^2/km$) in the slow-light region, which could be neglected while keeping the signal transmission unchanged.

Optimization of vertical SOI slot optical waveguide with confinement factor and sensitivity for integrated-optical biochemical sensors (구속계수와 감지도에 기반한 집적광학 바이오케미컬 센서에 적합한 수직 SOI 슬롯 광 도파로 최적화)

  • Jung, Hongsik
    • Journal of Sensor Science and Technology
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    • v.30 no.3
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    • pp.131-138
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    • 2021
  • The optimization of the specifications of vertical silicon on insulator (SOI) slot optical waveguides suitable for integrated-optical biochemical sensors was performed through computational analysis of the confinement factor of the guided mode distributed in the slot in addition to analytical examination of the TE mode. The optimized specifications were confirmed based on sensitivity in terms of the change in the refractive index of the biochemical analyte. When the slot width, rail width, and height were set to 120 nm, 200 nm, and 320 nm, respectively, the confinement factor was evaluated to be about 56% and the sensitivity was at least 0.9 [RIU/nm].

Sensitivity Analysis for Specifications of Silicon-on-Insulator (SOI) Slot Optical Waveguide-based Single and Add-drop Channel Ring-resonant Biochemical Integrated Optical Sensors (SOI 슬롯 광 도파로 기반 단일 및 삽입-분기 채널 링-공진형 바이오·케미컬 집적광학 센서의 제원에 대한 감도 해석)

  • Jang, Jaesik;Jung, Hongsik
    • Journal of Sensor Science and Technology
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    • v.31 no.2
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    • pp.107-114
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    • 2022
  • The effects of ring radius and coupling spacing on the free spectral range (FSR), full width at half maximum (FWHM), quality factor, and sensitivity of single-channel and add-drop channel slot ring resonators were systematically investigated using FIMMPROP and PICWAVE numerical software. The single-channel ring resonator exhibited better characteristics, namely, a wider FSR and narrower FWHM compared with the add-drop structure; thus, it was evaluated to be more suitable for biochemical sensors. The FSR, FWHM, quality factor, and sensitivity for a single channel ring resonator with a radius of 59.4 ㎛ and coupling gap of 0.5 ㎛ were 2.4 nm, 0.087 nm, 17677, and 550 [nm/RIU], respectively.

Development of a Plate-type Megasonic with Cooling Pins for Sliced Ingot Cleaning

  • Hyunse Kim;Euisu Lim
    • Journal of the Semiconductor & Display Technology
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    • v.22 no.3
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    • pp.21-27
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    • 2023
  • In this article, a plate-type megasonic cleaning system with cooling pins is proposed for the sliced ingot, which is a raw material of silicon (Si) wafers. The megasonic system is operated with a lead zirconate titanate (PZT) actuator, which has high electric resistance, thus when it is being operated, it dissipates much heat. So this article proposes a megasonic system with cooling pins. In the design process, finite element analysis was performed and the results were used for the design of the waveguide. The frequency with the maximum impedance value was 998 kHz, which agreed well with the measured value of 997 kHz with 0.1 % error. Based on the results, the 1 MHz waveguide was fabricated. Acoustic pressures were measured, and analyzed. Finally, cleaning tests were performed, and 90 % particle removal efficiency (PRE) was achieved over 10 W power. These results imply that the developed 1 MHz megasonic will effectively clean sliced ingot wafer surfaces.

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A study on basic characteristics of transmission lines employing various periodic strip structures on silicon substrate for a miniaturization of RF components (RF 소자의 소형화를 위해 실리콘 박막상에서 다양한 형태의 주기적 스트립 구조를 가지는 전송선로의 기본특성 연구)

  • Han, Sung-Jo;Jeong, Jang-Hyeon;Yun, Young
    • Journal of Advanced Marine Engineering and Technology
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    • v.38 no.1
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    • pp.70-77
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    • 2014
  • In this work, we studied basic characteristics of transmission lines employing various PSS (periodic strip structure) on silicon substrate for application to a miniaturization of RF components. According to the results, the transmission lines employing various PSS showed wavelength shorter than conventional coplanar waveguide due to their strong wave characteristics. Especially, with-contact structure was most effective for a miniaturization of RF component. Concretely, the size of the transmission line employing with-contact was only 4.39 % of the conventional coplanar waveguide, According to the bandwidth extraction result, the bandwidth of the transmission lines employing various PSS structures were wider than 384 GHz. Above results indicate that the transmission lines employing various PSS can be effectively used for application to a broadband and miniature RF component, and especially, with-contact is most effective for a miniaturization of RF components.

LiNbO3 integrated optic devices with an UV-curable polymer buffer layer

  • Jeong, Woon-Jo;Kim, Seong-Ku;Park, Gye-Choon;Lee, Jin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.05b
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    • pp.111-118
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    • 2002
  • A new lithium niobate optical modulator with a polymer buffer layer on Ni in-diffused optical waveguide is proposed for the fist time, successfully fabricated and examined at a wavelength of 1.3 mm. By determining the diffusion parameters of Ni in-diffused waveguide to achieve more desirable mode size which is well matched to the mode in the fiber, the detailed results on the achievement of high optical throughput are reported. In addition, the usefulness of polymer buffer layer which can be applicable to a buffer layer in Ni in-diffused waveguide devices is demonstrated. Several sets of channel waveguides fabricated on Z-cut lithium niobate by Ni in-diffusion were obtained and on which coplanar traveling-wave type electrodes with a polymer-employed buffer layer were developed by a conventional fabrication method for characterizing of electro-optical performances of the proposed device. The experimental results show that the measured half-wave voltage is of ~10 V and the total measured fiber-to-fiber insertion loss is of ~6.4 dB for a 40 mm long at a wavelength of =1.3 mm, respectively. From the experimental results, it is confirmed that the polymer-employed buffer layer in LiNbO3 optical modulator can be a substitute material instead of silicon oxide layer which is usually processed at a high temperature of over $300^{\circ}C$. Moreover, the fabrication tolerances by using polymer materials in LiNbO3 optical modulators are much less strict in comparison to the case of dielectric buffer layer.

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Bragg Reflecting Waveguide Device Fabricated on a Flexible Substrate using a Nano-imprinting Technology (나노임프린팅 기술을 이용한 유연성 브래그 반사 광도파로 소자)

  • Kim, Kyung-Jo;Yi, Jeong-Ah;Oh, Min-Cheol
    • Korean Journal of Optics and Photonics
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    • v.18 no.2
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    • pp.149-154
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    • 2007
  • Bragg reflecting waveguide devices have been fabricated on a flexible polymer substrate utilizing a post lift-off process which could Provide excellent uniformity of grating Patterns on Plastic film. The 510 m Period Bragg grating pattern is made by two methods. In the first sample the grating is fabricated by exposing the laser interference pattern on a photoresist, and then it is inscribed by $O_2$ plasma etching. The grating pattern of the second sample is formed by a PDMS soft mold imprinting process. The selective adhesion property of SU-8 material for Au and Si surfaces is utilized to prepare a 100-mm thick plastic substrate. Single mode waveguide is fabricated on the plastic substrate using polymer materials with refractive indices of 1.540 and 1.430 for the core and the cladding layers, respectively. The Bragg grating on Plastic substrate does not show any degradation in its spectral response compared to the reference sample made on a silicon wafer.

나노임프린트 리소그래피를 이용한 SOI 광결정 슈퍼프리즘 제작

  • Choe, Chun-Gi;Han, Yeong-Tak;O, Sang-Sun
    • Proceedings of the Optical Society of Korea Conference
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    • 2007.07a
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    • pp.319-320
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    • 2007
  • We report on the fabrication of two-dimensional Silicon On Insulator (SOI) photonic crystal (PhC) superprism. To optimize the design of 2-D SOI PhC superprism, the photonic band structures (TE-polarization) for triangular lattices and the dispersion surfaces were calculated and analyzed by the plane wave expansion method. Dense 2-D SOI PhC superprism nanostructures with taper input and output waveguide microstructures were successfully fabricated by nanoimprint lithography, followed by inductively coupled plasma (ICP) etching.

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