• 한국결정성장학회지
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• 제12권3호
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• pp.138-143
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• 2002

본 연구에서는 용액합성법(solution synthesis technique)에 의해 ZnS : Cu nano 입자를 합성하였고, 결정구조 및 입자형상 등의 구조적 특성과, 광흡수/투과 특성, 에너지밴드갭, 그리고 photoluminescence(PL) 여기 및 발광 특성 등의 광학적 특성을 분석하였다. 일반적인 용액상태의 화학적 합성 방법과는 달리 합성온도를 $80^{\circ}C$로하였으며, sulfur의 precursor로 thiourea를 채택하여 Cu 도핑의 용이성을 구현하였다. 합성된 undoped ZnS 와 ZnS : Cu nano 입자는 모두 cubic 구조를 가졌으며 구형입자로 합성되었고, 광흡수단의 위치도 모두 ~305 nm에 나타나서 양자사이즈효과가 발생하였음을 알 수 있었다. PL 발광강도와 반가폭은 Cu 도핑농도가 0.03M 일 때 각각 최고치와 최저치를 나타냈는데, 이와 같이 용액합성법에 의해 합성된 ZnS : Cu 에서 Cu 의 농도변화에 따른 PL 스펙트럼의 강도와 반가폭의 변화는 본 연구에서 최초로 보고되는 것이다. 광흡수단 측정 및 PL 여기 실험결과, 본 연구의 주된 발광피크인 ~510 nm 발광밴드는 Cu에 의해 에너지밴드갭 내에 형성된 발광재결합센터를 통한 것임을 알 수 있었다.

• 한국분말재료학회지
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• 제19권5호
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• pp.362-366
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• 2012

We report the effect of the chain length of carboxylic acid on the photoluminescence(PL) of $CuInS_2$/ZnS nanocrystals. $CuInS_2$/ZnS nanocrystals with emission wavelength ranging from 566 nm through 583 nm were synthesized with zinc acetate and carboxylic acids with various chain length. In this study, $CuInS_2$/ZnS nanocrystals prepared using long chain carboxylic acid showed more improved PL intensity. The origin of strong photoluminescence of the nanocrystals prepared with zinc acetate and long chain carboxylic acid was ascribed to improved size distribution due to strong reactivity between long chain carboxylic acid and zinc acetate.

• Journal of the Optical Society of Korea
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• 제18권5호
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• pp.582-588
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• 2014

We study polarization-dependent spontaneous emission (SE) rate and light extraction efficiency (LEE) in localized-surface-plasmon (LSP)-coupled light emitting diodes (LEDs). The closely packed seven $Ag/SiO_2$ core-shell (CS) nanoparticles (NPs) lie on top of the GaN surface for LSP coupling with a radiated dipole. According to the dipole direction, both the SE rate and the LEE are significantly modified by the LSP effect at the $Ag/SiO_2$ CS NPs when the size of Ag, the thickness of $SiO_2$, and the position of the dipole source are varied. The enhancement of the SE rate is related to an induced dipole effect at the Ag, and the high LEE is caused by light scattering with an LSP mode at $Ag/SiO_2$ CS NPs. We suggest the optimum position of the quantum well (QW) in blue InGaN/GaN LEDs with $Ag/SiO_2$ CS NPs for practical application.

• 한국재료학회지
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• 제23권2호
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• pp.116-122
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• 2013

For fabricating silicon solar cells with high conversion efficiency, texturing is one of the most effective techniques to increase short circuit current by enhancing light trapping. In this study, four different types of textures, large V-groove, large U-groove, small V-groove, and small U-groove, were prepared by a wet etching process. Silicon substrates with V-grooves were fabricated by an anisotropic etching process using a KOH solution mixed with isopropyl alcohol (IPA), and the size of the V-grooves was controlled by varying the concentration of IPA. The isotropic etching process following anisotropic etching resulted in U-grooves and the isotropic etching time was determined to obtain U-grooves with an opening angle of approximately $60^{\circ}$. The results indicated that U-grooves had a larger diffuse reflectance than V-grooves and the reflectances of small grooves was slightly higher than those of large grooves depending on the size of the grooves. Then amorphous Si:H thin film solar cells were fabricated on textured substrates to investigate the light trapping effect of textures with different shapes and sizes. Among the textures fabricated in this work, the solar cells on the substrate with small U-grooves had the largest short circuit current, 19.20 mA/$cm^2$. External quantum efficiency data also demonstrated that the small, U-shape textures are more effective for light trapping than large, V-shape textures.

• 한국결정성장학회지
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• 제6권3호
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• pp.351-359
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• 1996

ECR (electron cyclotron resonance) 플라즈마원이 장착되어 있는 화학선에피탁시 (chemical beam epitaxy : CBE) 장치를 사용하여 InAs 양자점 구조형성에 미치는 수소플라즈마의 효과에 대하여 조사하였다. 자기조직화(self-organized)에 의해 GaAs 기판위에서 InAs 양자점의 형성을 RHEED(reflection high energy electron diffraction)로 관측한 결과 수소가스 및 수소플라즈마의 영향을 받지 않은 상태에서는 1.9 ML(monolayer)의 InAs 층성장(layer growth) 후에 형성되는데 비해 수소플아즈마를 조사한 상태에서는 약 2.6 ML의 InAs 층성장(layer growth) 후에 형성되는데 비해 수소플아즈마를 조사한 상태에서는 약 2.6 ML의 InAs층이 성장된 후 뒤늦게 이루어짐을 확인하였다. 기판의 온도 $370^{\circ}C$에서 동일한 조건으로 형성시킨 InAs 양자점의 밀도 및 크기는 수소플라즈마의 영향을 받지 않은 경우 $1.9{\times}10^{11}cm^{-2}$ 및 17.7 nm에서 수소플라즈마를 쪼인 경우 $1.3{\times}10^{11}cm^{-2}$ 및 19.4 nm로 양자점 형성 다소 완화되는 것으로 나타났다. 또한, 수소플아즈마에 의한 InAs 양자점의 PL(photoluminescence) 신호의 적색이동(red shift)과 반치폭 증가로부터 양자점 크기의 증가와 균일성이 다소 감소되는 모습을 알 수 있었다. 이와같은 수소플라즈마의 영향은 GaAs 기판과 InAs 사이의 부정합 변형환화 효과에의해 InAs의 충성장을 강화시키는 원자상 수소의 작용때문인 것으로 고려되었다.

• ETRI Journal
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• 제34권6호
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• pp.950-953
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• 2012

Schottky barrier single electron transistors (SB-SETs) and Schottky barrier single hole transistors (SB-SHTs) are fabricated on a 20-nm thin silicon-on-insulator substrate incorporating e-beam lithography and a conventional CMOS process technique. Erbium- and platinum-silicide are used as the source and drain material for the SB-SET and SB-SHT, respectively. The manufactured SB-SET and SB-SHT show typical transistor behavior at room temperature with a high drive current of $550{\mu}A/{\mu}m$ and $-376{\mu}A/{\mu}m$, respectively. At 7 K, these devices show SET and SHT characteristics. For the SB-SHT case, the oscillation period is 0.22 V, and the estimated quantum dot size is 16.8 nm. The transconductance is $0.05{\mu}S$ and $1.2{\mu}S$ for the SB-SET and SB-SHT, respectively. In the SB-SET and SB-SHT, a high transconductance can be easily achieved as the silicided electrode eliminates a parasitic resistance. Moreover, the SB-SET and SB-SHT can be operated as a conventional field-effect transistor (FET) and SET/SHT depending on the bias conditions, which is very promising for SET/FET hybrid applications. This work is the first report on the successful operations of SET/SHT in Schottky barrier devices.

• Bulletin of the Korean Chemical Society
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• 제34권9호
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• pp.2737-2740
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• 2013

The layered $KTiNbO_5$ was successfully synthesized with titanium(IV) isopropoxide and niobium oxalate by a novel polymerized complex (PC) method. The morphology and structure of the as-prepared sample was characterized by means of High-Resolution Transmission Electron Microscope, powder X-ray diffraction, and Laser Raman Spectroscopy. The spectral response characteristic was recorded by using UV-vis Diffuse Reflectance Spectroscopy. Results show that $KTiNbO_5$ as-prepared by PC method presents an uniform morphology of nano-particles, the mean particle sizes is ca. 28 nm corresponding to the (002), and the crystal structure can be well indexed to the orthorhombic phase. The sample as-prepared by PC method has higher band gap energy than that of the sample prepared by a solid-state reaction method due to the quantum size effect.

• JSTS:Journal of Semiconductor Technology and Science
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• 제1권1호
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• pp.40-49
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• 2001

We have developed a repeatable process of forming uniform, small-size and high-density self-assembled Si nano-crystals. The Si nano-crystals were fabricated in a conventional LPCVD (low pressure chemical vapor deposition) reactor at $620^{\circ}c$ for 15 sec. The nano-crystals were spherical shaped with about 4.5 nm in diameter and density of $5{\times}l0^{11}/$\textrm{cm}^2$. More uniform dots were fabricated on nitride film than on oxide film. To take advantage of the above-mentioned characteristics of nitride film while keeping the high interface quality between the tunneling dielectrics and the Si substrate, nitride-oxide tunneling dielectrics is proposed in n-channel device. For the first time, the single electron effect at room temperature, which shows a saturation of threshold voltage in a range of gate voltages with a periodicity of ${\Delta}Ｖ_{GS}\;{\approx}\;1.7{\;}V$, corresponding to single and multiple electron storage is reported. The feasibility of p-channel nano-crystal memory with thin oxide in direct tunneling regime is demonstrated. The programming mechanisms of p-channel nano-crystal memory were investigated by charge separation technique. For small gate programming voltage, hole tunneling component from inversion layer is dominant. However, valence band electron tunneling component from the valence band in the nano-crystal becomes dominant for large gate voltage. Finally, the comparison of retention between programmed holes and electrons shows that holes have longer retention time.

• 한국세라믹학회지
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• 제34권5호
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• pp.467-472
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• 1997

Porous silicon was prepared by an anodic etching. The pore size was about 10 nm at an etching time of 20 sec and a current density of 20 mA/$\textrm{cm}^2$. The porous layer was composed of an micro-porous layer (0.6 ${\mu}{\textrm}{m}$) and a macro-porous layer (10 ${\mu}{\textrm}{m}$). Room temperature PL with maximum peak 6700$\AA$ appeared. The peak disappeared by an oxidation reaction when the porous silicon was heated to 100~20$0^{\circ}C$ in atmosphere. In order to avoid the oxidation a heat treatment was done in H2 atmosphere. The micro-pore and Si column, which formed quantum well, were collapsed by the high temperature. The PL maximum peak of heated sample was gradually red-shifted and showed about 300$\AA$ red-shift at 50$0^{\circ}C$. The intensity of PL was maintained to high temperatures in lower pressures. The porous Si was carbonized in C2H2+H2 gas in order to increase thermal stability. The carbonization of the porous Si prevented red-shift of the maximum PL peak caused by sintering effect at high temperatures, and the carbonized porous Si showed Pl signal at higher temperatures by above 20$0^{\circ}C$ than the sample in H2 atmosphere.

• 한국진공학회지
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• 제16권4호
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• pp.298-304
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• 2007

rf 플라즈마 소스가 장착된 분자선 에피택시 장비를 이용하여 Si(111) 기판위에 GaN 나노로드를 성장할 때, N2의 흐름양을 조절하여 나노로드의 구조 및 광학적인 특성을 조사하였다. $N_2$의 양이 1.1sccm에서 2.0sccm으로 변할 때 육각형 모양의 나노로드가 성장되었으며, 평균 직경이 80nm에서 190nm 까지 변화 하였다. 그러나 나노로드와 compact한 영역의 길이 (두께)비는 $N_2$의 양이 1.7sccm 까지는 증가하지만 그 이상에서는 변화지 않았다. PL 측정으로부터, $N_2$의 양이 적은 나노로드에서 자유 엑시톤의 피이크가 더욱 뚜렷하게 관측되었고, 모든 PL 피이크의 위치는 직경이 적을수록 나노로드의 크기 효과에 의해서 고에너지 쪽으로 이동하였다. $N_2$의 양이 1.7sccm 인 시료에서는 온도에 따른 PL의 피이크의 위치가 온도가 증가함에 따라서 "S-형"의 거동을 나타내었다.