• Title/Summary/Keyword: Seed layer

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Effects of Ag Seed Layer on the Magnetic Properties and the Microstructural Evolution of SmCo/Cr Thin Films (Ag 씨앗층이 SmCo/Cr 박막의 자기적 특성과 미세구조에 미치는 영향)

  • 이성래;고광식;김영근
    • Journal of the Korean Magnetics Society
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    • v.11 no.2
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    • pp.63-71
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    • 2001
  • The effects of an Ag seed layer on the magnetic properties and the microstructural evolution of SmCo/Cr thin films deposited on glass substrates were investigated. Coercivity of the films is 2.0 kOe when the thickness of Ag seed layer was 1nm thick, but it increased to 2.7 kOe when the Ag seed layer thickness is 3 nm. The increase of coercivity for film with 3 nm-thick Ag is due to roughness of Cr and grain size of Cr by the Ag microbumps. Ar partial pressure influenced on the formation of Ag microbumps, for example, they were formed at 5 mTorr when Ag thickness was 1 nm. The mechanism of magnetization reversal of the SmCo films changed from domain wall motion to domain rotation as the Ag inserted. This was thought to be due to inhibition of domain wall motion by the reduction of Cr grain size and the increase of roughness.

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$Pb(Mg_{1/3}Nb_{2/3})O_3-PbTiO_3$ 박막의 성장 및 전기적 특성에 관한 연구

  • 김도형;이재찬
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.85-85
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    • 1999
  • Pb(Mg1/3Nb2/3)O3-PbTiO3 (PMN-PT)는 높은 유전율로 인해 강유전체 메모리 소자의 응용을 위한 연구가 되고 있으며 또한 전왜(electrostrictive)성을 갖고 있어 이력현상을 갖지 않음으로 최근 들어 미세전기기계소자(MEMS)로의 연구가 활발히 되고 있다. 본 연구에서는 MEMS 소자로서의 응용을 위해 저응력 SiNx가 형성된 Si 기판위에 Pt 전극 혹은 산화물 전극 SrRuO3를 갖는 PMN-PT 박막 캐패시터를 제조하였다. 박막 하부의 구조는 금속전극의 경우 Pt/Ti/LTO/SiNx/Si이고 산화물전극은 SrRuO3/Ru/SiNx/Si의 구조를 갖는다. PMN-PT 박막은 alkoxide를 기반으로 회전 coating 방법을 사용하여 박막 하부층의 변화를 주어서 성장시켰다. PMN-PT 용액의 합성은 분말합성법에서 사용하는 columbite 방법을 응용하여 상대적으로 반응정도가 낮은 Mg를 Nb와 우선 반응하여 Mg-Nb solution을 얻고 Pb-acetate 용액과 합성하여 PMN을 제조한 후 PT를 반응시켜서 제조하였다. PMN-PT 박막에서 동일한 공정조건 하에서 박막 하부층의 구조에 따라서 PMN-PT 박막의 조성이 A2B2O6의 조성을 가지는 파이로클러어상이 형성되거나 또는 ABO3인 페로브스카이트상이 형성되는 것을 관찰하였다. 금속 전극인 Pt를 하부전극으로 사용한 경우는 혼재상이 형성되어 패로브스카이드 PMN-PT를 얻기 위해 seed layer로서 PbTiO3를 사용하였으며 이러한 seed layer 위에 형성된 PMN-PT를 형성하는 경우 rutile 구조인 RuO2 위에 성장시킨 PMN-PT는 파이로클로어와 페로브스카이트의 혼재상이 얻어졌으나 pseudo-perovskite 구조인 SrRuO3 박막 위에 형성된 PMN-PT 박막에서는 페로브스카이트가 주된 상으로 얻어졌다. 즉 하부층(전극 또는 seed layer)으로 perovskite 구조를 갖는 박막을 형성하게 되면 페로브스카이트를 갖는 PMN-PT 박막을 얻을 수 있었다. 전기적인 특성은 상부전극으로 Pt를 사용하여 HP 4194A로 측정을 하였다. PT seed layer를 포함한 PMN-PT 박막은 유전상수 1086과 유전손실 2.75%을 가졌다.

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Characteristic of Through Silicon Via's Seed Layer Deposition and Via Filling (실리콘 관통형 Via(TSV)의 Seed Layer 증착 및 Via Filling 특성)

  • Lee, Hyunju;Choi, Manho;Kwon, Se-Hun;Lee, Jae-Ho;Kim, Yangdo
    • Korean Journal of Materials Research
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    • v.23 no.10
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    • pp.550-554
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    • 2013
  • As continued scaling becomes increasingly difficult, 3D integration has emerged as a viable solution to achieve higher bandwidths and good power efficiency. 3D integration can be defined as a technology involving the stacking of multiple processed wafers containing integrated circuits on top of each other with vertical interconnects between the wafers. This type of 3D structure can improve performance levels, enable the integration of devices with incompatible process flows, and reduce form factors. Through silicon vias (TSVs), which directly connect stacked structures die-to-die, are an enabling technology for future 3D integrated systems. TSVs filled with copper using an electro-plating method are investigated in this study. DC and pulses are used as a current source for the electro-plating process as a means of via filling. A TiN barrier and Ru seed layers are deposited by plasma-enhanced atomic layer deposition (PEALD) with thicknesses of 10 and 30 nm, respectively. All samples electroplated by the DC current showed defects, even with additives. However, the samples electroplated by the pulse current showed defect-free super-filled via structures. The optimized condition for defect-free bottom-up super-filling was established by adjusting the additive concentrations in the basic plating solution of copper sulfate. The optimized concentrations of JGB and SPS were found to be 10 and 20 ppm, respectively.

A Study on Preferred Orientation of ZnO Piezoelectric Thin Film Using Helped Seed Layer (보조씨드층을 이용한 ZnO 압전박막의 우선배향성에 관한 연구)

  • Park, In-Chul;Kim, Hong-Bae
    • Journal of the Korean Vacuum Society
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    • v.15 no.6
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    • pp.619-623
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    • 2006
  • The most important factor which determines resonance characteristics of FBAR(Film Bulk Acoustic Resonator) is the piezoelectricity of piezoelectric film. The piezoelectric properties of ZnO thin films which is strong as FBAR piezoelectric film is determined by the degree of c-axis preferred orientation with (002) plan. Therefore, many researchers have been interested in the study on the preferred orientation of the piezoelectric thin film. This paper has studied the preferred orientation of ZnO piezoelectric thin films using the helped seed layer of ZnO. The result shows that the c-axis ZnO thin films with columnar grains that the value of standard $deviation(\sigma)$ of XRD rocking curve is of $\sigma=1.15^{\circ}$ have the excellent piezoelectric property.

Side Channel Analysis with Low Complexity in the Diffusion Layer of Block Cipher Algorithm SEED (SEED 블록 암호 알고리즘 확산계층에서 낮은 복잡도를 갖는 부채널 분석)

  • Won, Yoo-Seung;Park, Aesun;Han, Dong-Guk
    • Journal of the Korea Institute of Information Security & Cryptology
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    • v.27 no.5
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    • pp.993-1000
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    • 2017
  • When the availability of embedded device is considered, combined countermeasure such as first-order masking and hiding countermeasures is quite attractive because the security and efficiency can be provided at the same time. Especially, combined countermeasure can be applied to the confusion and diffusion layers of the first and last rounds in order to provide the efficiency. Also, the middle rounds only employs first-order masking countermeasure or no countermeasure. In this paper, we suggest a novel side channel analysis with low complexity in the output of diffusion layer. In general, the attack target cannot be set to the output of diffusion layer owing to the high complexity. When the diffusion layer of block cipher is composed of AND operations, we show that the attack complexity can be reduced. Here, we consider that the main algorithm is SEED. Then, the attack complexity with $2^{32}$ can be reduced by $2^{16}$ according to the fact that the correlation between the combination of S-box outputs and that of the outputs of diffusion layer. Moreover, compared to the fact that the main target is the output of S-box in general, we demonstrate that the required number of traces can be reduced by 43~98% in terms of simulated traces. Additionally, we show that only 8,000 traces are enough to retrieve the correct key by suggested scheme, although it fails to reveal the correct key when performing the general approach on 100,000 traces in realistic device.

Zinc oxide seed layer 형성 조건 제어를 통한 나노 구조체 형상 조절 연구

  • Lee, Jae-Hyeok;Kim, Seong-Hyeon;Lee, Gyeong-Il;Lee, Cheol-Seung;Jo, Jin-U;Kim, Seon-Min
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.386-386
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    • 2011
  • sol-gel 및 hydrothermal growth method를 이용한 zinc oxide nanorod는 제작 시 고가의 장비가 필요치 않기에 저비용 대면적 박막을 제작하는데 적합하지만 rod들의 array 및 density 조절에서 어려움을 가지고 있다. 본 연구에서는 이러한 nanorod array 형상 조절을 위하여 zinc oxide seed layer 형성 과정 중 precursor solution에 이종 나노 입자를 첨가하였다. 첨가한 seed precursor solution을 spin coating한 이후에 후처리 하여 hydrothermal method를 이용해 성장시켰다. 합성한 rod들을 optic과 FE-SEM으로 측정해 rod들의 density 변화를 확인할 수 있었다.

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Anatomical and Histochemical Changes in Berries of Piper nigrum L.

  • Kuriachen, P.M.;Dave, Yash
    • Journal of Plant Biology
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    • v.32 no.1
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    • pp.11-21
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    • 1989
  • Anatomical and histochemical changes taking place in Piper nigrum berries during their ripening are described. The important observations on the pericarp are the development of sclereids in the exocarp, a continuous band of oil cells in mesocarp and the wall thickening of the endocarpic cells. The mature seed with a single layer of seed coat, representing the innermost tegment layer, encloses abundant perisperm. The endosperm and embryo are situated laterally at the terminal part of the seed. The perisperm is distinguished into an outer protein-rich zone and inner starch-filled zone. Starch and protein are also deposited in the mature pericarpic tissue. Lipid bodies are seem in the form of oil globules in oil cells.

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Effect of Seed-layer on the Crystallization and Electric Properties of SBN60 Thin Films (SBN60 박막의 결정화 및 전기적 특성에 관한 씨앗층의 영향)

  • Jang, Jae-Hoon;Lee, Dong-Gun;Lee, Hee-Young;Jo, Sang-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07b
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    • pp.723-727
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    • 2003
  • [ $Sr_xBa_{1-x}Nb_2O_6$ ] (SBN, $0.25{\leq}x{\leq}0.75$) ceramic is a ferroelectric material with tetragonal tungsten bronze (TTB) type structure, which has a high pyroelectric coefficient and a nonlinear electro-optic coefficient value. In spite of its advantages, SBN has not been investigated well compared to other ferroelectric materials with perovskite structure. In this study, SBN thin film was manufactured by ion beam sputtering technique using the prepared SBN target in $Ar/O_2$ atmosphere. SBN30 thin film of $1000{\AA}$ was pre-deposited as a seed layer on $Pt(100)/TiO_2/SiO_2/Si$ substrate followed by SBN60 deposition up to $3000{\AA}$ in thickness. As-deposited SBN60/SBN30 layer was heat-treated at different temperatures of 650, 700, 750, and $800^{\circ}C$ in air, respectively The crystallinity and orientation behavior as well as electric properties of SBN60/SBN30 multi-layer were examined. The deposited layer was uniform and the orientation was shown primarily along (001) plane from XRD pattern. There was no difference in the crystal structure with heat-treatment temperature, but the electric properties depended on the heating temperature and was the best at $750^{\circ}C$. In electric properties of Pt/SBN60/SBN30/Pt thin film capacitor prepared, the remnant polarization (2Pr) value was $15{\mu}C/cm^2$, the coercive field (Ec) 75 kV/cm, and the dielectric constant 1075, respectively.

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Effect of Seed-layer on the Crystallization and Electric Properties of SBN60 Thin Films (SBN60 박막의 결정화 및 전기적 특성에 관한 씨앗층의 영향)

  • Jang, Jae-Hoon;Lee, Dong-Gun;Lee, Hee-Young;Jo, Sang-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.08a
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    • pp.85-88
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    • 2003
  • $Sr_xBa_{1-x}Nb_2O_6$(SBN, $025{\leq}x{\leq}0.75$) ceramic is a ferroelectric material with tetragonal tungsten bronze (TTB) type structure, which has a high pyroelectric coefficient and a nonlinear electro-optic coefficient value. In spite of its advantages, SBN has not been investigated well compared to other ferroelectric materials with perovskite structure. In this study, SBN thin film was manufactured by ion beam sputtering technique using the prepared SBN target in Ar/$O_2$ atmosphere. SBN30 thin film of 500 ${\AA}$ was pre-deposited as a seed layer on Pt(l00)/$TiO_2$/$SiO_2$/Si substrate followed by SBN60 deposition up to 4500 ${\AA}$ in thickness. SBN60/SBN30 layer was deposited at different Oxygen amount of 0, 8.1, 17, and 31.8 sccm, respectively. The crystallinity and orientation behavior as well as electric properties of SBN60/SBN30 multi-layer were examined. The deposited layer was uniform and the orientation was shown primarily along (001) plane from XRD pattern. The crystal structure and the electric properties depended on the Oxygen amount, heating temperature and was the best at O2 = 8.1 seem, $750^{\circ}C$. In electric properties of Pt/SBN60/SBN30/Pt thin film capacitor prepared, the remnant polarization (2Pr) value was 13 ${\mu}C/cm^2$, the coercive field (Ec) 75 kV/cm, and the dielectric constant 1492, respectively.

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Epitaxial growth of buffer layers for superconducting coated conductors (초전도 선재용 완충층의 결정성장 연구)

  • Chung, Kook-Chae;Yoo, Jai-Moo;Kim, Young-Kuk;Wang, X.L.;Dou, S.X.
    • Progress in Superconductivity and Cryogenics
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    • v.9 no.3
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    • pp.5-8
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    • 2007
  • All three buffer layers of $Y_2O_3$, YSZ, and $CeO_2$ have been deposited on the biaxially textured metal substrates using rf-sputtering method, The first 50-70nm thick $Y_2O_3$ films were grown epitaxially on biaxially textured metal substrates as a seed layer and followed by the diffusion barrier ${\sim}100nm$ thick YSZ and subsequent capping layer ${\sim}200nm$ thick $CeO_2$ deposited epitaxially on top of $Y_2O_3$ seed layer. The epitaxial orientation of all three layers were all (100) grown with rocking curve Full Width at Half Maximum(FWHM) of $4-5^{\circ}$ and in plane phi-scan FWHM of $6-8^{\circ}$ using X -ray diffraction analysis. The NiO phases formed during the $Y_2O_3$ seed layer deposition seem to degrade the crystallinity and roughen the surface morphology of the following layer observed by AFM(Atomic Force Microscopy). The buffered tapes were used as substrates for long length YBCO coated conductors with high critical current density $J_c$. The five multi-turn of metal tapes was employed to increase the thickness of films and production rate to compensate the low growth rate of rf-sputtering method.