• Title/Summary/Keyword: Si-doped

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Thermoelectric Properties of AlN-doped SiC Ceramics (AlN 첨가 SiC 세라믹스의 열전변환특성)

  • Pai, Chul-Hoon
    • Korean Journal of Metals and Materials
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    • v.50 no.11
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    • pp.839-845
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    • 2012
  • The effect of an AlN additive on the thermoelectric properties of SiC ceramics was studied. Porous SiC ceramics with 48-54% relative density were fabricated by sintering the pressed ${\alpha}-SiC$ powder compacts with AlN at $2100-2200^{\circ}C$ for 3 h in an Ar atmosphere. In the undoped specimens, the Seebeck coefficients were positive (p-type semiconducting) possibly due to a dominant effect of the acceptor impurities (Al, Fe) contained in the starting powder. With AlN addition, the reverse phase transformation of 6H-SiC to 4H-SiC was observed during the sintering process. The electrical conductivity of the AlN doped specimen was larger than that of the undoped specimen under the same conditions, which might be due to a reverse phase trans-formation. The Seebeck coefficient of the AlN doped specimen was also larger than that of the undoped specimen. The density of specimen and the amount of addition had significant effects on the thermoelectric properties.

Preparation and Luminescent Properties of (Zn1-xMgx)2SiO4:mn Phosphors ((Zn1-xMgx)2SiO4:mn 형광체의 제조와 발광특성)

  • Lee, Ji-Young;Yu, Il
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.5
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    • pp.415-418
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    • 2009
  • $Zn_{2}SiO_{4}$:Mn green phosphors doped with Mg for PDP were synthesized by solid state reaction method. $Zn_{2}SiO_{4}$:Mn, Mg phosphors with increasing Mg concentration were changed from Rhombohedral to Orthorhombic structure. Photoluminescence intensity of $Zn_{2}SiO_{4}$:Mn phosphors doped with Mg 0.5 mol was definitely higher than that of Mg non-doped sample. The enhanced luminescence with doping Mg in the $Zn_{2}SiO_{4}$:Mn phosphors was interpreted by the increase of energy transfer from host to Mn ions with substitution Mg for Zn in the $Zn_{2}SiO_{4}$:Mn host.

Resistive Switching Properties of Cr-Doped SrZrO3 Thin Film on Si Substrate (실리콘 기판위에서의 Cr-Doped SrZrO3 박막의 저항변화 특성)

  • Yang, Min-Kyu;Ko, Tae-Kuk;Park, Jae-Wan;Lee, Jeon-Kook
    • Korean Journal of Materials Research
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    • v.20 no.5
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    • pp.241-245
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    • 2010
  • One of the weak points of the Cr-doped SZO is that until now, it has only been fabricated on perovskite substrates, whereas NiO-ReRAM devices have already been deposited on Si substrates. The fabrication of RAM devices on Si substrates is important for commercialization because conventional electronics are based mainly on silicon materials. Cr-doped ReRAM will find a wide range of applications in embedded systems or conventional memory device manufacturing processes if it can be fabricated on Si substrates. For application of the commercial memory device, Cr-doped $SrZrO_3$ perovskite thin films were deposited on a $SrRuO_3$ bottom electrode/Si(100)substrate using pulsed laser deposition. XRD peaks corresponding to the (112), (004) and (132) planes of both the SZO and SRO were observed with the highest intensity along the (112) direction. The positions of the SZO grains matched those of the SRO grains. A well-controlled interface between the $SrZrO_3$:Cr perovskite and the $SrRuO_3$ bottom electrode were fabricated, so that good resistive switching behavior was observed with an on/off ratio higher than $10^2$. A pulse test showed the switching behavior of the Pt/$SrZrO_3:Cr/SrRuO^3$ device under a pulse of 10 kHz for $10^4$ cycles. The resistive switching memory devices made of the Cr-doped $SrZrO_3$ thin films deposited on Si substrates are expected to be more compatible with conventional Si-based electronics.

Synthesis of SiAlON Ceramics with Novel Magnetic Properties

  • Karunaratne, Baththanamudiyanselage Samarakoon Bandara;Ko, Jae-Woong;Park, Young-Jo;Kim, Hai-Doo
    • Journal of the Korean Ceramic Society
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    • v.46 no.5
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    • pp.525-527
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    • 2009
  • This paper presents a study on the magnetic behaviour of selected doped SiAlONs with various compositions including Y, Yb, Sm, Gd, and Er. The resulting crystalline phases were confirmed by X-ray diffraction. The magnetic hysteresis data for the samples were collected at room temperature using a vibrating sample magnetometer. The study revealed that doped SiAlONs experience an appreciable level of magnetic hysteresis. Although the parameters corresponding to hysteresis loops in doped SiAlONs are less than those of common ferrites, their magnetic properties of SiAlONs may open up new potential areas of application as the host SiAlON ceramics have excellent structural properties.

Accurate electronic structures for Ce doped SiAlON using a semilocal exchange-correlation potential

  • Yu, Dong-Su;Jeong, Yong-Jae
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.438-438
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    • 2011
  • White light-emitting diodes (LEDs), the so-called next-generation solid-state lighting, offer benefits in terms of reliability, energy-saving, maintenance, safety, lead-free, and eco-friendly. Recently, rare-earth-doped oxynitride or nitride compounds have attracted a great deal of interest as a photoluminescent material because of their unique luminescent property, especially for white LEDs applications. Ce doped ${\beta}$-SiAlON has been studied as a wavelength conversion phosphor in white LEDs thanks to its high absorption rates, high quantum efficiency, and excellent thermal stability. Previously researches were not enough to understand the detail mechanism and characteristics of ${\beta}$-SiALON. The bandgap structures and electronic structures were not exact due to limitation of calculation methods. In this study, to elucidate the Ce doping effect on the SiAlON system, accurate band structures and electronic structure of the Ce doped ${\beta}$-SiAlON was intensively investigated using density functional theory calculations. In order to get a better description of the band gaps, MBJLDA method were used. We have found a single Ce atom site in ${\beta}$-SiAlON super cell. Furthermore, the density of state, band structure and lattice constant were intensively investigated.

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Application of Modified Rapid Thermal Annealing to Doped Polycrystalline Si Thin Films Towards Low Temperature Si Transistors

  • So, Byung-Soo;Kim, Hyeong-June;Kim, Young-Hwan;Hwang, Jin-Ha
    • Korean Journal of Materials Research
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    • v.18 no.10
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    • pp.552-556
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    • 2008
  • Modified thermal annealing was applied to the activation of the polycrystalline silicon films doped as p-type through implantation of $B_2H_6$. The statistical design of experiments was successfully employed to investigate the effect of rapid thermal annealing on activation of polycrystalline Si doped as p-type. In this design, the input variables are furnace temperature, power of halogen lamps, and alternating magnetic field. The degree of ion activation was evaluated as a function of processing variables, using Hall effect measurements and Raman spectroscopy. The main effects were estimated to be furnace temperature and RTA power in increasing conductivity, explained by recrystallization of doped ions and change of an amorphous Si into a crystalline Si lattice. The ion activation using rapid thermal annealing is proven to be a highly efficient process in low temperature polycrystalline Si technology.

The Preparation of $Ce^{3+}$doped Y-SiAlON for LED Phosphor.

  • Ahn, Joong-In;Han, Cheong-Hwa;Kim, Chang-Hae
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.644-646
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    • 2004
  • We have investigated luminescence properties of Ln-SiAlON materials doped with $Ce^{3+}$. Low-energy 4f${\leftrightarrow}$5d transitions were observed as compared to the luminescence of this ion doped in oxidic host-lattices.$^1$ Ce-doped Y-a-SiAlON show bright long wavelength luminescence with high absorption for 305 and 455nm excitation. In our experiment, the sintering temperature of this material(1400$^{\circ}C$) was lower than that of normal sintering temperature (1700$^{\circ}C$). However, Single phase of SiAlON was not composed we observed the YAG phase.

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Enhancement of Saturation Current of a p-channel MESFET using SiGe and $\delta$-dopend Layers ($\delta$도핑과 SiGe을 이용한 p 채널 MESFET의 포화 전류 증가)

  • 이찬호;김동명
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.36D no.4
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    • pp.86-92
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    • 1999
  • A SiGe p-channel MESFET using $\delta$-doped layers is designed and the considerabel enhancement of the current driving capability of the device is observed from the result of simulation. The channel consists of double $\delta$-doped layers separated by a low-doped spacer which consists of Si and SiGe. A quantum well is formed in the valence band of the Si/SiGe heterojunction and much more holes are accumulated in the SiGe spacer than those in the Si spacer. The saturation current is enhanced by the contribution of the holes in the spacer. Among the design parameters that affect the performance of the device, the thickness of the SiGe layer and the Ge composition are studied. The thickness of 0~300$\AA$ and the Ge composition of 0~30% are investigated, and saturation current is observed to be increased by 45% compared with a double $\delta$-doped Si p-channel MESFET.

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