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Effect of Rise Time of a Pulse Bias Voltage on Atmospheric Plasma Generation  

Kim, Jae-Hyeok (홍익대 대학원 전기정보제어공학부)
Jin, Sang-Il (홍익대 대학원 전기정보제어공학부)
Kim, Young-Min (홍익대 공대 전자전기공학부)
Publication Information
The Transactions of The Korean Institute of Electrical Engineers / v.57, no.7, 2008 , pp. 1218-1222 More about this Journal
Abstract
We investigate the effect of rise time of a pulse bias voltage on atmospheric plasma generation. With the faster rise time of the pulse bias, the glow discharge appears to be more uniformly generated along the electrodes. I-V measurement confirms that higher loading power can be obtained using the faster rise time. A new understanding for atmospheric plasma generation at a micro-gap electrode is suggested.
Keywords
MEMS; Electroplating; Self-aligned; Discharge; Plasma;
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