웨이퍼 스텝퍼에서의 기준정렬을 위한 2차원 버니어 패턴의 성능예측

  • 이종현 (한국전자통신연구소 반도체연구단 공정장비연구부) ;
  • 장원익 (한국전자통신연구소 반도체연구단 공정장비연구부) ;
  • 최부연 (한국전자통신연구소 반도체연구단 공정장비연구부) ;
  • 장기호 (한국전자통신연구소 반도체연구단 공정장비연구부) ;
  • 김도훈 (한국전자통신연구소 반도체연구단 공정장비연구부) ;
  • 유형준 (한국전자통신연구소 반도체연구단 공정장비연구부)
  • Published : 1993.10.01

Abstract

New methodology for fiducial alignment is proposed to improve the alignment accuracy in wafer steppers. The positioning error is detected by PSD(Position Sensitive Detector)when 2-dimensional vernier patterns on a reticle on a reticle are projected on the fiducial marks of wafer stage. The width and period of vernier patterns are deter mined to get the highest S/N ratio for the exposure wavelength 248.4nm of KrF excimer laser. This new method has an advantage of higher accuracy and faster alignment over the conventional one.

Keywords