1 |
오성진, 박경우, 김기문, 박희용, 1998, '수평 CVD 반응기에서의 3차원 혼합대류 열전달 특성,' 대한기계학회 논문집 B권, 제22권 제5호, pp. 672-684
과학기술학회마을
|
2 |
Wang, C. A., Patnaik, S., Caunt, J. W. and Brown, R. A., 1988, 'Growth Characteristics of a Vertical Rotating-disk MOVPE Reactor,' J. Crystal Growth, Vol. 93, pp. 228-234
DOI
ScienceOn
|
3 |
Mahajan, R. L., 1996, 'Transport Phenomena in Chemical Vapor Deposition Systems,' Advances in Heat Transfer, Vol. 28, pp. 339-415
DOI
|
4 |
Fluent Inc., 1998, Fluent User's Guide(V.5)
|
5 |
Chiu, W. K. S., and Jaluria, Y., 1997, 'Heat Transfer in Horizontal and Vertical CVD Reactors,' HTD-Vol.347, National Heat Transfer Conference, ASME, Vol. 9, pp. 293-311
|
6 |
Chiu, W. K. S., and Jaluria, Y., 1998, 'Heat and Mass Transfer in Continuous CVD Reactors,' Proc. 11th Int. Heat Transfer Conf., Vol. 5, pp. 187-191
|
7 |
Kleijn. C. R., 1991, 'A Mathematical Model of the Hydrodynamics and Gas-phase Reactions in Silicon LPCVD in Single-Wafer Reactor,' J. Electrochem. Soc., Vol. 138, pp. 2190-2200
DOI
|
8 |
Eversteyn, F. C., P. J. W. Severin, v.d. Brekel, C. H. J., and H. L. Peek, 1970, 'A Stagnant Layer Model for the Epitaxial Growth of Silicon from Silane in a Horizontal Reactor,' Journal of the Electrochemical Society, Vol. 117, pp. 925-931
DOI
|
9 |
Kleijn, C. R., van der Meer, Th. H. and Hoogendoom, C. J., 1989, 'A Mathematical Model for LPCVD in Single Wafer Reactor,' J. Electrochem. Soc., Vol. 136, pp. 3423-3433
DOI
|
10 |
Evans, G. and R. Grief, 1987, 'A Numerical Model of the Flow and Heat Transfer in a Rotating Disk Chemical Vapor Deposition Reactor,' ASME Journal of Heat Transfer, Vol. 109, pp. 928-935
DOI
|
11 |
Jensen, K. F., Einset, E. O. and Fortiadis, D. I., 1991. 'Flow Phenomena in Chemical vapor Deposition of Thin Films,' Ann. Rev. Fluid Mech., Vol. 23, pp. 197-232
DOI
ScienceOn
|
12 |
이세영, 조형희, 이영원, 2000, '반도체 웨이퍼용 핫 플레이트 오븐에서 온도 균일도 향상을 위한 연구,' 대한기계학회 2000년도 추계 학술대회 논문집 B권, pp. 261-266
|
13 |
조원국, 최도형, 김문언, 1998, '원통형 화학중착로에서 균일한 박막형성을 위한 입구 농도분포 최적화,' 대한기계학회 논문집 B권, 제22권 제2호, pp. 173-183
과학기술학회마을
|