• Title/Summary/Keyword: Silane gas

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A Study on the As Low As Reasonably Practicable (ALARP)-Concept Risk Assessment of Silane in Semiconductor and LCD Process (반도체/LCD 제조공정에서의 Silane에 대한 ALARP개념의 화재 폭발 위험성평가에 관한 연구)

  • Lee, Joong-Hee;Hwang, Seong-Min;Woo, In-Sung
    • Journal of the Korea Safety Management & Science
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    • v.12 no.4
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    • pp.93-98
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    • 2010
  • 본 연구에서는, 반도체, LCD 공정에서 금속막을 증착하기 위하여 PECVD장비에 화재, 폭발 위험성과 독성을 가진 Silane가스를 사용하게 되는 장비인 gas cabinet, pipeline, VMB(Valve manifold box), MFC(mass flow controller)장비 등, 전반적인 시스템에 대하여 영국 HES의 ALARP개념을 도입하여 위험성 평가를 실시하여 문제점을 도출하고 대책을 강구 하는데 목적이 있고, 여러 가지 문제점중 절대적으로 수용 할 수 없는 Critical Risk로는 Gas Cylinder를 사용하여 Silane을 공급하고자 할 때에는 필히 Gas Cabinet을 사용하여 공급하여야 하고, Tube Trailer를 사용하여 공급하고자 할 때에는 필수적으로 Purge System을 갖추어 공급하여야 한다. 선택적으로 수용할 수 있는 High, Medium Risk로는 Gas Cylinder 또는 Tube Trailer를 사용하여 Silane을 공급하고자 할 때는 Inlet 부분에 RFO(Resticted Flow Orifice)를 설치하여 사용하고 Gas Supply Room에는 CO2소화설비를 적용하지 말고 Water Mist등 물 분무설비를 적용하여야한다.

Kinetic Analysis of Solution Reaction between CR and Silane Coupling Agents (Silane Coupling제(劑)와 고분자탄성체간(高分予彈性體間)의 용액반응(溶液反應)에 대한 속도론적(速度論的) 해석(解析))

  • Park, Young-Su;Yoon, Jeong-Sik;Yoo, Chong-Sun;Paik, Nam-Chul
    • Elastomers and Composites
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    • v.25 no.2
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    • pp.112-116
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    • 1990
  • In this study, as one way of developing the new cross-linking method that is curable in water, kinetic analysis of solution reaction between CR and silane coupling agents was attemped. First, CR was reacted with silane coupling agents in solution state. According to the time, reaction quantity was pursued by gas chromatography. Also, reaction rate coefficient and activation energy were calculated from the reaction quantity. Silane coupling agents which were used in this study were MPS, CPS and VES.

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Variation of Gas Selectivity by Silane binders in SWNT Gas sesnsors (SWNT 가스센서에서 실란 바인더에 의한 가스 선택성의 변화)

  • Lee, Ho-Jung;Kim, Seong-Jeen
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.03b
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    • pp.19-19
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    • 2010
  • We suggest CNT-based gas sensors for breath alcohol measurement. The sensors were composed of single-walled carbon nanotubes (SWNTs) thin film on glass substrate with simple process, and the SWNTs thin film as sensing layer was formed by multiple spray-coating with SWNT composites which was well-dispersed, highly controlled and differently functionalized by various binders (TEOS, MTMS, and VTMS) added in ethanol solvent. In this work, three different SWNTs thin films were made to compare their electrical response properties for alcohol vapor. From fabricated sensors, conductance responses were measured and discussed. In the result, our alcohol gas sensors showed an effective selectivity even at room temperature.

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Numerical Analysis of Silicon Deposition in Horizontal & Vertical CVD Reactor (수평 및 수직형 CVD 증착로의 실리콘 부착에 관한 수치해석)

  • Kim, In;Baek, Byung-Joon
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.26 no.3
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    • pp.410-416
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    • 2002
  • The fluid flow, heat transfer and the local mass fraction of chemical species in the chemical vapor deposition(CVD) manufacturing process are studied numerically. Flow with a dilute precursor concentration of silane in hydrogen as the carrier gas enters to the reactor and deposits silicon onto the heated surface. The silicon deposition rate using silane is calculated in the horizontal or vertical, axisymmetric reactor. The effects of inlet carrier gas velocity, mass fraction of silane, susceptor angle and rotation of surface on the deposition rate are described.

The Variation of Response on Humidity in CNT Thin Film by Silane Binders (실란 바인더에 의한 탄소나노튜브 박막의 감습 특성 변화)

  • Kim, Seong-Jeen
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.10
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    • pp.782-787
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    • 2010
  • Recently the solution-based thin film technology has often been treated in the field of device fabrication owing to easy process and convenience for the development of various semiconductor devices and sensors. We deposited on glass substrate single-walled carbon nanotubes (SWNTs)/silane hybrid thin films by multiple spray-coating which is one of solution-based processes, and examined their electrical response for humidity. Generally silane binders which are often mixed in carbon nanotube (CNT) solution to adhere CNTs to substrate well form easily each own functionalized group on the surface of CNTs after they are hardened by way of the hydrolysis reaction. In this work, we investigated how silane binders (TEOS (tetraethoxy silane), MTMS (methyltrimethoxysilane) and VTMS (vinyltrimethoxysilane)) in CNT thin films make effect to their electrical response on humidity. As the result, we found that the resistance in the samples using TEOS was changed dramatically while it was almost invariant in the samples using MTMS and VTMS for increasing humidity.

Particle Contamination in PCVD Reactor for Semiconductor Processing (반도체 제조용 PCVD 반응기에서의 미립자 오염)

  • Kim, Dong-Joo;Kim, Kyo-Seon
    • Proceedings of the KIEE Conference
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    • 1996.07c
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    • pp.1492-1494
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    • 1996
  • We have studied the generation, growth and behavior of chemical species and particles in silane PCVD. We included the plasma chemistry of silane, particle nucleation by homogeneous formation, acrosol dynamics and transport phenomena of chemical species and particles. The concentration profile of chemical species and particles were shown as a function of reactor length. The effects of process variables such as reactor pressure, total gas flow rate and electrical field strength on the behavior of chemical species and particles were analyzed.

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Surface treatments of environmentally friendly Cr-free organic compounds for corrosion protection of metals (금속의 내식성 향상을 위한 환경 친화형 무크롬 유기화합물의 표면처리)

  • 이원기;박찬영
    • Journal of Environmental Science International
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    • v.12 no.7
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    • pp.801-807
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    • 2003
  • This work aims the search of environmentally friendly pre-treatment technologies to develop chromate replacements for metal finishing industries due to its toxicological properties. Since the corrosion resistance of steel was strongly related to water permeation, galvanized steel sheets were treated with various hydrophobic silane compounds and water-suspended polymer solution. Also, plasma gas discharge was applied to modify the surface of a polymer coated-steel sheet to be hydrophobic. The surface hydrophobicity of materials was introduced by CF$_3$H plasma exposure. The corrosion property before and after the plasma treatment was investigated in a slat spray tester with 3.5 wt.% NaCl at 35$^{\circ}C$. The results showed that both silane/polymer double coatings and plasma treatment of the galvanized steel exhibited significant retardation of corrosion.

Numerical Analysis of Silicon Deposition in CVD Reactor (화학기상 성장법에 의한 실리콘 부착에 관한 수치해석)

  • Kim, In;Baek, Byung-Joon;Yoon, Jeong-Mo;Lee, Cheul-Ro
    • Proceedings of the KSME Conference
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    • 2000.11b
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    • pp.359-364
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    • 2000
  • The fluid flow, heat transfer and the local mass fi-action of chemical species in the chemical vapor deposition(CVD) manufacturing process are numerically studied. The deposition of silicon from dilute silane is hydrogen carrier gas in a horizontal CVD reactor is investigated. The effect of inlet carrier gas velocity, mass fraction of silane, susceptor angle on the deposition thickness and uniformity was represented.

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EFFECTS OF SUBSTRATE TEMPERATURE ON PROPERTIES OF FLUORINE CONTAINED SILICON OXIDE FILMS PREPARED BY MICROWAVE PLASMA- ENHANCED CVD

  • Sugimoto, Nobuhisa;Hozumi, Atsushi;Takai, Osamu
    • Journal of the Korean institute of surface engineering
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    • v.29 no.5
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    • pp.577-584
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    • 1996
  • Silicon oxide films with high hardness and water repellency were prepared by microwave plasma-enhanced CVD using four kind of organosilicon compound-fluoro-alkyl silane mixtures as source gases. An argon gas was used as a carrier gas for fluoro-alkyl silane. The substrate temperatures during deposition were controlled by resistant heating at a constant value between 50 and $300^{\circ}C$. The hardness of the films increased, but the deposition rate and the contact angle for a water drop decreased with increasing substrate temperature. The number of methoxy groups also affected the water repellency and hardness. The deposited films became more inorganic with increasing substrate temperature because of the thermal dissociation of reactants.

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