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http://dx.doi.org/10.4313/JKEM.2011.24.1.64

Characteristic Investigation on Super-Hydrophobicity of PTFE Thin Films Deposited on Al Substrates Using RF-Magnetron Sputtering Method  

Bae, Kang (Department of Electronic Engineering, Catholic University of Daegu)
Kim, Hwa-Min (Department of Electronic Engineering, Catholic University of Daegu)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.24, no.1, 2011 , pp. 64-69 More about this Journal
Abstract
Super-hydrophobic properties have been achieved on the rf-sputtered polytetrafluoroethylene(PTFE) films deposited on etched aluminum surfaces. The microstructural evolution created after etching has been investigated by FESEM. The water contact angle over $160^{\circ}$ can be achieved on the rf-sputtered ultra-tihn PTFE film less than 10 nm coated on aluminum surface etched with 7 wt.%, 12.5 wt.%, and 15 wt.% HCl concentration for 12 min. XPS analysis have revealed the presence of a large quantity of $-CF_3$ and $-CF_2$ groups in the rf-sputtered PTFE films that effectively can reduce the surface energy of etched aluminum. The presence of patterned morphology along with the low surface energy at the rf-sputtered PTFE coating makes the aluminum surface with high super-hydrophobic property.
Keywords
PTFE; Rf-magnetron sputtering; Super-hydrophobicity; HCl; Contact angle;
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