• Title/Summary/Keyword: Sawyer-tower circuit

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A Hystesis Loop Modeling of Ferroelectric Thin Film Using Numerical Integration Method (수치적분을 이용한 강유전체의 이력곡선 모델링)

  • 강성준;정양희;유일현
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2003.05a
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    • pp.696-699
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    • 2003
  • In this study, we suggested the model to precisely evaluate the ferroelectric hysteresis loop, using the modified Sawyer-Tower circuit and the ferroelectric capacitor with a MDFM(Metal-Dielectric-ferroelectric-Metal) structure. The mathematical expression of dipole polarization is applied to the numerical integration algorithm, and the fatigue property can be considered including the dielectric layer between ferroelectrics and bottom electrode. The validity of our model is proved comparing the estimated value of our model and the measured results of PLT(10) thin film.

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Errors and Their Corrections in the Measurement of Dielectric Hysteresis in Ferroelectrics (강유전체의 유전이력특성 측정에서의 오차요인 및 보정)

  • 박재환
    • Journal of the Korean Ceramic Society
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    • v.38 no.7
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    • pp.667-671
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    • 2001
  • Sawyer-tower 회로를 이용한 강유전 이력곡선의 측정과정에서의 주요 오차 원인을 살펴보고 이에 대한 대안을 제시해 보았다. 강유전체 시편에 존재하는 직류 누설성분에 의해 잔류분극과 항전계는 과대평가될 수 있는 위험성이 항상 있음을 알 수 있었으며 이러한 오차의 보정에 대하여 논의하였다. 또한 강유전 이력곡선의 측정에서 측정하는 시간이 증가되면서 시편의 발열로 인해서 시편의 온도가 증가하게 되어 잔류분극 값과 항전계 값이 감소하는 경향으로 나타남을 관찰하였고, 그 대책을 제안하였다.

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Measurement of Dielectric Hysteresis and Current Hysteresis for Determining Ferroelectricity (유전이력곡선 및 전류이력곡선을 통한 강유전성 확인 방법)

  • 박재환;박재관;김윤호
    • Korean Journal of Crystallography
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    • v.12 no.2
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    • pp.65-91
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    • 2001
  • Errors and its compensation in the measurement of dielectric hysteresis in ferroelectric by using Sawyer-Tower circuit were discussed. When ferroelectrics are lossy, remanent polarization and coercive field are likely to be over-estimated. As the DC conductivity and measuring time increases, measurement errors in ferroelectric properties increase. Current hysteresis measurement was suggested for compensation such errors.

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Electrical properties of piezoelectric PZT thick film by aerosol deposition method (에어로졸 증착법에 의한 압전 PZT 후막의 전기적 특성)

  • Kim, Ki-Hoon;Bang, Kook-Soo;Park, Dong-Soo;Park, Chan
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.25 no.6
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    • pp.239-244
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    • 2015
  • Lead zirconate titanate (PZT) thick films with thickness of $10{\sim}20{\mu}m$ were fabricated on silicon substrate by aerosol deposition method. As-deposited films on silicon were annealed at the temperatures of $700^{\circ}C$. The electrical properties of films deposited by PZT powders were characterized using impedance analyzer and Sawyer-Tower circuit. The PZT powder was prepared by both conventional solid reaction process and sol-gel process. The remanent polarization, coercive field, and dielectric constant of the $10{\mu}m$ thick film with solid reaction process were $20{\mu}C/cm^2$, 30 kV/cm and 1320, respectively. On the other hand, the PZT films by sol-gel process showed a poor dielectric constant of 635. The reason was probably due to the presence of pores produced from organic residue during annealing.

Transferred charge density and Optical Property on Powder Electroluminescent device (후막 EL 소자의 광학 및 이동전하밀도 특성)

  • 오주열;이종찬;박대희
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.05a
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    • pp.286-290
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    • 1999
  • Electroluminescence is occurred when phosphor is located in electric field. In this paper, we made powder electroluminescent device (PELD) with structured ITO film/Phosphor/Insulator/Silver paste. The transparent electrode was ITO film and green(2704-01), orange(2702-02) and blue-green(2703-01) were used as phosphor. The insulator was BaTiO$_3$ and $Y_2$O$_3$, back electrode was silver paste. To investigate electrical and optical properties of PELDs, EL spectrum, Brightness, Transferred charge density using Sawyer-Tower\`s circuit was measured.

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Characteristics of CaS:Eu,S electroluminescent devices (CaS:Eu,S 전계발광소자의 특성)

  • 조제철;유용택
    • Electrical & Electronic Materials
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    • v.8 no.6
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    • pp.752-758
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    • 1995
  • Red emitting CaS:Eu,S electroluminescent(EL) device prepared at 550.deg. C by an electron-beam evaporation technique, demonstrated luminance of 175cd/m$\^$2/ and efficiency of 0.311m/W with 3kHz drive. Luminance was increased with the increase of applied voltage and frequency. From the results of the PL spectrum and the EL spectrum, the CaS:Eu, S device showed emission peak near 640nm resulted from the transition of EU$\^$2+/ 4f$\^$6/5d.rarw.4f$\^$7/. The capacitance of the phosphor layer from the Sawyer-Tower circuit was 10.5nF/cm$\^$2/.

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Preparation of Paraelectric PLT Thin Films Using Reactive Magnetron Sputtering of Multicomponent Metal Target

  • Kim, H.H.;Sohn, K.S.;Casas, L.M.;Pfeffer, R.L.;Lareau, R.T.
    • Electrical & Electronic Materials
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    • v.11 no.10
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    • pp.53-59
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    • 1998
  • Paraelectric lead landthanum titanate(PLT) thin films have been prepared by a reactive dc magnetron sputtering system using a multicomponent metal target. The surface area control of each element on the target markedly facilitates the fabrication of thin films of complex ceramic compounds. A postdeposition heat-treatment was applied to all as-deposited PLT thin films at annealing temperatures up to 75$0^{\circ}C$ for crystalization. The composition of the PLT(28) thin filmannealed at $650^{\circ}C$ was: Pb, 0.73; La, 0.28; Ti, 0.88; O, 2.9. The dielectric constant and dissipation factor of the thin film(200 nm) at low filed measurements (500 Vcm-1) are 1216 and 0.018, respectively. The charge storage density using a typical Sawyer-Tower circuit with a 500 Hz sine wave was 12.5 $\mu$Ccm-2 at the electric field of 200 kVcm-1.

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A Study on Powder Electroluminescent Device through Structure and Thickness Variation (구조 및 두께 변화에 따른 후막 전계발광 소자에 관한 연구)

  • Han, Sang-Mu;Lee, Jong-Chan;Park, Dae-Hee
    • Proceedings of the KIEE Conference
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    • 1998.07d
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    • pp.1379-1381
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    • 1998
  • Powder electroluminescent device (PELD) structured conventionally dielectric and phosphor layer, between electrode and their layer fabricated by screen printing splaying or spin coating method. To promote performance of PELDs, we approached the experiments for different structure and thickness variation of PELD. Thickness variation($30{\mu}m{\sim}130{\mu}m$) was taken. To investigate electrical and optical properties of PELDs, EL spectrum, transferred charge density using Sawyer-Tower's circuit brightness was measured. Variation of structure in PELDs was as follows: WK-1 (ITO/BaTiO3/ZnS:Cu/Silver paste), WK-2 (ITO/BaTiO3/ZnS:Cu/BaTiO3/ZnS:Silver paste), WK-3 (ITO/BaTiO3/ZnS:Cu/BaTiO3/Silver paste), WK-4(ITO/BaTiO3+ZnS:Cu/Silver paste) As a result, structure of the highest brightness appeared WK-4 possessed 60 ${\mu}m$ thickness. The brightness was 2719 cd/$m^2$ at 100V, 400Hz.

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Properties of metal-ferroelectric thin film-silicon(MFS) structure using BaMgF$_{4}$ (BaMgF$_{4}$ 를 이용한 금속-강유전체박막-실리콘(MFS) 구조의 특성)

  • 김광호;김제덕;유병곤
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.33A no.5
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    • pp.102-107
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    • 1996
  • Use of a rapid thermal annealing (RTA) technique is shown to improve the properties of metal-ferroelectric BaMgF$_{4}$-silicon structures. The fluoride film was deposited in an ultra-high vacuum system at asubstrate temperature of 300$^{\circ}C$. A post-deposition annelaing was conducted for 10 seconds at 600.deg. C in a vacuum of 0.1 Torr, using a home-made RTA apparatus. The results showed that the resistivity of the ferroelectric BaMgF$_{4}$ film from a typical value of 1-2${\times}10^{11}{\Omega}{\cdot}cm$ before the annealing to about 5${\times}10^{13}{\Omega}{\cdot}cm$ and reduce the interface state density of the BaMgF$_{4}$/Si interface to about 8${\times}10^{10}cm^{2}{\cdot}$eV. Ferroelectric hysteresis measurements using a sawyer-tower circuit yielded remanent polarization and coercive field values of about 0.5$\mu$C/cm$^{2}$ and 80 kV/cm, respectively. the typical remanent polarization of the BaMgF$_{4}$ films ont he (100) and (111) oreientated silicon wafers were 0.5 - 0.6 $\mu$C/cm$^{2}$ and that of th efilms on the (110) wafers was 1.2$^{\circ}C$/cm$^{2}$.

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Electrical and Structural Properties of $LiNbO_3/Si$ Structure by RF Sputtering Method (RF 스퍼터링법을 이용한 $LiNbO_3/Si$구조의 전기적 및 구조적 특성)

  • Lee, Sang-Woo;Kim, Kwang-Ho;Lee, Won-Jong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.2
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    • pp.106-110
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    • 1998
  • The $LiNbO_3$ thin films were prepared directly on Si(100) substrates by conventional RF magnetron spurttering system for nonvolatile memory applications. RTA(Rapid Thermal Annealing) treatment was performed for as-deposited films in an oxygen atmosphere at 600 $^{\circ}C$ for 60 s. The rapid thermal annealed films were changed to poly-crystalline ferroelectric nature from amorphous of as-deposition. The resistivity of the ferroelectric $LiNbO_3$ film was increased from a typical value of $1{\sim}2{\times}10^8{\Omega}{\cdot}cm$ before the annealing to about $1{\times}10^{13}{\Omega}{\cdot}cm$ at 500 kV/cm and reduced the interface state density of the $LiNbO_3/Si$ (100) interface to about $1{\times}10^{11}/cm^2{\cdot}eV$. Ferroelectric hysteresis measurements using a Sawyer-Tower circuit yielded remanent polarization ($P_r$) and coercive field ($E_c$) values of about 1.2 ${\mu}C/cm^2$ and 120 kV/cm, respectively.

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