• 제목/요약/키워드: Silicon Machining

검색결과 145건 처리시간 0.023초

스트레이트 숫돌에 의한 대직경 Si-wafer의 ELID 경면연삭 (Mirror Surface ELID Grinding of Large Scale Diametral Silicon Wafer with Straight Type Wheel)

  • 박창수;김경년;김원일
    • 한국정밀공학회:학술대회논문집
    • /
    • 한국정밀공학회 2001년도 춘계학술대회 논문집
    • /
    • pp.946-949
    • /
    • 2001
  • Mirror surface finish of Si-wafers has been achieved by rotary in-feed machining with cup-type wheels in ELID grinding. But the diameter of the workpiece is limited with the diameter of the grinding wheel in the in-feed machining method. In this study, some grinding experiments by the rotary surface grinding machine with straight type wheels were conducted, by which the possible grinding area of the workpiece is independent of the diameter of the wheels. For the purpose of investigating the grinding characteristics of large scale diametral silicon wafer, grinding conditions such as rotation speed of grinding wheels and revolution of workpiece are varied, and grinding machine used in this experiment is rotary type surface grinding m/c equipped with an ELID unit. The surface ground using the SD8000 wheels showed that mirror like surface roughness can be attained near 2~6nm in Ra.

  • PDF

절삭유의 필터링 시스템이 플라즈마 에칭 전극의 표면 품질에 미치는 영향 (Effects of Filtering System of Cutting Fluid on the Surface Quality of Plasma Etching Electrode)

  • 이은영;김문기
    • 반도체디스플레이기술학회지
    • /
    • 제17권4호
    • /
    • pp.46-50
    • /
    • 2018
  • The purpose of this study is to analyze effects of filtering system of cutting fluid which is used for machining silicon electrode. For the research, different sizes of filter clothes are applied to check grain size of sludge of cutting fluid. Surface roughness of machined workpiece, depth of damage inside of silicon electrode, and suspended solids of cutting fluid are experimented and analyzed. From these experiments, it is verified that filtering system of cutting fluid is very important factor for machining. Results of this study can affect various benefits to the semiconductor industry for better productivity and better atmospheric pollution in workplace.

엑사이머 레이져를 이용한 실리콘웨이퍼의 미세가공

  • 윤경구;이성국;황경현
    • 한국정밀공학회:학술대회논문집
    • /
    • 한국정밀공학회 1997년도 춘계학술대회 논문집
    • /
    • pp.1058-1062
    • /
    • 1997
  • Development of laser induced chemical etching technologt with KrF laser are carried out in this study for micromachining of silicon wafer. The paper is devoted to experimental identification of excimer laser induced mechanism of silicon under chlorine pressures(0.02~500torr). Experimental results on pulsed KrF excimer laser etching of silicon in chorine atmosphere are presented. Etching rate dependency on laser fluence and chlorine pressure are discussed on the basis of experimental analysis, it is concluded that accurate digital micro machining process of silicon wafer can achieved by KrF laser induced chemical etching technology.

극초단 펄스 레이저 응용 미세가공기술 (Ultrafast Laser Micro-machining Technology)

  • 이제훈;손현기
    • 한국정밀공학회지
    • /
    • 제27권2호
    • /
    • pp.7-12
    • /
    • 2010
  • Due to the extremely short interaction time (< $10\times10^{-12}$sec) between laser pulse and material, which enables the minimization of heat affection, ultrafast laser micro-machining has rapidly widened its applications. In this paper, the characteristics of ultrafast laser micro-machining have been reviewed and experimentally demonstrated in laser drilling of silicon wafer and in laser cutting of rigid PCB.

배분력의 정량적인 분석을 통한 단결정실리콘의 나노패턴 연성가공법 연구 (Study on Ductile Machining Technology for Manufacturing Nano-Patterns on Single Crystal Silicon through Quantitative Analysis of Thrust Force)

  • 최대희;전은채;윤민아;김광섭;제태진;정준호
    • 한국정밀공학회지
    • /
    • 제33권1호
    • /
    • pp.11-16
    • /
    • 2016
  • Lithography techniques are generally used to manufacture nano-patterns on silicon, however, it is difficult to make a V-shaped pattern using these techniques. Although silicon is a brittle material, it can be treated as a ductile material if mechanically machined at extremely low force scale. The manufacturing technique of nano-patterns on single crystal silicon using a mechanical method was developed in this study. First, the linear pattern was machined on the silicon with increasing thrust force. Then, the correlation between measured cutting force and machined pattern was analyzed. Based on the analysis, the critical thrust force was quantitatively determined, and then the silicon was machined at a force lower than the critical thrust force. The machined pattern was observed using SEM and AFM to check for the occurrence of brittle fractures. Finally, the sharp V-shaped nano-pattern was manufactured on the single crystal silicon.

유리의 미세 초음파 가공 시 입구 진원도 향상 및 출구 크랙방지 (Roundness Improvement and Exit Crack Prevention in Micro-USM of Soda-Lime Glass)

  • 홍지훈;김덕환;주종남;김보현
    • 대한기계학회논문집A
    • /
    • 제31권10호
    • /
    • pp.1039-1045
    • /
    • 2007
  • Ultrasonic machining (USM) is suitable for machining hard, brittle and non-conductive materials such as silicon, glass and ceramics. Usually, when micro holes are machined on glass by USM, roundness of hole entrance is poor and cracks appear around the hole exit. In this paper the machining characteristics were studied for roundness improvement and exit crack prevention. From experiments, the tool bending and the shape of tool tip affect hole roundness. When the tool tip is hemispherical, good roundness of holes was obtained. The feedrate and the rotational speed of the tool affect the exit crack. With the machining conditions of 150 rpm in spindle speed and $0.5\;{\mu}m/s$ in feedrate, micro holes with less than $100\;{\mu}m$ in diameter were machined without an exit crack.

화학 기계적 미세가공 기술 (Chemical Mechanical Micro Machining(C3M) Process)

  • 박준민;정해도;김성헌;정상철;이응숙
    • 한국정밀공학회:학술대회논문집
    • /
    • 한국정밀공학회 2000년도 추계학술대회 논문집
    • /
    • pp.739-742
    • /
    • 2000
  • Micro machining technology has been studied to fabricate small size and high accuracy milli-structure products. To perfectly overcome the conventional mechanical machining methods, the chemical mechanical micro machining(C3M) process was developed. The mechanism of C3M process is that chemical solution etches the material and results in the generation of the chemical reacted layer, and the mechanical micro tool subsequently removes the layer. From the fundamental experiments, the C3M process has been founded to have the advantages of lower machining resistance, tool wear, and higher surface quality and form accuracy than conventional methods. This study focuses on the micro grooving of both the metallic material(SKDII, A1) and hard brittle silicon oxide.

  • PDF

AE를 이용한 AFM 연성 영역 가공 특성 연구 (Characteristic of Ductile Regime AFM Machining Using Acoustic Emission)

  • 안병운;이광호;이성환
    • 한국공작기계학회논문집
    • /
    • 제15권4호
    • /
    • pp.15-21
    • /
    • 2006
  • Recently, atomic force microscope(AFM) with suitable tips is being used for nano fabrication/nanometric machining purposes. In this paper, acoustic emission(AE) was introduced to monitor the nanometric machining of brittle materials(silicon) using AFM. In the experiments, AE responses were sampled, as the tip load was linearly increased(ramped load), to investigate the machining characteristics during a continuous movement. By analyzing the experimental results, it can be concluded that measured AE energy is sensitive to changes in the mechanism of material removal including the ductile-brittle transition during the nanometric machining. The critical depth of cut value for the transition is evaluated and discussed.

음향방출과 다구찌 방법을 이용한 나노머시닝 가공조건의 최적화 (Optimization of Nano Machining Parameters Using Acoustic Emission and the Taguchi Method)

  • 이성환;손정무
    • 한국정밀공학회지
    • /
    • 제21권3호
    • /
    • pp.163-170
    • /
    • 2004
  • Atomic force microscope (AFM) techniques are increasingly used fur tribological studies of engineering surfaces at scales ranging from atomic and molecular to micro-scale. Recently, AFM with suitable tips is being used for nano fabrication/nano machining purposes. In this paper, machining characteristics of silicon were investigated by nano indentation and nano scratch. Nano-scale material removal mechanisms are studied and the Taguchi method was introduced to acquire optimum parameters for nano machining. Also, Acoustic Emission (AR) is used for the monitoring of nano machining.

실리콘 카바이드의 초정밀 연삭 가공에 관한 연구 (Research on Ultra-precision Grinding Work of Silicon Carbide)

  • 박순섭;원종호
    • 한국정밀공학회지
    • /
    • 제26권9호
    • /
    • pp.58-63
    • /
    • 2009
  • Silicon carbide (SiC) has been used for many engineering applications because of their high strength at high temperatures and high resistances to chemical degradation. SiC is very useful especially for a glass lens mold whose components demanded to the machining with good surface finish and low surface damage. The performance and reliability of optical components are strongly influenced by the surface damage of SiC during grinding process. Therefore, the severe process condition optimization shall be necessary for the highly qualified SiC glass lens mold. Usually the major form of damage in grinding of SiC is a crack occurs at surface and subsurface. The energy introduced in the layers close to the surface leads to the formation of these cracks. The experimental studies have been carried out to get optimum conditions for grinding of silicon carbide. To get the required qualified surface finish in grinding of SiC, the selection of type of the wheel is also important. Grinding processes of sintered SiC work-pieces is carried out with varying wheel type, depth of cut and feed using diamond wheel. The machining result of the surface roughness and the number of flaws, have been analyzed by use of surface profilers and SEM.