• 한국표면공학회지
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• 제40권5호
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• pp.209-213
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• 2007

Change of the plasma volume by pulse frequency in a bipolar pulsed DC unbalanced magnetron sputtering was investigated. As increasing the frequency at off duty 10% and at a constant power, the plasma volume was lengthened in vertical direction from the AZO target. When there is an electrically floated substrate, the vertical length of the plasma area was not affected by the pulse frequency. Instead, the diameter of the plasma volume was increased. We found that the temperature rise of a substrate was affected by the pulse frequency, too. As increasing it, the maximum temperature rise of a glass substrate was decreased from $132^{\circ}C\;to\;108^{\circ}C$.

• 전자공학회논문지B
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• 제29B권1호
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• pp.67-75
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• 1992

A new method of driving the PDP(Plasma Display Panel) was proposed and its characteristics were investigated. Applying high frequency non-discharge pulses to an auxiliary anode resulted an increased region of stable operation, decreased delay time and increased light intensity. It is suggested that PDP with DPM (Double Pulse Memory) drive technique improves the delay time, luminance, region of stable operation and luminous efficacy compared to PDP with PPM(Planar Pulse Memory) drive technique developed by NHK Lab. in Japan.

• 전기학회논문지
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• 제57권7호
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• pp.1218-1222
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• 2008

We investigate the effect of rise time of a pulse bias voltage on atmospheric plasma generation. With the faster rise time of the pulse bias, the glow discharge appears to be more uniformly generated along the electrodes. I-V measurement confirms that higher loading power can be obtained using the faster rise time. A new understanding for atmospheric plasma generation at a micro-gap electrode is suggested.

• 전기학회논문지
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• 제56권10호
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• pp.1802-1806
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• 2007

Nowadays, many configurations and applications of small atmospheric plasma source have been investigated with growing interest, as it provides the bacteria inactivation, the surface modification and removal of unwanted small regions, and so on. In this paper, the non-thermal micro plasma source under atmospheric pressure by means of submicrosecond pulse voltage waveforms is suggested. Plasma operates in helium is appears as a small (sub-mm) glow at the tip of a plasma gun. Electrical measurements show that the plasma source operates at low voltage (about 500V) and the power consumption is about 1W at 25kHz. Moreover, the emission spectrum shows the relatively higher emission intensity of oxygen particles than those of helium and nitrogen.

• 한국표면공학회지
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• 제45권2호
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• pp.53-60
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• 2012

Modulated Pulse Power (MPP) magnetron sputtering is a new high-power pulsed magnetron sputtering (HPPMS) technology which overcomes the low deposition rate problem by modulating the pulse voltage shape, amplitude, and the duration. Highly ionized magnetron sputtering can be performed without arcing because it can be controlled as multiple steps of micro pulses within one overall pulse period in the range of 500-3,000 ${\mu}s$. In this study, the various waveforms of discharge voltage and current for micro pulse sets of MPP were investigated to find the possibility of controlling the strongly ionized plasma mode. Enhanced ionization of the sputtered metal atoms was obtained by OES. Large grained columnar structure can be grown by the strongly ionized plasma mode in the AZO deposition using MPP. In the most highly ionized deposition condition, the preferred orientation of (002) plane decreased, and the resistivity, therefore, increased by the plasma damage.

• 한국재료학회지
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• 제11권12호
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• pp.1063-1067
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• 2001

The effect of the pulse parameters(pulse ratio and frequency) on the characteristics of the nitrided layer in the pulsed plasma nitrified SCM435 Steels was investigated. Material properties of the nitrided layer were analysed by employing optical microscope, scanning electron microscope(SEM), X-ray diffractometer(XRD) and micro-Vickers hardness tester. It was found that both the compound layer thickness and the surface hardness decreased with decreasing of pulse ratios. At high pulse ratio, the compound layer thickness and the surface hardness were rapidly decreased with decreasing frequency compared to lower pulse ratios.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2004년도 하계학술대회 논문집 C
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• pp.1817-1819
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• 2004

From the plasma application point of view, electron temperature and density are one of the most important parameters for plasma process. But it is only available to control plasma by adjusting external factors like gas pressure and input power. In this paper, pulse-modulated plasma is generated by modulating 13.56GHz RF power with 1, 5, 10kHz pulse. And Langmuir probe technique is used to study the distribution of electron temperature and density. When modulated pulse is off, electron temperature decreases gradually in form of exponential decay. The value t of exponential decay slope is 33.619, 13.834, 10.803 in 1kHz. 5kHz. 10kHz. This implies that this method can be used to control electron temperature and density.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2002년도 하계학술대회 논문집 C
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• pp.1830-1833
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• 2002

We measured 3-dimensional temporal behavior of the light emitted from AC plasma display panel(PDP) at various auxiliary voltage pulse width supplied to the address electrode in sustain period using scanned point detecting system. In the case of applying an auxiliary address voltage pulse, the light emission starts at the inner edges of the cathode so the larger discharge volume toward address electrode can be obtained compared with the normal sustain discharge. Especially, when the auxiliary voltage pulse width is the $2{\mu}s$, the maximum luminance and long emission time can be obtained.

• 한국재료학회지
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• 제28권10호
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• pp.544-550
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• 2018

The passivation of AZ91D Mg alloys by plasma anodization requires deliberate choice of process parameters due to the presence of large amounts of structural defects. We study the dependence of pore formation, surface roughness and corrosion resistance on voltage by comparing the direct current (DC) mode and the pulse wave (pulse) mode in which anodization is performed. In the DC plasma anodization mode, the thickness of the electrolytic oxide film of the AZ91D alloy is uneven. In the pulse mode, the thickness is relatively uniform and the formed thin film has a three-layer structure. The pulse mode creates less roughness, uniform thickness and improved corrosion resistance. Thus, the change of power mode from DC to pulse at 150 V decreases the surface roughness (Ra) from $0.9{\mu}m$ to $0.1{\mu}m$ and increases the corrosion resistance in rating number (RN) from 5 to 9.5. Our study shows that an optimal oxide film can be obtained with a pulse voltage of 150 V, which produces an excellent coating on the AZ91D casting alloy.

• 한국표면공학회지
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• 제47권5호
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• pp.221-226
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• 2014

A low temperature plasma nitrocarburizng was implemented on the duplex stainless steel to achieve the enhancement of surface hardness without degradation of its corrosion resistance. Attempts were made to investigate the influence of Pulse frequency and Duty factor of pulsed power in a high Pulse frequency regime on the surface characteristics of the hardened layer. The hardened layer (S-phase) was formed on all of the treated surfaces. Surface hardness reached up to 1300 $HV_{0.1}$ which is about 4.6 times higher than that of the untreated material (280 $HV_{0.1}$). The thickness of the hardened layer tends to increase lightly with the higher Pulse frequency and the higher Duty factor. The corrosion resistance of nitrocarburized duplex stainless steel was almost similar to that of the untreated material. Both the Pulse frequency and the Duty factor do not have a significant influence on the corrosion property of plasma treated duplex stainless steel.