• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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• pp.19-20
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• 2006

Two methods that can reduce reflectance in solar cells are surface texturing and anti-reflection coating. Wet chemical etching is a typical method that surface texturing of multi-crystalline silicon. Wet chemical etching methods are the acid texturization of saw damage on the surface of multi-crystalline silicon or double-step chemical etching after KOH saw damage removal too. These methods of surface texturing are realized by chemical etching in acid solutions HF-$HNO_3$-$H_2O$. In this solutions we can reduce reflectance spectra by simple process etching of multi-crystalline silicon surface. We have obtained reflectance of 27.19% m 400~1100nm from acidic chemical etching after KOH saw damage removal. This result is about 7% less than just saw damage removal substrate. The surface morphology observed by microscope and scanning electron microscopy (SEM).

• 신재생에너지
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• 제5권1호
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• pp.26-31
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• 2009

The surface etching characteristics of single crystalline silicon wafer were investigated using potassium hydroxide (KOH) and tetramethylammonium hydroxide (TMAH). The saw damage layer was removed after 10min by KOH 45wt% solution at $80^{\circ}C$. The wafer etched at high temperature ($90^{\circ}C$) and in low concentration (4wt%) of TMAH solution showed an increased etch rate of silicon wafer and wavy patterns on the surface. Especially, pyramidal textures were formed in 4wt% TMAH solution without alcohol additives.

• Current Photovoltaic Research
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• 제6권1호
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• pp.27-30
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• 2018

The dependency of the electrical characteristics of silicon solar-cells on the depth of damaged layer induced by wire-sawing process was investigated. To compare cell efficiency with residual sawing damage, silicon solar-cells were fabricated by using as-sawn wafers having different depth of saw damage without any damaged etching process. The damaged layer induced by wire-sawing process in silicon bulk intensely influenced the value of fill factor on solar cells, degrading fill factor to 57.20%. In addition, the photovoltaic characteristics of solar cells applying texturing process shows that although the initial depth of saw-damage induced by wire-sawing process was different, the value of short-circuit current, fill-factor, and power-conversion-efficiency have an almost same, showing ~17.4% of cell efficiency. It indicated that the degradation of solar-cell efficiency induced by wire-sawing process could be prevented by eliminating all damaged layer through sufficient pyramid-surface texturing process.

• 한국도로학회논문집
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• 제14권4호
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• pp.73-81
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• 2012

PURPOSES : The purpose of this study is to select the proper sealing method and to see the performance of the saw and seal method for concrete rehabilitation based on accelerated pavement testings and lab tests. METHODS : Two accelerated pavement testings were conducted. One is to select proper sealing method of the asphalt joints and the other is to see the performance of the saw and seal method. Lab tests were conducted to select proper sealing method and a test section was constructed to see the field performance. RESULTS : The result of the first accelerated pavement testing indicated that the adhesive preformed sealants showed good performance when asphalt layer was rutted and in terms preventing from water infiltration. The second acceleration test indicated that the saw and seal method using the adhesive preformed sealant showed much better performance than the control. In the lab test bitumen, rubber and epoxy showed good performance as the adhesive. CONCLUSIONS : Saw and Seal method using the adhesive preformed sealant would markedly reduce the joint damage on the asphalt overlay.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 1998년도 춘계학술대회논문집; 용평리조트 타워콘도, 21-22 May 1998
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• pp.187-193
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• 1998

In the tandom pencil slat saw lines, feeding of cedar blocks is often stopped because excessive motor current is required in a saw machine. These events are called "kickoffs' in factory lines. Kickoffs decrease productivity due to machine down-time and damage to saw blades often accompanies them. Researches on saw behavior at kickoff are required to understand and reduce the frequency and severity of kickoff events. This research aims at understanding the fundamental mechanisms of kickoffs during cutting, predicting the impending kickoff and evolving design improvements for high cutting performance with fewer and less severe kickoffs.offs.

• 한국재료학회지
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• 제20권11호
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• pp.617-622
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• 2010

We have studied methods to save Si source during the fabrication process of crystalline Si solar cells. One way is to use a thin silicon wafer substrate. As the thickness of the wafers is reduced, mechanical fractures of the substrate increase with the mechanical handling of the thin wafers. It is expected that the mechanical fractures lead to a dropping of yield in the solar cell process. In this study, the mechanical properties of 220-micrometer-solar grade Cz p-type monocrystalline Si wafers were investigated by varying saw-damage etching conditions in order to improve the flexural strength of ultra-thin monocrystalline Si solar cells. Potassium hydroxide (KOH) solution and tetramethyl ammonium hydroxide (TMAH) solution were used as etching solutions. Etching processes were operated with a varying of the ratio of KOH and TMAH solutions in different temperature conditions. After saw-damage etching, wafers were cleaned with a modified RCA cleaning method for ten minutes. Each sample was divided into 42 pieces using an automatic dicing saw machine. The surface morphologies were investigated by scanning electron microscopy and 3D optical microscopy. The thickness distribution was measured by micrometer. The strength distribution was measured with a 4-point-bending tester. As a result, TMAH solution at $90^{\circ}C$ showed the best performance for flexural strength.

• 대한금속재료학회지
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• 제46권12호
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• pp.835-840
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• 2008

Texturing for crystalline silicon solar cells is one of the important techniques to increase conversion efficiency by effective photon trapping. Generally, incoming wafers or alkali etched wafers are used for texturing. From this conventional etching process, $7{\sim}10{\mu}m$-sized random pyramids are formed. In this study, acid etching for removal of saw damages was practiced before texturing. This improved the resulting surface morphology, which consisted of $2{\sim}4{\mu}m$-sized pyramids. Because these pyramids covered the surface much more extensively, we obtained reduction of optical losses on the surface. In order to compare with conventional texturing, FE-SEM is used for observing surface morphology and reflectance data is analyzed by UV-VIS spectrophotometer.

• 한국생산제조학회지
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• 제21권4호
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• pp.525-531
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• 2012

This study aims at the structural analysis of vibration and fatigue according to the configuration of engine mount. Maximum equivalent stress or deformation is shown at bracket or case respectively. As harmonic vibration analysis, the maximum displacement amplitude is happened at 4,000Hz. Among the cases of nonuniform fatigue loads, 'SAE bracket history' with the severest change of load becomes most unstable but 'Sample history' or 'Saw tooth' becomes most stable. In case of 'Sample history' or 'Saw tooth' with the average stress of 4,200MPa or 0MPa and the amplitude stress of -3,000MPa or 7MPa, the possibility of maximum damage becomes 70%. This stress state can be shown with 7 times more than the damage possibility of 'SAE bracket history' or 'SAE transmission'. The structural result of this study can be effectively utilized with the design on engine mount by investigating prevention and durability against its damage.

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2000년도 추계 기술심포지움 논문집
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• pp.3-8
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• 2000

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.323-323
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• 2010

Saw damage of crystalline silicon wafer is unavoidable factor. Usually, alkali treatment for removing the damage has been carried out as the saw damage removal (SDR) process for priming the alkali texture. It usually takes lots of time and energy to remove the sawed damages for solar grade crystalline silicon wafers We implemented two different mixed acidic solution treatments to obtain the improved surface structure of silicon wafer without much sacrifice of the silicon wafer thickness. At the first step, the silicon wafer was dipped into the mixed acidic solution of $HF:HNO_3$=1:2 ration for polished surface and at the second step, it was dipped into the diluted mixed acidic solution of $HF:HNO_3:H_2O$=7:3:10 ratio for porous structure. This double treatment to the silicon wafer brought lower reflectance (25% to 6%) and longer carrier lifetime ($0.15\;{\mu}s$ to $0.39\;{\mu}s$) comparing to the bare poly-crystalline silicon wafer. With optimizing the concentration ratio and the dilution ratio, we can not only effectively substitute the time consuming process of SDR to some extent but also skip plasma enhanced chemical vapor deposition (PECVD) process. Moreover, to conduct alkali texture for pyramidal structure on silicon wafer surface, we can use only nitric acid rich solution of the mixed acidic solution treatment instead of implementing SDR.