• Journal of the Korean institute of surface engineering
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• v.25 no.5
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• pp.271-281
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• 1992

Amorphous hydrogenated silicon carbide(a-Si1-xCx : H) films have been prepared by the rf sputtering using a silicon target in a gas mixture of Argon and methane with varying methane gas flow rate(fCH) in the range of 1.5 to 3.5 sccm at constant Argon flow rate of 30sccm and rf power in the range of 3 to 6 W/$\textrm{cm}^2$. The effects of methane flow rate and rf power on the structure and optical properties of a-Si1-xCx : H films have been analysed by measuring both the IR absorption spectrum and the UV transmittance for the films. With increasing the methane flow rate, the optical band gap(Eg) of a-Si1-xCx : H films increases gradually from 1.6eV to the maximum value of 2.42eV at rf power of 4 W/$\textrm{cm}^2$, which is due to an increases in C/Si ratio in the films by an significant increase in the number of C-Hn bonds. As the rf power increases, the number of Si-C and Si-Hn bonds increases rapidly with simultaneous reduction in the number of C-Hn bonds, which is associated with an increase in both degree of methane decomposition and sputtering of silicon. The effects of rf power on the Eg of films are considerably influenced by the methane flow rate. At low methane flow rate, the Eg of films decreased from 2.3eV to 1.8eV with the rf power. On the other hand, at high methane flow rate, that of films increased slowly to 2.4eV.

• Transactions on Electrical and Electronic Materials
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• v.5 no.4
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• pp.153-157
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• 2004

ITO thin films were deposited on PET and soda-lime glass substrates by a dc reactive magnetron sputtering of In-Sn alloy metal target without substrate heater and post-deposition thermal treatment. The dependency of rf-bias voltage and substrate power during deposition processing was investigated to control the electrical and optical properties of ITO films. The range of rf bias voltage is from 0 to -80 V and the substrate power is applied from 10 to 50 W. The minimum resistivity of ITO film is 5.4${\times}$10$^{-4}$ $\Omega$cm at 50 W power and rf-bias voltage of -20 V. The best transmittance of ITO films at 550 nm wavelength is 91 % in the substrate power of 30 W and rf-bias voltage of -80 V.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2014.11a
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• pp.254-255
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• 2014

RF magnetron sputtering법으로 증착한 비정질 IGZO 박막과 이를 Active layer로 이용한 TFT의 Transfer 특성에 대한 RF Power의 영향에 대해 연구하였다. Carrier concentration은 Sputtering 공정 중에 산소 분압으로 조절하였다. RF Power가 75에서 150W로 증가할수록 IGZO 박막의 Roughness는 12.2에서 $6.5{\AA}$ 감소하였고 Density는 6.0에서 $6.1g/cm^3$로 증가하였다. 또한, 모든 IGZO 박막은 가시광 영역에서 85% 이상의 투과율을 보였고 Optical band gap은 미세하게 감소하였다. RF Power가 증가할수록 a-IGZO TFT의 Threshold voltage는 0.9에서 7V로 증가하였고, Subthreshold slope은 0.3에서 0.8 V/decade로 증가하였다. 하지만 Mobility는 11에서 $19cm^2/V{\cdot}s$로 증가하였다.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.48 no.9
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• pp.1-5
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• 2011

In this paper, we investigated the characteristics of AlGaN/GaN HEMTs to optimize their DC and RF characteristics by using a two-dimensional device simulator. First, we analyzed the variation of the DC characteristics with respect to the variation of 2DEG concentrations when varying the Al mole fraction and the thickness of the AlGaN layer. Then, we examined the variation of the RF characteristics by varying the size and the location of the gate, source and drain electrodes. When the Al mole fraction increased from 0.2 to 0.45, both the transconductance and I-V characteristics increased. On the other hand, the I-V characteristics were improved but transconductance was decreased as the thickness of the AlGaN layer increased from 10nm to 50nm. In the RF characteristics, the gate length was found to be the most influential parameter, and the RF characteristics were improved when the gate length was shorten.

• Journal of the Microelectronics and Packaging Society
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• v.6 no.3
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• pp.1-7
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• 1999

A single RF transceiver evaluation board have been developed for the purpose of application to the 900MHz band transceiver contained RF-IC chip And environment test was evaluated. The RF-IC chipset includes LNA(Low Noise Amplifier), down-conversion mixer, AGC(Automatic Gain Controller), switched capacitor filter and down sampling mixer. The RF evaluation board for the testing of chipset contained various external matching circuits, filters such as RF/IF SAW(Surface Acoustic Wave) filter and duplexer and power supply circuits. With the range of 2.7~3.3V the operated chip revealed moderate power consumption of 42mA. The chip was well operated at the receiving frequency of 925~960MHz. Measurement result is similar to general RF receiving specification of the 900MHz digital mobile phone.

• Journal of Ginseng Research
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• v.21 no.1
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• pp.13-18
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• 1997

Identification and changes of physiologically active substances during chilling storage of dehisced ginseng (Panax ginseng C. A. Meyer) seeds were analyzed using various preparatory separation methods and purification columns; Dowex 50W and silica gel columns. Seven components with Rf values of 0.20, 0.40, 0.58, 0.66, and 0.70 In solvent system, $CHCl_3$:MeOH=3:1 (v/v), Rf values of 0. 63 and 0.74 in solvent system, $CHCl_3$:MeOH:$H_2O$:=7:3:1 (v/v) were obtained through Dowex 50W and silica gel column chromatographies. Two components with Rf values of 0.20 and 0.63 in the all chilling treatments were detected in the extract obtained through both chromatographies, and only the former component was gradually increased till 4 weeks of chilling storage and then rapidly decreased from 8 to 16 weeks. UV spectra of Rf values of 0.66 and 0.56 were similar to that of cytokinin, but their physiological activities were not found. Rf values of 0.20 showed activity by radish cotyledon expansion bioassay. The component with Rf value of 0.20 was revealed to have a naphthalene in the proposed chemical structure by various NMR techniques.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.32 no.3
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• pp.201-206
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• 2019

This report constitutes the first demonstration in Korea of single-crystal lateral gallium oxide ($Ga_2O_3$) as a metal-oxide-semiconductor field-effect-transistor (MOSFET), with a breakdown voltage in excess of 480 V. A Si-doped channel layer was grown on a Fe-doped semi-insulating ${\beta}-Ga_2O_3$ (010) substrate by molecular beam epitaxy. The single-crystal substrate was grown by the edge-defined film-fed growth method and wafered to a size of $10{\times}15mm^2$. Although we fabricated several types of power devices using the same process, we only report the characterization of a finger-type MOSFET with a gate length ($L_g$) of $2{\mu}m$ and a gate-drain spacing ($L_{gd}$) of $5{\mu}m$. The MOSFET showed a favorable drain current modulation according to the gate voltage swing. A complete drain current pinch-off feature was also obtained for $V_{gs}<-6V$, and the three-terminal off-state breakdown voltage was over 482 V in a $L_{gd}=5{\mu}m$ device measured in Fluorinert ambient at $V_{gs}=-10V$. A low drain leakage current of 4.7 nA at the off-state led to a high on/off drain current ratio of approximately $5.3{\times}10^5$. These device characteristics indicate the promising potential of $Ga_2O_3$-based electrical devices for next-generation high-power device applications, such as electrical autonomous vehicles, railroads, photovoltaics, renewable energy, and industry.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.30 no.4
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• pp.282-285
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• 2019

A 100-nm gate-length metamorphic high electron mobility transistor(mHEMT) with a T-shaped gate was fabricated using a two-step gate recess and characterized for DC and microwave performance. The mHEMT device exhibited DC output characteristics having drain current($I_{dss}$), an extrinsic transconductance($g_m$) of 1,090 mS/mm and a threshold voltage($V_{th}$) of -0.65 V. The $f_T$ and $f_{max}$ obtained for the 100-nm mHEMT device were 190 and 260 GHz, respectively. The developed mHEMT will be applied in fabricating W-band monolithic microwave integrated circuits(MMICs).

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.40 no.8
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• pp.555-559
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• 2003

In this paper, a new CMOS RF model for RF IC design including the capacitance effect, the skin effect, and the proximity effect between metal lines on the Si surface is proposed for tile first time for accurately predicting the RF behavior of CMOS devices. The capacitances between metal lines on the Si surface are modeled with the layout. And the skin effect is modeled with a parallel branch added in equivalent circuit of metal line. The proximity effect is modeled by adding the mutual inductance between cross-coupled inductances in the ladder circuit representation. Compared to the BSIM 3v3. the proposed RF model shows good agreements with the measured data and shows well the frequency dependent behavior of devices in GHz ranges.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.111.2-111.2
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• 2013

고주파 전자가속기는 고출력 RF 시스템으로 구동된다. 이러한 고주파 전자가속기에서 고출력 RF 시스템은 종종 고출력 방전으로 인해 가속관에 손상을 입힐 수 있기 때문에 조심스럽게 RF conditioning을 진행 하여야 한다. 일반적으로 RF conditioning은 아주 긴 시간을 필요로 하고, RF 출력을 서서히 높여가며 진행할 필요성이 있다. 한국원자력연구원에서는 9 MeV와 6 MeV 에너지를 출력하기 위해서는 가속관으로 RF 입력을 약 5.5 MW까지 RF conditioning을 진행하여야 한다. 따라서, 본 연구에서는 Klystron 최대 출력이 약 5.5 MW로 한국원자력연구원에서 개발된 S-band (2,856 MHz) RF 전자가속관에 RF conditioning을 진행 하였다. 가속관의 진공을 약 1.0e-7을 유지하면서 반복률을 10 Hz부터 180 Hz로 증가시켰고, RF 입력 파워는 약 6 MW까지 RF conditioning을 진행 하였다. 그 결과 짧은 시간에 RF commissioning을 진행할 수 있었다.