• 제목/요약/키워드: Silicon oxide substrate

검색결과 238건 처리시간 0.028초

화염 열복사의 파장별 선택적 반사를 위한 도료 코팅에 대한 수치적 연구 (Numerical study of a coating with pigment to selectively reflect the thermal radiation from fire)

  • 변도영;백승욱
    • 대한기계학회논문집B
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    • 제22권3호
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    • pp.399-407
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    • 1998
  • The infrared reflection coatings with pigment can be used to protect the surfaces of combustible materials exposed to fire. To obtain high reflectivities in the infrared range (0.5-10.mu.m) important to fire, several dielectric pigments, such as titanium dioxide, iron oxide, and silicon, can be synthesized to polymer coatings. The theoretical analysis shows that the coating design with particles diameter in the 1.5 to 2.5.mu.m range and volume fraction in the 0.1 to 0.2 range is estimated to be optimal. In the analysis of the radiation, the dependent scattering, absorption by polymeric binder, and the internal interface reflection are considered. In addition, the temperature distribution in the semi-transparent coating layer and an opaque substrate (PMMA) is also presented.

젖음성 차이와 무전해도금을 이용한 연성 구리 회로패턴 형성 (Etchless Fabrication of Cu Circuits Using Wettability Modification and Electroless Plating)

  • 박상진;고태준;윤주일;문명운;한준현
    • 한국재료학회지
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    • 제25권11호
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    • pp.622-629
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    • 2015
  • Cu circuits were successfully fabricated on flexible PET(polyethylene terephthalate) substrates using wettability difference and electroless plating without an etching process. The wettability of Cu plating solution on PET was controlled by oxygen plasma treatment and $SiO_x$-DLC(silicon oxide containing diamond like carbon) coating by HMDSO(hexamethyldisiloxane) plasma. With an increase of the height of the nanostructures on the PET surface with the oxygen plasma treatment time, the wettability difference between the hydrophilicity and hydrophobicity increased, which allowed the etchless formation of a Cu pattern with high peel strength by selective Cu plating. When the height of the nanostructure was more than 1400 nm (60 min oxygen plasma treatment), the reduction of the critical impalement pressure with the decreasing density of the nanostructure caused the precipitation of copper in the hydrophobic region.

CVD 에 의한 탄소나노튜브의 구조 및 성장에 대한 촉매금속의 영향 (Catalyst effect on the structure and growth of carbon nanotube by chemical vapor deposition)

  • 손권희;이태재;류승철;최성헌;이철진;유재은;김성진
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2000년도 하계학술대회 논문집 C
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    • pp.1628-1630
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    • 2000
  • Vertically aligned multiwalled carbon nanotubes are grown on silicon oxide substrate at 950$^{\circ}C$ by thermal chemical vapor deposition using $C_{2}H_2$. Three catalytic metals such as iron(Fe), cobalt (Co), and nickel(Ni) are used as catalyst, we found that the growth rate of carbon nanotubes for three catalyst particles are in an order of Fe > Ni > Co. All carbon nanotubes are revealed to have bamboo structure with no encapsulated catalytic particles, the diameter of carbon nanotubes depend on the catalyst, the tip and the compartment sheets of bamboo structure also depend on the shape of catalytic particles.

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유도 결합 플라즈마($Cl_2$/Ar)를 이용한 $CeO_2$ 박막의 식각 특성 연구 (A Study on the Etching Characteristics of $CeO_2$ Thin Films using inductively coupled $Cl_2$/Ar Plasma)

  • 오창석;김창일;권광호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 추계학술대회 논문집
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    • pp.29-32
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    • 2000
  • Cerium oxide thin film has been proposed as a buffer layer between the ferroelectric film and the Si substrate in Metal-Ferroelectric-Insulator-Silicon (MFIS ) structures for ferroelectric random access memory (FRAM) applications. In this study, CeO$_2$ thin films were etched with Cl$_2$/Ar gas combination in an inductively coupled plasma (ICP). The highest etch rate of CeO$_2$ film is 230 $\AA$/min at Cl$_2$/(Cl$_2$+Ar) gas mixing ratio of 0.2. This result confirms that CeO$_2$ thin film is dominantly etched by Ar ions bombardment and is assisted by chemical reaction of Cl radicals. The selectivity of CeO$_2$ to YMnO$_3$ was 1.83. As a XPS analysis, the surface of etched CeO$_2$ thin films was existed in Ce-Cl bond by chemical reaction between Ce and Cl. The results of XPS analysis were confirmed by SIMS analysis. The existence of Ce-Cl bonding was proven at 176.15 (a.m.u.).

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Charge Pumping 방법을 이용한 비휘발성 SNOS FET기억소자의 Si-SiO$_2$계면상태 특성에 관한 연구 (A Study on the Si-SiO$_2$Interface State Characteristics of Nonvolatile SNOS FET Memories using The Charge Pumping Method)

  • 조성두;이상배;문동찬;서광열
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1992년도 춘계학술대회 논문집
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    • pp.82-85
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    • 1992
  • In this study, charge pumping method was used to investigate the Si-SiO$_2$interface characteristics of the nonvolatile SNOSFET memory devices, fabricated using the CMOS 1 Mbit processes (1.2$\mu\textrm{m}$ design rule), with thin oxide layer of 30${\AA}$ thick and nitride layer of 525${\AA}$ thick on the n-type silicon substrate (p-channel). Charge pumping current characteristics with the pulse base level were measured for various frequencies, falling times and rising times. By means of the charge dynamics in a non-steady state, the average Si-SiO$_2$interface state density and capture cross section were determined to be 3.565${\times}$10$\^$11/cm$\^$-2/eV$\^$-1/ and 4.834${\times}$10$\^$-16/$\textrm{cm}^2$, respectively. However Si-SiO$_2$ interface state densities were disributed 2.8${\times}$10$\^$-11/~5.6${\times}$10$\^$11/cm$\^$-2/~6${\times}$10$\^$11/cm$\^$-2/eV$\^$-1/ in the lover half of energy gap.

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Influence of RTA treatments on optical properties of ZnO nanorods synthesized by wet chemical method

  • Shan, Qi;Ko, Y.H.;Lee, H.K.;Yu, J.S.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.190-190
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    • 2010
  • Zinc oxide is the most attractive material due to the large direct band gap (3.37 eV), excellent chemical and thermal stability, and large exciton binding energy (60 meV). Recently, ZnO nanorods were used as the high efficient antireflection coating layer of solar cells based on silicon (Si). In this reports, we studied the effects of rapid thermal annealing (RTA) treatment on optical properties of ZnO nanorods. For fabrication of ZnO nanorods, there are many methods such as hydrothermal method, sol-gel method, and metal organic chemical vapor deposition method. Among of them, we used the conventional wet chemical method which is simple and low temperature growth. In order to synthesize the ZnO nanorods, the ZnO films were deposited on Si substrate by RF magnetron sputtering at room temperature and the samples were dipped to aqua solution containing the zinc nitrate and hexamethylentetramines (HMT). The synthesis process was achieved in keeping with temperature of $90-95^{\circ}C$ and under constant stirring. The morphology of ZnO nanorods on glass and Si was characterized by scanning electron microscopy. For the analysis of antireflection performance, the reflectance and transmittance were measured by spectrophotometer. And for analyzing the effects of RTA treatment on ZnO nanorods, crystalline properties were investigated by X-ray diffraction measurements and optical properties was estimated by photoluminescence spectra.

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진동형 마이크로 자이로스코프의 각속도 주파수 동역학적 모델의 도출 및 성능 해석 (Performance Analysis of a Vibrating Microgyroscope using Angular Rate Dynamic Model)

  • 홍윤식;이종현;김수현
    • 한국정밀공학회지
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    • 제18권1호
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    • pp.89-97
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    • 2001
  • A microgyroscope, which vibrates in two orthogonal axes on the substrate plane, is designed and fabricated. The shuttle mass of the vibrating gyroscope consists of two parts. The one is outer shuttle mass which vibrates in driving mode guided by four folded springs attached to anchors. And the other is inner shuttle mass which vibrates in driving mode as the outer frame does and also can vibrate in sensing mode guided by four folded springs attached to the outer shuttle mass. Due to the directions of vibrating mode, it is possible to fabricate the gyroscope with simplified process by using polysilicon on insulator structure. Fabrication processes of the microgyroscope are composed of anisotropic silicon etching by RIE, gas-phase etching (GPE) of the buried sacrificial oxide layer, metal electrode formation. An eletromechanical model of the vibrating microgyroscope was modeled and bandwidth characteristics of the gyroscope operates at DC 4V and AC 0.1V in a vacuum chamber of 100mtorr. The detection circuit consists of a discrete sense amplifier and a noise canceling circuit. Using the evaluated electromechanical model, an operating condition for high performance of the gyroscope is obtained.

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탄소 주입 실리콘 산화 절연박막에서 전위장벽과 온도 변화에 대한 상관성 (Correlation between the Potential Barrier and Variation of Temperature on SiOC thin film)

  • 오데레사
    • 한국정보통신학회논문지
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    • 제12권12호
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    • pp.2247-2252
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    • 2008
  • 탄소 주입실리콘 산화막으로서 SiOC 박막은 화학적 증착 방법에 의해 성막되었으며, 박막의 분석기법으로 FTIR 분석기와 I-V 측정과 표면분석으로 전자현미경을 이용하였다. 증착된 샘플들은 유량비의 변화에 따라서 화학적 이동현상이 나타났으며, 표면에서의 그레인은 유기물 특성과 무기물 특성의 SiOC 박막샘플에서 나타났다. 그러나 하이브리드 특성의 박막에서는 그레인이 형성되지 않았다. 하이브리드 특성의 박막샘플에서 온도가 증가할수록 누설전류는 감소하였다. 누설전류는 온도가 증가함에 따라 감소하였는데 전위장벽이 증가하기 때문에 감소하는 것으로 나타났다.

Enhancement of thermoelectric properties of MBE grown un-doped ZnO by thermal annealing

  • Khalid, Mahmood;Asghar, Muhammad;Ali, Adnan;Ajaz-Un-Nabi, M.;Arshad, M. Imran;Amin, Nasir;Hasan, M.A.
    • Advances in Energy Research
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    • 제3권2호
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    • pp.117-124
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    • 2015
  • In this paper, we have reported an enhancement in thermoelectric properties of un-doped zinc oxide (ZnO) grown by molecular beam epitaxy (MBE) on silicon (001) substrate by annealing treatment. The grown ZnO thin films were annealed in oxygen environment at $500^{\circ}C-800^{\circ}C$, keeping a step of $100^{\circ}C$ for one hour. Room temperature Seekbeck measurements showed that Seebeck coefficient and power factor increased from 222 to $510{\mu}V/K$ and $8.8{\times}10^{-6}$ to $2.6{\times}10^{-4}Wm^{-1}K^{-2}$ as annealing temperature increased from 500 to $800^{\circ}C$ respectively. This observation was related with the improvement of crystal structure of grown films with annealing temperature. X-ray diffraction (XRD) results demonstrated that full width half maximum (FWHM) of ZnO (002) plane decreased and crystalline size increased as the annealing temperature increased. Photoluminescence study revealed that the intensity of band edge emission increased and defect emission decreased as annealing temperature increased because the density of oxygen vacancy related donor defects decreased with annealing temperature. This argument was further justified by the Hall measurements which showed a decreasing trend of carrier concentration with annealing temperature.

저분자 유기 광다이오드 소자의 p형 유기물 두께에 따른 전류 특성에 관한 연구 (A Study on the Thickness Dependence of p-type Organic Layer on the Current of Small Molecule-based Organic Photodiode)

  • 김영우;이동운;전용민;조의식;권상직
    • 반도체디스플레이기술학회지
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    • 제22권3호
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    • pp.101-105
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    • 2023
  • Organic photo Diodes (OPDi) give multiple advantages in the growing interest of the flexible optoelectronic devices. Organic semiconductors are freeform as they can deposit on any substrate, so it could be flexible. But the inorganic material photodiodes (PDs) are usually fabricated on silicon wafers which are solid. So, normally PDs are inflexible. By those reasons, we decided to make the vacuum deposited small molecule OPDi. We have investigated the OPDi's J-V characteristic by changing the thickness of p-type layer of OPDi. This device consists of indium-tin-oxide (ITO) / 2,3:6,7-dibenzanthracene (pentacene) / buckminsterfullerene (C60) / aluminum (Al). Its J-V characteristics were measured in the probe station(4156C) that can give dark condition while measuring. And for the luminance characteristics, the photocurrent was measured with the bright halogen lamp and a probe station.

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