1 |
H. Sugai and K. Nakamura, "Recent Innovations in Microwave Probes for Reactive Plasma Diagnostics," Jpn. J. Appl. Phys., Vol. 58, No. 6, pp. 060101:1-19, 2019.
|
2 |
J. Kim and S. W. Lee, "Impedance Matching Method and Impedance Matching System," Kor. Patent 10-1544975, Aug.,10, 2015.
|
3 |
Y. Lee, W. Song and S. J. Hong, "In situ monitoring of plasma ignition step in capacitively coupled plasma systems," Jpn. J. Appl. Phys., Vol. 59, No. JS, pp. SJJD02:1-6, 2020.
|
4 |
Y. C. Jang, S. H. Park, S. M. Jeong, S. W. Ryu, G. H. Kim, "Role of Features in Plasma Information Based Virtual Metrology (PI-VM) for SiO2 Etching Depth," J. Semi. Disp. Technol., Vol. 18, No. 4, pp. 30-34, 2019.
|
5 |
K. H. Jang, S.-Y. Park, J.-J. Cho, and D.-H. Lee "Error Rate Enhancement Algorithm for 13.56 MHz Impedance Automatic Matching System," J. Kor. Inst. Electromagnetic Eng. Sci., Vol. 29, No. 7, pp. 55-60, 2020.
|
6 |
H.C. Wang and H.I. Seo, “RF Loss Miniaturization Method Using High Impedance Filter for Research,” J. Semi. Disp. Technol., Vol. 19, No. 1, pp. 30-34, 2019.
|
7 |
J. H. Kim, S.W. Lee, and Y. K. Lee, "Impedance Matching Method and Electrical Equipment for this Method," Kor. Patent 10-0895689, April, 23, 2009
|
8 |
N. Manabu and H. Naoya "Matcher and matching method," Kor. Patent 10-1829563, Feb, 24, 2015
|
9 |
S. M. Rossnagel, “Sputter Deposition for Semiconductor Manufacturing,” IBM J. Research and Development, Vol. 43, No. 1.2, pp. 163-179, 1999.
DOI
|
10 |
D. K. Choi, C. Y. Won, "High Frequency Power Unit and Impedance Matching," The Korean Institute of Illuminating and Electrical Installation Engineers, pp.23-28, 2002
|
11 |
H. C. Wang and H. I. Seo, “RF Loss Minimization Method Using High Impedance Filter for Research,” J. Semiconductor & Display Technology, Vol. 19, No. 1, pp. 56-60, 2020.
|