• Title/Summary/Keyword: RF 특성

Search Result 3,127, Processing Time 0.032 seconds

RF Magnetron Sputter로 증착 한 HfN 박막의 Plasma Power 변화에 따른 Nano-electroribology 특성 변화 연구

  • Park, Myeong-Jun;Kim, Seong-Jun;Kim, Su-In;Lee, Chang-U
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2014.02a
    • /
    • pp.354.2-354.2
    • /
    • 2014
  • 최근 반도체 산업의 발전에 따라 반도체 소자 내 배선재료로 사용되던 Aluminium (Al)의 대체물로 Copper (Cu)가 사용되고 있다. Cu는 Al보다 우수한 전도성과 비용이 저렴하다는 장점이 있으나 반도체 기판과의 확산으로 이를 해결해야만 하는 문제점이 있다. 이는 Si와 Cu사이에 확산방지막을 사용하여 해결할 수 있는데 Hafnium Nitride (HfN) 박막은 다른 물질과 비교해 고온에서의 안정성과 낮은 비저항을 가지고 있어 주목을 받고 있다. 본 연구에서는 rf magnetron sputter 방법으로 박막 증착 시에 인가하는 rf power가 박막의 표면 특성에 어떠한 영향을 미치는지 nano-indenter를 사용해 surface hardness와 elastic modulus의 변화를 중심으로 알아보았다. 시료는 rf magnetron sputter로 증착 시 인가하는 plasma power를 60W와 80W로 달리하여 증착하였다. 증착가스는 Ar과 $N_2$를 조절하여 사용하였고 총 유량을 40 sccm 으로 고정하였으며, 이 때 압력은 3mTorr로 유지하였다. 실험결과 plasma power를 80W로 인가하여 증착한 시료의 surface hardness (18.48 GPa)가 60W로 증착한 시료의 surface hardness (12.03 GPa)보다 큰 값을 나타내었다. 이와 마찬가지로 80W로 증착한 시료의 elastic modulus(187.16 GPa)도 60W로 증착한 시료의 탄성계수 (141.15 GPa)보다 큰 값을 나타내었다. 이는 증착 시 인가하는 plasma power의 크기가 증가하면 박막표면에 compressive stress가 생성되어 박막의 surface hardness와 elastic modulus가 상대적으로 높게 측정되는 것으로 생각된다.

  • PDF

Optical Properties of Organic Light Emitting Diode and Characteristics of ITO by Variation of Radio Frequency Plasma Power (Radio Frequency Plasma Power변화에 따른 ITO 특성 및 OLED의 광학적 특성)

  • Ki, Hyun-Chul;Kim, Hwe-Jong;Hong, Kyung-Jin;Kim, En-Mei;Gu, Hal-Bon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.22 no.1
    • /
    • pp.81-85
    • /
    • 2009
  • We has been analysed optical properties of OLED(organic light emitting diode) and characteristics of ITO(Indium Tin Oxide) in terms of $O_2$ plasma treatment for manufacturing high efficiency OLED, RF power of $O_2$ plasma was changed 25, 50, 100, 200 W. $O_2$ gas flow, gas pressure and treatment time were fixed. Sheet resistance and surface roughness of ITO were measured by Hall-effect measurement system and AFM, respectively. The ranges of sheet resistance and surface roughness were $5.5{\sim}6,06\;{\Omega}$ and $2.438{\sim}3.506\;nm$ changing of RF power, respectively, PM(Passive Matrix)OLED was fabricated with the structure of ITO(plasm treatment)/TPD($400\;{\AA}$)/$Alq_3(600\;{\AA})$/LiF($5\;{\AA}$)/Al($1200\;{\AA}$). Turn-on voltage of PMOLED was 7 V and luminance was $7,371\;cd/m^2$ at the RF power of 25 W, $O_2$ plasma treatment of ITO surface was result in lowering the operating voltage and improving luminance of PMOLED.

Effects of RF Power, Substrate Temperature and Gas Flow Ratio on the Mechanical Properties of WCx Films Deposited by Reactive Sputtering (반응성 스퍼터링법에서의 RF전력, 기판온도 및 가스유량비가 WCx막의 기계적 특성에 끼치는 효과)

  • Park Y. K.;Lee C. M.
    • Korean Journal of Materials Research
    • /
    • v.15 no.10
    • /
    • pp.621-625
    • /
    • 2005
  • Effects of rf power, pressure, sputtering gas composition, and substrate temperature on the deposition rate of the $WC_x$ coatings were investigated. The effects of rf power and sputtering gas composition on the hardness and corrosion resistance of the $WC_x$ coatings deposited by reactive sputtering were also investigated. X-ray diffraction (XRD) and Auger electron spectroscopy (AES) analyses were performed to determine the structures and compositions of the films, respectively. The hardnesses of the films were investigated using a nanoindenter, scanning electron microscopy, ana a salt-spray test, respectively. The deposition rate of the films was proportional to rf power and inversely proportional to the $CH_4$ content of $Ar/CH_4$ sputtering gas. The deposition rate linearly increased with increasing chamber pressure. The hardness of the $WC_x$ coatings Increased as rf power increased. The highest hardness was obtained at a $Ar/CH_4$ concentration of $10 vol.\%$ in the sputtering gas. The hardness of the $WC_x$ film deposited under optimal conditions was found to be much higher than that of the electroplated chromium film, although the corrosion resistance of the former was slightly lower than that of the latter.

A Cathode Ripple Resolution Method on 600W SHF TWTA for Satellite Communications (위성통신용 600W급 SHF대역 진행파관 증폭기 캐소드 리플 특성 개선방안)

  • Hong, In-Pyo
    • The Journal of Korean Institute of Communications and Information Sciences
    • /
    • v.31 no.1A
    • /
    • pp.48-57
    • /
    • 2006
  • TWTA is to perform the function that amplifies the input RF signal and outputs it to the antenna. This paper proposes a method that is to improve the cathode ripple or the SHF TWTA for satellite communications. Through the embodiment and experiment of 600W SHF TWTA, this method satisfies the design specifications. Also, RF performance is improved by reducing the noise of auxiliary power sources supplied to the RF part and eliminating the unexpected noise. Therefore, this method is very effective and can be used to develop the similar equipments.

Characteristic Investigation on Super-Hydrophobicity of PTFE Thin Films Deposited on Al Substrates Using RF-Magnetron Sputtering Method (고주파 마그네트론 스퍼터링 방법을 사용하여 Al 기판위에 증착된 PTFE 박막의 초-발수에 관한 특성 연구)

  • Bae, Kang;Kim, Hwa-Min
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.24 no.1
    • /
    • pp.64-69
    • /
    • 2011
  • Super-hydrophobic properties have been achieved on the rf-sputtered polytetrafluoroethylene(PTFE) films deposited on etched aluminum surfaces. The microstructural evolution created after etching has been investigated by FESEM. The water contact angle over $160^{\circ}$ can be achieved on the rf-sputtered ultra-tihn PTFE film less than 10 nm coated on aluminum surface etched with 7 wt.%, 12.5 wt.%, and 15 wt.% HCl concentration for 12 min. XPS analysis have revealed the presence of a large quantity of $-CF_3$ and $-CF_2$ groups in the rf-sputtered PTFE films that effectively can reduce the surface energy of etched aluminum. The presence of patterned morphology along with the low surface energy at the rf-sputtered PTFE coating makes the aluminum surface with high super-hydrophobic property.

An Implementation of Miniature RF Transmitter Module for ITS Applications by Using LTCC Technique (LTCC 기법을 이용한 ITS용 초소형 RF 송신기 모듈의 구현)

  • Yun Gi-Ho
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
    • /
    • v.16 no.10 s.101
    • /
    • pp.1020-1027
    • /
    • 2005
  • In this paper, economic miniature RF transmitter module for intelligent transportation system(ITS) is described. This module which consists of ASK modulator, frequency synthesizer, power amplifier is operating at 5.8 GHz frequency band and implemented by using LTCC process technique. Thus, ultra small size of 0.8 CC and improved electrical performances has been obtained. From the test results, transmitting characteristics of 10 dBm ouput power and -46 dBc interchannel interference with 1.024 Mbps ASK modulated have been shown. Frequency synthesizer as a transmitting signal source reveals very short locking time of 26 usec and outstanding phase noise of -115 dBc/Hz at 1 MHz offset from 5.8 GHz center frequency.

Design and Fabrication of a Wideband Single-Balanced-Mixer using Planar Balun (평판형 발룬을 이용한 단일 평형 광대역 주파수 혼합기의 설계 및 제작)

  • 김성민;정재호;최현철
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
    • /
    • v.10 no.1
    • /
    • pp.90-98
    • /
    • 1999
  • This paper presents a wideband single-balanced mixer using a diode which can be used in RF receiver of microwave measurement systems. For wideband characteristic, local oscillator(LO) signal is provided to diode with low loss using a coplanar waveguide-to-slotline balun. For high isolation characteristic radio frequency (RF) port and intermediate frequency (IF) port are designed using directional coupler. This mixer presents 30.5~31.17dB conversion loss whose flatness is within 1dB for 9 kHz~2.6 GHz wideband RF signal, and above 30 dB isolation for LO signal.

  • PDF

RF Magnetron Sputtering법으로 제작된 비정질 산화물 반도체 IGZO 박막의 특성

  • Jin, Chang-Hyeon;Kim, Hong-Bae
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2014.02a
    • /
    • pp.338.1-338.1
    • /
    • 2014
  • 비정질 산화물 반도체(Amorphous Oxide Smeiconcuctor)를 이용하여 투명 박막 트랜지스터의 채널층으로 많은 연구가 진행되고 있다. 투명 박막 트랜지스터의 채널층으로 사용되고 있는 IGZO박막은 비정질임에도 불구하고 높은 이동도와 넓은 밴드갭을 갖고 있는 것으로 알려져 있다. 본 연구는 RF magnetron sputtering법으로 유리기판 위에 IGZO박막을 증착시켰으며 소결된 타겟으로는 In:Ga:ZnO를 각각 1:1:2mol%의 조성비로 혼합하여 이용하였으며, $30{\times}30mm$의 XG Glass 유리기판에 sputtering 방식으로 증착하였다. 박막 증착 조건은 초기압력 $3.0{\times}10^{-6}Torr$, 증착 압력 20mTorr, 반응가스 Ar 25sccm, 공정 변수로는 RF Power 25W, 50W, 75W, 100W 각각 변화를 주어 실험을 진행 하였으며, 증착온도는 실온으로 고정 하였다. 분석 결과로 RF Power 25W 일 때 XRD 분석결과 Bragg's 법칙을 만족하는 피크가 나타나지 않는 비정질 구조임을 확인하였으며, AFM 분석결과 0.5 mm 이하의 Roughness를 가졌다. UV-Visible-NIR 측정 결과 가시광선 영역에서 87%이상의 투과도를 나타냈으며, Hall 측정 결과 Carrier concentration $3.31{\times}10^{19}$, Mobility $10.9cm^2/V.s$, Resistivity $1.8{\times}10^{-2}$, 투명 박막 트랜지스터의 채널층으로 사용 가능함을 확인 할 수 있었다.

  • PDF

A Study on the Low Elevation Target Tracking under Multipath Conditions Using Laser Tracking System (레이저 추적기를 이용한 저고도 비행체 추적 기법 연구)

  • Yoo, Seung-Oh
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
    • /
    • v.26 no.6
    • /
    • pp.572-580
    • /
    • 2015
  • RF skin tracking of instrumentation RADAR cannot acquire stable track data, because of effect of multipath interference especially elevation direction. In this paper, low altitude target tracking method using laser tracking system is suggested to overcome this restriction. The effect of multipath can be reduced by increasing angle resolution with laser characteristics of very short pulse and narrow beamwidth. RF skin track, beacon track and laser track data for the integrated calibration target on the ground and target ship on the sea are gathered. And they are compared and analyzed to confirm the performance of laser tracking system. As a result, it shows that the suggested laser track method has better performance than RF skin track under multipath conditions.

Design and Implementation of Base Station Transceiver for Wideband CDMA PCS System (Wideband CDMA PCS 기지국용 송수신기 설계 및 구현)

  • 정영준;김봉겸;이일규;박재홍
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
    • /
    • v.8 no.1
    • /
    • pp.61-72
    • /
    • 1997
  • The implementation of base station transceiver for Wideband CDMA(Code Division Multiple Access) PCS(Personal Communication Service) system using spread spectrum CDMA technology is presented in this paper. The receiver that requires wide dynamic range and high sensitivity and the transmitter that has good spurious emission supression were designed and implemented with 5 MHz RF channel bandwidth. This paper shows the some factors that should be considered and simulated using the RF simulation S/W with commercial and customized components. The implemented transceiver based on the simulation gave good results that satisfied the functional specifications of the transceiver.

  • PDF