• 조명전기설비학회논문지
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• 제18권5호
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• pp.35-41
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• 2004

본 연구에서 사용된 방전 기체는 오염물의 제거 및 박막 표면 정제 등의 연구 분야에 응용되고 있는 질소 가스를 사용하였으며, 1차원 동심구 모델의 개발로 인하여, 접지 면적을 넓게 함에 따라 경방향으로의 플라즈마 분포가 중심축의 분포와 동일하다는 1차원적 가정이 적절하지 못하다는 Barnes 모델을 보완할 수 있었다. 일정한 인가 전압하에서는 입체각($\omega$)의 증가에 따라 질소 플라즈마를 구성하는 각 입자의 수밀도 분포, 전계 및 포텐셜이 감소함을 볼 수 있었다. 그러나 면적비가 증가하면서 구동 전극에서의 각 입자들의 움직임은 상대적으로 높은 전계로부터 더욱 활발하게 형성됨에 따라 직렬 연결된 블로킹 콘덴서에서 발생하는 자기 바이어스 전압은 증가하는 것을 알 수 있었다.

• 천문학논총
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• 제30권2호
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• pp.453-455
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• 2015

In this paper we introduce the Plasma Physics of Active Galactic Nuclei project, which is an ongoing experiment with Korean VLBI Network (KVN) and KVN and VERA Array (KaVA) to study multi-frequency polarimetric properties on parsec scales of active galaxies. The goal of the project is to improve our understanding of fundamental jet physics, especially evolution of the relativistic outflow coupled with the large-scale magnetic field. We selected six radio-loud AGN as our targets. So far we (i) detected resolved emissions regions at 86 and 129 GHz on VLBI scales, (ii) constructed 2D spectral index maps of the outflows, and (iii) found polarizations at 22 and 43 GHz for a few targets. Here we present spectral index distributions of 3C 120 between 22 and 43 GHz and a linear polarization map of BL Lac at 43 GHz obtained with KVN.

• Applied Science and Convergence Technology
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• 제23권6호
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• pp.357-365
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• 2014

A non-invasive method for ion energy distribution measurement at a RF biased surface is proposed for monitoring the property of ion bombardments in capacitively coupled plasma sources. To obtain the ion energy distribution, the measured electrode voltage is analyzed based on the circuit model which is developed with the linearized sheath capacitance on the assumption that the RF driven sheath behaves like a simple diode for a bias power whose frequency is much lower than the ion plasma frequency. The method is verified by comparing the ion energy distribution function obtained from the proposed model with the experimental result taken from the ion energy analyzer in a dual cathode capacitively coupled plasma source driven by a 100 MHz source power and a 400 kHz bias power.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.290-290
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• 2011

In this study Diamond-like carbon (DLC) films were deposited on p-type Si substrates using a Radio-Frequency magnetron Sputtering system. The DLC film was deposited by bombarding graphite target with a N2/Ar plasma mixture with various conditions: substrate, pressure, deposition time, temperature of substrate, power and ratio of gas mixture. The effect on the conduction and hardness of DLC thin films were investigated. The conduction of DLC films were measured by I-V measurement. In addition, Raman analysis was performed to study the chemical bonding structure. The hardness was measured by Nano indentation. Atomic Force Microscopy was used for determined surface morphology of DLC film.

• 반도체디스플레이기술학회지
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• 제22권2호
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• pp.64-71
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• 2023

If an impedance mismatch occurs between the source and load in a Radio Frequency transmission system, reflected power is generated. This results in incomplete power transmission and the generation of Reflected Power, which returns to the Radio Frequency generator. To minimize this Reflected Power, Impedance matching is performed. Fast and efficient Impedance matching, along with converging reflected power towards zero, is advantageous for achieving desired plasma characteristics in semiconductor processes. This paper explores Impedance matching by adjusting the Vacuum Variable Capacitor of an L-type Matching Module based on the trends observed in the voltage of the Phase Sensor and Electromotive Force voltage. After assessing the impedance matching characteristics, the findings are described.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.135.1-135.1
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• 2014

Silicon nanoparticles can be synthesized in a standard radio-frequency glow discharge system at low temperature (${\sim}200^{\circ}C$). Plasma synthesis of silicon nanoparticles, initially a side effect of powder formation, has become over the years an exciting field of research which has opened the way to new opportunities in the field of materials deposition and their application to optoelectronic devices. Hydrogenated polymorphous silicon (pm-Si:H) has a peculiar microstructure, namely a small volume fraction of plasma synthesized silicon nanoparticles embedded in an amorphous matrix, which originates from the unique deposition mechanism. Detailed discussion on plasma synthesis of silicon nanoparticles, growth mechanism and photovoltaic application of pm-Si:H will be presented.

• International Journal of Precision Engineering and Manufacturing
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• 제9권2호
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• pp.39-43
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• 2008

Atmospheric pressure plasma polishing (APPP) is a noncontact precision machining technology that uses low temperature plasma chemical reactions to perform atom-scale material removal. APPP is a complicated process, which is affected by many factors. Through a preliminary theoretical analysis and simulation, we confirmed that some of the key factors are the radio frequency (RF) power, the working distance, and the gas ratio. We studied the influence of the RF power and gas ratio on the removal rate using atomic emission spectroscopy, and determined the removal profiles in actual operation using a commercial form talysurf. The experimental results agreed closely with the theoretical simulations and confirmed the effect of the working distance. Finally, we determined the element compositions of the machined surfaces under different gas ratios using X-ray photoelectron spectroscopy to study the influence of the gas ratio in more detail. We achieved a surface roughness of Ra 0.6 nm on silicon wafers with a peak removal rate of approximately 32 $mm^{3}$/min.

• 반도체디스플레이기술학회지
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• 제19권3호
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• pp.43-48
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• 2020

The demand for stable plasma has been on the rise because of the increased delivery power amount in the chamber for improving productivity, and fast and accurate plasma impedance matching become a crucial performance measure for radio frequency (RF) power system in semiconductor manufacturing equipment. In this paper, the overall impedance matching was understood, and voltage and current values were extracted with voltage - current (VI) probe to measure plasma impedance in real-time. Actual matching data were analyzed to derive calibration coefficient for V and I measurements to understand the characteristics of VI probe, and we demonstrated the tendency of RF impedance matching according to changes in load impedance. This preliminary empirical research can contribute to fast RF matching as well as advanced equipment control for the next level of detailed investigation on embedded system based-RF matching controller.

• KIEE International Transaction on Systems and Control
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• 제2D권2호
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• pp.120-124
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• 2002

A new methodology is presented to diagnose faults in equipment plasma. This is accomplished by using neural networks as a pattern recognizer of radio frequency (rf) impedance match data. Using a match monitor system, the match data were collected. The monitor system consisted mainly of a multifunction board and a signal flow diagram coded by Visual Designer. Plasma anomaly was effectively represented by electrical match positions. Twenty sets of fault-symptom patterns were experimentally simulated with variations in process factors, which include rf source power, pressure, Ar, and $O_$2 flow rates. As an input to neural networks, two means and standard deviations of positions were used as well as a reflected power. Diagnostic accuracy was measured as a function of training factors, which include the number of hidden neurons, the magnitude of initial weights, and two gradients of neuron activation functions. The accuracy was the most sensitive to the number of hidden neurons. Interaction effects on the accuracy were also examined by performing a 2$^$4 full factorial experiment. The experiments were performed on multipole inductively coupled plasma equipment.

• 한국추진공학회:학술대회논문집
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• 한국추진공학회 2004년도 제22회 춘계학술대회논문집
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• pp.251-256
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• 2004

A concept in which laser-sustained plasmas (LSPs) are combined with inductively coupled plasmas (ICPs) is proposed. The concept is aiming at extensions of operative conditions of a CW laser thruster due to the fact that the ICP has some characteristics which are in contrast to those of LSPs. An estimation confirmed that the concept would effectively work. And a fundamental experiment was conducted. The results showed that the radio frequency magnetic field induced by a alternate current of 13.56 MHz coupled inductively with LSPs, resulting in the enlargement of the plasma region and the attainment of the enthalpy. It is expected that some improvements will enable to transfer the RF power to the work gas more effectively and to demonstrate the synergy effect between the LSPs and the ICPs.