THE CHARACTERIZATION OF SHALLOW TRENCH ISOLATION CHEMICAL MECHANICAL PLANARIZATION(STI CMP) THROUGH THE ANALYSIS FOR RELATIONSHIP OF BETWEEN PATTERN AND NON-PATTERN WAFER
-
- 한국재료학회:학술대회논문집
- /
- 한국재료학회 1998년도 IUMRS-ICEM ABSTRACT BOOK
- /
- pp.78.2-78
- /
- 1998