• 제목/요약/키워드: Process Patterns

검색결과 3,174건 처리시간 0.053초

황동의 Micro Groove 가공시 절삭칩과 표면거칠기 (Cutting Chip and Surface Roughness in Micro Groove Cutting of Brass)

  • 민경탁;장호수
    • 한국기계가공학회지
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    • 제9권4호
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    • pp.1-7
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    • 2010
  • Recently optical and electric and electronic forms in the field of ultra fine patterns has been used extensively, and techniques of the optical parts are required that can precision-machine this micro-patterns such as V or R-shaped micro-groove patterns. In this study, V and R type, shaping the way micro groove brass machining process to characterize the material feed rate and cutting depth and the V and R as a variable brother, using two kinds of diamond tools for each picture shape and surface roughness caused by conditions such as chips, processed through the analysis of effects of geometry and analysis such as precision machining.

인터넷 메신저를 이용한 의사결정 환경에서의 커뮤니케이션패턴에 관한 연구

  • 박상혁
    • 한국정보시스템학회:학술대회논문집
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    • 한국정보시스템학회 2004년도 추계학술대회
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    • pp.499-513
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    • 2004
  • This study identifies communication patterns of groups using Internet Messenger for their group decision-making, and examines how these patterns are associated with creative solutions to problems. Our research suggests that certain communication behavior of groups, when appropriately organized, can be of help in enhancing creative production of outcomes. A qualitative study was conducted on communication patterns based on an analysis of text-based electronic conversation protocols. Specifically this research tried to overcome existing studies on electronic groups by focusing on interactive process of communication among participants. The major study conclusions are: (1) The production of creative outcome may depend on the process or sequence of discussion among group members with Internet Messenger. That is, proper interactive responses and appropriate control of the discussion process are essential to obtain a high level of performance. (2) It is important to make discuss rules based on meta-cognitive and interactive protocols in the early stage. Explicit rules relating to internal group processes as well as communication medium use are even more important to groups with Internet Messenger than face-to-face groups.

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나노 임프린트 공정을 이용한 결정형 실리콘 태양전지 효율 향상 기술 (Technology for Efficiency Enhancement of Crystalline Si Solar Cell using Nano Imprint Process)

  • 조영태;정윤교
    • 한국기계가공학회지
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    • 제12권5호
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    • pp.30-35
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    • 2013
  • In order to increase cell efficiency in crystalline silicon solar cell, reduction of light reflection is one of the essential problem. Until now silicon wafer was textured by wet etching process which has random patterns along crystal orientation. In this study, high aspect ratio patterns are manufactured by nano imprint process and reflectance could be minimized under 1%. After that, screen printed solar cell was fabricated on the textured wafer and I-V characteristics was measured by solar simulator. Consequently cell efficiency of solar cell fabricated using the wafer textured by nano imprint process increased 1.15% than reference solar cell textured by wet etching. Internal quantum efficiency was increased in the range of IR wave length but decreased in the UV wavelength. In spite of improved result, optimization between nano imprinted pattern and solar cell process should be followed.

가스 용해를 고려한 금형내압제어 사출성형공정의 마이크로패턴 충전 해석 (Numerical Analysis of Micro-pattern Filling with Gas Dissolution by Injection Molding Process)

  • 박성호;유형민;이우일
    • 한국기계가공학회지
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    • 제13권4호
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    • pp.21-27
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    • 2014
  • The injection molding process has several advantages enabling it to produce large quantities of molded plastic products using a repetitive process. In recent years, it has been necessary to develop an injection molding process with micro/nano-sized patterns for application to the semiconductor industry and to the bio/nano manufacturing industry. In this study, we apply gas pressure to the inside of a mold and consider the gas dissolution phenomenon for a resin filling into a micro pattern with a line structure. Using numerical analysis, we calculate the filling ratio with respect to time for various internal gas pressures and various aspect ratios of the micro-patterns.

노인의 임종과정에 대한 태도 유형 분석 (A Study on Attitude Patterns of Elderly toward Dying)

  • 김순이;김신미
    • 성인간호학회지
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    • 제15권3호
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    • pp.343-353
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    • 2003
  • Purpose: This study was performed to identify and understand the nature of attitude patterns regarding dying process exhibited in the elderly persons who lived in the community setting. Method: Q methodology was applied. Ten elderly were selected from the senior centers and requested to answer open ended questions by using written questionnaires. Additionally, 12 other elderly from different senior centers were interviewed in depth, and their statements were recorded via voice pen by researchers to derive Q-population. From the 120 Q-population, 33 Q-sample were selected. 22 P-sample were rated by 1 to 9 point scale respectively for Q-sorting. For Q-type analysis, pc QUNAL was used. Result: Three types of attitude patterns were identified, which were valuing dignity, seeking provision of nature, and avoiding of dying process. Conclusion: The significance of this study is as follows : Discovery of 3 attitude patterns of elderly toward dying, better understanding about elderly's perspectives for favorable dying, and informations for possible development of nursing strategies for elderly who is facing death.

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광리소그래피에서 최적 모양의 패턴 구현을 위한 포토마스크 역설계 (Reverse design of photomask for optimum fiedelity in optical lithography)

  • 이재철;오명호;임성우
    • 전자공학회논문지D
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    • 제34D권12호
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    • pp.62-67
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    • 1997
  • The optical lithography wit an ArF excimer laser as a light source is expected to be used in the mass production of giga-bit DRAMs which require less than 0.2.mu.m minimum feature size. In this case, the distortion of a patterned image becomes very severe, since the lithography porcess is performed at the resolution limit. Traditionally, the photomask pattern was designed and revised with trial-and-error methods, such as repeated execution of process simulators or actual process experiments which require time and effort. Ths paper describes a program which automatically finds an optimal mask pattern. The program divides the mask plane into cells with same sizes, chooses a cell randomly, changes the transparent/opaque property of the cell, and eventually genrates a mask pattern which produces required image pattern. The program was applied to real DRAM cell patterns to produce mask patterns which genertes image patterns closer to object images than original mask patterns.

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미세패턴 평판 금형가공 기술동향 (Trends of Flat Mold Machining Technology with Micro Pattern)

  • 제태진;최두선;전은채;박언석;최환진
    • 한국기계가공학회지
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    • 제11권2호
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    • pp.1-6
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    • 2012
  • Recent ultra-precision machining systems have nano-scale resolution, and can machine various shapes of complex structures using five-axis driven modules. These systems are also multi-functional, which can perform various processes such as planing, milling, turning et al. in one system. Micro machining technology using these systems is being developed for machining fine patterns, hybrid patterns and high aspect-ratio patterns on large-area molds with high productivity. These technology is and will be applied continuously to the fields of optics, display, energy, bio, communications and et al. Domestic and foreign trends of micro machining technologies for flat molds were investigated in this study. Especially, we focused on the types and the characteristics of ultra-precision machining systems and application fields of micro patterns machined by the machining system.

SWCNT 다중채널 FET용 표면 프로그램된 APTES와 OTS 패턴을 이용한 공정에 대한 연구 (Programmed APTES and OTS Patterns for the Multi-Channel FET of Single-Walled Carbon Nanotubes)

  • 김병철;김주연;안호명
    • 한국정보전자통신기술학회논문지
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    • 제8권1호
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    • pp.37-44
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    • 2015
  • 본 논문에서 전계효과 트랜지스터 (field effect transistor; FET) 제작을 위한 표면 프로그램된 aminopropylethoxysilane(APTES)와 1-octadecyltrichlorosilane(OTS) 패턴을 이용하여 단일벽 탄소 나노튜브(single-walled carbon nanotube; SWCNT)를 실리콘 기판 위에 선택적으로 흡착시키는 공정방법을 제안하였다. 양성 표면 분자 패턴을 만들기 위해 형성된 APTES 패턴은 많은 양의 SWCNT의 흡착을 위해 제작되었고, OTS 만을 이용한 공정보다 효과적인 SWCNT 흡착이 가능하다. 산화막(silicon dioxide)이 형성된 실리콘 기판 위에 사진공정(photolithography process)을 이용하여 임의의 감광액(photoresist; PR) 패턴이 형성되었다. PR 패턴이 형성된 기판은 헥산 용매를 이용하여 1:500 (v/v)로 희석된 OTS 용액 속에 담가진다. OTS 박막이 표면 전체에 만들어지고, PR 패턴이 제거되는 과정에서 PR 위에 형성되었던 OTS 박막도 같이 제거되어, 선택적으로 형성된 OTS 박막 패턴을 얻을 수 있다. 이 기판은 다시 에탄올 용매를 이용하여 희석된 APTES 용액 속에 담가진다. APTES 박막은 OTS 박막 패턴이 없는 노출된 산화막 위에 형성된다. 마지막으로 이처럼 APTES와 OTS에 의해 표면 프로그램된 기판은 SWCNT가 분산된 다이클로로벤젠(dichlorobenzene) 용액 속에 담가진다. 결과적으로 SWCNT는 양 극성을 띠는(positive charged) APTES 박막 패턴 위에만 흡착된다. 반면 중성O TS 박막 패턴 위에는흡착되지 않는다. 이러한 표면 프로그램 방법을 사용하여 SWCNT는 원하는 영역에 자기 조립시킬 수 있다. 우리는 이 방법을 이용하여 소오스와 드레인 전극사이에 SWCNT가 멀티 채널로 구성된 다중채널 FET를 성공적으로 제작하였다.

서보건을 이용한 저항 점용접 공정에서의 가압력 패턴에 의한 용접품질 평가 (The Evaluation on Welding Qualities by Gun Press Force Patterns in the RSW (Resistance Spot Welding) Process using Servo Gun)

  • 박영제;조형석;박지환
    • 제어로봇시스템학회:학술대회논문집
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    • 제어로봇시스템학회 2000년도 제15차 학술회의논문집
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    • pp.252-252
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    • 2000
  • The Resistance Spot Welding (RSW) has been considered as an inherently safe and reliable method far joining metals, and has been widely employed, especially in automobile body assembly shops, as a manufacturing process. In recent years, the requirement for more sophisticated quality control procedures has considerably grown in the mass production industries. The object of the application of servo control to spot welding gun is the improvement of quality control in the spot welding, one of conventional industrial areas. The important factors affecting welding qualities (shear strength, nuggest size, indentation depth) are welding current, welding time, and gun press force. Welding current and welding time are controlled by welding timer. But, the conventional welding guns using compressed air are out of control in changing gun press forces in welding process. In this paper, a servo gun welding system having a AC servo motor and a PC control system is presented. The main object of this paper is to estimate the influence of gun press force changes in the welding process (press time -> welding time -> hold time) to welding qualities, and to evaluate welding qualities in real time, by recognizing the patterns of gun press forces changed in the welding process and comparing with the standard patterns.

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프로세스 기반 이벤트 분석을 이용한 비즈니스 활동 모니터링 (Business Activity Monitoring Using Process-based Event Analysis)

  • 손성호;정재윤;강석호;조남욱
    • 한국전자거래학회지
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    • 제12권2호
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    • pp.219-231
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    • 2007
  • 본 논문에서는 복합 이벤트 처리를 적용하여 비즈니스 활동 분석(BAM)을 위한 이벤트 분석 방안을 제안한다. 이는 프로세스 관리자가 프로세스가 종료되기 이전에 발생 가능한 위험을 감지하고 모니터링하기 위하여 실시간에 진행되는 이벤트에 대하여 조기 경보를 제공하기 위하여 개발되었다. 본 연구에서는 의미 있는 위험을 가지는 이벤트를 추출하는, 프로세스 기반의 이벤트 모니터링 과정을 제시하였다. 복합 이벤트 패턴은 과거 누적된 이벤트 로그를 바탕으로 정의되며, 이벤트의 위험도는 그 패턴들에 기반하여 평가된다. 제안된 방법론은 홈쇼핑업체의 서비스 프로세스의 예를 이용하여 설명한다.

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