• 전력전자학회논문지
• /
• 제24권3호
• /
• pp.161-168
• /
• 2019

This study introduces a new topology to decrease the voltage stress experienced by a 13.56 MHz electrical variable capacitor (EVC) circuit with an asymmetrical switch structure applied to the impedance matching circuit of a radio frequency (RF) plasma system. The method adopts a symmetrical switch structure instead of an asymmetrical one in each of the capacitor's leg in the EVC circuit. The proposed topology successfully reduces voltage stress in the EVC circuit due to the symmetrical charging and discharging mode. This topology can also be applied to the impedance matching circuit of a high-power and high-frequency RF etching system. The target features of the proposed circuit topology are investigated via simulation and experiment. Voltage stress on the switch of the EVC circuit is successfully reduced by more than 40%.

• 한국통신학회논문지
• /
• 제37C권12호
• /
• pp.1211-1221
• /
• 2012

본 논문은 30 MHz 이하에서 동작하는 유도성 시스템과 전파통신 서비스의 공존을 위해서, 유도성 시스템의 간섭으로부터 전파통신 서비스를 보호하기 위한 보호 거리에 관한 것이다. 보호 거리 산출을 위해 유도성 시스템과 전파통신 서비스 간의 간섭 시나리오 모델을 제시하고 이를 기반으로 유도성 시스템의 방사 전력과 희생원의 허용 가능한 전계 강도를 비교하여 적용된 전파 모델에 따른 보호 거리를 산출하는 방법을 제안하였으며 이 방법을 적용한 RFID(Radio Frequency IDentification), PDP(Plasma Display Panel) TV의 간섭 분석을 통해, 30 MHz 이하의 전파통신 서비스 보호를 위한 보호 거리를 도출하였다. 제안한 방법은 2012년 6월 SG(Study Group) 1 회의에서 ISM 기기에 대한 결의 63과 관련된 ITU-R 권고서로 채택되어 유도성 시스템뿐만 아니라 무선전력 전송 및 전력선 통신 등에 의한 간섭 영향 분석에 활용될 전망이다.

• Applied Science and Convergence Technology
• /
• 제25권4호
• /
• pp.73-76
• /
• 2016

Multi-layer films of $SiN_x/SiO_x$/InSnO with anti-reflective effect were grown by new-concept plasma enhanced chemical vapor deposition system (PECVD) with hybrid plasma source (HPS). Anti-reflective effect of $SiN_x/SiO_x$/InSnO was investigated as a function of ratio of $SiN_x$ and $SiO_x$ thickness. Multi-layers deposited by PECVD with HPS represents the enhancement of anti-reflective effect with high transmittance, comparing to the layers by conventional radio frequency (RF) sputtering system. This change is strongly related to the optical and physical properties of each layer, such as refractive index, composition, film density, and surface roughness depending on the deposition system.

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
• /
• pp.1211-1214
• /
• 2005

One of the important problems in recent AC-PDP technology is high efficiency. In this research, we have been investigated electro-optical characteristics of MgO protective layer after radio frequency(RF) plasma treatment using Ar, $O_2$, and $H_2$ gases. The breakdown voltage order was $O_2$ > Ar > Nontreatment > $H_2$. Also, brightness order was $O_2$ > Ar > Non-treatment > $H_2$. In this experiment, the best result was obtained after $O_2-plasma$ treatment.

• 대한전기학회:학술대회논문집
• /
• 대한전기학회 1999년도 추계학술대회 논문집 학회본부 C
• /
• pp.1066-1068
• /
• 1999

Magnetic field is commonly used in low temperature processing plasmas in order to obtain high density. E $\times$ B magnetron or surface multipole configuration were most popular. However, the properties of capacitively coupled rf plasma confined by axially applied static magnetic fields have rarely been studied. In this paper, the effects of magnetic field on the characteristics of 13.56MHz/40KHz argon plasma will be reported. Ion saturation current, electron temperature and plasma potential were measured by Langmuir probe and omissive probe. At low pressure region ($\sim$10mTorr), ion current was increased by a factor of 3 - 4 due to reduction of diffusion loss of charged particles to the wall. It was observed that magnetic field induces large time variation of the plasma potential. The experimental result was compared with particle-in-cell simulation. It was also observed that electron temperature tend to decrease with increasing magnetic induction level for 40KHz discharge.

• Transactions on Electrical and Electronic Materials
• /
• 제12권4호
• /
• pp.144-147
• /
• 2011

In this work, we present a study regarding the etching characteristics on titanium nitride (TiN) thin films using an inductively coupled plasma system. The TiN thin film was etched using a $N_2/BCl_3$/Ar plasma. The studied etching parameters were the gas mixing ratio, the radio frequency (RF) power, the direct current (DC)-bias voltages, and the process pressures. The baseline conditions were as follows: RF power = 500 W, DC-bias voltage = -150 V, substrate temperature = $40^{\circ}C$, and process pressure = 15 mTorr. The maximum etch rate and the selectivity of the TiN to the $SiO_2$ thin film were 62.38 nm/min and 5.7, respectively. The X-ray photoelectron spectroscopy results showed no accumulation of etching byproducts from the etched surface of the TiN thin film. Based on the experimental results, the etched TiN thin film was obtained by the chemical etching found in the reactive ion etching mechanism.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
• /
• pp.489.1-489.1
• /
• 2014

Plasma Enhanced Chemical Vapor Deposition (PECVD) 장치를 통하여 증착된 수소화된 질화막(SiNx:H)은 결정질 태양전지의 반사방지막과 패시베이션 층으로 널리 사용되고 있다. 본 연구에서는 PECVD 장치내에 플라즈마를 형성하는 무선주파수(Radio Frequency)를 다양하게 변화시켜 수소화된 실리콘 질화막의 경향성을 알아보고 각 무선주파수에서 최적화된 패시베이션층을 태양전지에 적용하여 그 특성들을 분석하였다. 다양한 무선주파수 범위는 고주파(High Frequency: 13.56 MHz), 저주파 (Low Frequency: 440 kHZ) 그리고 혼합주파(Dual Frequency: 13.56 MHz + 440 kHz)를 각각 이용하여 수소화된 질화막을 증착 하였으며 $156{\times}156mm$ 대면적 결정질 실리콘 태양전지를 제작하여 비교하였다.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
• /
• pp.179-179
• /
• 2016

A radio-frequency (RF) Inductively Coupled Plasma (ICP) torch system was used for boron-nitride nano-tube (BNNT) synthesis. Because of electrodeless plasma generation, no electrode pollution and effective heating transfer during nano-material synthesis can be realized. For stable plasma generation, argon and nitrogen gases were injected with 60 kW grid power in the difference pressure from 200 Torr to 630 Torr. Varying hydrogen gas flow rate from 0 to 20 slpm, the electrical and optical plasma properties were investigated. Through the spectroscopic analysis of atomic argon line, hydrogen line and nitrogen molecular band, we investigated the plasma electron excitation temperature, gas temperature and electron density. Based on the plasma characterization, we performed the synthesis of BNNT by inserting 0.5~1 um hexagonal-boron nitride (h-BN) powder into the plasma. We analysis the structure characterization of BNNT by SEM (Scanning Electron Microscopy) and TEM (Transmission Electron Microscopy), also grasp the ingredient of BNNT by EELS (Electron Energy Loss Spectroscopy) and Raman spectroscopy. We treated bundles of BNNT with the atmospheric pressure plasma, so that we grow the surface morphology in the water attachment of BNNT. We reduce the advancing contact angle to purity bundles of BNNT.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 1996년도 제11회 학술발표회 논문개요집
• /
• pp.34-35
• /
• 1996

• 한국원자력학회:학술대회논문집
• /
• 한국원자력학회 1998년도 춘계학술발표회논문집(2)
• /
• pp.935-940
• /
• 1998

The Korea Superconducting Tokamak Research (KSTAR) tokamak will have 6 MW of radio-frequency (rf) heating in the ion cyclotron range of frequencies (ICRF). The response of the antenna to the heat loads is analyzed and the resulting stresses in the Faraday shield during the normal operation is calculated. Various heat loading conditions including in the analyzes are the heat loads from the plasma, the ripple-trapped beam particles and the rf loss.