• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2007.11a
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• pp.128-129
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• 2007

Cr-Al-N, Cr-Si-N 그리고 Cr-Al-Si-N 코팅막을 WC-Co 모재위에 AIP법과 DC 마그네트론 스퍼터링 법을 결합한 하이브리드 시스템을 이용하여 합성하였으며, Si함량에 따른 Cr-Al-Si-N 코팅막의 미세구조, 기계적 특성과 마찰 거동에 관해 비교 연구하였다. Cr-Si-N(${\sim}35GPa$)과 Cr-Al-Si-N(${\sim}55GPa$) 코팅막의 경도값은 CrN(${\sim}23GPa$)과 Cr-Al-N(${\sim}25GPa$) 코팅막과 비교하여 각각 증가하였고, CrN(${\sim}0.50$)과 Cr-Al-N(${\sim}0.84$)의 평균 마찰계수는 Si 함량이 9 at.% 일때, Cr-Si-N(${\sim}0.30$)과 Cr-Al-Si-N(${\sim}0.57$)으로 각각 감소하였다.

• Journal of the Korean Magnetics Society
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• v.9 no.5
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• pp.256-262
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• 1999

Sputter deposited CoCr(Mo)/Si film were studied with emphasis on the correlation between magnetic properties and crystallographic orientation. The perpendicular coercivities of CoCr films decreased with Si underlayer thickness, whereas those of CoCrMo films increased with Si underlayer thickness. It has been explained that additions of the larger atomic radius Mo atoms in CoCr films impedes crystal growth resulting in a decrease in grain size, thus this small grain size may induce high perpendicular coercivity. The c-axis alignment of CoCrMo film was improved due to addition of 2at.%Mo. It means CoCrMo layer grow self-epitaxial directly from orientation and structure of Si underlayer when the main layer grow on underlayer.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.15 no.3
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• pp.281-286
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• 2002

In odder to investigate the magnetic properties of CoCr-based bilayered thin films on kind of underlayer, we introduced amorphous Si layer to Co-Cr(-Ta) magnetic layer as underlayer. First, we prepared CoCr and CoCrTa single layer using the Facing Targets Sputtering system to investigate theirs properties. It was revealed that with increasing the film thickness of CoCr, CoCrTa single layer, crystalline orientation and perpendicular coercivity was improved. The CoCrTa thin film showed bettor crystalline and magnetic characteristics than CoCr thin film. As a result of investigating magnetic properties of CoCr and CoCrTa magnetic layer on introducing the Si underlayer, perpendicular coercivity and saturation magnetization of CoCr/Si and CoCrTa/Si bilayered thin film were decreased due to the increased grain size and diffusion of Si atoms to magnetic layer. And they showed constant with increasing the film thickness of Si thin film. However, in case of CoCrTa/Si bilayered thin film, in-plane coercivity was controlled low at about 250Oe. The c-axis orientations of CoCr/si and CoCrTa/Si bilayered thin film showed a good crystalline characteristics as about $2^{\circ}$.

• Journal of the Korean Magnetics Society
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• v.9 no.4
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• pp.203-209
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• 1999

Effects of Mo and Si addition in Cr underlayer on magnetic properties of CoCrTa/CrMo and CoCrTa/Si thin films media were investigated. Thin films were prepared with DC magnetron sputtering system. The thickness of CoCrTa magnetic layer and Cr underlayer were fixed at 300 $\AA$ and 700 $\AA$, respectively. The substrate heating temperature was kept constant at 26$0^{\circ}C$ for both magnetic layer and underlayer preparation. The coercivity increase of CoCrTa film was realized due to Mo addition in Cr underlayer. Si addition made a small decrease in coercivity. Coercivity increase seems to be attributed by the improvement of preferred orientation of Cr(200) plane. It is found that lattice fit between Cr(200) and CoCrTa(1120) of CrMo underlayer is better than that of CrSi underlayer. This small misfit may also contribute coercivity increase.

• Journal of the Korean Magnetics Society
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• v.21 no.4
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• pp.127-131
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• 2011

In this paper, we study the electronic and magnetic properties of Cr substituted SiTe in the rock-salt structure compound using the full potential linearized augmented plane wave method within the generalized gradient approximation to the exchange correlation potential. Two stoichiometries are studied: $CrSi_3Te_4$ with 25 %, and $CrSiTe_2$ with 50 % Cr substitution. We found, from the total energy calculations, that the equilibrium lattice constant for cubic $CrSi_3Te_4$ is 11.64 a.u. and a = 7.89 a.u. and c = 11.13 a.u. for tetragonal $CrSiTe_2$. The integer value of the calculated magnetic moment per unit cell, $4{\mu}_B$ for $CrSiTe_2$ suggests that this compound is halfmetallic. The magnetic moment per unit cell for $CrSi_3Te_4$ is slightly larger than $4{\mu}_B$. The magnetic moment on Cr atoms are 3.61 and $3.62{\mu}_B$ in the $CrSi_3Te_4$ and $CrSiTe_2$, respectively. The presence of Cr atoms causes that the other atoms become slightly magnetized in both compounds. The electronic properties and the magnetism are discussed with the calculated spin-polarized density of states.

• Journal of the Korean institute of surface engineering
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• v.38 no.4
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• pp.137-143
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• 2005

CrSiN coatings of stepwise changing Si concentration were deposited on stainless steel by closed field unbalanced magnetron sputtering (CFUBM) system. Microstructure of the films due to the Si concentration is measured by XRD. The corrosion behavior of CrSiN coatings in deaerated $3.5\%$ NaCl solution was investigated by potentiodynamic test, electrochemical impedance spectroscopy (EIS) and surface analyses. The microstructure of CrSiN film depends on the Si concentration. When Si/(Cr+si) was under $11.7\%$, preferred orientation is defined at CrN(220), CrN(311) and $Cr_2N(111).$ The results of potentiodynamic polarization tests showed that the corrosion current density and porosity decreased with increasing Si/(Cr+si) ratio. EIS measurements showed that the corrosion resistance of Si-bearing CrN was improved by phase transformation of the film, which leads to increase of pore resistance and charge transfer resistance. At the Si(Cr+si) ratio of 20, the Si-bearing CrN possesses the best corrosion resistance due to the highest pore resistance and charge transfer resistance.

• Journal of the Korean institute of surface engineering
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• v.40 no.6
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• pp.279-282
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• 2007

Cr-Mo-Si-C-N coatings were deposited on steel and Si wafer by a hybrid system of AIP and sputtering techniques using Cr, Mo and Si target in $Ar/N_2/CH_4$ gaseous mixture. Instrumental analyses of XRD and XPS revealed that the Cr-Mo-Si-C-N coatings must be a composite consisting of fine(Cr, Mo and Si)(C and N) crystallites and amorphous $Si_3N_4$ and SiC. The hardness value of Cr-Mo-Si-C-N coatings significantly increased from 41 GPa of Cr-Mo-C-N coatings to about 53 GPa with Si content of 9.3 at.% due to the refinement of (Cr, Mo and Si)(C and N) crystallites and the composite microstructure characteristics. A systematic investigation of the microstructures and mechanical properties of Cr-Mo-Si-C-N coatings prepared with various Si contents is reported in this paper.

• Korean Journal of Materials Research
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• v.29 no.1
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• pp.7-10
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• 2019

Cr-Al alloys are attracting attention as oxidation resistant coating materials for high temperature metallic materials due to their excellent high temperature stability. However, the mechanical properties and oxidation resistance of Cr-Al alloys can be further enhanced, and such attempts are made in this study. To improve the properties of Cr-Al alloys, Si is added up to 5 wt%. Casting specimens with different amounts of Si content are prepared by a vacuum arc remelting method and isothermally heated under steam conditions at $1,100^{\circ}C$ for 1 hour. The as-cast microstructure of low Si alloys is mainly composed of only a Cr phase, while $Al_8Cr_5$ and $Cr_3Si$ phases are also observed in the 5 % Si alloy. In the high Si alloy, only Cr and $Cr_3Si$ phases remain after the isothermal heating at $1,100^{\circ}C$. It is found that Si additions slightly decrease the oxidation resistance of the Cr-Al alloy. However, the microhardness of the Cr-Al alloy is observed to increase with an increasing Si content.

• Journal of the Korean Vacuum Society
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• v.2 no.2
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• pp.236-245
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• 1993

Single crystals, SbSI : V, SbSeI : V, BiSI : V, BiSeI : V, SbSI : Cr, SbSeI : Cr, BiSI : Cr, BiSeI : Cr, SbSI : Ni, SbSeI : Ni, BiSI : Ni, and BiSeI : Ni were grown by the vertical Bridgman method. It is found that the grown single crystals have an orthorhombic structure and the indirect optical transitions. The temperature dependence of energy gap shows the two reflection point related with the phase transitions and is well fitted with Varshni equation in the continuous region. The optical absorption peaks due to the doped impurities (V, Cr and Ni) are respectively attributed to the electron transitions between the split energy levels of $V^{+2}$, $Cr^{+2}$ and $Ni^{+2}$ ions sited at $T_d$ symmetry of the host lattice.

• Korean Journal of Materials Research
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• v.15 no.11
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• pp.730-734
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• 2005

Cr-Al-Si-N coatings were deposited on WC-Co substrates by a hybrid coating system of arc ion plating and DC magnet :on sputtering technique in $N_2/Ar$ mixture. The Cr-tll-Si-N coatings were synthesized with different Si contents. Their microstructure and mechanical properties were systematically investigated. The average size of crystallites largely decreases with the increase of Si content compared with Cr-Al-N. The microhardness of Cr-Al-Si-N coatings largely increases from 24 to 55 GPa. The enhanced hardness is believed to originate from the microstructural change by the fine composite microstructure of Cr-Al-N coatings with Si addition. The average friction coefficient of Cr-Al-Si-N coatings decreases from 0.84 to 0.45 with increasing Si content up to $16\;at.\%$.