Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2000.11a
- /
- Pages.29-32
- /
- 2000
A Study on the Etching Characteristics of $CeO_2$ Thin Films using inductively coupled $Cl_2$ /Ar Plasma
유도 결합 플라즈마($Cl_2$ /Ar)를 이용한 $CeO_2$ 박막의 식각 특성 연구
Abstract
Cerium oxide thin film has been proposed as a buffer layer between the ferroelectric film and the Si substrate in Metal-Ferroelectric-Insulator-Silicon (MFIS ) structures for ferroelectric random access memory (FRAM) applications. In this study, CeO