• Title/Summary/Keyword: Reaction barrier

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Development of Plasma Assisted ALD equipment and Electrical Characteristic of TaN thin film deposited PAALD method (Plasma Assisted ALD 장비 계발과 PAALD법으로 증착 된 TaN 박막의 전기적 특성)

  • Do Kwan Woo;Kim Kyoung Min;Yang Chung Mo;Park Seong Guen;Na Kyoung Il;Lee Jung Hee;Lee Jong Hyun
    • Journal of the Semiconductor & Display Technology
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    • v.4 no.2 s.11
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    • pp.39-43
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    • 2005
  • In the study, in order to deposit TaN thin film for diffusion barrier and bottom electrode we made the Plasma Assisted ALD equipment and confirmed the electrical characteristics of TaN thin films grown PAALD method. Plasma Assisted ALD equipment depositing TaN thin film using PEMAT(pentakis(ethylmethlyamino) tantalum) precursor and NH3 reaction gas is shown that TaN thin film deposited high density and amorphous phase with XRD measurement. The degree of diffusion and reaction taking place in Cu/TaN (deposited using 150W PAALD)/$SiO_{2}$/Si systems with increasing annealing temperature was estimated for MOS capacitor property and the $SiO_{2}$, (600${\AA}$)/Si system surface analysis by C-V measurement and secondary ion material spectrometer (SIMS) after Cu/TaN/$SiO_{2}$ (400 ${\AA}$) layer etching. TaN thin film deposited PAALD method diffusion barrier have a good diffusion barrier property up to 500$^{\circ}C$.

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Adsorption Reactions of Trimethylgallium and Arsine on H/Si(100)-2x1 Surface

  • Cho, Ji-Eun;Ghosh, Manik Kumer;Choi, Cheol-Ho
    • Bulletin of the Korean Chemical Society
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    • v.30 no.8
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    • pp.1805-1810
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    • 2009
  • The adsorptions of trimethygallium (TMG) and arsine (As$H_3$) on H/Si(100)-2x1 surface were theoretically investigated. In the case of TMG adsorption, methane loss reaction, surface methylation, hydrogen loss reaction and ring closing reaction channels were found. The mechanism of As$H_3$ adsorption on the surface was also identified. Among these, the methane loss reaction depositing –Ga(C$H_3)_2$ was found to be the major channel due to its low barrier height and the large exothermicity. The surface methylation reaction is the second most favorable channel. In contrast, arsine turned out to be less reactive on the surface, implying that Arsine surface reaction would be the rate limiting step in the overall ALD process.

Changes of Performance of Soil-Cement Barrier due to Migration of Acids (산 이동에 따른 심층혼합기둥체 차수벽의 성능변화)

  • 정문경;천찬란;이주형;김강석
    • Proceedings of the Korean Geotechical Society Conference
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    • 2003.03a
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    • pp.189-196
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    • 2003
  • Soil-cement column is often used as a contaminant barrier. This study presents the results of experimental study performed to investigate the changes of properties of soil-cement column under the attack of acids. Sulfuric nitric, and ascetic acid were used as contaminants. Specimen were made of clayey and sandy soils with addition of cement and water Permeability of soil-cement decreased with time during permeability test. When significant amount of acid percolated the specimen, permeability increased and compressive strength decreased due to the dissolution and leaching of cement and its chemical reaction compounds. Sulfuric and nitric acid were more effective than ascetic acid in deteriorating soil-cement column. Amount of acid required to lower the pH of soil cement below 12 was calculated from the results of permeability tests. This leads to a conclusion that, under the conditions employed in this study, the chemical stability of soil-cement column could be maintained against acid attack for longer than generally accepted lifetime of contaminant barriers.

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Decomposition of Acetonitrile by Planar Type Dielectric Barrier Discharge Reactor (평판형 유전체 장벽 방전 반응기에서 Acetonitrile의 분해 특성)

  • 송영훈;김관태;류삼곤;이해완
    • Journal of the Korea Institute of Military Science and Technology
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    • v.5 no.3
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    • pp.105-112
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    • 2002
  • A combined process of non-thermal plasma and catalytic techniques has been investigated to treat toxic gas compounds in air. The treated gas in the present study is $CH_3$CN that has been known to be a simulant of toxic chemical agent. A planar type dielectric barrier discharge(DBD) reactor has been used to generate non-thermal plasma that produces various chemically active species, O, N, OH, $O_3$, ion, electrons, etc. Several different types of adsorbents and catalysts, which are MS 5A, MS 13X, Pt/alumina, are packed into the plasma reactor, and have been tested to save power consumption and to treat by-products. Various aspects of the present techniques, which are decomposition efficiencies along with the power consumption, by-product analysis, reaction pathways modified by the adsorbents and catalysts, have been discussed in the present study.

Reaction Probabilities for Three-atom Rearrangement Reaction. A + B - C = A - B + C : An Idealized Classical Approach (三原子 置煥反應의 反應確率. 간단한 古典力學的 取扱)

  • Kim Yoo Hang;Hyung Kyu Shin
    • Journal of the Korean Chemical Society
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    • v.19 no.5
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    • pp.294-303
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    • 1975
  • An idealized linear collision model has been employed to calculate the reaction probabilities for the three-atom rearrangement reaction $A+B-C{\to}A-B+C$. Potential energy surface used is also a highly idealized one with constant values. Numerical results were obtained for the system in which the atomic masses of all three atoms are the same. Potentials were varied to see the effect of the magnitude of the opposing potential barrier on the reaction probabilities. Results obtained were compared with those obtained using different models.

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A Unique Function of Reaction Path (II). Applications to Thermal Electrocyclic Reactions (반응 경로의 일의적 함수 (제 2 보). Thermal Electrocyclic Reaction 에 대한 응용)

  • Kim, Ho-Jing;Jang, Hyo-Weon
    • Journal of the Korean Chemical Society
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    • v.32 no.2
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    • pp.103-112
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    • 1988
  • For two possible paths of thermal ring opening reactions, the approximate reaction path functions, their norms and the approximate reaction path average energies are computed and compared. Illustrated examples clearly justify the postulate that the path with larger norm and lower average energy has lower barrier height than the other.

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The Rearrangement Reaction of CH3SNO2 to CH3SONO Studied by a Density Functional Theory Method

  • Choi, Yoon-Jeong;Lee, Yoon-Sup
    • Bulletin of the Korean Chemical Society
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    • v.25 no.11
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    • pp.1657-1660
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    • 2004
  • Several critical geometries associated with the rearrangement of $CH_3SNO_2\;to\;CH_3SONO$ are calculated with the density functional theory (DFT) method and compared with those of the ab initio molecular orbital methods. There are two probable pathways for this rearrangement, one involving the transition state of an oxygen migration and the other through the homolytic decomposition to radicals. The reaction barrier via the transition state is about 60 kcal/mol and the decomposition energy into radicals about 35 kcal/mol, suggesting that the reaction pathway via the homolytic cleavage to radical species is energetically favorable. Since even the homolytic cleavage requires large energies, the rearrangement reaction is unlikely without the aid of catalysts.

Application of Reaction Path Smoluchowski Equation Formalism to the Photoisomerization of Trans-Stilbene

  • Kim, Dong-Sup;Lee, Sang-Youb
    • Bulletin of the Korean Chemical Society
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    • v.12 no.6
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    • pp.692-698
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    • 1991
  • The reaction path Smoluchowski equation approach developed in a recent work to calculate the rate constant for a diffusive multidimensional barrier crossing process is extended to incorporate the configuration-dependent diffusion matrix. The resulting formalism is then applied to the investigation of stilbene photoisomerization dynamics. Adapting a model two-dimensional potential and a model diffusion matrix proposed by Agmon and Kosloff [J. Phys. Chem.,91 (1987) 1988], we derive an eigenvalue equlation for the relaxation rate constant of the stilbene photoisomerization. This eigenvalue equation is solved numerically by using the finite element method. The advantages and limitations of the present method are discussed.

Evaluation of Microcanonical Rate Constants by Semiclassical Boundary Conditions : Early Asymptotic Analysis

  • Sungyul Lee
    • Bulletin of the Korean Chemical Society
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    • v.13 no.5
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    • pp.538-541
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    • 1992
  • An approximate scheme for evaluating total reaction probability is proposed. Semiclassical boundary conditions are imposed well before the asymptotic region in the reactant and product channels to calculate the Green's function and its derivatives. Propagations are confined to a limited regime near the activated complex. Calculations are made for one dimensional Eckart barrier model of H + $H_2$ reaction. Implications of the procedure in multi-dimensional systems are discussed.

An Analysis of Vacuum Plasma Phenomena in DBD(Dielectric Barrier Discharges) (DBD(Dielectric Barrier Discharges)에서 전공 플라즈마 발생에 대한 해석적 연구)

  • Shin, Myoung-Soo;Cha, Sung-Hoon;Kim, Jong-Bong;Kim, Jong-Ho;Kim, Seong-Young;Lee, Hye-Jin
    • Journal of the Korean Society for Precision Engineering
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    • v.26 no.3
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    • pp.122-128
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    • 2009
  • DBD(Dielectric Barrier Discharges) plasma is often used to clean the surface of semiconductor. The cleaning performance is affected mainly by plasma density and duration time. In this study, the plasma density is predicted by coupled simulation of flow, chemistry mixing and reaction, plasma, and electric field. 13.56 MHz of RF source is used to generate plasma. The effect of dielectric thickness, gap distance, and flow velocity on plasma density is investigated. It is shown that the plasma density increases as the dielectric thickness decreases and the gap distance increases.