• 제목/요약/키워드: Reticle

검색결과 31건 처리시간 0.022초

고정 레티클 탐색기의 IRCM 재밍효과 분석 (IRCM Jamming Effect Analysis of a Stationary Reticle Seeker)

  • 안상호;김영춘;이광세;김기홍;김성수
    • 한국군사과학기술학회지
    • /
    • 제13권2호
    • /
    • pp.304-312
    • /
    • 2010
  • The function of IRCM(Infrared Countermeasures) jamming is to cause the missile to miss its intended target by disturbing the seeker tracking process. This paper analyzes the jamming effect of IRCM jamming for a stationary reticle seeker. The phase error containing the azimuth angle information of target is analyzed for the intensity, frequency and duty ratio variation of the jammer pulse signal. We confirmed that the more the jammer frequency is similar to the spinning frequency of the stationary seeker, the more jamming effect is high.

segmented Focal Plane Array를 이용한 개선된 레티클 탐색기 (An Improved Reticle Seeker Using the Segmented Forcal Plane Array)

  • 홍현기;한성현;최종수
    • 한국통신학회논문지
    • /
    • 제21권10호
    • /
    • pp.2670-2678
    • /
    • 1996
  • Reticle seekers temporally modulate target location onto the incoming spatial signal. When large or multiple targets are present in the FOV, however, it is hard to precisely modulate the incoming target signal by the relicle. To solve this loss of modulatoin depth problem, we present an improved retical seeker using the segmented focal plane array(FPA). The new reticle system uses the normalized difference as well as the modulated signal of each detector output in the segmented FPA. In simulation, we have ascertained the proposed system can make an effective analysis and tracking for multiple or large targets.

  • PDF

웨이퍼 스텝퍼에서의 기준정렬을 위한 2차원 버니어 패턴의 성능예측

  • 이종현;장원익;최부연;장기호;김도훈;유형준
    • 한국정밀공학회:학술대회논문집
    • /
    • 한국정밀공학회 1993년도 추계학술대회 논문집
    • /
    • pp.243-248
    • /
    • 1993
  • New methodology for fiducial alignment is proposed to improve the alignment accuracy in wafer steppers. The positioning error is detected by PSD(Position Sensitive Detector)when 2-dimensional vernier patterns on a reticle on a reticle are projected on the fiducial marks of wafer stage. The width and period of vernier patterns are deter mined to get the highest S/N ratio for the exposure wavelength 248.4nm of KrF excimer laser. This new method has an advantage of higher accuracy and faster alignment over the conventional one.

  • PDF

레이저를 이용한 마이크로렌즈 제조에 관한 연구 (Microlens fabricated by laser irradiation)

  • 윤경구;이성국;김재구;김철새;김재도
    • 한국정밀공학회:학술대회논문집
    • /
    • 한국정밀공학회 2000년도 추계학술대회 논문집
    • /
    • pp.748-751
    • /
    • 2000
  • Microlens made by laser radiation method have advantages in the easiness of their fabrication. The process is based on the projection of a chromium-on-quartz reticle on to the Polymer using a pulsed 248nm KrF excimer laser. Fabrication process is a fluence-dependent rate and density. The lens shape is defined by a rotationally symmetric sluence distribution with smooth radial variation in the image plane of the reticle. A typical lens of 50㎛ diameter was fabricated by irradiating 2000 laser pulses within 40 seconds. The experimental results show microlens fabrication by UV laser is possible and well worth studying further.

  • PDF

BS 프리즘을 이용한 주야 조준경 개발 (Development of Day and Night Scope with BS Prism)

  • 이동희
    • 한국안광학회지
    • /
    • 제19권3호
    • /
    • pp.339-344
    • /
    • 2014
  • 목적: 본 연구는 BS 프리즘의 반사면을 이용한 주야 조준경의 개발에 관한 것이다. 방법: BS(beam splitting) 프리즘의 반사면의 상하에 도트시표발생부와 LCD 패널을 배치하고, BS 프리즘 전방에는 doublet 형태로 설계된 반사경을 배치하였다. 이렇게 함으로서 도트시표 발생부에서의 도트시표 허상을 관찰자 쪽에 결상시키도록 하는 기능, 외부 목표물 주변부의 정보는 관찰자에게 1배로 보이도록 하는 기능과 LCD 패널의 영상을 직접 관찰자가 볼 수 있게 하는 기능을 가진 새로운 형태의 BS 프리즘을 이용한 주야 조준경을 개발하였다. 결과: BS 프리즘의 반사면이 도트 시표를 반사시키는 도트사이트로서의 역할과 LCD 패널에 디스플레이된 야간 열영상을 관찰자가 관찰할 수 있도록 하는 반사 광학계 역할을 하도록 함으로써 주간에는 도트사이트로서 주간조준경 기능을, 야간에는 열영상 디스플레이 장치로서 야간조준경 기능을 하는 주야 조준경 장치를 개발하였다. 결론: 본 연구에서 우리는 기존의 도트사이트와 기존의 야간조준경을 BS 프리즘을 이용하여 결합함으로서 선택적으로 주야 조준경 역할을 할 수 있는 주야 조준경을 개발하였다. 이렇게 함으로써 우리는 기존의 도트사이트와 야간조준경의 착탈식 조합보다 사격의 신속성을 더욱 높일 수 있으며 총기류에의 장착에 있어서 보다 편리함을 제공해주는 새로운 형태의 BS 프리즘을 이용한 주야 조준경을 설계 개발할 수 있었다.

Development of Optical Sighting System for Moving Target Tracking

  • Jeung, Bo-Sun;Lim, Sung-Soo;Lee, Dong-Hee
    • Current Optics and Photonics
    • /
    • 제3권2호
    • /
    • pp.154-163
    • /
    • 2019
  • In this study, we developed an optical sighting system capable of shooting at a long-distance target by operating a digital gyro mirror composed of a gyro sensor and an FSM. The optical sighting system consists of a reticle part, a digital gyro mirror (FSM), a parallax correction lens, a reticle-ray reflection mirror, and a partial reflection window. In order to obtain the optimal volume and to calculate the leading angle range according to the driving angle of the FSM, a calculation program using Euler rotation angles and a three-dimensional reflection matrix was developed. With this program we have confirmed that the horizontal leading angle of the developed optical sighting system can be implemented under about ${\pm}8^{\circ}$ for the maximum horizontal driving angle (${\beta}={\pm}12.5^{\circ}$) of the current FSM. Also, if the ${\beta}$ horizontal driving angle of the FSM is under about ${\pm}15.5^{\circ}$, it can be confirmed that the horizontal direction leading angle can be under ${\pm}10.0^{\circ}$. If diagonal leading angles are allowed, we confirmed that we can achieve a diagonal leading angle of ${\pm}10.0^{\circ}$ with a vertical driving angle ${\alpha}$ of ${\pm}7.1^{\circ}$ and horizontal driving angle ${\beta}$ of ${\pm}12.5^{\circ}$.

고압환경에서 이미지 프로세싱 기법을 이용한 액적크기 측정 (Drop Size Measurement using Image Processing Method under High Ambient Pressure Condition)

  • 임병직;길태옥;정기훈;윤영빈
    • 한국가시화정보학회:학술대회논문집
    • /
    • 한국가시화정보학회 2003년도 추계학술대회 논문집
    • /
    • pp.111-114
    • /
    • 2003
  • Drop size is one of the most important parameters which are control the performance of the engine using liquid fuel/oxidizer and drop formation is mainly controlled by aerodynamic force caused by ambient gas. Because of this, empirical data and correlation acquired under standard ambient condition are not valid. So experiments under high ambient pressure condition to measure the drop size using image processing method And find the empirical correlation between SMD and chamber pressure(density), injection velocity.

  • PDF

다중 표적에 대한 적외선 레티클 탐색기의 오차 신호 분석 (Analysis of the error signals for infrared reticle seekers in multiple targets)

  • 한성현;홍현기;최종수
    • 한국통신학회논문지
    • /
    • 제21권6호
    • /
    • pp.1438-1446
    • /
    • 1996
  • Infrared seekers using reticles with a single detector have been widely used due to small size and low cost. However, the analysis of the error signals and the performance in multiple targets are performed either simplistically or not at all. In this paper, we present detector signals and processing results using image and signal processing techniques, especially performance analysis in multiple targets. The simulation results are essential to make the advanced signal processing part of retical seekers which can deal with various engagement scenarios.

  • PDF

반도체 포토공정에서 총 가중작업흐름시간을 최소화하기 위한 스케쥴링 방법론에 관한 연구 (Scheduling Algorithms for Minimizing Total Weighted Flowtime in Photolithography Workstation of FAB)

  • 최성우
    • 산업경영시스템학회지
    • /
    • 제35권1호
    • /
    • pp.79-86
    • /
    • 2012
  • This study focuses on the problem of scheduling wafer lots of several recipe(operation condition) types in the photolithography workstation in a semiconductor wafer fabrication facility, and sequence-dependent recipe set up times may be required at the photolithography machines. In addition, a lot is able to be operated at a machine when the reticle(mask) corresponding to the recipe type is set up in the photolithography machine. We suggest various heuristic algorithms, in which developed recipe selection rules and lot selection rules are used to generate reasonable schedules to minimizing the total weighted flowtime. Results of computational tests on randomly generated test problems show that the suggested algorithms outperform a scheduling method used in a real manufacturing system in terms of the total weighted flowtime of the wafer lots with ready times.