• Title/Summary/Keyword: Rocking curve

검색결과 127건 처리시간 0.034초

CMOS 공정에 적합한 AlN 압전 마이크로 발전기의 제작 및 특성 (Fabrication of AlN piezoelectric micro power generator suitable with CMOS process and its characteristics)

  • 정귀상;이병철
    • 센서학회지
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    • 제19권3호
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    • pp.209-213
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    • 2010
  • This paper describes the fabrication and characteristics of AlN piezoelectric MPG(micro power generator). The micro energy harvester was fabricated to convert ambient vibration energy to electrical power as a AlN piezoelectric cantilever with Si proof-mass. To be compatible with CMOS process, AlN thin film was grown at low temperature by RF magnetron sputtering and micro power generators were fabricated by MEMS technologies. X-ray diffraction pattern proved that the grown AlN film had highly(002) orientation with low value of FWHM(full width at the half maximum, $\theta=0.276^{\circ}$) in the rocking curve around(002) reflections. The implemented harvester showed the $198.5\;{\mu}m$ highest membrane displacement and generated 6.4 nW of electrical power to $80\;k{\Omega}$ resistive load with $22.6\;mV_{rms}$ voltage from 1.0 G acceleration at its resonant frequency of 389 Hz. From these results, the AlN piezoelectric MPG will be possible to suitable with the batch process and confirm the possibility for power supply in portable, mobile and wearable microsystems.

수직 Bridgman법에 의한 InSe 단결정의 성장 및 Sn이 첨가된 InSe에서 Zn의 확산에 잔한 연구 (A study on the growth of undoped-lnSe single crystal by vertical Bridgman method and Zn diffusion in Sn-doped InSe)

  • 정회준;문동찬;김선태
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 추계학술대회 논문집
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    • pp.464-467
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    • 1999
  • The undoped-InSe and Sn-doped InSe single crystals were grown by vertical Bridgman method and their properties were invesigated. The orientations and the crystallinites of these crystals were identified by X-ray diffraction(XRD), double crystal rocking curve(DCRC) and etch-pit density(EPD) measurements. From the Raman spectrum at room temperature, TO, LO modes and together with their overtones and combinations were observed. Optical properties were inves ated by PL at 12K and direct band gap of these crystals obtained from optical absorption spectrum. Compared with undo&-InSe, electrical properties of Sn-doped InSe were increased and the electrical conductivity type were n-type. But electrical properties along growth direction of crystals and radial direction of wafer showed nearly uniform distribution. The Zn diffusion mechanism in InSe could be explained by interstitial-substitutional and vacancy complex models and the activation energy of 1.15-3.01eV were needed for diffusion.fusion.

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Structural and Electrical Properties of SrRuO3 thin Film Grown on SrTiO3 (110) Substrate

  • Kwon, O-Ung;Kwon, Namic;Lee, B.W.;Jung, C.U.
    • Journal of Magnetics
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    • 제18권1호
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    • pp.39-42
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    • 2013
  • We studied the structural and electrical properties of $SrRuO_3$ thin films grown on $SrTiO_3$ (110) substrate. High resolution X-ray diffraction measurement of the grown film showed 1) very sharp peaks for $SrRuO_3$ film with a very narrow rocking curve with FWHM = $0.045^{\circ}$ and 2) coherent growth behavior having the same in-plane lattice constants of the film as those of the substrate. The resisitivity data showed good metallic behavior; ${\rho}$ = 63(205) ${\mu}{\Omega}{\cdot}cm$ at 5 (300) K with a residual resistivity ratio of ~3. The observed kink at ${\rho}(T)$ showed that the ferromagnetic transition temperature was ~10 K higher than that of $SrRuO_3$ thin film grown on $SrTiO_3$ (001) substrate. The observed rather lower RRR value could be partially due to a very small amount of Ru vacancy generally observed in $SrRuO_3$ thin films grown by PLD method and is evident in the larger unit-cell volume compared to that of stoichiometric thin film.

초크랄스키 방법으로 성장한 CaF2 단결정 분석 (Analysis of calcium fluoride single crystal grown by the czochralski method)

  • 이하린;나준혁;박미선;장연숙;정해균;김두근;이원재
    • 한국결정성장학회지
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    • 제32권6호
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    • pp.219-224
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    • 2022
  • 광학 윈도우, 프리즘, 렌즈 등에 사용되는 CaF2 단결정은 3개의 부격자를 가진 face-centered cubic(FCC) 구조를 가지고 있으며 밴드갭(12 eV)이 크고 넓은 파장영역에서 투과율이 우수하고 굴절률이 낮다는 특징이 있다. CaF2 단결정 성장은 대표적으로 높은 생산효율과 큰 결정을 만들 수 있는 초크랄스키(Czochralski) 방법으로 생산되고 있다. 이 연구에서는 초크랄스키 방법으로 성장한 일본의 Nikon 사와 미국의 M TI 사 (100)면, (111)면의 CaF2 단결정 상용화 웨이퍼의 결정성과 결함밀도를 분석하기 위해 X선 회절(XRD), XRC(X-ray rocking curve) 측정 및 Chemical Etching을 수행하였고 푸리에 변환 적외선 분광법(FT-IR)과 UV-VIS-NIS을 이용하여 CaF2 결정의 광학적 특성을 분석하였다. 다양한 분석 결과를 통해 CaF2 단결정의 다양한 분야에서의 응용가능성을 체계적으로 살펴보았다.

이트리움 실리사이드 박막의 (100)Si 기판상에서의 방향성 성장과 미세조직의 특성 (Epitaxial growth and microstructural characterization of $YSi_2$ films on (100)Si substrate)

  • Lee, Young-Ki
    • 한국결정성장학회지
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    • 제7권1호
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    • pp.59-69
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    • 1997
  • 이트리움 실리사이드($YSi_2$)는 $400^{\circ}C$ 이상의 진공열처리 중 고상반응에 의하여 (100)Si 기판상에서 $YSi_2$의 (1100)면이 방향성 성장을 하였으며, $YSi_2$ 박막과 (100)Si 기판과의 방위관계는 [0001]$YSi_2$//[011i]Si과 [0001]$YSi_2$//[011]Si이었다. 그러나 방위관계에서도 알 수 있는 바와 같이 $YSi_2$는 [1100]$YSi_2$의 domain이 상호간에 $90^{\circ}$의 방위각을 이루며 성장하는 이른바 double-domain 구조를 나타내었다. 이는(1100)$YSi_2$면과 Si기판과의 계면에서 커다란 격자 불일치의 이방성 때문이라 생각되며, 각각의 domain은 (2201) 비대칭 반사면의 $\omega$-mode rocking curve 측정 결과, 거의 동등한 체적율과 결정성을 나타내었다. 본 연구에서는 이러한 double-domain의 형성기구를 (1100)$YSi_2$면과 (100)Si기판과의 계면에서 정합 모델에 근거한 기하학적 matching 관계로 설명하였다.

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RF 필터응용을 위한 FBAR 소자제작과 증착온도가 ZnO 박막의 결정성장에 미치는 영향 (FBAR Devices Fabrication and Effects of Deposition Temperature on ZnO Crystal Growth for RF Filter Applications)

  • Munhyuk Yim;Kim, Dong-Hyun;Dongkyu Chai;Mai Linh;Giwan Yoon
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2003년도 춘계종합학술대회
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    • pp.88-92
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    • 2003
  • 본 논문에서는 Al 하부전극 상에서 RF magnetron sputtering 기술을 이용한 ZnO 박막 증착 및 공정온도가 ZnO 결정성장에 미치는 영향을 고려하여 제작한 FBAR 소자에 대한 연구를 발표한다. 결과적으로, 20$0^{\circ}C$의 공정온도에서 주상형 결정립(columnar grain)을 가지고 c축 우선 배향된 ZnO 박막을 얻을 수 있었다. 이렇게 얻은 ZnO 박막을 FBAR 소자에 적용하여 제작한 결과, 2.05GHz의 공진 주파수에서 ~19.5dB의 반사손실을 보였다.

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$^{57}Fe$ 도프된 GaAs의 Mossbauer 효과 및 광학적 특성에 관한 연구 (A study on the Mossbauer effect and optical properties of $^{57}Fe$-doped-GaAs)

  • 고정대;홍성락;김득영;강태원
    • 한국진공학회지
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    • 제6권4호
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    • pp.337-342
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    • 1997
  • GaAs내의 철(Fe)의 상태에 관한 연구를 위하여, 액상에피탁시 방법으로 Fe를 도프 한 GaAs를 성장하고 성장된 에피층의 특성을 연구하였다. 도판트 물질인 Fe는 동위원소 $^{57}Fe$를 사용하였고, Fe이온의 GaAs내에서의 전하상태를 Mossbauer분광실험으로 분석하였 다. Mossbauer 스펙트럼으로부터 isomer shift 값을 계산한 결과 Fe 이온은 GaAs내에서 +3 가 이온 상태로 존재함을 알 수 있었다. X-ray 분석 및 photoluminescence(PL) 분광실험으 로부터 결정성이 우수한 에피층이 성장되었음을 알 수 있었으며, Fe가 도프된 GaAs의 저온 PL에서 0.99eV 및 1.15eV에서 피크를 갖는 반치폭이 매우 큰 발광대를 관찰 할 수 있었다. 이들 피크는 GaAs내 Fe 억셉터와 관련된 2개의 복사성 깊은 준위를 반영하는 발광현상으 로 해석된다.

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Hot Wall Epitaxy(HWE) 방법에 의한 $CuInTe_2$ 단결정 박막 성장과 특성에 관한 연구 (Growth and Characterization of $CuInTe_2$ Single Crystal thin Films by Hot Wall Epitaxy)

  • 홍광준;이관교;이상열;유상하;정준우;정경아;백형원;방진주;신영진
    • 한국결정학회지
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    • 제11권4호
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    • pp.212-223
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    • 2000
  • A stochiometric mix of CuInTe₂ polycrystal was prepared in a honizonatal furnace. To obtain the single crystal thin films, CuInTe₂ mixed crystal was deposited on throughly etched GaAs(100) by the HWE system. The source and substrate temperatures were 610℃ and 450℃ respectively, and the thickness of the deposited single crystal thin film was 2.4㎛. CuInTe₂ single crystal thin film was proved to be the optimal growth condition when the excition emission spectrum was the strongest at 1085.3 nm(1.1424 eV) of photoluminescence spectrum at 10 K, and also FWHM of Double Crystal X-ray Rocking Curve (DCRC) was the smallest, 129 arcsec. The Hall effect on this sample was measured by the method of Van der Pauw, and the carrier density and mobility dependent on temperature were 9.57x10/sup 22/ electron/㎥, 1.31x10/sup -2/㎡/V·s at 293 K, respectively. The ΔCr(Crystal field splitting) and the ΔSo (spin orbit coupling splitting( measured at f10K from the photocurrent peaks in the short wavelength of the CuInTe₂ single crystal thin film were about 0.1200 eV, 0.2833 eV respectively. From the PL spectra of CuInTe₂ single crystal thin film at 10 K, the free exciton (E/sub x/) was determined to be 1064.5 nm(1.1647 eV) and the donor-bound exciton(D/sup 0/, X) and acceptor-bound exciton (A/sup 0/, X) were determined to be 1085.3 nm(1.1424 eV) and 1096.8 nm(1.1304 eV0 respectively. And also, the donor-acciptor pair (DAP)P/sub 0/, DAP-replica P₁, DAP-replica P₂ and self-activated (SA) were determined to be 1131 nm (1.0962 eV), 1164 nm(1.0651 eV), 1191.1 nm(1.0340 eV) and 1618.1 nm (0.7662 eV), respectively.

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HWE 방법에 의한 AgGaS$_2$/GaAs 단결정 박막 성장과 광학적 특성 (Growth and optic characteristics of AgGaS$_2$/GaAs single crystal thin film by hot wall epitaxy)

  • 이상열;홍광준;정준우
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
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    • pp.281-287
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    • 2002
  • The stochiometric composition of AgGaS$_2$ polycrystal source materials for the AgGaS$_2$/GaAs epilayer was prepared from horizontal furnace. From the extrapolation method of X-ray diffraction patterns it was found that the polycrystal AgGaS$_2$ has tetragonal structure of which lattice constant a$\sub$0/ and c$\sub$0/ were 5.756 ${\AA}$ and 10.305 ${\AA}$, respectively. AgGaS$_2$/GaAs epilayer was deposited on throughly etched GaAs(100) substrate from mixed crystal AgGaS$_2$ by the Hot Wall Epitaxy (100) system. The source and substrate temperature were 590$^{\circ}C$ and 440$^{\circ}C$ respectively. The crystallinity of the grown AgGaS$_2$/GaAs epilayer was investigated by the DCRC (double crystal X-ray diffraction rocking curve). The optical energy gaps were found to be 2.61 eV for AgGaS$_2$/GaAs epilayer at room temperature. The temperature dependence of the photocurrent peak energy is well explained by the Varshni equation, then the constants in the Varshni equation are given by ${\alpha}$ : 8.695${\times}$10$\^$-4/ eV/K, and ${\beta}$ = 332 K. From the photocurrent spectra by illumination of polarized light of the AgGaS$_2$/GaAs epilayer, we have found that crystal field splitting ΔCr was 0.28 eV at 20 K. From the PL spectra at 20 K, the peaks corresponding to free and bound excitons and a broad emission band due to D-A pain are identified. The binding energy of the free excitons are determined to be 0.2676 eV and 0.2430 eV and the dissociation energy of the bound excitons to be 0.4695 eV.

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4H-SiC 기판 위에 성장된 ZnO 박막의 온도에 따른 구조적 특성 분석 (Effect of Deposition Temperature on Structural Properties of ZnO Thin Films on 4H-SiC Substrate)

  • 김지홍;조대형;문병무;방욱;김상철;김남균;구상모
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.120-120
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    • 2008
  • We demonstrate epitaxial growth of ZnO thin films on 4H-SiC(0001) substrates using pulsed laser deposition (PLD). ZnO and SiC have attracted attention for their special material properties as wide band gap semiconductors. Especially, ZnO could be applied to optoelectronic applications such as light emitting devices and photo detectors due to its direct wide bandgap (Eg) of ~3.37eV and large exciton binding energy of ~60meV. SiC shows a good lattice matching to ZnO compared with other commonly used substrates and in this regard SiC is a good candidate as a substrate for ZnO. In this work, ZnO thin films were grown on 4H-SiC(0001) substrates by PLD using an Nd:YAG laser with a 355nm wavelength. The crystalline properties of the films were evaluated by x-ray diffraction (XRD) $\theta-2\theta$, rocking curve and pole figure measurements using a high-resolution diffractometer. The surface morphology of the films was studied by atomic force microscopy (AFM).

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