• Title/Summary/Keyword: Run to Run Control

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Remote Dynamic Control of AM1 Robot Using Network (네트워크를 이용한 AM1 로봇의 원격 동적 제어)

  • Kim, Seong-Il;Yoon, Sin-Il;Bae, Gil-Ho;Lee, Jin;Han, Seong-Hyeon
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 2002.04a
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    • pp.556-560
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    • 2002
  • In this paper, we propose a remote controller for robot manipulator using local area network(LAN) and internet. To do this, we develope a server-client system as used in the network field. The client system is in any computer in remote place for the user to log-in the server and manage the remote factory. the server system is a computer which controls the manipulator and waits for a access from client. The server system consists of several control algorithms which is needed to drive the manipulator and networking system to transfer images that shows states of the work place, and to receive a Tmp data to run the manipulator The client system consists of 3D(dimension) graphic user interface for teaching and off-line task like simulation, external hardware interface which makes it easier for the user to teach. Using this server-client system, the user who is on remote place can edit the work schedule of manipulator, then run the machine after it is transferred and monitor the results of the task.

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FIR CV-EWMA Control Chart (FIR CV-EWMA 관리도)

  • Hong, Eui-Pyo;Kang, Hae-Woon;Kang, Chang-Wook;Baek, Jae-Won
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.33 no.3
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    • pp.146-153
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    • 2010
  • When the production run is short and process parameters change frequently, it is difficult to monitor the process using traditional control charts. In such a case, the coefficient of variation (CV) is very useful for monitoring the process variability. The CV control chart is an effective tool to control the mean and variability of process simultaneously. The CV control chart, however, is not sensitive at small shifts in the magnitude of CV. The CV-EWMA(exponentially weighted moving average) control chart which was developed recently is effective in detecting a small shifts of CV. Since the CV-EWMA control chart scheme can be viewed as a weighted average of all past and current CV values, it is very sensitive to small change of mean and variability of the process. In this paper, we propose an FIR(Fast initial response) CV-EWMA control chart to improve the sensitivity of a CV-EWMA scheme at process start-up or out-of-control process. Moreover, we suggest the values of design parameters and show the results of the performance study of FIR CV-EWMA control chart by the use of average run length(ARL). Also, we compared the performance of FIR CV-EWMA control chart with that of the CV-EWMA control chart and we found that the CV-EWMA control chart gives longer in-control ARL and much shorter out-of-control ARL.

APC Technique and Fault Detection and Classification System in Semiconductor Manufacturing Process (반도체 공정에서의 APC 기법 및 이상감지 및 분류 시스템)

  • Ha, Dae-Geun;Koo, Jun-Mo;Park, Dam-Dae;Han, Chong-Hun
    • Journal of Institute of Control, Robotics and Systems
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    • v.21 no.9
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    • pp.875-880
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    • 2015
  • Traditional semiconductor process control has been performed through statistical process control techniques in a constant process-recipe conditions. However, the complexity of the interior of the etching apparatus plasma physics, quantitative modeling of process conditions due to the many difficult features constraints apply simple SISO control scheme. The introduction of the Advanced Process Control (APC) as a way to overcome the limits has been using the APC process control methodology run-to-run, wafer-to-wafer, or the yield of the semiconductor manufacturing process to the real-time process control, performance, it is possible to improve production. In addition, it is possible to establish a hierarchical structure of the process control made by the process control unit and associated algorithms and etching apparatus, the process unit, the overall process. In this study, the research focused on the methodology and monitoring improvements in performance needed to consider the process management of future developments in the semiconductor manufacturing process in accordance with the age of the APC analysis in real applications of the semiconductor manufacturing process and process fault diagnosis and control techniques in progress.

Energy Efficient Locomotion Control of Compliant Legged Robot (유연 다리 구조를 가진 로봇의 에너지 효율적 주행 제어)

  • Kwon, Oh-Seok;Choi, Rock-Hyun;Lee, Dong-Ha
    • The Journal of Korea Robotics Society
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    • v.7 no.2
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    • pp.76-82
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    • 2012
  • In this study, we aim to develop energy efficient walking and running robot with compliant leg. So, we propose the energy efficient locomotion control method. And, we experiment the proposed control method applying to the experimental robot with compliant leg. From the experiment, we look at whether the proposed control method can the robot walk and run energy efficiently.

Adaptive Exponentially Weighted Moving Average Control Chart Using a Kalman Filter (칼만필터를 적용한 Adaptive EWMA관리도)

  • 김양호;정윤성;김광섭
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.16 no.28
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    • pp.93-101
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    • 1993
  • In this paper, two adaptive exponentially weighted moving avenge control chart schemes which available for real-time are proposed. The weighting coefficient is estimated using a recursive kalman filter algorithm. Simulated average run lengths indicate the proposed schemes are sensitive to process shifts And their performance is comparable to CUSUM control chart and customary EWMA control chart.

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Development of CV Control Chart Using EWMA Technique (EWMA 기법을 적용한 CV 관리도의 개발)

  • Hong, Eui-Pyo;Kang, Chang-Wook;Baek, Jae-Won;Kang, Hae-Woon
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.31 no.4
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    • pp.114-120
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    • 2008
  • The control chart is widely used statistical process control(SPC) tool that searches for assignable cause of variation and detects any change of process. Generally, ${\bar{X}}-R$ control chart and ${\bar{X}}-S$ are most frequently used. When the production run is short and process parameter changes frequently, it is difficult to monitor the process using traditional control charts. In such a case, the coefficient of variation (CV) is very useful for monitoring the process variability. The CV control chart is an effective tool to control the mean and variability of process simultaneously. The CV control chart, however, is not sensitive at small shift in the magnitude of CV. In this paper, we propose an CV-EWMA (exponentially weighted moving average) control chart which is effective in detecting a small shift of CV. Since the CV-EWMA control chart scheme can be viewed as a weighted average of all past and current CV values, it is very sensitive to small change of mean and variability of the process. We suggest the values of design parameters and show the results of the performance study of CV-EWMA control chart by the use of average run length (ARL). When we compared the performance of CV-EWMA control chart with that of the CV control chart, we found that the CV-EWMA control chart gives longer in-control ARL and much shorter out-of-control ARL.

A Development of Expected Loss Control Chart Using Reflected Normal Loss Function (역정규 손실함수를 이용한 기대손실 관리도의 개발)

  • Kim, Dong-Hyuk;Chung, Young-Bae
    • Journal of Korean Society of Industrial and Systems Engineering
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    • v.39 no.2
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    • pp.37-45
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    • 2016
  • Control chart is representative tools of statistical process control (SPC). It is a graph that plotting the characteristic values from the process. It has two steps (or Phase). First step is a procedure for finding a process parameters. It is called Phase I. This step is to find the process parameters by using data obtained from in-controlled process. It is a step that the standard value was not determined. Another step is monitoring process by already known process parameters from Phase I. It is called Phase II. These control chart is the process quality characteristic value for management, which is plotted dot whether the existence within the control limit or not. But, this is not given information about the economic loss that occurs when a product characteristic value does not match the target value. In order to meet the customer needs, company not only consider stability of the process variation but also produce the product that is meet the target value. Taguchi's quadratic loss function is include information about economic loss that occurred by the mismatch the target value. However, Taguchi's quadratic loss function is very simple quadratic curve. It is difficult to realistically reflect the increased amount of loss that due to a deviation from the target value. Also, it can be well explained by only on condition that the normal process. Spiring proposed an alternative loss function that called reflected normal loss function (RNLF). In this paper, we design a new control chart for overcome these disadvantage by using the Spiring's RNLF. And we demonstrate effectiveness of new control chart by comparing its average run length (ARL) with ${\bar{x}}-R$ control chart and expected loss control chart (ELCC).

Changes in the Characteristics of Wintertime Climatology Simulation for METRI AGCM Using the Improved Radiation Parameterization (METRI AGCM의 복사 모수화 개선에 따른 겨울철 기후모의의 특징적 변화)

  • Lim, Han-Cheol;Byun, Young-Hwa;Park, Suhee;Kwon, Won-Tae
    • Atmosphere
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    • v.19 no.2
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    • pp.127-143
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    • 2009
  • This study investigates characteristics of wintertime simulation conducted by METRI AGCM utilizing new radiation parameterization scheme. New radiation scheme is based on the method of Chou et al., and is utilized in the METRI AGCM recently. In order to analyze characteristics of seasonal simulation in boreal winter, hindcast dataset from 1979 to 2005 is produced in two experiments - control run (CTRL) and new model's run (RADI). Also, changes in performance skill and predictability due to implementation of new radiation scheme are examined. In the wintertime simulation, the RADI experiment tends to reduce warm bias in the upper troposphere probably due to intensification of longwave radiative cooling over the whole troposphere. The radiative cooling effect is related to weakening of longitudinal temperature gradient, leading to weaker tropospheric jet in the upper troposphere. In addition, changes in vertical thermodynamic structure have an influence on reduction of tropical precipitation. Moreover, the RADI case is less sensitive to variation of tropical sea surface temperature than the CTRL case, even though the RADI case simulates the mean climate pattern well. It implies that the RADI run does not have significant improvement in seasonal prediction point of view.

Control Chart for Correlation Coefficients of Correlated Quality Variables

  • Kim, Jae-Joo;Chang, Duk-Joon
    • Journal of Korean Society for Quality Management
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    • v.26 no.2
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    • pp.51-60
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    • 1998
  • Exponetially weighted moving average(EWMA) control chart to simultaneously monitor correlation coefficients of several correlated quality variables under multivariate normal process are proposed. Performances of the proposed control charts are measured in terms of average run length(ARL) by simulation. Numerical results show that smaller values of smoothing constant are more efficient in terms of ARL.

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Multivariate EWMA Control Charts for Monitoring Dispersion Matrix

  • Chang Duk-Joon;Lee Jae Man
    • Communications for Statistical Applications and Methods
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    • v.12 no.2
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    • pp.265-273
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    • 2005
  • In this paper, we proposed multivariate EWMA control charts for both combine-accumulate and accumulate-combine approaches to monitor dispersion matrix of multiple quality variables. Numerical performance of the proposed charts are evaluated in terms of average run length(ARL). The performances show that small smoothing constants with accumulate-combine approach is preferred for detecting small shifts of the production process.