• Title/Summary/Keyword: Si(111)

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Removal and Restraint Effects by Mg Metal on Scale in Water Pipe (금속 마그네슘을 이용한 배관 내벽의 스케일 제거 및 억제 효과 연구)

  • Kim, Jeong-Jin;Kim, Yoon-Young;Kim, Hyoung-Soo;Jang, Yun-Deuk
    • Journal of the Mineralogical Society of Korea
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    • v.19 no.2 s.48
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    • pp.111-121
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    • 2006
  • SEM, stereo-microscope, XRD, scale-removal experiment were used for the study of mineralogical characteristics and possibilities of removal and depress of scales in water pipe. Scales are mostly composed mainly of iron minerals with minor Si and Ca containing minerals. This experimental study showed that the combination of Mg and brass was most effective on removing scales.

Effect of Laser Pulse Repetition Rate on the Electrical Properties of $Pb(Zr_{0.48}Ti_{0.52})O_3$ (PZT) Thin Films grown by Pulsed Laser Deposition (펄스 레이저 증착법에 의해 제작된 Laser pulse repetition rate의 변화에 따른 $Pb(Zr_{0.48}Ti_{0.52})O_3$ (PZT) 박막의 전기적 특성)

  • Li, Dong-Hua;Lee, Sang-Yeol
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.11-12
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    • 2005
  • [ $Pb(Zr_{0.48}Ti_{0.52})O_3$ ] (PZT) thin films were deposited on Pt(111)/Ti/$SiO_2$/Si substrates by pulsed laser deposition. In order to study the effect of different laser pulse repetition rate on the dielectric and ferroelectric properties of PZT thin films,2 Hz and 5 Hz of laser pulse repetition rate were selected. We compared the results of XRD pattern, dielectric constant and hysteresis characteristics. From the experimental data, we found that the electrical properties of PZT thin films which grown ar 2 Hz of laser pulse repetition rate were better than those which grown at 5 Hz of laser pulse repetition rate.

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Preparation and Electrical Properties of Ferroelectric $Bi_{3.3}Eu_{0.7}Ti_3O_{12}$ Thin Films for Memory Applications (강유전체 메모리용 $Bi_{3.3}Eu_{0.7}Ti_3O_{12}$ 박막의 증착과 전기적 특성)

  • Kang, Dong-Kyun;Park, Won-Tae;Kim, Byong-Ho
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.11a
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    • pp.39-40
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    • 2005
  • Ferroelectric Eu-substituted $Bi_4Ti_3O_{12}$ (BET) thin films with a thickness of 200 nm were deposited on Pt(111)/Ti/SiO$_2$/Si(100) substrate by means of the liquid delivery MOCVD system and annealed at several temperatures in an oxygen atmosphere. At annealing temperature above $600^{\circ}C$, the microstructure of layered perovskite phase was observed. The remanent polarization of these films increased with increase in annealing temperature. The remanent polarization values ($2P_r$) of the BET thin films annealed at $720^{\circ}C$ were $37.71{\mu}C/cm^2$ at an applied voltage of 5 V.

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Dielectric Properties of the (Ba, Sr)$TiO_3$ Thin Films with deposition time (증착시간에 따른 (Ba, Sr)$TiO_3$ 박막의 유전특성)

  • Lee, Sang-Chul;Lim, Sung-Soo;Lee, Sung-Gap;Chung, Jang-Ho;Lee, Young-Hie
    • Proceedings of the KIEE Conference
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    • 1999.11d
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    • pp.845-847
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    • 1999
  • (Ba, Sr)$TiO_3$[BST] thin films were fabricated on Pt/$TiO_2/SiO_2$/Si substrate by RF sputtering. The structural and dielectric properties of the BST thin films were investigated with the deposition time. Increasing the deposition time from 20 min. to 60 min., second phases were decreased, and EST (111), (100), (200) peaks were increased. The relative dielectric constant and dielectric loss of the EST thin films with the thickness of 3000$\AA$ were 300 and 0.018, respectively at 1[kHz]. The relative dielectric constants was decreased and dielectric losses was increased as increasing the frequency.

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Effects of Pretreatment Condition and Substrate Bias on the Characteristics of MPECVD Diamond Thin Films (전처리조건과 기판Bias가 MPECVD 다이아몬드 박막의 특성에 미치는 영향)

  • 최지환;박정일;박광자;이은아;장감용;박종완
    • Journal of the Korean institute of surface engineering
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    • v.28 no.4
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    • pp.225-235
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    • 1995
  • To investigate the effects of pretreatment and substrate bias on the characteristics of the diamond thin films, the thin films were deposited on the p-type Si(100) wafer by MPECVD using mixtures of $H_2$, $CH_4$, and $O_2$ gases. Deposition was carried out at the substrate temperature of $900^{\circ}C$ and at the pressure of 40torr. The effect of the pretreatment on the film formation was the examined by using SiC and diamond powders as abrasive powders. Furthermore, the substrate bias effect on the formation of the diamond film was also examined. The highest nucleation density was observed for the pretreatment with 40~60$\mu\textrm{m}$ size of diamond powders and a negative bias potential(-50V). Many defects and(111) twins in the diamond films were observed.

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Growth of $(Pb_{0.72}La_{0.28})Ti_{0.93}O_3$ thin film by pulsed laser deposition (펄스 레이저 증착법에 의한 $(Pb_{0.72}La_{0.28})Ti_{0.93}O_3$ 박막의 증착)

  • Eun, Dong-Seog;Park, Jeong-Heum;Lee, Sang-Yeol;Park, Chang-Yub
    • Proceedings of the KIEE Conference
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    • 1997.07d
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    • pp.1236-1238
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    • 1997
  • 유전체 PLT(28) ($Pb_{0.72}La_{0.28}Ti_{0.93}O_3$) 박막을 레이저 어블레이션 기법으로 Pt/Ti/$SiO_3$/Si기판을 $500^{\circ}C{\sim}700^{\circ}C$까지 가열한 상태에서 $O_2$분위기에서 증착시켰다. 증착된 박막은 SEM, XRD 등의 구조적 분석을 통하여 $600^{\circ}C$이상에서 증착된 경우, (111)방향으로 우세하게 성장한, 결정성이 양호한 박막임을 확인하였다. 박막의 전기적 특성은, 증착 온도가 $650^{\circ}C$일 때 약 1400정도의 높은 비유전율을 얻었으며, 전하저장밀도는 100[KV/cm]에서 약 9[${\mu}C/cm^2$]이었다.

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Microstructure of the Oriented Hexagonal HoMnO3 Thin Films by PLD

  • Choi, Dong-Hyeok;Shim, In-Bo;Kouh, Tae-Joon;Kim, Chul-Sung
    • Journal of Magnetics
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    • v.12 no.4
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    • pp.141-143
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    • 2007
  • We have fabricated (0001) oriented hexagonal $HoMnO_3$ thin films with thickness of 300 nm using Pulsed Laser Deposition (PLD) technique on $Pt(111)/Ti/SiO_2/Si$ substrates. The XRD $\theta-2\theta$ pattern shows only (0002), (0004), and (0008) reflection of a hexagonal phase, and the full width at half maximum (FWHM) of (0004) peak is under $1.6^{\circ}$. The chemical state of Mn from XPS spectra of the films reveals the presence of $Mn^{3+}$ only. The temperature dependence of dielectric constant shows a weak anomaly at magnetic $N\acute{e}el$ temperature $(T_N)$, which is about 70 K.

Effects of heat treatment conditions on the crystallinity and electrical characteristics of co-supttered BST this films (열처리 조건이 BST 박막의 결정성과 전기적 특성에 미치는 영향)

  • Ju, Jae-Hyeon;Ju, Seung-Gi
    • Korean Journal of Materials Research
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    • v.5 no.5
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    • pp.518-524
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    • 1995
  • BST 박막을 Pt/Si$O_{2}$/Si 기판위에 co-sputtering 방법으로 형성할 때 열처리 조건이 BST 박막의 결정성과 전기적 특성에 미치는 영향에 관하여 연구하였다. BST 박막의 특성은 급속 열처리나 관상로 열처리과 같은 후열처리 온도보다 증착시의 기판온도에 따라서 민감하게 변화하였고, 기판 온도를 55$0^{\circ}C$로 하여 증착할대 Perovskite상이 가장 안정적으로 성장하여 유전율 1100, 유전손실계수 0.02로 우수한 유전특성을 나타내는 막을 형성할 수 있었다. BST 박막은 기판온도를 증가하면 정합에너지와 표면에너지를 최소로하는 (111) 방향으로 우선방위를 나타내었고 결정립의 조대화 현상으로 누설전류가 증가하였다.

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The Microstructure and Mechanical Behavior of Deformed Silicon (변형된 실리콘의 미세구조와 기계적 거동)

  • Kim, Seong-Won;Kim, Hyung-Tae;Zuo, Jian-Min;Pacaud, Jerome
    • Journal of the Korean Ceramic Society
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    • v.46 no.5
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    • pp.510-514
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    • 2009
  • The microstructure and mechanical behavior of deformed silicon were characterized using transmission electron microscopy and nanoindentation. Structural defects such as stacking faults and dislocations were observed through the diffraction contrast in transmission electron microscopy. The mechanical properties of deformed Si and 111 Si wafer and mechanical behaviors during contact loading were also characterized using nanoindentation. The hardness values of silicon samples were ${\sim}10$ GPa and the elastic modulus were varied with indentation conditions. Elbow or pop-out behaviors were found in load-displacement curves of silicon samples during nanoindentation. Deformed silicon showed 'pop-out' behavior more frequently under the load of 10 mN, which is attributed to the structural defects in deformed silicon.